KR20120127755A - 노광장치 및 디바이스 제조방법 - Google Patents

노광장치 및 디바이스 제조방법 Download PDF

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Publication number
KR20120127755A
KR20120127755A KR1020127029007A KR20127029007A KR20120127755A KR 20120127755 A KR20120127755 A KR 20120127755A KR 1020127029007 A KR1020127029007 A KR 1020127029007A KR 20127029007 A KR20127029007 A KR 20127029007A KR 20120127755 A KR20120127755 A KR 20120127755A
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KR
South Korea
Prior art keywords
substrate
liquid
recovery
recovery device
stage
Prior art date
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Ceased
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KR1020127029007A
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English (en)
Korean (ko)
Inventor
마사히로 네이
나오유키 고바야시
다이 아라이
소이치 오와
Original Assignee
가부시키가이샤 니콘
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Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20120127755A publication Critical patent/KR20120127755A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020127029007A 2002-12-10 2003-12-08 노광장치 및 디바이스 제조방법 Ceased KR20120127755A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2002-357958 2002-12-10
JP2002357958 2002-12-10
JP2003296491 2003-08-20
JPJP-P-2003-296491 2003-08-20
PCT/JP2003/015666 WO2004053953A1 (ja) 2002-12-10 2003-12-08 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020057009676A Division KR20050062665A (ko) 2002-12-10 2003-12-08 노광장치 및 디바이스 제조방법

Publications (1)

Publication Number Publication Date
KR20120127755A true KR20120127755A (ko) 2012-11-23

Family

ID=32510636

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020057009676A Abandoned KR20050062665A (ko) 2002-12-10 2003-12-08 노광장치 및 디바이스 제조방법
KR1020127029007A Ceased KR20120127755A (ko) 2002-12-10 2003-12-08 노광장치 및 디바이스 제조방법

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020057009676A Abandoned KR20050062665A (ko) 2002-12-10 2003-12-08 노광장치 및 디바이스 제조방법

Country Status (9)

Country Link
US (3) US20050219488A1 (enExample)
EP (1) EP1571695A4 (enExample)
JP (1) JP4596077B2 (enExample)
KR (2) KR20050062665A (enExample)
CN (2) CN101852993A (enExample)
AU (1) AU2003289236A1 (enExample)
SG (3) SG158745A1 (enExample)
TW (1) TW200425268A (enExample)
WO (1) WO2004053953A1 (enExample)

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* Cited by examiner, † Cited by third party
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US20060238730A1 (en) 2006-10-26
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US7589820B2 (en) 2009-09-15
US20090180089A1 (en) 2009-07-16
TWI334160B (enExample) 2010-12-01
KR20050062665A (ko) 2005-06-23
CN1723541A (zh) 2006-01-18
EP1571695A4 (en) 2008-10-15
CN101852993A (zh) 2010-10-06
SG158745A1 (en) 2010-02-26
CN1723541B (zh) 2010-06-02
US8089611B2 (en) 2012-01-03
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