KR100864126B1 - 기판처리 장치 및 방법 - Google Patents
기판처리 장치 및 방법 Download PDFInfo
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- KR100864126B1 KR100864126B1 KR1020070079353A KR20070079353A KR100864126B1 KR 100864126 B1 KR100864126 B1 KR 100864126B1 KR 1020070079353 A KR1020070079353 A KR 1020070079353A KR 20070079353 A KR20070079353 A KR 20070079353A KR 100864126 B1 KR100864126 B1 KR 100864126B1
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Abstract
Description
Claims (9)
- 노광 장치에 인접하도록 배치되는 기판처리 장치에 있어서,기판 위에 막을 형성하는 막형성 유닛과,상기 막형성 유닛에 의한 막형성후 또한 상기 노광 장치에 의한 노광처리전의 기판의 단부에 부착하는 오염물질을 제거하기 위해 상기 기판의 단부를 물리적으로 세정하는 제1의 처리 유닛과,상기 제1의 처리 유닛에 의해 단부가 세정된 기판을 상기 노광 장치에 주고, 상기 노광 장치로부터 노광처리후의 기판을 받는 반송유닛을 포함하며,상기 반송유닛은, 기판을 유지하는 제1 및 제2의 유지부를 포함하고, 상기 제1의 처리 유닛으로 기판을 반입할 때에는 상기 제1의 유지부에 의해 기판을 유지하고, 상기 제1의 처리 유닛으로부터 기판을 반출할 때에는 상기 제2의 유지부에 의해 기판을 유지하는 것을 특징으로 하는 기판처리 장치.
- 노광 장치에 인접하도록 배치되는 기판처리 장치에 있어서,기판 위에 막을 형성하는 막형성 유닛과,상기 막형성 유닛에 의한 막형성후 또한 상기 노광 장치에 의한 노광처리전의 기판의 단부를 세정하는 제1의 처리 유닛과,상기 제1의 처리 유닛에 의해 단부가 세정된 기판을 상기 노광 장치에 주고, 상기 노광 장치로부터 노광처리후의 기판을 받는 반송유닛을 포함하고,상기 반송유닛은, 기판을 유지하는 제1 및 제2의 유지부를 포함하고, 상기 제1의 처리 유닛으로 기판을 반입할 때에는 상기 제1의 유지부에 의해 기판을 유지하고, 상기 제1의 처리 유닛으로부터 기판을 반출할 때에는 상기 제2의 유지부에 의해 기판을 유지하며,상기 제1의 처리 유닛은, 브러시를 이용해서 기판의 단부를 세정하는 것을 특징으로 하는 기판처리 장치.
- 노광 장치에 인접하도록 배치되는 기판처리 장치에 있어서,기판 위에 막을 형성하는 막형성 유닛과,상기 막형성 유닛에 의한 막형성후 또한 상기 노광 장치에 의한 노광처리전의 기판의 단부를 세정하는 제1의 처리 유닛과,상기 제1의 처리 유닛에 의해 단부가 세정된 기판을 상기 노광 장치에 주고, 상기 노광 장치로부터 노광처리후의 기판을 받는 반송유닛을 포함하고,상기 제1의 처리 유닛은, 2류체(流體) 노즐을 이용해서 기판의 단부를 세정하는 것을 특징으로 하는 기판처리 장치.
- 노광 장치에 인접하도록 배치되는 기판처리 장치에 있어서,기판 위에 막을 형성하는 막형성 유닛과,상기 막형성 유닛에 의한 막형성후 또한 상기 노광 장치에 의한 노광처리전의 기판의 단부를 세정하는 제1의 처리 유닛과,상기 제1의 처리 유닛에 의해 단부가 세정된 기판을 상기 노광 장치에 주고, 상기 노광 장치로부터 노광처리후의 기판을 받는 반송유닛을 포함하고,상기 제1의 처리 유닛은, 초음파 노즐을 이용해서 기판의 단부를 세정하는 것을 특징으로 하는 기판처리 장치.
- 제1항 내지 제4항 중 어느 한 항에 있어서,상기 막형성 유닛은, 기판 위에 감광성 재료로 이루어지는 감광성 막을 형성하는 제2의 처리 유닛을 더 포함하고,상기 제1의 처리 유닛은, 상기 제2의 처리 유닛에 의해 감광성 막이 형성된 기판의 단부를 세정하는 것을 특징으로 하는 기판처리 장치.
- 제1항 내지 제4항 중 어느 한 항에 있어서,상기 막형성 유닛은,기판 위에 감광성 재료로 이루어지는 감광성 막을 형성하는 제2의 처리 유닛과,상기 제2의 처리 유닛에 의해 형성된 상기 감광성 막 위에 그 감광성 막을 보호하는 보호막을 형성하는 제3의 처리 유닛을 포함하고,상기 제1의 처리 유닛은, 상기 제3의 처리 유닛에 의해 보호막이 형성된 기판의 단부를 세정하는 것을 특징으로 하는 기판처리 장치.
- 제5항에 있어서,상기 막형성 유닛은,상기 제2의 처리 유닛에 의한 감광성 막의 형성전에, 기판 위에 반사 방지막을 형성하는 제4의 처리 유닛을 더욱 포함하는 것을 특징으로 하는 기판처리 장치.
- 노광 장치에 인접하도록 배치되는 기판처리 장치를 이용해서 기판을 처리하는 방법에 있어서,상기 기판처리 장치내에서 기판 위에 막을 형성하는 공정과,상기 막이 형성된 기판을 반송유닛의 제1의 유지부에 의해 유지하여 세정 유닛에 반입하는 공정과,상기 세정 유닛내에서 상기 막이 형성된 기판의 단부를 물리적으로 세정하는 공정과,단부가 세정된 기판을 상기 반송유닛의 제2의 유지부에 의해 유지하여 상기 세정 유닛으로부터 반출하는 공정과,상기 세정 유닛으로부터 반출된 기판을 상기 노광 장치에 주는 공정과,상기 노광 장치에 의해 노광처리가 행해진 기판을 상기 노광 장치로부터 상기 기판처리 장치내에 반입하는 공정을 포함하는 것을 특징으로 하는 기판처리 방법.
- 제6항에 있어서,상기 막형성 유닛은,상기 제2의 처리 유닛에 의한 감광성 막의 형성전에, 기판 위에 반사 방지막을 형성하는 제4의 처리 유닛을 더욱 포함하는 것을 특징으로 하는 기판처리 장치.
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KR0175278B1 (ko) * | 1996-02-13 | 1999-04-01 | 김광호 | 웨이퍼 세정장치 |
KR19990023624A (ko) * | 1997-08-15 | 1999-03-25 | 히가시 데쓰로 | 기판처리장치 |
KR20040111070A (ko) * | 2003-06-16 | 2004-12-31 | 동경 엘렉트론 주식회사 | 기판 처리 장치 및 기판 반송 장치의 위치 맞춤 방법 |
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CN1885160A (zh) | 2006-12-27 |
KR20070092191A (ko) | 2007-09-12 |
CN1885160B (zh) | 2011-12-28 |
TWI326392B (en) | 2010-06-21 |
TW200707087A (en) | 2007-02-16 |
JP4845463B2 (ja) | 2011-12-28 |
JP2007005659A (ja) | 2007-01-11 |
JP2007095891A (ja) | 2007-04-12 |
KR20060135531A (ko) | 2006-12-29 |
JP4522329B2 (ja) | 2010-08-11 |
US7604424B2 (en) | 2009-10-20 |
US20060291855A1 (en) | 2006-12-28 |
KR100809766B1 (ko) | 2008-03-07 |
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