KR101590686B1 - 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법 - Google Patents

액침 리소그래피용 유체를 제공하기 위한 장치 및 방법 Download PDF

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Publication number
KR101590686B1
KR101590686B1 KR1020137016869A KR20137016869A KR101590686B1 KR 101590686 B1 KR101590686 B1 KR 101590686B1 KR 1020137016869 A KR1020137016869 A KR 1020137016869A KR 20137016869 A KR20137016869 A KR 20137016869A KR 101590686 B1 KR101590686 B1 KR 101590686B1
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South Korea
Prior art keywords
fluid
workpiece
optical element
nozzle
recovery
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Expired - Fee Related
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KR1020137016869A
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English (en)
Korean (ko)
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KR20130090918A (ko
Inventor
알렉스 카 팀 푼
레너드 와이 펑 코
Original Assignee
가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/522—Projection optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H10P76/2041—

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1020137016869A 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법 Expired - Fee Related KR101590686B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US50031203P 2003-09-03 2003-09-03
US60/500,312 2003-09-03
US54132904P 2004-02-02 2004-02-02
US60/541,329 2004-02-02
PCT/US2004/022915 WO2005024517A2 (en) 2003-09-03 2004-07-16 Apparatus and method for providing fluid for immersion lithography

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020117024246A Division KR101371917B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020147005373A Division KR101523180B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법

Publications (2)

Publication Number Publication Date
KR20130090918A KR20130090918A (ko) 2013-08-14
KR101590686B1 true KR101590686B1 (ko) 2016-02-01

Family

ID=34278701

Family Applications (8)

Application Number Title Priority Date Filing Date
KR1020137016869A Expired - Fee Related KR101590686B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020127020883A Expired - Fee Related KR101308826B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020147029538A Expired - Fee Related KR101748923B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020117024246A Expired - Fee Related KR101371917B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020177015903A Abandoned KR20170070264A (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020117019694A Expired - Fee Related KR101288140B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020067003381A Expired - Fee Related KR101238114B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020147005373A Expired - Fee Related KR101523180B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법

Family Applications After (7)

Application Number Title Priority Date Filing Date
KR1020127020883A Expired - Fee Related KR101308826B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020147029538A Expired - Fee Related KR101748923B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020117024246A Expired - Fee Related KR101371917B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020177015903A Abandoned KR20170070264A (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020117019694A Expired - Fee Related KR101288140B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020067003381A Expired - Fee Related KR101238114B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020147005373A Expired - Fee Related KR101523180B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법

Country Status (7)

Country Link
US (8) US7292313B2 (enExample)
EP (4) EP1660925B1 (enExample)
JP (10) JP4288426B2 (enExample)
KR (8) KR101590686B1 (enExample)
CN (1) CN101430508B (enExample)
TW (6) TWI578112B (enExample)
WO (1) WO2005024517A2 (enExample)

Families Citing this family (224)

* Cited by examiner, † Cited by third party
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