JP2013545295A5 - - Google Patents

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Publication number
JP2013545295A5
JP2013545295A5 JP2013535073A JP2013535073A JP2013545295A5 JP 2013545295 A5 JP2013545295 A5 JP 2013545295A5 JP 2013535073 A JP2013535073 A JP 2013535073A JP 2013535073 A JP2013535073 A JP 2013535073A JP 2013545295 A5 JP2013545295 A5 JP 2013545295A5
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JP
Japan
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layer
trench
semiconductor rectifier
substrate
conductivity type
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JP2013535073A
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English (en)
Japanese (ja)
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JP5989652B2 (ja
JP2013545295A (ja
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Priority claimed from US13/222,249 external-priority patent/US8816468B2/en
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Publication of JP2013545295A5 publication Critical patent/JP2013545295A5/ja
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JP2013535073A 2010-10-21 2011-10-20 改良されたショットキー整流器 Active JP5989652B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US40529310P 2010-10-21 2010-10-21
US61/405,293 2010-10-21
US13/222,249 2011-08-31
US13/222,249 US8816468B2 (en) 2010-10-21 2011-08-31 Schottky rectifier
PCT/US2011/057012 WO2012054682A2 (en) 2010-10-21 2011-10-20 Improved schottky rectifier

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016155375A Division JP6471126B2 (ja) 2010-10-21 2016-08-08 改良されたショットキー整流器

Publications (3)

Publication Number Publication Date
JP2013545295A JP2013545295A (ja) 2013-12-19
JP2013545295A5 true JP2013545295A5 (enExample) 2014-11-06
JP5989652B2 JP5989652B2 (ja) 2016-09-07

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JP2013535073A Active JP5989652B2 (ja) 2010-10-21 2011-10-20 改良されたショットキー整流器
JP2016155375A Active JP6471126B2 (ja) 2010-10-21 2016-08-08 改良されたショットキー整流器

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JP2016155375A Active JP6471126B2 (ja) 2010-10-21 2016-08-08 改良されたショットキー整流器

Country Status (7)

Country Link
US (2) US8816468B2 (enExample)
EP (1) EP2630663B1 (enExample)
JP (2) JP5989652B2 (enExample)
KR (1) KR101987009B1 (enExample)
CN (1) CN103180961B (enExample)
TW (1) TWI566422B (enExample)
WO (1) WO2012054682A2 (enExample)

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CN103943688B (zh) * 2014-04-21 2017-06-13 中航（重庆）微电子有限公司 一种肖特基势垒二极管器件结构及其制作方法
DE102015204137A1 (de) * 2015-03-09 2016-09-15 Robert Bosch Gmbh Halbleitervorrichtung mit einer Trench-Schottky-Barrier-Schottky-Diode
DE102015204138A1 (de) * 2015-03-09 2016-09-15 Robert Bosch Gmbh Halbleitervorrichtung mit einer Trench-MOS-Barrier-Schottky-Diode
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CN107591318B (zh) * 2016-07-07 2020-08-07 北大方正集团有限公司 沟槽肖特基器件的制作方法
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CN109148605B (zh) * 2017-06-19 2022-02-18 比亚迪半导体股份有限公司 快恢复二极管及制备方法、电子设备
EP3654387A4 (en) * 2017-07-08 2021-03-31 Flosfia Inc. SEMICONDUCTOR COMPONENT
US10424677B2 (en) * 2017-08-31 2019-09-24 Littelfuse, Inc. Charge carrier extraction inverse diode
CN108010910A (zh) * 2017-11-21 2018-05-08 重庆大学 一种沟槽型肖特基接触超级势垒整流器及其制作方法
CN109962097A (zh) * 2017-12-26 2019-07-02 比亚迪股份有限公司 二极管器件及其制造工艺
WO2019155768A1 (ja) * 2018-02-09 2019-08-15 三菱電機株式会社 電力用半導体装置
US10608122B2 (en) 2018-03-13 2020-03-31 Semicondutor Components Industries, Llc Schottky device and method of manufacture
US10692988B2 (en) 2018-11-26 2020-06-23 Infineon Technologies Austria Ag Semiconductor device having integrated MOS-gated or Schottky diodes
CN109786472A (zh) * 2019-03-01 2019-05-21 重庆平伟实业股份有限公司 一种功率半导体器件
TW202038473A (zh) * 2019-04-10 2020-10-16 台灣茂矽電子股份有限公司 二極體結構及其製造方法
CN111816693A (zh) * 2019-04-10 2020-10-23 台湾茂矽电子股份有限公司 二极管结构及其制造方法
US11532758B2 (en) 2019-09-24 2022-12-20 Texas Instruments Incorporated Low leakage Schottky diode
CN114300543B (zh) * 2022-03-10 2022-06-07 安建科技(深圳)有限公司 一种电子抽取型续流二极管器件及其制备方法
CN115312591B (zh) * 2022-10-10 2022-12-23 深圳市威兆半导体股份有限公司 一种快恢复二极管及其制备方法
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