JP5578797B2 - 半導体装置 - Google Patents

半導体装置 Download PDF

Info

Publication number
JP5578797B2
JP5578797B2 JP2009061276A JP2009061276A JP5578797B2 JP 5578797 B2 JP5578797 B2 JP 5578797B2 JP 2009061276 A JP2009061276 A JP 2009061276A JP 2009061276 A JP2009061276 A JP 2009061276A JP 5578797 B2 JP5578797 B2 JP 5578797B2
Authority
JP
Japan
Prior art keywords
inductor
circuit
semiconductor device
transmission
side inductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009061276A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010219122A (ja
JP2010219122A5 (enExample
Inventor
康隆 中柴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Electronics Corp
Original Assignee
Renesas Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Electronics Corp filed Critical Renesas Electronics Corp
Priority to JP2009061276A priority Critical patent/JP5578797B2/ja
Priority to US12/722,092 priority patent/US8410493B2/en
Publication of JP2010219122A publication Critical patent/JP2010219122A/ja
Publication of JP2010219122A5 publication Critical patent/JP2010219122A5/ja
Priority to US13/788,542 priority patent/US20130181324A1/en
Application granted granted Critical
Publication of JP5578797B2 publication Critical patent/JP5578797B2/ja
Priority to US14/638,287 priority patent/US9922926B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5227Inductive arrangements or effects of, or between, wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/50Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/528Layout of the interconnection structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5383Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/20Inductors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05553Shape in top view being rectangular
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45147Copper (Cu) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/4813Connecting within a semiconductor or solid-state body, i.e. fly wire, bridge wire
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12041LED

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP2009061276A 2009-03-13 2009-03-13 半導体装置 Expired - Fee Related JP5578797B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009061276A JP5578797B2 (ja) 2009-03-13 2009-03-13 半導体装置
US12/722,092 US8410493B2 (en) 2009-03-13 2010-03-11 Semiconductor device which can transmit electrical signals between two circuits
US13/788,542 US20130181324A1 (en) 2009-03-13 2013-03-07 Semiconductor device
US14/638,287 US9922926B2 (en) 2009-03-13 2015-03-04 Semiconductor device for transmitting electrical signals between two circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009061276A JP5578797B2 (ja) 2009-03-13 2009-03-13 半導体装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013230353A Division JP2014064015A (ja) 2013-11-06 2013-11-06 半導体装置

Publications (3)

Publication Number Publication Date
JP2010219122A JP2010219122A (ja) 2010-09-30
JP2010219122A5 JP2010219122A5 (enExample) 2012-03-29
JP5578797B2 true JP5578797B2 (ja) 2014-08-27

Family

ID=42729998

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009061276A Expired - Fee Related JP5578797B2 (ja) 2009-03-13 2009-03-13 半導体装置

Country Status (2)

Country Link
US (3) US8410493B2 (enExample)
JP (1) JP5578797B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010140297A1 (ja) * 2009-06-04 2010-12-09 日本電気株式会社 半導体装置及び信号伝達方法
ITMI20111416A1 (it) * 2011-07-28 2013-01-29 St Microelectronics Srl Circuito integrato dotato di almeno una antenna integrata
JP5819737B2 (ja) * 2012-01-20 2015-11-24 株式会社日立製作所 半導体装置
DE102013112220B4 (de) * 2013-11-06 2021-08-05 Intel Corporation (N.D.Ges.D. Staates Delaware) Spulenanordnung mit Metallfüllung und Verfahren zu deren Herstellung
JP6395304B2 (ja) 2013-11-13 2018-09-26 ローム株式会社 半導体装置および半導体モジュール
US9711451B2 (en) * 2014-01-29 2017-07-18 Renesas Electronics Corporation Semiconductor device with coils in different wiring layers
JP6371725B2 (ja) * 2015-03-13 2018-08-08 株式会社東芝 半導体モジュール
JP6237909B1 (ja) * 2015-07-03 2017-11-29 富士電機株式会社 アイソレータおよびアイソレータの製造方法
US10032850B2 (en) * 2016-05-11 2018-07-24 Texas Instruments Incorporated Semiconductor die with back-side integrated inductive component
JP7034031B2 (ja) 2018-08-01 2022-03-11 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP7101627B2 (ja) 2019-01-29 2022-07-15 ルネサスエレクトロニクス株式会社 半導体モジュールおよびその製造方法
JP2021174955A (ja) * 2020-04-30 2021-11-01 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP2021184450A (ja) * 2020-05-22 2021-12-02 ルネサスエレクトロニクス株式会社 半導体装置
US11605701B2 (en) * 2020-07-17 2023-03-14 Infineon Technologies Austria Ag Lateral coreless transformer

Family Cites Families (119)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5384434A (en) * 1992-03-02 1995-01-24 Murata Manufacturing Co., Ltd. Multilayer ceramic circuit board
JPH0677407A (ja) * 1992-04-06 1994-03-18 Nippon Precision Circuits Kk 半導体装置
US6728113B1 (en) * 1993-06-24 2004-04-27 Polychip, Inc. Method and apparatus for non-conductively interconnecting integrated circuits
US5370766A (en) * 1993-08-16 1994-12-06 California Micro Devices Methods for fabrication of thin film inductors, inductor networks and integration with other passive and active devices
TW359019B (en) 1995-06-08 1999-05-21 Niigata Seimitsu Co Ltd Semiconductor device
JP2904086B2 (ja) * 1995-12-27 1999-06-14 日本電気株式会社 半導体装置およびその製造方法
JP3456093B2 (ja) * 1996-06-25 2003-10-14 松下電工株式会社 非接触電力伝達装置
US5952849A (en) 1997-02-21 1999-09-14 Analog Devices, Inc. Logic isolator with high transient immunity
US6426267B2 (en) * 1998-06-19 2002-07-30 Winbond Electronics Corp. Method for fabricating high-Q inductance device in monolithic technology
TW386279B (en) * 1998-08-07 2000-04-01 Winbond Electronics Corp Inductor structure with air gap and method of manufacturing thereof
DE69931670T2 (de) * 1998-12-11 2006-09-21 Matsushita Electric Industrial Co., Ltd., Kadoma Hochfrequenzinduktivität mit hohem Q-Faktor
US7531417B2 (en) * 1998-12-21 2009-05-12 Megica Corporation High performance system-on-chip passive device using post passivation process
US6869870B2 (en) * 1998-12-21 2005-03-22 Megic Corporation High performance system-on-chip discrete components using post passivation process
US6459343B1 (en) 1999-02-25 2002-10-01 Formfactor, Inc. Integrated circuit interconnect system forming a multi-pole filter
US6255714B1 (en) * 1999-06-22 2001-07-03 Agere Systems Guardian Corporation Integrated circuit having a micromagnetic device including a ferromagnetic core and method of manufacture therefor
JP4005762B2 (ja) * 1999-06-30 2007-11-14 株式会社東芝 集積回路装置及びその製造方法
US6097273A (en) * 1999-08-04 2000-08-01 Lucent Technologies Inc. Thin-film monolithic coupled spiral balun transformer
US6612852B1 (en) * 2000-04-13 2003-09-02 Molex Incorporated Contactless interconnection system
US6759275B1 (en) * 2001-09-04 2004-07-06 Megic Corporation Method for making high-performance RF integrated circuits
JP2003179148A (ja) * 2001-10-04 2003-06-27 Denso Corp 半導体基板およびその製造方法
JP3861669B2 (ja) * 2001-11-22 2006-12-20 ソニー株式会社 マルチチップ回路モジュールの製造方法
US6885090B2 (en) * 2001-11-28 2005-04-26 North Carolina State University Inductively coupled electrical connectors
JP3792635B2 (ja) * 2001-12-14 2006-07-05 富士通株式会社 電子装置
US6864509B2 (en) * 2002-02-06 2005-03-08 Eugene Robert Worley Packaging optically coupled integrated circuits using flip-chip methods
US7271465B2 (en) * 2002-04-24 2007-09-18 Qualcomm Inc. Integrated circuit with low-loss primary conductor strapped by lossy secondary conductor
US6759937B2 (en) * 2002-06-03 2004-07-06 Broadcom, Corp. On-chip differential multi-layer inductor
US7091813B2 (en) * 2002-06-13 2006-08-15 International Business Machines Corporation Integrated circuit transformer for radio frequency applications
US7260890B2 (en) * 2002-06-26 2007-08-28 Georgia Tech Research Corporation Methods for fabricating three-dimensional all organic interconnect structures
JP2004039867A (ja) * 2002-07-03 2004-02-05 Sony Corp 多層配線回路モジュール及びその製造方法
US7039381B2 (en) * 2002-07-23 2006-05-02 Broadcom Corporation On-chip differential inductor and applications thereof
WO2004015764A2 (en) * 2002-08-08 2004-02-19 Leedy Glenn J Vertical system integration
FR2844096A1 (fr) * 2002-08-30 2004-03-05 St Microelectronics Sa Procede de fabrication d'un circuit electrique comprenant une etape de polissage
US6841847B2 (en) * 2002-09-04 2005-01-11 Chartered Semiconductor Manufacturing, Ltd. 3-D spiral stacked inductor on semiconductor material
JP3925378B2 (ja) * 2002-09-30 2007-06-06 ソニー株式会社 高周波モジュール装置の製造方法。
US7141883B2 (en) * 2002-10-15 2006-11-28 Silicon Laboratories Inc. Integrated circuit package configuration incorporating shielded circuit element structure
US6967555B2 (en) * 2002-10-17 2005-11-22 Via Technologies Inc. Multi-level symmetrical inductor
US7285867B2 (en) * 2002-11-08 2007-10-23 Casio Computer Co., Ltd. Wiring structure on semiconductor substrate and method of fabricating the same
KR100466542B1 (ko) * 2002-11-13 2005-01-15 한국전자통신연구원 적층형 가변 인덕터
FR2851078A1 (fr) * 2003-02-07 2004-08-13 St Microelectronics Sa Inductance integree et circuit electronique l'incorporant
JP4012840B2 (ja) * 2003-03-14 2007-11-21 三菱電機株式会社 半導体装置
JP4141881B2 (ja) * 2003-04-04 2008-08-27 シャープ株式会社 集積回路
EP2302850A1 (en) 2003-04-30 2011-03-30 Analog Devices, Inc. Signal isolators using micro-transformers
JP2005006153A (ja) 2003-06-13 2005-01-06 Nec Electronics Corp 電圧制御発振器
JP4904813B2 (ja) * 2003-06-16 2012-03-28 日本電気株式会社 半導体デバイスおよびその製造方法
JP4948756B2 (ja) * 2003-09-30 2012-06-06 アギア システムズ インコーポレーテッド 集積回路内に形成されたインダクタ及びその製造方法
US6946928B2 (en) * 2003-10-30 2005-09-20 Agilent Technologies, Inc. Thin-film acoustically-coupled transformer
US6972658B1 (en) * 2003-11-10 2005-12-06 Rf Micro Devices, Inc. Differential inductor design for high self-resonance frequency
JP4444683B2 (ja) 2004-02-10 2010-03-31 株式会社日立製作所 コイル状アンテナを有する半導体チップ及びこれを用いた通信システム
US7242274B2 (en) * 2004-03-03 2007-07-10 Atheros Communications, Inc. Inductor layout using step symmetry for inductors
US7205632B2 (en) * 2004-04-05 2007-04-17 Taiwan Semiconductor Manufacturing Company, Ltd. Anti-scattering attenuator structure for high energy particle radiation into integrated circuits
US8169108B2 (en) 2004-06-03 2012-05-01 Silicon Laboratories Inc. Capacitive isolator
US7436281B2 (en) * 2004-07-30 2008-10-14 Texas Instruments Incorporated Method to improve inductance with a high-permeability slotted plate core in an integrated circuit
US8008775B2 (en) * 2004-09-09 2011-08-30 Megica Corporation Post passivation interconnection structures
US7612321B2 (en) * 2004-10-12 2009-11-03 Dcg Systems, Inc. Optical coupling apparatus for a dual column charged particle beam tool for imaging and forming silicide in a localized manner
CN101390248B (zh) * 2004-12-09 2012-12-05 维斯普瑞公司 零极点元件及相关系统和方法
US7118925B2 (en) * 2004-12-10 2006-10-10 Texas Instruments Incorporated Fabrication of a ferromagnetic inductor core and capacitor electrode in a single photo mask step
US7265433B2 (en) * 2005-01-13 2007-09-04 International Business Machines Corporation On-pad broadband matching network
US7619296B2 (en) * 2005-02-03 2009-11-17 Nec Electronics Corporation Circuit board and semiconductor device
US7262681B2 (en) * 2005-02-11 2007-08-28 Semiconductor Components Industries, L.L.C. Integrated semiconductor inductor and method therefor
KR100698617B1 (ko) * 2005-02-15 2007-03-21 삼성전자주식회사 집적 인덕터를 포함한 집적회로
US7470927B2 (en) * 2005-05-18 2008-12-30 Megica Corporation Semiconductor chip with coil element over passivation layer
JP2006351859A (ja) * 2005-06-16 2006-12-28 Sharp Corp 光結合装置の製造方法
JP2007059878A (ja) * 2005-07-27 2007-03-08 Seiko Epson Corp 半導体装置、及び発振器
US7323948B2 (en) * 2005-08-23 2008-01-29 International Business Machines Corporation Vertical LC tank device
US7486167B2 (en) * 2005-08-24 2009-02-03 Avago Technologies General Ip (Singapore) Pte. Ltd. Cross-coupled inductor pair formed in an integrated circuit
US8190086B2 (en) * 2005-09-02 2012-05-29 Nec Corporation Transmission method, interface circuit, semiconductor device, semiconductor package, semiconductor module and memory module
US7519328B2 (en) * 2006-01-19 2009-04-14 Murata Manufacturing Co., Ltd. Wireless IC device and component for wireless IC device
JP4725346B2 (ja) * 2006-02-08 2011-07-13 ソニー株式会社 半導体装置
CN101385039B (zh) * 2006-03-15 2012-03-21 株式会社半导体能源研究所 半导体器件
US7924131B2 (en) * 2006-05-19 2011-04-12 Freescale Semiconductor, Inc. Electrical component having an inductor and a method of formation
US7531407B2 (en) * 2006-07-18 2009-05-12 International Business Machines Corporation Semiconductor integrated circuit devices having high-Q wafer backside inductors and methods of fabricating same
US8455350B2 (en) * 2006-08-18 2013-06-04 Globalfoundries Singapore Pte. Ltd. Integrated circuit system employing gate shield and/or ground shield
US7847666B2 (en) * 2006-09-27 2010-12-07 Agere Systems Inc. Differential inductor for use in integrated circuits
US8165552B2 (en) 2006-09-29 2012-04-24 Broadcom Corporation Method and system for identifying radio frequency identification (RFID) tag location using a switchable coil
US7656264B2 (en) * 2006-10-19 2010-02-02 United Microelectronics Corp. High coupling factor transformer and manufacturing method thereof
CN101529691A (zh) * 2006-10-26 2009-09-09 皇家飞利浦电子股份有限公司 电感式功率系统和操作方法
US7674646B2 (en) 2006-11-07 2010-03-09 Freescale Semiconductor, Inc. Three dimensional integrated passive device and method of fabrication
US8041227B2 (en) * 2006-11-16 2011-10-18 Silicon Laboratories Inc. Apparatus and method for near-field communication
US8749021B2 (en) * 2006-12-26 2014-06-10 Megit Acquisition Corp. Voltage regulator integrated with semiconductor chip
US7602027B2 (en) * 2006-12-29 2009-10-13 Semiconductor Components Industries, L.L.C. Semiconductor component and method of manufacture
US8243467B2 (en) * 2007-02-13 2012-08-14 Nec Corporation Semiconductor device
JP5180625B2 (ja) * 2007-03-12 2013-04-10 ルネサスエレクトロニクス株式会社 半導体装置
US7750852B2 (en) 2007-04-13 2010-07-06 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
KR100843243B1 (ko) * 2007-04-18 2008-07-02 삼성전자주식회사 신호의 전송파워를 최적화한 반도체 메모리 장치 및 그파워 초기화 방법
US8362481B2 (en) * 2007-05-08 2013-01-29 Scanimetrics Inc. Ultra high speed signal transmission/reception
GB2463806B (en) * 2007-05-08 2012-07-18 Scanimetrics Inc Ultra high speed signal transmission/reception
WO2008156565A1 (en) * 2007-06-20 2008-12-24 Skyworks Solutions, Inc. Semiconductor die with backside passive device integration
JP2009064963A (ja) * 2007-09-06 2009-03-26 Nec Electronics Corp 電子デバイス
WO2009030980A2 (en) * 2007-09-06 2009-03-12 Quantum Semiconductor Llc Photonic via waveguide for pixel arrays
KR100882679B1 (ko) * 2007-09-14 2009-02-06 삼성모바일디스플레이주식회사 발광표시장치 및 그의 제조방법
JP5403903B2 (ja) * 2007-12-04 2014-01-29 ルネサスエレクトロニクス株式会社 半導体装置、その製造方法、および当該半導体装置を用いた信号送受信方法
US20090153229A1 (en) * 2007-12-14 2009-06-18 Andre Hanke Method for Signal Transmission between Semiconductor Substrates, and Semiconductor Component Comprising Such Semiconductor Substrates
JP2009147150A (ja) * 2007-12-14 2009-07-02 Nec Electronics Corp 半導体装置
JP5442950B2 (ja) * 2008-01-29 2014-03-19 ルネサスエレクトロニクス株式会社 半導体装置、その製造方法、当該半導体装置を用いた信号送受信方法、およびテスタ装置
US7710215B2 (en) * 2008-02-04 2010-05-04 Infineon Technologies Austria Ag Semiconductor configuration having an integrated coupler and method for manufacturing such a semiconductor configuration
US7838964B2 (en) * 2008-02-25 2010-11-23 Fairchild Semiconductor Corporation Micromodules including integrated thin film inductors
US7750435B2 (en) * 2008-02-27 2010-07-06 Broadcom Corporation Inductively coupled integrated circuit and methods for use therewith
US7795700B2 (en) * 2008-02-28 2010-09-14 Broadcom Corporation Inductively coupled integrated circuit with magnetic communication path and methods for use therewith
US20090218657A1 (en) * 2008-03-03 2009-09-03 Broadcom Corporation Inductively coupled integrated circuit with near field communication and methods for use therewith
JP5658429B2 (ja) * 2008-07-03 2015-01-28 ルネサスエレクトロニクス株式会社 回路装置
WO2009113373A1 (ja) * 2008-03-13 2009-09-17 日本電気株式会社 半導体装置
US7928525B2 (en) * 2008-04-25 2011-04-19 Qimonda Ag Integrated circuit with wireless connection
JP5085487B2 (ja) * 2008-05-07 2012-11-28 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP5324829B2 (ja) * 2008-06-05 2013-10-23 ルネサスエレクトロニクス株式会社 半導体装置
US20100022063A1 (en) * 2008-07-28 2010-01-28 Mete Erturk Method of forming on-chip passive element
JP4977101B2 (ja) * 2008-08-26 2012-07-18 株式会社東芝 積層型半導体装置
US7772081B2 (en) * 2008-09-17 2010-08-10 Stats Chippac, Ltd. Semiconductor device and method of forming high-frequency circuit structure and method thereof
JP5216532B2 (ja) * 2008-10-30 2013-06-19 株式会社日立製作所 半導体集積回路
US20100165585A1 (en) * 2008-12-26 2010-07-01 Megica Corporation Chip packages with power management integrated circuits and related techniques
US8008125B2 (en) * 2009-03-06 2011-08-30 General Electric Company System and method for stacked die embedded chip build-up
JP5238562B2 (ja) * 2009-03-13 2013-07-17 ルネサスエレクトロニクス株式会社 半導体装置
JP5214525B2 (ja) * 2009-04-20 2013-06-19 ルネサスエレクトロニクス株式会社 半導体装置
JP5390246B2 (ja) * 2009-04-20 2014-01-15 ルネサスエレクトロニクス株式会社 半導体装置
JP5496541B2 (ja) * 2009-04-20 2014-05-21 ルネサスエレクトロニクス株式会社 半導体装置
TWI385680B (zh) * 2009-05-19 2013-02-11 Realtek Semiconductor Corp 螺旋電感之堆疊結構
US8350639B2 (en) * 2009-08-26 2013-01-08 Qualcomm Incorporated Transformer signal coupling for flip-chip integration
JP5646830B2 (ja) * 2009-09-02 2014-12-24 ルネサスエレクトロニクス株式会社 半導体装置、半導体装置の製造方法、及びリードフレーム
JP5970308B2 (ja) * 2012-09-19 2016-08-17 ルネサスエレクトロニクス株式会社 半導体装置
JP6266219B2 (ja) * 2013-03-18 2018-01-24 ルネサスエレクトロニクス株式会社 半導体装置

Also Published As

Publication number Publication date
US9922926B2 (en) 2018-03-20
JP2010219122A (ja) 2010-09-30
US20100230783A1 (en) 2010-09-16
US20130181324A1 (en) 2013-07-18
US8410493B2 (en) 2013-04-02
US20150179572A1 (en) 2015-06-25

Similar Documents

Publication Publication Date Title
JP5578797B2 (ja) 半導体装置
JP5324829B2 (ja) 半導体装置
JP5496541B2 (ja) 半導体装置
JP5435029B2 (ja) 半導体装置及び信号伝達方法
JP5214525B2 (ja) 半導体装置
JP5238562B2 (ja) 半導体装置
JP5749366B2 (ja) 半導体装置
US8350357B2 (en) Semiconductor device including an inductor that is inductively coupled to another inductor
JP6062486B2 (ja) 半導体装置
JP5968968B2 (ja) 半導体装置
JP2014064015A (ja) 半導体装置
JP2013239731A (ja) 半導体装置
JP5562459B2 (ja) 半導体装置
JP6081961B2 (ja) 半導体装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120213

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120213

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130910

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130912

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20131023

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131106

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140114

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140304

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140401

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140516

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140624

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140708

R150 Certificate of patent or registration of utility model

Ref document number: 5578797

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

LAPS Cancellation because of no payment of annual fees