JP2015145331A - 表面処理された金属酸化物粒子 - Google Patents
表面処理された金属酸化物粒子 Download PDFInfo
- Publication number
- JP2015145331A JP2015145331A JP2015032952A JP2015032952A JP2015145331A JP 2015145331 A JP2015145331 A JP 2015145331A JP 2015032952 A JP2015032952 A JP 2015032952A JP 2015032952 A JP2015032952 A JP 2015032952A JP 2015145331 A JP2015145331 A JP 2015145331A
- Authority
- JP
- Japan
- Prior art keywords
- metal oxide
- oxide particles
- particles
- less
- hydrophobic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 title claims abstract description 251
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 199
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 199
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 83
- 239000006185 dispersion Substances 0.000 claims abstract description 62
- 238000000034 method Methods 0.000 claims abstract description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 84
- 239000011541 reaction mixture Substances 0.000 claims description 49
- 239000008119 colloidal silica Substances 0.000 claims description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 27
- 238000001035 drying Methods 0.000 claims description 22
- 239000003795 chemical substances by application Substances 0.000 claims description 14
- 239000003960 organic solvent Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 3
- 239000000203 mixture Substances 0.000 abstract description 90
- 150000001875 compounds Chemical class 0.000 abstract description 32
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 42
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 28
- 229960003493 octyltriethoxysilane Drugs 0.000 description 28
- 229910052783 alkali metal Inorganic materials 0.000 description 17
- -1 silicate ions Chemical class 0.000 description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- 229910052799 carbon Inorganic materials 0.000 description 13
- 239000000843 powder Substances 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- 239000011148 porous material Substances 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 239000008367 deionised water Substances 0.000 description 9
- 229910021641 deionized water Inorganic materials 0.000 description 9
- 238000010902 jet-milling Methods 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 230000002776 aggregation Effects 0.000 description 6
- 238000005384 cross polarization magic-angle spinning Methods 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 239000012736 aqueous medium Substances 0.000 description 3
- 238000005119 centrifugation Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 239000011164 primary particle Substances 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 238000001694 spray drying Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- NJVOHKFLBKQLIZ-UHFFFAOYSA-N (2-ethenylphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1C=C NJVOHKFLBKQLIZ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910017518 Cu Zn Inorganic materials 0.000 description 2
- 229910017752 Cu-Zn Inorganic materials 0.000 description 2
- 229910017943 Cu—Zn Inorganic materials 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000005021 aminoalkenyl group Chemical group 0.000 description 2
- 125000004103 aminoalkyl group Chemical group 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000001143 conditioned effect Effects 0.000 description 2
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- BAAAEEDPKUHLID-UHFFFAOYSA-N decyl(triethoxy)silane Chemical compound CCCCCCCCCC[Si](OCC)(OCC)OCC BAAAEEDPKUHLID-UHFFFAOYSA-N 0.000 description 2
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 2
- YGUFXEJWPRRAEK-UHFFFAOYSA-N dodecyl(triethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OCC)(OCC)OCC YGUFXEJWPRRAEK-UHFFFAOYSA-N 0.000 description 2
- SCPWMSBAGXEGPW-UHFFFAOYSA-N dodecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OC)(OC)OC SCPWMSBAGXEGPW-UHFFFAOYSA-N 0.000 description 2
- 239000011363 dried mixture Substances 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000003517 fume Substances 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 2
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000009987 spinning Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 2
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 2
- SAWDTKLQESXBDN-UHFFFAOYSA-N triethoxy(heptyl)silane Chemical compound CCCCCCC[Si](OCC)(OCC)OCC SAWDTKLQESXBDN-UHFFFAOYSA-N 0.000 description 2
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- FHVAUDREWWXPRW-UHFFFAOYSA-N triethoxy(pentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)OCC FHVAUDREWWXPRW-UHFFFAOYSA-N 0.000 description 2
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 2
- SVKDNKCAGJVMMY-UHFFFAOYSA-N triethoxy(tetradecyl)silane Chemical compound CCCCCCCCCCCCCC[Si](OCC)(OCC)OCC SVKDNKCAGJVMMY-UHFFFAOYSA-N 0.000 description 2
- BBWMWJONYVGXGQ-UHFFFAOYSA-N triethoxy(undecyl)silane Chemical compound CCCCCCCCCCC[Si](OCC)(OCC)OCC BBWMWJONYVGXGQ-UHFFFAOYSA-N 0.000 description 2
- JEPXSTGVAHHRBD-UHFFFAOYSA-N trimethoxy(nonyl)silane Chemical compound CCCCCCCCC[Si](OC)(OC)OC JEPXSTGVAHHRBD-UHFFFAOYSA-N 0.000 description 2
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 2
- AXNJHBYHBDPTQF-UHFFFAOYSA-N trimethoxy(tetradecyl)silane Chemical compound CCCCCCCCCCCCCC[Si](OC)(OC)OC AXNJHBYHBDPTQF-UHFFFAOYSA-N 0.000 description 2
- LIJFLHYUSJKHKV-UHFFFAOYSA-N trimethoxy(undecyl)silane Chemical compound CCCCCCCCCCC[Si](OC)(OC)OC LIJFLHYUSJKHKV-UHFFFAOYSA-N 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- 238000004400 29Si cross polarisation magic angle spinning Methods 0.000 description 1
- BHTZPJXABISXPB-UHFFFAOYSA-N 4-triethoxysilylbutan-2-amine Chemical compound CCO[Si](OCC)(OCC)CCC(C)N BHTZPJXABISXPB-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-OUBTZVSYSA-N Carbon-13 Chemical compound [13C] OKTJSMMVPCPJKN-OUBTZVSYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 241000233855 Orchidaceae Species 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000006184 cosolvent Substances 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000009837 dry grinding Methods 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000009775 high-speed stirring Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- XUIMIQQOPSSXEZ-OUBTZVSYSA-N silicon-29 atom Chemical compound [29Si] XUIMIQQOPSSXEZ-OUBTZVSYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- SNOOUWRIMMFWNE-UHFFFAOYSA-M sodium;6-[(3,4,5-trimethoxybenzoyl)amino]hexanoate Chemical compound [Na+].COC1=CC(C(=O)NCCCCCC([O-])=O)=CC(OC)=C1OC SNOOUWRIMMFWNE-UHFFFAOYSA-M 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000012289 standard assay Methods 0.000 description 1
- FZXOVEZAKDRQJC-UHFFFAOYSA-N triethoxy(nonyl)silane Chemical compound CCCCCCCCC[Si](OCC)(OCC)OCC FZXOVEZAKDRQJC-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 238000001238 wet grinding Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/12—Treatment with organosilicon compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3009—Physical treatment, e.g. grinding; treatment with ultrasonic vibrations
- C09C1/3018—Grinding
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/309—Combinations of treatments provided for in groups C09C1/3009 - C09C1/3081
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/006—Combinations of treatments provided for in groups C09C3/04 - C09C3/12
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/04—Physical treatment, e.g. grinding, treatment with ultrasonic vibrations
- C09C3/041—Grinding
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09716—Inorganic compounds treated with organic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09725—Silicon-oxides; Silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/86—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by NMR- or ESR-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
- Y10T428/2995—Silane, siloxane or silicone coating
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silicon Compounds (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Developing Agents For Electrophotography (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Abstract
【解決手段】本発明は、少なくとも1つのアルコキシシラン化合物で表面処理された金属酸化物粒子を含む粒子組成物に関し、金属酸化物粒子は疎水性であり、一次凝集しておらず、そしてタップ密度が約110g/L〜約420g/LおよびBET表面積が約200m2/g未満である。
【選択図】なし
Description
例1
この例は、コロイドシリカをアルコキシシランで処理することによる、疎水性金属酸化物粒子の調製を示す。
この例は、コロイドシリカをアルコキシシランで処理することによる、疎水性金属酸化物粒子の調製を示す。
この例は、コロイドシリカをアルコキシシランで処理することによる、疎水性金属酸化物粒子の調製を示す。
この例は、コロイドシリカをアルコキシシランで処理することによる、疎水性金属酸化物粒子の調製を示す。
この例は、2つの異なる種類のコロイドシリカをアルコキシシランで処理することによる、疎水性金属酸化物粒子の調製を示す。
この例は、コロイドシリカをアルコキシシランで処理することによる、疎水性金属酸化物粒子の調製を示す。
例7
この例は、コロイドシリカをアルコキシシランで処理することによる、疎水性金属酸化物粒子の調製を示す。
この例は、コロイドシリカをアルコキシシランで処理することによる、疎水性金属酸化物粒子の調製を示す。
この例は、疎水性フュームシリカ粒子のタップ密度を示す。OTESで処理された、商業的に入手し得るフュームシリカ粒子(AEROSIL R 805, Degussa)のタップ密度は、タップ体積計で0,300,600,1250および3000タップ後に測定された。フュームシリカ粒子のタップ密度を表9に示す。
この例は、ポア密度に対する、疎水性金属酸化物粒子を含む粉末のジェットミルの効果を示す。
Claims (6)
- (a)一次凝集していない親水性金属酸化物粒子の水性分散体を得ること、
(b)その分散体を少なくとも1つのアルコキシシラン処理剤と一緒にして反応混合物を得、ここでその反応混合物は塩基性であること、ならびに
(c)反応混合物を乾燥して、疎水性であり一次凝集しておらず、かつタップ密度が110g/L〜420g/LおよびBET表面積が200m2/g未満である金属酸化物粒子を得ること、を含む疎水性金属酸化物粒子の製造方法。 - 分散体が、金属酸化物分散体を、水、ついで水溶性有機溶媒と混合することにより調製される請求項1に記載の方法。
- 水に対する水溶性有機溶媒の体積比が0.2〜2である請求項2に記載の方法。
- 反応混合物が、45℃〜75℃の温度で、1時間以上保持される請求項1に記載の方法。
- 分散体が、10wt%〜25wt%の金属酸化物粒子を含む請求項1に記載の方法。
- 金属酸化物粒子がコロイドシリカ粒子である請求項1に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/774,478 US8435474B2 (en) | 2006-09-15 | 2007-07-06 | Surface-treated metal oxide particles |
US11/774,478 | 2007-07-06 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010514881A Division JP5757734B2 (ja) | 2007-07-06 | 2008-07-02 | 表面処理された金属酸化物粒子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015145331A true JP2015145331A (ja) | 2015-08-13 |
JP6013531B2 JP6013531B2 (ja) | 2016-10-25 |
Family
ID=39792775
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010514881A Active JP5757734B2 (ja) | 2007-07-06 | 2008-07-02 | 表面処理された金属酸化物粒子 |
JP2015032952A Active JP6013531B2 (ja) | 2007-07-06 | 2015-02-23 | 表面処理された金属酸化物粒子 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010514881A Active JP5757734B2 (ja) | 2007-07-06 | 2008-07-02 | 表面処理された金属酸化物粒子 |
Country Status (6)
Country | Link |
---|---|
US (3) | US8435474B2 (ja) |
EP (1) | EP2176361B1 (ja) |
JP (2) | JP5757734B2 (ja) |
KR (2) | KR20100041735A (ja) |
CN (1) | CN101796145B (ja) |
WO (1) | WO2009009011A1 (ja) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8455165B2 (en) * | 2006-09-15 | 2013-06-04 | Cabot Corporation | Cyclic-treated metal oxide |
US20080070146A1 (en) | 2006-09-15 | 2008-03-20 | Cabot Corporation | Hydrophobic-treated metal oxide |
US8202502B2 (en) * | 2006-09-15 | 2012-06-19 | Cabot Corporation | Method of preparing hydrophobic silica |
DE102006061057A1 (de) * | 2006-12-22 | 2008-06-26 | Wacker Chemie Ag | Organofunktionelle Silikonharzschichten auf Metalloxiden |
US8945804B2 (en) * | 2008-07-09 | 2015-02-03 | Cabot Corporation | Treated metal oxide particles and toner compositions |
WO2010139603A1 (en) * | 2009-06-05 | 2010-12-09 | Basf Se | RASPBERRY-TYPE METAL OXIDE NANOSTRUCTURES COATED WITH CeO2 NANOPARTICLES FOR CHEMICAL MECHANICAL PLANARIZATION (CMP) |
US20110244382A1 (en) | 2010-04-06 | 2011-10-06 | Christopher Alyson M | Hydrophobic silica particles and method of producing same |
US20120070771A1 (en) * | 2010-09-17 | 2012-03-22 | Toshiba Tec Kabushiki Kaisha | Electrophotographic toner |
JP6089173B2 (ja) * | 2010-12-28 | 2017-03-08 | 日本メナード化粧品株式会社 | 分散安定剤及びこの製造方法 |
FR2979107A1 (fr) * | 2011-08-16 | 2013-02-22 | Bluestar Silicones France | Procede de preparation d'une silice greffee par un compose organosilicie |
US8790856B2 (en) * | 2011-11-09 | 2014-07-29 | Xerox Corporation | Low dielectric additives for toner |
US8673530B2 (en) * | 2011-11-09 | 2014-03-18 | Xerox Corporation | Alkyl silane surface treated silica for toner |
WO2013148241A1 (en) | 2012-03-26 | 2013-10-03 | Cabot Corporation | Treated fumed silica |
JP2014196215A (ja) * | 2013-03-29 | 2014-10-16 | 日揮触媒化成株式会社 | 改質金属酸化物微粒子粉末およびその製造方法 |
US9029057B2 (en) * | 2013-04-17 | 2015-05-12 | Xerox Corporation | Single component developer composition |
EP3065717A1 (en) | 2013-11-04 | 2016-09-14 | Biopharmx, Inc. | Dosage form comprising an active ingredient and a plurality of solid porous microcarriers |
EP3070054A4 (en) | 2013-11-13 | 2017-05-03 | Sumitomo Osaka Cement Co., Ltd. | Silicon-oxide-coated zinc oxide and method for manufacturing same, silicon-oxide-coated zinc-oxide-containing composition, and cosmetic |
DE102013224206A1 (de) * | 2013-11-27 | 2015-05-28 | Wacker Chemie Ag | Oberflächenmodifizierte partikuläre Metalloxide |
CN103919693A (zh) * | 2014-03-26 | 2014-07-16 | 上海得高实业有限公司 | 一种亲油处理的水分散粉浆及应用该粉浆的产品 |
KR102246324B1 (ko) * | 2014-03-31 | 2021-04-29 | 스미토모 오사카 세멘토 가부시키가이샤 | 산화 규소 피복 산화 아연과 그 제조 방법 및 산화 규소 피복 산화 아연 함유 조성물과 화장료 |
CN109906411B (zh) | 2016-11-04 | 2022-12-27 | 卡博特公司 | 含结晶聚酯和有机硅的纳米复合物 |
KR102166845B1 (ko) * | 2017-09-15 | 2020-10-16 | 주식회사 엘지화학 | 하드 코팅 필름 |
WO2020067406A1 (ja) * | 2018-09-28 | 2020-04-02 | 住友大阪セメント株式会社 | 表面処理金属酸化物粒子、分散液、組成物、化粧料および表面処理金属酸化物粒子の製造方法 |
JP7095534B2 (ja) * | 2018-09-28 | 2022-07-05 | 住友大阪セメント株式会社 | 表面処理金属酸化物粒子、分散液、化粧料および表面処理金属酸化物粒子の製造方法 |
KR20220072859A (ko) * | 2019-10-02 | 2022-06-02 | 다우 글로벌 테크놀로지스 엘엘씨 | 소수성으로 개질된 안료 조성물 |
CN115348990B (zh) | 2020-02-04 | 2024-06-04 | 卡博特公司 | 用于基于液体的增材制造的组合物 |
CN113105758B (zh) * | 2021-03-11 | 2022-06-14 | 中国科学院理化技术研究所 | 一种具有扁平化结构的高振实密度的改性气相二氧化硅及其制备方法和用途 |
CN113717709B (zh) * | 2021-08-27 | 2023-02-17 | 西安长庆化工集团有限公司 | 一种纳米流体渗吸剂及其制备方法和应用 |
CN113881250A (zh) * | 2021-10-20 | 2022-01-04 | 广州集泰化工股份有限公司 | 一种导热填料及其表面处理方法 |
WO2023230251A1 (en) | 2022-05-27 | 2023-11-30 | Cabot Corporation | Aerogel composition for thermal insulation |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03187913A (ja) * | 1989-12-15 | 1991-08-15 | Shin Etsu Chem Co Ltd | シリカ粉末の製造方法 |
JPH08119619A (ja) * | 1994-10-26 | 1996-05-14 | Tokuyama Corp | シリカ粒子の表面処理方法 |
JP2004339508A (ja) * | 2003-05-02 | 2004-12-02 | Wacker Chemie Gmbh | 有機官能性で表面変性された金属酸化物の製造法、そのような金属酸化物及び該金属酸化物を含有している製品 |
WO2006056377A1 (en) * | 2004-11-25 | 2006-06-01 | Degussa Gmbh | Pulverulent cosmetic formulation having a high water content |
Family Cites Families (209)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3900588A (en) | 1974-02-25 | 1975-08-19 | Xerox Corp | Non-filming dual additive developer |
GB8320086D0 (en) * | 1983-07-26 | 1983-08-24 | Ciba Geigy Ag | Spherical fused silica |
JP2684033B2 (ja) | 1986-03-11 | 1997-12-03 | コニカ株式会社 | 静電像現像用トナーおよび画像形成方法 |
FR2613708B1 (fr) * | 1987-04-13 | 1990-10-12 | Rhone Poulenc Chimie | Silice de precipitation hydrophobe, son procede de preparation et son application au renforcement des elastomeres silicones |
JP2630946B2 (ja) | 1987-05-29 | 1997-07-16 | 東レ・ダウコーニング・シリコーン株式会社 | 正帯電性樹脂粉末の流動性向上剤 |
US4950502A (en) * | 1987-09-10 | 1990-08-21 | Dow Corning Corporation | Method of hydrophobing silica |
US4985477A (en) * | 1988-05-13 | 1991-01-15 | Dow Corning Corporation | Method of producing treated silica filler for silicone rubber |
US5226930A (en) | 1988-06-03 | 1993-07-13 | Monsanto Japan, Ltd. | Method for preventing agglomeration of colloidal silica and silicon wafer polishing composition using the same |
WO1989012082A1 (en) | 1988-06-03 | 1989-12-14 | Mitsubishi Monsanto Chemical Company | Abrasive composition for silicon wafer |
JP2810389B2 (ja) * | 1988-11-17 | 1998-10-15 | キヤノン株式会社 | 正帯電性現像剤 |
JPH02180963A (ja) | 1989-01-06 | 1990-07-13 | Shin Etsu Chem Co Ltd | オルガノポリシロキサン組成物 |
US5008305A (en) * | 1989-02-06 | 1991-04-16 | Dow Corning Corporation | Treated silica for reinforcing silicone elastomer |
US5013585A (en) * | 1989-06-13 | 1991-05-07 | Shin-Etsu Chemical Co., Ltd. | Method for the preparation of surface-modified silica particles |
US5096733A (en) * | 1989-10-30 | 1992-03-17 | The United States Of America As Represented By The Secretary Of The Dept. Of Health And Human Services | Prevention of the acute cytotoxicity associated with silica containing minerals |
JP2932084B2 (ja) * | 1990-06-07 | 1999-08-09 | 花王株式会社 | 静電荷像現像剤組成物 |
JP2646150B2 (ja) | 1990-08-27 | 1997-08-25 | 出光興産 株式会社 | 撥水性シリカゾルおよびその製造方法 |
US5135832A (en) | 1990-11-05 | 1992-08-04 | Xerox Corporation | Colored toner compositions |
US5194356A (en) * | 1990-11-05 | 1993-03-16 | Xerox Corporation | Toner compositions |
US5266432A (en) | 1991-03-01 | 1993-11-30 | Kao Corporation | Hydrophobic polyester toner composition |
JP2633130B2 (ja) * | 1991-03-08 | 1997-07-23 | キヤノン株式会社 | 磁性トナー、画像形成方法、表面改質シリカ微粉末及びその製造方法 |
JP2624027B2 (ja) | 1991-05-14 | 1997-06-25 | 富士ゼロックス株式会社 | 表面処理無機微粉末を用いた電子写真現像剤 |
JP2715691B2 (ja) * | 1991-05-14 | 1998-02-18 | 富士ゼロックス株式会社 | 電子写真用トナー組成物 |
DE4202695C2 (de) * | 1992-01-31 | 1993-12-09 | Degussa | Oberflächenmodifiziertes, pyrogen hergestelltes Titandioxid |
JPH05224456A (ja) * | 1992-02-14 | 1993-09-03 | Fuji Xerox Co Ltd | 静電荷像現像剤とその製造方法および画像形成方法 |
JPH05257316A (ja) * | 1992-03-11 | 1993-10-08 | Sharp Corp | 静電荷像用現像剤 |
JPH0695426A (ja) | 1992-09-16 | 1994-04-08 | Fuji Xerox Co Ltd | 静電荷像現像用乾式トナー |
US5376172A (en) | 1992-12-23 | 1994-12-27 | Xerox Corporation | Metal oxide processes and toners thereof |
US6193795B1 (en) * | 1993-08-02 | 2001-02-27 | Degussa Corporation | Low structure pyrogenic hydrophilic and hydrophobic metallic oxides, production and use |
JP3368005B2 (ja) | 1993-08-26 | 2003-01-20 | 東レ・ダウコーニング・シリコーン株式会社 | 消泡剤組成物 |
US5543173A (en) | 1993-10-12 | 1996-08-06 | Aluminum Company Of America | Surface treating aluminum trihydrate powders with prehydrolized silane |
US5597853A (en) * | 1993-11-08 | 1997-01-28 | Shin-Etsu Chemical Co., Ltd. | Silicone rubber compositions |
GB2284812B (en) | 1993-12-20 | 1997-11-26 | Gen Electric Co Plc | Addition-curable silicone adhesive compositions |
DE4402370A1 (de) | 1994-01-27 | 1995-08-03 | Degussa | Silanisierte Kieselsäuren |
JPH07323204A (ja) | 1994-05-30 | 1995-12-12 | Toray Dow Corning Silicone Co Ltd | 抑泡剤組成物 |
DE4419234A1 (de) | 1994-06-01 | 1995-12-07 | Wacker Chemie Gmbh | Verfahren zur Silylierung von anorganischen Oxiden |
FR2721615A1 (fr) * | 1994-06-24 | 1995-12-29 | Rhone Poulenc Chimie | Procédé de préparation de particules d'oxyde métallique organophiles. |
EP0694576A1 (en) * | 1994-07-28 | 1996-01-31 | General Electric Company | Treating process for precipitated silica fillers |
JPH0895285A (ja) | 1994-09-22 | 1996-04-12 | Mita Ind Co Ltd | 電子写真用トナー |
IT1270628B (it) * | 1994-10-06 | 1997-05-07 | Enichem Spa | Manufatti in ossido di silicio e/o altri ossidi metallici misti e procedimento per la loro preparazione in dimensioni finali o quasi finali |
DE69520328T2 (de) | 1994-11-08 | 2001-08-23 | Canon Kk | Toner für die Entwicklung elektrostatischer Bilder, Zwei-Komponenten-Entwickler, Entwicklungsmethode, Bilderzeugungsverfahren, Hitzefixierverfahren und Verfahren zur Herstellung von Tonern |
US5484678A (en) * | 1994-12-01 | 1996-01-16 | Xerox Corporation | Toner compositions with charge additive mixture |
US5827632A (en) | 1994-12-05 | 1998-10-27 | Canon Kabushiki Kaisha | Toner for developing electrostatic image containing hydrophobized inorganic fine powder |
PT725037E (pt) | 1995-02-04 | 2001-07-31 | Degussa | Granulados a base de dioxido de silicio preparado pirogenicamente processo para a sua preparacao e sua utilizacao |
US5716748A (en) * | 1995-07-28 | 1998-02-10 | Nippon Zeon Co., Ltd. | Developer and finely particulate polymer |
JP3229174B2 (ja) | 1995-08-21 | 2001-11-12 | 日本アエロジル株式会社 | 表面改質金属酸化物微粉末およびその製造方法 |
US5747211A (en) * | 1996-02-20 | 1998-05-05 | Minolta Co., Ltd. | Toner for developing electrostatic latent images |
US6191122B1 (en) * | 1996-03-29 | 2001-02-20 | DEGUSSA HüLS AKTIENGESELLSCHAFT | Partially hydrophobic precipitated silicas |
US6165663A (en) | 1996-04-08 | 2000-12-26 | Canon Kabushiki Kaisha | Magnetic coated carrier two-component type developer and developing method |
US5766814A (en) * | 1996-04-08 | 1998-06-16 | Cannon Kabushiki Kaisha | Magnetic coated carrier, two-component type developer and developing method |
DE19616781A1 (de) * | 1996-04-26 | 1997-11-06 | Degussa | Silanisierte Kieselsäure |
US5959005A (en) | 1996-04-26 | 1999-09-28 | Degussa-Huls Aktiengesellschaft | Silanized silica |
US5776646A (en) | 1996-06-21 | 1998-07-07 | Minolta Co., Ltd. | Negatively chargeable toner with specified fine particles added externally |
US5725987A (en) * | 1996-11-01 | 1998-03-10 | Xerox Corporation | Supercritical processes |
US5840287A (en) | 1996-12-20 | 1998-11-24 | Procter & Gamble Company | Antiperspirant compositions containing gellants in the form of alkyl amides of di- and tri-carboxylic acids |
US5942590A (en) | 1997-02-24 | 1999-08-24 | Dow Corning Corporation | Process for making hydrophobic silica with reduced surface area under neutral conditions |
JP3394048B2 (ja) | 1997-02-24 | 2003-04-07 | ダウ コーニング コーポレイション | 減少した表面積を有する中性−熟成疎水性シリカゲル |
US5989768A (en) | 1997-03-06 | 1999-11-23 | Cabot Corporation | Charge-modified metal oxides with cyclic silazane and electrostatographic systems incorporating same |
JP3576741B2 (ja) | 1997-03-06 | 2004-10-13 | 東レ・ダウコーニング・シリコーン株式会社 | シリコーン硬化物の難燃性を向上させる方法 |
CA2205789A1 (en) | 1997-05-22 | 1998-11-22 | Bayer Inc. | Process for hydrophobicizing particles, and their use as fillers in polymer masterbatches |
EP0881192B1 (en) * | 1997-05-26 | 2002-03-27 | Nissan Chemical Industries, Ltd. | Process of producing hydrophobic organosilica sol |
US6448331B1 (en) | 1997-07-15 | 2002-09-10 | Asahi Kasei Kabushiki Kaisha | Alkoxysilane/organic polymer composition for thin insulating film production and use thereof |
US6242147B1 (en) * | 1997-09-03 | 2001-06-05 | Minolta Co., Ltd. | Negatively chargeable toner and developing device using thereof |
US5908660A (en) * | 1997-09-03 | 1999-06-01 | Dow Corning Corporation | Method of preparing hydrophobic precipitated silica |
DE19740440A1 (de) * | 1997-09-15 | 1999-03-18 | Degussa | Leicht dispergierbare Fällungskieselsäure |
US6045650A (en) * | 1997-09-16 | 2000-04-04 | Sunsmart, Inc. | Hydrophilic materials and their method of preparation |
EP0908494A3 (en) | 1997-10-08 | 1999-11-10 | E.I. Dupont De Nemours And Company | Uniformly coated particulate metal oxide |
DE19756831A1 (de) * | 1997-12-19 | 1999-07-01 | Wacker Chemie Gmbh | Siliciumdioxid, das an seiner Oberfläche teil- oder vollständig silylierte Polykieselsäureketten trägt |
US5919298A (en) | 1998-01-12 | 1999-07-06 | Dow Corning Corporation | Method for preparing hydrophobic fumed silica |
US6015843A (en) * | 1998-01-14 | 2000-01-18 | Dendreon Corporation | Process for making silanized colloidal silica |
US5916722A (en) * | 1998-02-05 | 1999-06-29 | Xerox Corporation | Toner compositions |
US6376077B1 (en) * | 1998-04-10 | 2002-04-23 | Kyowa Chemical Industry Co., Ltd. | Process for the production of coupling agent-treated inorganic particles and use thereof |
DE69935769T2 (de) * | 1998-05-11 | 2007-12-27 | Nippon Aerosil Co., Ltd. | Feines, hydrophobes Metalloxidpulver, Verfahren zu seiner Herstellung und Tonerzusammensetzung für die Elektrophotographie |
EP0959102B1 (en) * | 1998-05-18 | 2005-09-28 | Shin-Etsu Chemical Co., Ltd. | Silica particles surface-treated with silane, process for producing the same and uses thereof |
JP3756339B2 (ja) | 1998-05-18 | 2006-03-15 | 信越化学工業株式会社 | シラン表面処理シリカ系微粒子、その製造方法およびそれを含有する有機樹脂組成物 |
DE19828364A1 (de) * | 1998-06-25 | 1999-12-30 | Degussa | Hydrophobe Fällungskieselsäure |
CN100370364C (zh) | 1998-06-25 | 2008-02-20 | 松下电器产业株式会社 | 调色剂及其制造方法 |
DE69924677T2 (de) | 1998-07-06 | 2005-09-29 | Canon K.K. | Toner, Bildherstellungsverfahren, und Apparatbauteil |
JP2000026727A (ja) | 1998-07-06 | 2000-01-25 | Dow Corning Toray Silicone Co Ltd | 硬化性シリコーンレジン組成物 |
US6004714A (en) | 1998-08-11 | 1999-12-21 | Xerox Corporation | Toner compositions |
US6190815B1 (en) * | 1998-08-11 | 2001-02-20 | Xerox Corporation | Toner compositions |
US6214507B1 (en) * | 1998-08-11 | 2001-04-10 | Xerox Corporation | Toner compositions |
US6051672A (en) | 1998-08-24 | 2000-04-18 | Dow Corning Corporation | Method for making hydrophobic non-aggregated colloidal silica |
US6066421A (en) * | 1998-10-23 | 2000-05-23 | Julien; Paul C. | Color toner compositions and processes thereof |
US6103441A (en) | 1998-11-12 | 2000-08-15 | Ricoh Company, Ltd. | Color toner for electrophotography |
US6174926B1 (en) * | 1999-01-13 | 2001-01-16 | Cabot Corporation | Method of preparing organically modified silica |
US6004711A (en) | 1999-02-03 | 1999-12-21 | Lexmark International, Inc. | Toner composition including positive and negative tribocharging hydrophobic extra-particulate additives |
JP4343378B2 (ja) * | 1999-02-22 | 2009-10-14 | キヤノン株式会社 | トナーの製造方法、及び画像形成方法 |
JP4013014B2 (ja) * | 1999-03-05 | 2007-11-28 | 信越化学工業株式会社 | 静電荷像現像剤 |
JP2000258955A (ja) | 1999-03-10 | 2000-09-22 | Fuji Xerox Co Ltd | 電子写真用トナー、その製造方法及び現像剤、画像形成方法 |
JP3927741B2 (ja) | 1999-03-12 | 2007-06-13 | 信越化学工業株式会社 | 静電荷像現像用トナー外添剤 |
US6184408B1 (en) * | 1999-04-28 | 2001-02-06 | Dow Corning Corporation | Method for preparation of hydrophobic precipitated silica |
JP2001031843A (ja) | 1999-05-14 | 2001-02-06 | Toagosei Co Ltd | シリカ充填材及びエポキシ樹脂組成物 |
US6087059A (en) | 1999-06-28 | 2000-07-11 | Xerox Corporation | Toner and developer compositions |
JP2003506519A (ja) | 1999-07-30 | 2003-02-18 | ピーピージー インダストリーズ オハイオ,インコーポレイティド | 改良ひっかき抵抗性を有するコーティング組成物、コート基材及びそれに関連する方法 |
US6610777B1 (en) | 1999-07-30 | 2003-08-26 | Ppg Industries Ohio, Inc. | Flexible coating compositions having improved scratch resistance, coated substrates and methods related thereto |
CN1368995A (zh) * | 1999-08-19 | 2002-09-11 | 陶氏康宁公司 | 化学改性硅石填料,生产方法和含有它的硅氧烷组合物 |
US7015271B2 (en) * | 1999-08-19 | 2006-03-21 | Ppg Industries Ohio, Inc. | Hydrophobic particulate inorganic oxides and polymeric compositions containing same |
US6736891B1 (en) * | 1999-08-19 | 2004-05-18 | Ppg Industries Ohio, Inc. | Process for producing hydrophobic particulate inorganic oxides |
US6318124B1 (en) | 1999-08-23 | 2001-11-20 | Alliedsignal Inc. | Nanoporous silica treated with siloxane polymers for ULSI applications |
JP4076681B2 (ja) * | 1999-08-24 | 2008-04-16 | 富士ゼロックス株式会社 | 静電潜像現像用トナーの製造方法 |
JP2001097710A (ja) | 1999-09-29 | 2001-04-10 | Nippon Aerosil Co Ltd | 低粘性スラリー用表面改質シリカ微粉末とその用途 |
EP1227781B9 (en) * | 1999-10-28 | 2006-03-08 | 3M Innovative Properties Company | Dental materials with nano-sized silica particles |
DE60031072T2 (de) * | 1999-11-22 | 2007-02-15 | Dainippon Ink And Chemicals, Inc. | Toner für elektrostatische Bildentwicklung und Bildherstellungsverfahren unter Verwendung desselben |
EP1249474B1 (en) * | 1999-12-08 | 2012-10-03 | Nippon Aerosil Co., Ltd. | Fine metal oxide powder having high dispersibility and toner composition comprising the same |
GB2357497A (en) * | 1999-12-22 | 2001-06-27 | Degussa | Hydrophobic silica |
US6579929B1 (en) * | 2000-01-19 | 2003-06-17 | Bridgestone Corporation | Stabilized silica and method of making and using the same |
US6294303B1 (en) | 2000-01-24 | 2001-09-25 | Nexpress Solutions Llc | Monocomponent developer containing positively chargeable fine power |
JP4631119B2 (ja) * | 2000-01-28 | 2011-02-16 | Jsr株式会社 | 疎水化コロイダルシリカの製造方法 |
US6319647B1 (en) | 2000-03-07 | 2001-11-20 | Xerox Corporation | Toner and developer for magnetic brush development system |
JP4512872B2 (ja) * | 2000-03-31 | 2010-07-28 | 日本アエロジル株式会社 | 表面改質シリカ微粉末とその製造方法 |
DE50005683D1 (de) * | 2000-04-11 | 2004-04-22 | Degussa | Streichfarben für Inkjet-Medien |
EP1156373A1 (en) | 2000-05-17 | 2001-11-21 | Heidelberger Druckmaschinen Aktiengesellschaft | Electrographic developer compositions and method for development of an electrostatic image |
US7083770B2 (en) | 2000-06-20 | 2006-08-01 | Nippon Aerosil Co., Ltd. | Amorphous, fine silica particles, and method for their production and their use |
JP4674936B2 (ja) | 2000-07-17 | 2011-04-20 | チタン工業株式会社 | 疎水性微粒子及びその応用 |
US6465670B2 (en) | 2000-08-01 | 2002-10-15 | The Goodyear Tire & Rubber Company | Preparation of surface modified silica |
US6203960B1 (en) * | 2000-08-22 | 2001-03-20 | Xerox Corporation | Toner compositions |
JP4390994B2 (ja) * | 2000-09-27 | 2009-12-24 | 富士ゼロックス株式会社 | 静電荷像現像用トナー、それを用いた画像形成方法及び画像形成装置 |
JP4306951B2 (ja) | 2000-11-07 | 2009-08-05 | 電気化学工業株式会社 | 表面処理された微細球状シリカ粉末および樹脂組成物 |
JP3964617B2 (ja) * | 2000-11-14 | 2007-08-22 | 株式会社巴川製紙所 | 負帯電性非磁性一成分トナー及びその現像方法 |
CN1365029A (zh) * | 2000-12-28 | 2002-08-21 | 精工爱普生株式会社 | 调色剂和使用该调色剂的图像形成装置 |
JP2002214825A (ja) | 2001-01-17 | 2002-07-31 | Fuji Xerox Co Ltd | 電子写真用トナー、電子写真用現像剤、及び画像形成方法 |
JP4161535B2 (ja) | 2001-02-16 | 2008-10-08 | 日本ゼオン株式会社 | 静電潜像現像用トナー |
JP4828032B2 (ja) | 2001-03-05 | 2011-11-30 | 株式会社トクヤマ | 疎水性シリカ粉末およびその製造方法 |
JP2002275356A (ja) | 2001-03-22 | 2002-09-25 | Denki Kagaku Kogyo Kk | エポキシ樹脂用充填材及びエポキシ樹脂組成物 |
US6696212B2 (en) * | 2001-03-27 | 2004-02-24 | Heidelberger Druckmaschinen Ag | Single component toner for improved magnetic image character recognition |
DE10118345A1 (de) | 2001-04-12 | 2002-10-17 | Creavis Tech & Innovation Gmbh | Eigenschaften von Strukturbildnern für selbstreinigende Oberflächen und die Herstellung selbiger |
JP2002338230A (ja) | 2001-05-22 | 2002-11-27 | Toagosei Co Ltd | シリカ粒子及び樹脂組成物 |
US6890657B2 (en) * | 2001-06-12 | 2005-05-10 | Eastman Kodak Company | Surface contacting member for toner fusing system and process, composition for member surface layer, and process for preparing composition |
US6503677B1 (en) * | 2001-07-10 | 2003-01-07 | Xerox Corporation | Emulsion aggregation toner particles coated with negatively chargeable and positively chargeable additives and method of making same |
DE10138490A1 (de) * | 2001-08-04 | 2003-02-13 | Degussa | Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme |
DE10138492A1 (de) * | 2001-08-04 | 2003-02-13 | Degussa | Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad |
DE10145162A1 (de) | 2001-09-13 | 2003-04-10 | Wacker Chemie Gmbh | Kieselsäure mit geringem Gehalt an Kieselsäure-Silanolgruppen |
DE10146325A1 (de) * | 2001-09-20 | 2003-04-10 | Degussa | Fällungskieselsäure mit hohem BET/CTAB-Verhältnis |
DE10151478C1 (de) * | 2001-10-18 | 2003-03-13 | Wacker Chemie Gmbh | Mit Aminogruppen oberflächenmodifizierte Feststoffe, Verfahren zu deren Herstellung und deren Verwendung |
JP3694474B2 (ja) | 2001-10-30 | 2005-09-14 | 秀博 神谷 | 球状シリカ粉末の製造方法 |
JP3891265B2 (ja) * | 2001-11-30 | 2007-03-14 | 信越化学工業株式会社 | 疎水性シリカ微粉末及びその製造方法 |
US20050203214A1 (en) | 2001-12-14 | 2005-09-15 | Nippon Aerosil Co., Ltd. | Surface modified inorganic oxide powder and its use |
US20050011409A1 (en) * | 2001-12-25 | 2005-01-20 | Yasuhide Isobe | Inorganic oxide |
JP2003201112A (ja) | 2001-12-28 | 2003-07-15 | Nippon Aerosil Co Ltd | 表面改質シリカ粉末とそのシリカスラリー |
JP2003238141A (ja) | 2002-02-07 | 2003-08-27 | Mitsubishi Rayon Co Ltd | 表面改質球状シリカ及びその製造方法、並びに半導体封止用樹脂組成物 |
DE10209698A1 (de) * | 2002-03-06 | 2003-09-18 | Sachtleben Chemie Gmbh | Verfahren zur Herstellung von gecoateten, feinteiligen, anorganischer Festkörpern und deren Verwendung |
JP2004029699A (ja) | 2002-05-02 | 2004-01-29 | Bridgestone Corp | 画像表示用粒子及びそれを用いた画像表示装置 |
US6972301B2 (en) | 2002-06-06 | 2005-12-06 | Sasol North America Inc. | Process for producing organically modified metal oxides and products thereof |
KR100972947B1 (ko) * | 2002-08-03 | 2010-07-30 | 에보닉 데구사 게엠베하 | 표면적이 넓은 침강 규산 |
US6780559B2 (en) | 2002-08-07 | 2004-08-24 | Xerox Corporation | Toner processes |
DE10239424A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Kieselsäuren |
US6875559B2 (en) * | 2002-08-29 | 2005-04-05 | Micron Technology, Inc. | Method of etching materials patterned with a single layer 193nm resist |
EP1519993B1 (en) * | 2002-08-29 | 2007-04-18 | Amber Chemical Company Ltd. | Room temperature curable organopolysiloxane compositions |
US6706398B1 (en) * | 2002-09-13 | 2004-03-16 | Dow Corning Corporation | Organosilicon compounds and blends for treating silica |
EP1406129B8 (en) * | 2002-10-02 | 2012-05-23 | Canon Kabushiki Kaisha | Silica fine particle, toner, two-component developer and image forming method |
CA2498627A1 (en) | 2002-10-02 | 2004-04-15 | Dow Corning Corporation | Filled silicone composition and cured silicone product |
US6830811B2 (en) | 2002-10-02 | 2004-12-14 | Dow Corning Corporation | Method of preparing hydrophobic partially aggregated colloidal silica |
DE10247359A1 (de) * | 2002-10-10 | 2004-04-29 | Basf Coatings Ag | Nanopartikel, Verfahren zur Modifizierung ihrer Oberfläche, Dispersion der Nanopartikel, Verfahren zu ihrer Herstellung und ihre Verwendung |
ES2329239T3 (es) | 2002-10-14 | 2009-11-24 | Akzo Nobel N.V. | Dispersion acuosa de silice. |
US7544726B2 (en) * | 2002-10-14 | 2009-06-09 | Akzo Nobel N.V. | Colloidal silica composition |
JP2004168559A (ja) | 2002-11-15 | 2004-06-17 | Nippon Aerosil Co Ltd | 高分散高疎水性シリカ粉末とその製造方法 |
US20040102529A1 (en) | 2002-11-22 | 2004-05-27 | Campbell John Robert | Functionalized colloidal silica, dispersions and methods made thereby |
KR100714942B1 (ko) | 2002-12-27 | 2007-05-07 | 가부시끼가이샤 도꾸야마 | 실리카 미립자 |
JP4189235B2 (ja) | 2003-02-25 | 2008-12-03 | 花王株式会社 | 非磁性一成分現像用トナー |
JP2004359476A (ja) | 2003-06-02 | 2004-12-24 | Tokuyama Corp | 疎水化シリカ組成物 |
JP4148033B2 (ja) | 2003-06-09 | 2008-09-10 | 富士ゼロックス株式会社 | 静電潜像現像用トナー、静電潜像現像剤、及び画像形成方法 |
JP2005062797A (ja) * | 2003-07-30 | 2005-03-10 | Canon Inc | 磁性トナー |
US7238387B2 (en) * | 2003-07-30 | 2007-07-03 | Canon Kabushiki Kaisha | Hydrophobic inorganic fine particles, hydrophobic inorganic fine particles production process, and toner |
US7008982B2 (en) * | 2003-09-29 | 2006-03-07 | J.M. Huber Corporation | Surface treated silicas |
US7547498B2 (en) | 2003-10-16 | 2009-06-16 | Konica Minolta Business Technologies, Inc. | Toner for developing electrostatic latent images and a production method for the same |
US7316881B2 (en) * | 2003-10-30 | 2008-01-08 | Eastman Kodak Company | Method of producing a custom color toner |
US20050095522A1 (en) * | 2003-10-30 | 2005-05-05 | Eastman Kodak Company | Control of charge-to-mass of toner using silica blends |
US7737187B2 (en) | 2003-12-19 | 2010-06-15 | Nissan Chemical Industries, Ltd. | Process for producing inorganic oxide organosol |
JP4239835B2 (ja) * | 2004-01-28 | 2009-03-18 | 富士ゼロックス株式会社 | 静電荷像現像用トナー、静電荷像現像用現像剤及び画像形成方法 |
US7435450B2 (en) | 2004-01-30 | 2008-10-14 | Hewlett-Packard Development Company, L.P. | Surface modification of silica in an aqueous environment |
US7906188B2 (en) * | 2004-01-30 | 2011-03-15 | Hewlett-Packard Development Company, L.P. | Porous silica coated inkjet recording material |
JP2005215491A (ja) | 2004-01-30 | 2005-08-11 | Sekisui Chem Co Ltd | トナー |
NZ549073A (en) * | 2004-02-17 | 2010-10-29 | Agrium Inc | Thiol ester compositions and processes for making and using same |
DE102004010756A1 (de) * | 2004-03-05 | 2005-09-22 | Degussa Ag | Silanisierte Kieselsäuren |
JP4102771B2 (ja) | 2004-03-25 | 2008-06-18 | 富士フイルム株式会社 | インクジェット記録用媒体 |
US7081234B1 (en) | 2004-04-05 | 2006-07-25 | Xerox Corporation | Process of making hydrophobic metal oxide nanoparticles |
US20050239921A1 (en) | 2004-04-27 | 2005-10-27 | Birmingham John N | Preparation of organic additive-treated, pyrogenic silica-encapsulated titanium dioxide particles |
KR100657415B1 (ko) | 2004-05-13 | 2006-12-13 | 주식회사 엘지화학 | 대전부 오염을 낮춘 칼라토너 |
JP2006022316A (ja) | 2004-06-10 | 2006-01-26 | Tokuyama Corp | エポキシ樹脂組成物用充填剤 |
JP3983234B2 (ja) | 2004-08-16 | 2007-09-26 | 電気化学工業株式会社 | トナー外添材の製造方法 |
JP2006065107A (ja) * | 2004-08-27 | 2006-03-09 | Fuji Xerox Co Ltd | 静電荷現像用マゼンタトナー、静電荷現像用現像剤、トナーの製造方法及び画像形成方法 |
JP4615952B2 (ja) | 2004-09-30 | 2011-01-19 | 株式会社トクヤマ | 改質疎水化シリカ及びその製造方法 |
WO2006045012A2 (en) | 2004-10-20 | 2006-04-27 | Cabot Corporation | Method of preparing hydrophobic silica directly from an aqueous colloidal silica dispersion |
JP4888633B2 (ja) | 2004-11-16 | 2012-02-29 | 日産化学工業株式会社 | 疎水性シリカ粉末の製造法 |
US20060112860A1 (en) * | 2004-11-16 | 2006-06-01 | Nissan Chemical Industries, Ltd. | Process for producing hydrophobic silica powder |
JP2006171017A (ja) | 2004-11-18 | 2006-06-29 | Seiko Epson Corp | トナーの製造方法 |
EP1841825B1 (en) | 2004-11-18 | 2011-03-23 | Evonik Degussa GmbH | Hydrophobic silica and its use in silicone rubber |
US7300734B2 (en) | 2004-12-03 | 2007-11-27 | Xerox Corporation | Toner compositions |
KR100677155B1 (ko) | 2004-12-04 | 2007-02-02 | 삼성전자주식회사 | 전자사진용 현상제 |
US7592114B2 (en) | 2005-01-18 | 2009-09-22 | Lg Chem Ltd. | Color toner for non-magnetic mono-component system for increasing printing quality and a method for preparing the same |
US8987351B2 (en) | 2005-02-08 | 2015-03-24 | Momentive Performance Materials Inc. | Filler treatments utilizing low VOC silanes |
US20060188722A1 (en) | 2005-02-22 | 2006-08-24 | Daniella White | Colloidal particle sols, methods for preparing and curable film-forming compositions containing the same |
EP1696006B1 (en) | 2005-02-28 | 2009-06-17 | Samsung SDI Germany GmbH | metal ink and substrate for a display and method for manufacturing the same |
EP1871824B1 (en) | 2005-03-24 | 2017-03-01 | Bridgestone Corporation | Compounding silica-reinforced rubber with low volatile organic compound (voc) emission |
US20060225615A1 (en) | 2005-04-11 | 2006-10-12 | Raman Narayan K | Treated filler and process and producing |
CA2619592C (en) | 2005-04-11 | 2011-10-11 | Ppg Industries Ohio, Inc. | Treated filler and process for producing |
EP1874858A1 (en) | 2005-04-29 | 2008-01-09 | Eidgenössische Technische Hochschule Zürich | Surface functionalization and coating of flame-generated nanoparticles |
KR101302646B1 (ko) * | 2005-07-04 | 2013-09-03 | 닛산 가가쿠 고교 가부시키 가이샤 | 소수성 실리카 분말의 제조방법 |
US20070009823A1 (en) * | 2005-07-08 | 2007-01-11 | Xerox Corporationd | Toner and developer compositions |
JP2007033583A (ja) | 2005-07-25 | 2007-02-08 | Tomoegawa Paper Co Ltd | 電子写真用トナー |
JP2007034223A (ja) | 2005-07-29 | 2007-02-08 | Kyocera Mita Corp | 静電荷像現像用トナーおよび画像形成方法 |
JP2007034224A (ja) | 2005-07-29 | 2007-02-08 | Kyocera Mita Corp | 静電荷像現像用トナーおよび画像形成方法 |
US7402370B2 (en) * | 2005-08-30 | 2008-07-22 | Xerox Corporation | Single component developer of emulsion aggregation toner |
WO2008008287A1 (en) | 2006-07-10 | 2008-01-17 | Borgwarner Inc. | Viscous fan drive systems having fill and scavenge control |
US20080049997A1 (en) | 2006-07-12 | 2008-02-28 | Daniel Chin | Method and device for enhancing images in display devices |
US7885436B2 (en) | 2006-07-13 | 2011-02-08 | Authentec, Inc. | System for and method of assigning confidence values to fingerprint minutiae points |
US8455165B2 (en) * | 2006-09-15 | 2013-06-04 | Cabot Corporation | Cyclic-treated metal oxide |
US20080070146A1 (en) * | 2006-09-15 | 2008-03-20 | Cabot Corporation | Hydrophobic-treated metal oxide |
US8202502B2 (en) * | 2006-09-15 | 2012-06-19 | Cabot Corporation | Method of preparing hydrophobic silica |
-
2007
- 2007-07-06 US US11/774,478 patent/US8435474B2/en active Active
-
2008
- 2008-07-02 CN CN2008801058799A patent/CN101796145B/zh active Active
- 2008-07-02 WO PCT/US2008/008293 patent/WO2009009011A1/en active Application Filing
- 2008-07-02 EP EP08826155.7A patent/EP2176361B1/en active Active
- 2008-07-02 KR KR1020107000105A patent/KR20100041735A/ko active Application Filing
- 2008-07-02 JP JP2010514881A patent/JP5757734B2/ja active Active
- 2008-07-02 KR KR1020147030104A patent/KR101665839B1/ko active IP Right Grant
-
2013
- 2013-01-17 US US13/743,909 patent/US20130129597A1/en not_active Abandoned
-
2015
- 2015-02-23 JP JP2015032952A patent/JP6013531B2/ja active Active
-
2017
- 2017-03-08 US US15/453,160 patent/US20170174896A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03187913A (ja) * | 1989-12-15 | 1991-08-15 | Shin Etsu Chem Co Ltd | シリカ粉末の製造方法 |
JPH08119619A (ja) * | 1994-10-26 | 1996-05-14 | Tokuyama Corp | シリカ粒子の表面処理方法 |
JP2004339508A (ja) * | 2003-05-02 | 2004-12-02 | Wacker Chemie Gmbh | 有機官能性で表面変性された金属酸化物の製造法、そのような金属酸化物及び該金属酸化物を含有している製品 |
WO2006056377A1 (en) * | 2004-11-25 | 2006-06-01 | Degussa Gmbh | Pulverulent cosmetic formulation having a high water content |
Also Published As
Publication number | Publication date |
---|---|
KR20140146142A (ko) | 2014-12-24 |
KR20100041735A (ko) | 2010-04-22 |
US8435474B2 (en) | 2013-05-07 |
JP2010532742A (ja) | 2010-10-14 |
US20130129597A1 (en) | 2013-05-23 |
JP5757734B2 (ja) | 2015-07-29 |
WO2009009011A1 (en) | 2009-01-15 |
EP2176361B1 (en) | 2017-11-29 |
US20170174896A1 (en) | 2017-06-22 |
CN101796145A (zh) | 2010-08-04 |
JP6013531B2 (ja) | 2016-10-25 |
EP2176361A1 (en) | 2010-04-21 |
US20080070140A1 (en) | 2008-03-20 |
CN101796145B (zh) | 2013-04-17 |
KR101665839B1 (ko) | 2016-10-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6013531B2 (ja) | 表面処理された金属酸化物粒子 | |
JP6257730B2 (ja) | 疎水性処理された金属酸化物 | |
JP5558347B2 (ja) | 環状処理金属酸化物 | |
JP5650786B2 (ja) | 疎水性シリカの調製方法 | |
JP5032328B2 (ja) | 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 | |
US7186440B2 (en) | Process for producing hydrophobic silica powder | |
JP5644789B2 (ja) | 粉体組成物 | |
JP4688895B2 (ja) | シリカのシラノール基含有率が低いシリカ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20151217 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160105 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20160405 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160616 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160726 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160819 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160913 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160921 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6013531 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |