JP4497551B2 - リソグラフィ装置及びデバイス製造方法 - Google Patents

リソグラフィ装置及びデバイス製造方法 Download PDF

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Publication number
JP4497551B2
JP4497551B2 JP2006516054A JP2006516054A JP4497551B2 JP 4497551 B2 JP4497551 B2 JP 4497551B2 JP 2006516054 A JP2006516054 A JP 2006516054A JP 2006516054 A JP2006516054 A JP 2006516054A JP 4497551 B2 JP4497551 B2 JP 4497551B2
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substrate
liquid
radiation
projection
projection system
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JP2009514183A (ja
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コルスニーチェンコ、アレクセイ、ユリービッヒ
デル ヴェルフ、ヤン、エヴァート ファン
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エーエスエムエル ネザーランズ ビー．ブイ．
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2006516054A 2003-06-27 2004-06-25 リソグラフィ装置及びデバイス製造方法 Expired - Fee Related JP4497551B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03254116A EP1491956B1 (de) 2003-06-27 2003-06-27 Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
PCT/EP2004/006875 WO2005001572A2 (en) 2003-06-27 2004-06-25 Lithographic apparatus and device manufacturing method

Related Child Applications (1)

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JP2010057575A Division JP5017402B2 (ja) 2003-06-27 2010-03-15 リソグラフィ投影装置

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JP2009514183A JP2009514183A (ja) 2009-04-02
JP4497551B2 true JP4497551B2 (ja) 2010-07-07

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JP2006516054A Expired - Fee Related JP4497551B2 (ja) 2003-06-27 2004-06-25 リソグラフィ装置及びデバイス製造方法
JP2010057575A Expired - Fee Related JP5017402B2 (ja) 2003-06-27 2010-03-15 リソグラフィ投影装置
JP2011278754A Pending JP2012070000A (ja) 2003-06-27 2011-12-20 リソグラフィ投影装置

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JP2010057575A Expired - Fee Related JP5017402B2 (ja) 2003-06-27 2010-03-15 リソグラフィ投影装置
JP2011278754A Pending JP2012070000A (ja) 2003-06-27 2011-12-20 リソグラフィ投影装置

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US (2) US7012673B2 (de)
EP (1) EP1491956B1 (de)
JP (3) JP4497551B2 (de)
DE (1) DE60308161T2 (de)
TW (1) TWI252380B (de)
WO (1) WO2005001572A2 (de)

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