KR101139142B1 - 질화물계 반도체 소자 및 그 제조 방법 - Google Patents
질화물계 반도체 소자 및 그 제조 방법 Download PDFInfo
- Publication number
- KR101139142B1 KR101139142B1 KR1020107012782A KR20107012782A KR101139142B1 KR 101139142 B1 KR101139142 B1 KR 101139142B1 KR 1020107012782 A KR1020107012782 A KR 1020107012782A KR 20107012782 A KR20107012782 A KR 20107012782A KR 101139142 B1 KR101139142 B1 KR 101139142B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- gan
- nitride
- electrode
- plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
- H10D62/8503—Nitride Group III-V materials, e.g. AlN or GaN
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/14—Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
Landscapes
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008285155 | 2008-11-06 | ||
| JPJP-P-2008-285155 | 2008-11-06 | ||
| JP2009030147 | 2009-02-12 | ||
| JPJP-P-2009-030147 | 2009-02-12 | ||
| JPJP-P-2009-097684 | 2009-04-14 | ||
| JP2009097684 | 2009-04-14 | ||
| PCT/JP2009/002532 WO2010052810A1 (ja) | 2008-11-06 | 2009-06-04 | 窒化物系半導体素子およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20100087372A KR20100087372A (ko) | 2010-08-04 |
| KR101139142B1 true KR101139142B1 (ko) | 2012-04-26 |
Family
ID=42152624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020107012782A Expired - Fee Related KR101139142B1 (ko) | 2008-11-06 | 2009-06-04 | 질화물계 반도체 소자 및 그 제조 방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US20110156048A1 (enExample) |
| EP (1) | EP2226853B1 (enExample) |
| JP (2) | JP4486701B1 (enExample) |
| KR (1) | KR101139142B1 (enExample) |
| CN (1) | CN101971364B (enExample) |
| WO (1) | WO2010052810A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101220042B1 (ko) | 2006-02-20 | 2013-01-18 | 엘지이노텍 주식회사 | 질화물 반도체 발광소자 및 그 제조 방법 |
| JP4486701B1 (ja) * | 2008-11-06 | 2010-06-23 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| EP2273573A4 (en) | 2009-03-11 | 2012-11-14 | Panasonic Corp | NITRIDE SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREFOR |
| CN102067348B (zh) * | 2009-04-06 | 2013-03-27 | 松下电器产业株式会社 | 氮化物系半导体元件及其制造方法 |
| CN102511085A (zh) * | 2009-12-25 | 2012-06-20 | 松下电器产业株式会社 | 氮化物系半导体元件及其制造方法 |
| JP4909448B2 (ja) | 2010-04-01 | 2012-04-04 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| JP4843123B2 (ja) | 2010-04-01 | 2011-12-21 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| JP4820465B1 (ja) | 2010-04-02 | 2011-11-24 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| CN102859724A (zh) | 2010-04-28 | 2013-01-02 | 松下电器产业株式会社 | 氮化物系半导体元件及其制造方法 |
| JP5547279B2 (ja) * | 2010-04-28 | 2014-07-09 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| US9253700B2 (en) | 2010-12-01 | 2016-02-02 | Nec Corporation | Radio base station, relay base station, mobile terminal, mobile communication system, and operation control method |
| CN103003964A (zh) | 2011-01-21 | 2013-03-27 | 松下电器产业株式会社 | 氮化镓类化合物半导体发光元件和具有该发光元件的光源 |
| JP5232338B2 (ja) * | 2011-04-08 | 2013-07-10 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| JP5437533B2 (ja) * | 2011-04-12 | 2014-03-12 | パナソニック株式会社 | 窒化ガリウム系化合物半導体発光素子およびその製造方法 |
| JP2012231087A (ja) * | 2011-04-27 | 2012-11-22 | Mitsubishi Chemicals Corp | 窒化物系ledの製造方法 |
| CN103081138A (zh) | 2011-05-18 | 2013-05-01 | 松下电器产业株式会社 | 氮化物类半导体发光元件及其制造方法 |
| KR20140085508A (ko) * | 2011-10-13 | 2014-07-07 | 가부시키가이샤 다무라 세이사쿠쇼 | 결정 적층 구조체 및 그 제조 방법 및 반도체 소자 |
| CN105144345B (zh) * | 2013-03-15 | 2018-05-08 | 晶体公司 | 与赝配电子和光电器件的平面接触 |
| KR102111140B1 (ko) * | 2013-08-30 | 2020-05-14 | 서울바이오시스 주식회사 | 발광 다이오드 및 그것을 제조하는 방법 |
| KR101439064B1 (ko) | 2013-12-02 | 2014-09-05 | 단국대학교 산학협력단 | 이종 접합 구조를 가지는 발광 다이오드 및 이의 제조방법 |
| JP2024106734A (ja) * | 2023-01-27 | 2024-08-08 | 国立大学法人東海国立大学機構 | 半導体装置および半導体装置の製造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1084159A (ja) | 1996-09-06 | 1998-03-31 | Matsushita Electric Ind Co Ltd | 半導体発光素子およびその製造方法 |
| JP2000174333A (ja) | 1998-12-02 | 2000-06-23 | Toshiba Corp | 窒化ガリウム系化合物半導体発光素子及び製造方法 |
| KR20050063293A (ko) * | 2003-12-22 | 2005-06-28 | 삼성전자주식회사 | 플립칩형 질화물계 발광소자 및 그 제조방법 |
| JP2008235804A (ja) | 2007-03-23 | 2008-10-02 | Rohm Co Ltd | 発光素子 |
Family Cites Families (62)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0711429A (ja) | 1993-06-23 | 1995-01-13 | Toshiba Corp | 金属蒸気発生方法および装置 |
| JPH0711430A (ja) * | 1993-06-29 | 1995-01-13 | Mitsubishi Electric Corp | 電子ビーム蒸着装置と電子ビームを用いた溶接装置及び自由電子レーザ装置 |
| US5708301A (en) * | 1994-02-28 | 1998-01-13 | Sumitomo Chemical Company, Limited | Electrode material and electrode for III-V group compound semiconductor |
| JP3494478B2 (ja) * | 1994-08-22 | 2004-02-09 | 日亜化学工業株式会社 | 窒化ガリウム系化合物半導体素子 |
| US6900465B2 (en) * | 1994-12-02 | 2005-05-31 | Nichia Corporation | Nitride semiconductor light-emitting device |
| US6072197A (en) * | 1996-02-23 | 2000-06-06 | Fujitsu Limited | Semiconductor light emitting device with an active layer made of semiconductor having uniaxial anisotropy |
| JPH10341039A (ja) | 1997-04-10 | 1998-12-22 | Toshiba Corp | 半導体発光素子およびその製造方法 |
| JP4013288B2 (ja) | 1997-06-25 | 2007-11-28 | 住友化学株式会社 | 3−5族化合物半導体用電極の製造方法と3−5族化合物半導体素子 |
| JP3299145B2 (ja) | 1997-07-15 | 2002-07-08 | 日本電気株式会社 | 窒化ガリウム系半導体のp型電極およびその形成方法 |
| JPH11233890A (ja) | 1998-02-12 | 1999-08-27 | Matsushita Electric Ind Co Ltd | 窒化ガリウム系化合物半導体素子 |
| JP4183299B2 (ja) * | 1998-03-25 | 2008-11-19 | 株式会社東芝 | 窒化ガリウム系化合物半導体発光素子 |
| JP3494880B2 (ja) * | 1998-03-26 | 2004-02-09 | 株式会社東芝 | 窒化物系半導体発光素子のp側電極及び窒化物系半導体発光素子 |
| JP2000049114A (ja) * | 1998-07-30 | 2000-02-18 | Sony Corp | 電極およびその形成方法ならびに半導体装置およびその製造方法 |
| JP3525061B2 (ja) | 1998-09-25 | 2004-05-10 | 株式会社東芝 | 半導体発光素子の製造方法 |
| JP4627850B2 (ja) | 1999-09-09 | 2011-02-09 | シャープ株式会社 | Iii族窒化物半導体の電極形成方法 |
| JP2001160656A (ja) | 1999-12-01 | 2001-06-12 | Sharp Corp | 窒化物系化合物半導体装置 |
| JP3929008B2 (ja) | 2000-01-14 | 2007-06-13 | シャープ株式会社 | 窒化物系化合物半導体発光素子およびその製造方法 |
| JP2001308462A (ja) | 2000-04-21 | 2001-11-02 | Matsushita Electric Ind Co Ltd | 窒化物半導体素子の製造方法 |
| JP2002170989A (ja) | 2000-12-04 | 2002-06-14 | Sharp Corp | 窒化物系化合物半導体発光素子 |
| JP3453558B2 (ja) | 2000-12-25 | 2003-10-06 | 松下電器産業株式会社 | 窒化物半導体素子 |
| US6649942B2 (en) * | 2001-05-23 | 2003-11-18 | Sanyo Electric Co., Ltd. | Nitride-based semiconductor light-emitting device |
| KR100583243B1 (ko) * | 2001-05-28 | 2006-05-25 | 쇼와 덴코 가부시키가이샤 | 반도체 소자, 반도체층 및 그 제조방법 |
| JP2003332697A (ja) | 2002-05-09 | 2003-11-21 | Sony Corp | 窒化物半導体素子及びその製造方法 |
| JP2004335559A (ja) * | 2003-04-30 | 2004-11-25 | Nichia Chem Ind Ltd | Iii族窒化物基板を用いる半導体素子 |
| US8350384B2 (en) * | 2009-11-24 | 2013-01-08 | Stats Chippac, Ltd. | Semiconductor device and method of forming electrical interconnect with stress relief void |
| KR100506741B1 (ko) * | 2003-12-24 | 2005-08-08 | 삼성전기주식회사 | 플립칩용 질화물 반도체 발광소자 및 그 제조방법 |
| KR100586943B1 (ko) * | 2003-12-26 | 2006-06-07 | 삼성전기주식회사 | 질화갈륨계 반도체 발광소자의 제조방법 |
| JP4439955B2 (ja) | 2004-03-15 | 2010-03-24 | パナソニック株式会社 | 半導体装置及び半導体レーザ装置の製造方法 |
| JP2005290510A (ja) * | 2004-04-02 | 2005-10-20 | Sodick Co Ltd | 電子ビーム蒸着方法及びその装置 |
| US9130119B2 (en) * | 2006-12-11 | 2015-09-08 | The Regents Of The University Of California | Non-polar and semi-polar light emitting devices |
| KR100773538B1 (ko) * | 2004-10-07 | 2007-11-07 | 삼성전자주식회사 | 반사 전극 및 이를 구비하는 화합물 반도체 발광소자 |
| TW200711171A (en) | 2005-04-05 | 2007-03-16 | Toshiba Kk | Gallium nitride based semiconductor device and method of manufacturing same |
| DE102005061828B4 (de) * | 2005-06-23 | 2017-05-24 | Osram Opto Semiconductors Gmbh | Wellenlängenkonvertierendes Konvertermaterial, lichtabstrahlendes optisches Bauelement und Verfahren zu dessen Herstellung |
| US7329907B2 (en) * | 2005-08-12 | 2008-02-12 | Avago Technologies, Ecbu Ip Pte Ltd | Phosphor-converted LED devices having improved light distribution uniformity |
| JP2007116076A (ja) * | 2005-09-22 | 2007-05-10 | Matsushita Electric Ind Co Ltd | 半導体素子 |
| JP4137936B2 (ja) * | 2005-11-16 | 2008-08-20 | 昭和電工株式会社 | 窒化ガリウム系化合物半導体発光素子 |
| KR100742988B1 (ko) | 2005-11-25 | 2007-07-26 | (주)더리즈 | p형 질화갈륨계 디바이스 제조방법 |
| JP2009526370A (ja) * | 2006-02-09 | 2009-07-16 | キユーデイー・ビジヨン・インコーポレーテツド | 半導体ナノ結晶およびドープされた有機材料を含む層を含むデバイスおよび方法 |
| US7755172B2 (en) | 2006-06-21 | 2010-07-13 | The Regents Of The University Of California | Opto-electronic and electronic devices using N-face or M-plane GaN substrate prepared with ammonothermal growth |
| JP2007329418A (ja) * | 2006-06-09 | 2007-12-20 | Rohm Co Ltd | 窒化物半導体発光素子 |
| JP4984119B2 (ja) * | 2006-08-28 | 2012-07-25 | スタンレー電気株式会社 | 窒化物半導体結晶ないしそれを用いた発光素子及びその製造方法 |
| JP2008109066A (ja) | 2006-09-29 | 2008-05-08 | Rohm Co Ltd | 発光素子 |
| JP2010512661A (ja) | 2006-12-11 | 2010-04-22 | ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア | 高特性無極性iii族窒化物光デバイスの有機金属化学気相成長法(mocvd)による成長 |
| JP2008153285A (ja) | 2006-12-14 | 2008-07-03 | Rohm Co Ltd | 窒化物半導体装置および窒化物半導体製造方法 |
| US7547908B2 (en) | 2006-12-22 | 2009-06-16 | Philips Lumilieds Lighting Co, Llc | III-nitride light emitting devices grown on templates to reduce strain |
| CN101601093A (zh) * | 2007-03-15 | 2009-12-09 | 富士通株式会社 | 支架组件的装配方法及支架组件的装配装置 |
| JP2008258503A (ja) * | 2007-04-06 | 2008-10-23 | Sumitomo Electric Ind Ltd | 窒化物系半導体発光素子、および窒化物系半導体発光素子を作製する方法 |
| KR100835116B1 (ko) | 2007-04-16 | 2008-06-05 | 삼성전기주식회사 | 질화물 반도체 발광 소자 |
| JP4924185B2 (ja) | 2007-04-27 | 2012-04-25 | 住友電気工業株式会社 | 窒化物半導体発光素子 |
| JP2009043613A (ja) | 2007-08-09 | 2009-02-26 | Toyota Motor Corp | パルス電子ビーム発生装置およびパルス電子ビーム成膜装置 |
| US7652301B2 (en) | 2007-08-16 | 2010-01-26 | Philips Lumileds Lighting Company, Llc | Optical element coupled to low profile side emitting LED |
| KR100889956B1 (ko) | 2007-09-27 | 2009-03-20 | 서울옵토디바이스주식회사 | 교류용 발광다이오드 |
| JP2009135466A (ja) | 2007-10-29 | 2009-06-18 | Mitsubishi Chemicals Corp | 半導体発光素子およびその製造方法 |
| US7781780B2 (en) | 2008-03-31 | 2010-08-24 | Bridgelux, Inc. | Light emitting diodes with smooth surface for reflective electrode |
| JP4510931B2 (ja) | 2008-09-09 | 2010-07-28 | パナソニック株式会社 | 窒化物系半導体発光素子およびその製造方法 |
| US8084763B2 (en) | 2008-10-31 | 2011-12-27 | The Regents Of The University Of California | Optoelectronic device based on non-polar and semi-polar aluminum indium nitride and aluminum indium gallium nitride alloys |
| US20100109025A1 (en) | 2008-11-05 | 2010-05-06 | Koninklijke Philips Electronics N.V. | Over the mold phosphor lens for an led |
| JP4486701B1 (ja) | 2008-11-06 | 2010-06-23 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| EP2273573A4 (en) * | 2009-03-11 | 2012-11-14 | Panasonic Corp | NITRIDE SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREFOR |
| WO2010113238A1 (ja) | 2009-04-03 | 2010-10-07 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| CN102067348B (zh) | 2009-04-06 | 2013-03-27 | 松下电器产业株式会社 | 氮化物系半导体元件及其制造方法 |
| WO2011086620A1 (ja) | 2010-01-18 | 2011-07-21 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
-
2009
- 2009-06-04 JP JP2009536554A patent/JP4486701B1/ja active Active
- 2009-06-04 WO PCT/JP2009/002532 patent/WO2010052810A1/ja not_active Ceased
- 2009-06-04 EP EP09815447.9A patent/EP2226853B1/en not_active Not-in-force
- 2009-06-04 US US12/679,347 patent/US20110156048A1/en not_active Abandoned
- 2009-06-04 KR KR1020107012782A patent/KR101139142B1/ko not_active Expired - Fee Related
- 2009-06-04 CN CN2009801017261A patent/CN101971364B/zh not_active Expired - Fee Related
- 2009-12-18 JP JP2009287740A patent/JP2010267950A/ja active Pending
-
2011
- 2011-07-26 US US13/191,026 patent/US8110851B2/en not_active Expired - Fee Related
-
2012
- 2012-12-07 US US13/708,097 patent/US8648378B2/en not_active Expired - Fee Related
- 2012-12-07 US US13/708,136 patent/US8686561B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1084159A (ja) | 1996-09-06 | 1998-03-31 | Matsushita Electric Ind Co Ltd | 半導体発光素子およびその製造方法 |
| JP2000174333A (ja) | 1998-12-02 | 2000-06-23 | Toshiba Corp | 窒化ガリウム系化合物半導体発光素子及び製造方法 |
| KR20050063293A (ko) * | 2003-12-22 | 2005-06-28 | 삼성전자주식회사 | 플립칩형 질화물계 발광소자 및 그 제조방법 |
| JP2008235804A (ja) | 2007-03-23 | 2008-10-02 | Rohm Co Ltd | 発光素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2226853A1 (en) | 2010-09-08 |
| US20110284905A1 (en) | 2011-11-24 |
| CN101971364A (zh) | 2011-02-09 |
| EP2226853B1 (en) | 2014-02-26 |
| US8686561B2 (en) | 2014-04-01 |
| US20130092968A1 (en) | 2013-04-18 |
| WO2010052810A1 (ja) | 2010-05-14 |
| JPWO2010052810A1 (ja) | 2012-03-29 |
| US8648378B2 (en) | 2014-02-11 |
| EP2226853A4 (en) | 2012-05-02 |
| US20130119398A1 (en) | 2013-05-16 |
| US8110851B2 (en) | 2012-02-07 |
| JP2010267950A (ja) | 2010-11-25 |
| JP4486701B1 (ja) | 2010-06-23 |
| KR20100087372A (ko) | 2010-08-04 |
| CN101971364B (zh) | 2013-05-15 |
| US20110156048A1 (en) | 2011-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101139142B1 (ko) | 질화물계 반도체 소자 및 그 제조 방법 | |
| US8058639B2 (en) | Nitride semiconductor element and method for production thereof | |
| US8357607B2 (en) | Method for fabricating nitride-based semiconductor device having electrode on m-plane | |
| JP4792136B2 (ja) | 窒化物系半導体素子およびその製造方法 | |
| US8729587B2 (en) | Nitride semiconductor element and manufacturing method therefor | |
| JPWO2011135866A1 (ja) | 窒化物系半導体素子およびその製造方法 | |
| JP2012227494A (ja) | 窒化物系半導体発光素子およびその製造方法 | |
| KR101171722B1 (ko) | 질화물계 반도체 소자 및 그의 제조방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| FPAY | Annual fee payment |
Payment date: 20160318 Year of fee payment: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| FPAY | Annual fee payment |
Payment date: 20170302 Year of fee payment: 6 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| FPAY | Annual fee payment |
Payment date: 20180316 Year of fee payment: 7 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7 |
|
| FPAY | Annual fee payment |
Payment date: 20190319 Year of fee payment: 8 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 8 |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20200417 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20200417 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |