DE602004028878D1 - Optische Halbleitervorrichtung und integrierte optische Halbleiterschaltung - Google Patents

Optische Halbleitervorrichtung und integrierte optische Halbleiterschaltung

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Publication number
DE602004028878D1
DE602004028878D1 DE602004028878T DE602004028878T DE602004028878D1 DE 602004028878 D1 DE602004028878 D1 DE 602004028878D1 DE 602004028878 T DE602004028878 T DE 602004028878T DE 602004028878 T DE602004028878 T DE 602004028878T DE 602004028878 D1 DE602004028878 D1 DE 602004028878D1
Authority
DE
Germany
Prior art keywords
integrated circuit
semiconductor device
semiconductor integrated
optical
optical semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004028878T
Other languages
English (en)
Inventor
Nobuhiro Nunoya
Yasuo Shibata
Naoki Fujiwara
Nobuhiro Kikuchi
Yuichi Tomori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Publication of DE602004028878D1 publication Critical patent/DE602004028878D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/131Integrated optical circuits characterised by the manufacturing method by using epitaxial growth
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/136Integrated optical circuits characterised by the manufacturing method by etching
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • G02B6/4201Packages, e.g. shape, construction, internal or external details
    • G02B6/4202Packages, e.g. shape, construction, internal or external details for coupling an active element with fibres without intermediate optical elements, e.g. fibres with plane ends, fibres with shaped ends, bundles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06203Transistor-type lasers
    • H01S5/06206Controlling the frequency of the radiation, e.g. tunable twin-guide lasers [TTG]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/0625Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
    • H01S5/06255Controlling the frequency of the radiation
    • H01S5/06256Controlling the frequency of the radiation with DBR-structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068Stabilisation of laser output parameters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/125Distributed Bragg reflector [DBR] lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/17Semiconductor lasers comprising special layers
    • H01S2301/173The laser chip comprising special buffer layers, e.g. dislocation prevention or reduction
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/065Mode locking; Mode suppression; Mode selection ; Self pulsating
    • H01S5/0651Mode control
    • H01S5/0653Mode suppression, e.g. specific multimode
    • H01S5/0654Single longitudinal mode emission
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1003Waveguide having a modified shape along the axis, e.g. branched, curved, tapered, voids
    • H01S5/101Curved waveguide
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1003Waveguide having a modified shape along the axis, e.g. branched, curved, tapered, voids
    • H01S5/1017Waveguide having a void for insertion of materials to change optical properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1025Extended cavities
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1082Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region with a special facet structure, e.g. structured, non planar, oblique
    • H01S5/1085Oblique facets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/1206Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
    • H01S5/1215Multiplicity of periods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/1221Detuning between Bragg wavelength and gain maximum
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/124Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers incorporating phase shifts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/2205Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
DE602004028878T 2003-03-31 2004-03-30 Optische Halbleitervorrichtung und integrierte optische Halbleiterschaltung Expired - Lifetime DE602004028878D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003094696 2003-03-31
JP2003400156 2003-11-28
JP2003412062 2003-12-10

Publications (1)

Publication Number Publication Date
DE602004028878D1 true DE602004028878D1 (de) 2010-10-07

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Country Status (6)

Country Link
US (3) US7738520B2 (de)
EP (3) EP1813974B1 (de)
JP (3) JP4295278B2 (de)
KR (4) KR100804371B1 (de)
DE (1) DE602004028878D1 (de)
WO (1) WO2004088802A1 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100524980C (zh) * 2003-03-19 2009-08-05 宾奥普迪克斯股份有限公司 高smsr单向蚀刻激光器和低背反射光子器件
JP4608334B2 (ja) * 2005-02-10 2011-01-12 日本電信電話株式会社 半導体光素子の波長調整方法
JP2007072433A (ja) * 2005-08-11 2007-03-22 Ricoh Co Ltd 光集積素子及び光制御素子
JP4868827B2 (ja) * 2005-11-08 2012-02-01 株式会社東芝 レーザ誘導光配線装置
JP2007157888A (ja) * 2005-12-02 2007-06-21 Nippon Telegr & Teleph Corp <Ntt> 発振波長温度無依存半導体レーザ
JP5191143B2 (ja) * 2006-03-30 2013-04-24 アンリツ株式会社 半導体レーザ素子、半導体レーザモジュール、および半導体レーザモジュールを用いたラマン増幅器
US7616854B2 (en) * 2007-05-09 2009-11-10 Alcatel-Lucent Usa Inc. Optical coupling structure
JP2009188262A (ja) * 2008-02-07 2009-08-20 Sumitomo Electric Ind Ltd 半導体レーザ素子及び半導体光集積素子
WO2009113469A1 (ja) * 2008-03-13 2009-09-17 日本電気株式会社 光デバイス、その製造方法とそれを用いた光集積デバイス
DE102008029726A1 (de) * 2008-06-23 2009-12-31 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Lichtleiteranordnung und Verfahren zum Herstellen von Lichtleiteranordnungen
JP5177285B2 (ja) * 2009-03-30 2013-04-03 富士通株式会社 光素子及びその製造方法
JP2011066174A (ja) * 2009-09-17 2011-03-31 Nippon Telegr & Teleph Corp <Ntt> 光集積素子
JP5477148B2 (ja) * 2010-04-28 2014-04-23 日本電気株式会社 半導体光配線装置
JP5703598B2 (ja) 2010-06-11 2015-04-22 セイコーエプソン株式会社 発光装置、およびプロジェクター
JP5772466B2 (ja) * 2011-10-04 2015-09-02 富士通株式会社 光半導体素子、光送信モジュール、光伝送システム及び光半導体素子の製造方法
JP5957855B2 (ja) * 2011-11-21 2016-07-27 住友電気工業株式会社 半導体集積素子
JP5957856B2 (ja) * 2011-11-21 2016-07-27 住友電気工業株式会社 半導体集積素子
CN102742099B (zh) 2011-12-20 2013-12-18 华为技术有限公司 激光器、无源光网络系统、装置以及波长控制方法
JP5880065B2 (ja) 2012-01-18 2016-03-08 住友電気工業株式会社 光集積素子の製造方法
JP2013149724A (ja) * 2012-01-18 2013-08-01 Sumitomo Electric Ind Ltd 光集積素子の製造方法
JP5880063B2 (ja) * 2012-01-18 2016-03-08 住友電気工業株式会社 光集積素子の製造方法
US9645311B2 (en) 2013-05-21 2017-05-09 International Business Machines Corporation Optical component with angled-facet waveguide
US9644966B2 (en) * 2014-09-11 2017-05-09 Honeywell International Inc. Integrated optic circuit with waveguides stitched at supplementary angles for reducing coherent backscatter
JP6527415B2 (ja) * 2015-07-23 2019-06-05 日本電信電話株式会社 半導体レーザ素子
US10809591B2 (en) * 2016-04-28 2020-10-20 Analog Photonics LLC Optical phase shifter device
US10921525B2 (en) * 2018-11-30 2021-02-16 Mitsubishi Electric Research Laboratories, Inc. Grating coupler and integrated grating coupler system
WO2020140286A1 (zh) * 2019-01-04 2020-07-09 华为技术有限公司 半导体激光器、光发射组件、光线路终端及光网络单元
US10923884B2 (en) * 2019-05-15 2021-02-16 Microsoft Technology Licensing, Llc Two-section edge-emitting laser
US11381056B2 (en) * 2020-02-28 2022-07-05 Silc Technologies, Inc. Laser cavity construction for reduced wavelengths
CN112993751B (zh) * 2021-01-28 2022-08-19 湖北光安伦芯片有限公司 一种纳米柱vcsel光源结构及其制备方法
US20220368105A1 (en) * 2021-05-14 2022-11-17 Microsoft Technology Licensing, Llc Laser having reduced coherence via phaser shifter

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3605037A (en) 1969-05-02 1971-09-14 Bell Telephone Labor Inc Curved junction laser devices
JPS51123585A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Semiconductor laser
JPS55123188A (en) * 1979-03-16 1980-09-22 Toshiba Corp Spectral bragg reflection mirror
JPS5743485A (en) * 1980-08-13 1982-03-11 Agency Of Ind Science & Technol Semiconductor ring laser device
DE3138968A1 (de) 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Optische steuervorrichtung zum steuern der in einem optischen wellenleiter gefuehrten strahlung, insbesondere optischer schalter
GB2115217B (en) * 1982-02-09 1986-04-03 Standard Telephones Cables Ltd Semiconductor lasers
US4464762A (en) * 1982-02-22 1984-08-07 Bell Telephone Laboratories, Incorporated Monolithically integrated distributed Bragg reflector laser
JPS60207389A (ja) 1984-03-31 1985-10-18 Agency Of Ind Science & Technol 半導体レ−ザ装置
JPS62202583A (ja) * 1986-03-03 1987-09-07 Toshiba Corp 分布帰還型半導体レ−ザ
JPS63116485A (ja) * 1986-11-04 1988-05-20 Sharp Corp 半導体レ−ザ素子
JPS6425586A (en) 1987-07-22 1989-01-27 Hitachi Ltd Photo-semiconductor device
JPH01118806A (ja) 1987-11-02 1989-05-11 Nippon Sheet Glass Co Ltd 複合光導波型デバイス
JPH0769494B2 (ja) 1988-09-12 1995-07-31 横浜国立大学長 光導波路
US5022042A (en) * 1990-09-10 1991-06-04 General Dynamics Corp. High power laser array with stable wavelength
JPH04132274A (ja) 1990-09-21 1992-05-06 Eastman Kodak Japan Kk 発光ダイオード
US5155737A (en) * 1990-11-07 1992-10-13 Nippon Telegraph & Telephone Corporation Semiconductor wavelength conversion device
JP2757615B2 (ja) * 1991-08-14 1998-05-25 日本電気株式会社 半導体光第2高調波発光素子
CN1061471C (zh) * 1993-01-29 2001-01-31 英国电讯公司 光学器件封装和制造封装件的方法
JP3129028B2 (ja) 1993-05-28 2001-01-29 松下電器産業株式会社 短波長レーザ光源
US5544268A (en) 1994-09-09 1996-08-06 Deacon Research Display panel with electrically-controlled waveguide-routing
JP3751052B2 (ja) 1994-12-28 2006-03-01 シャープ株式会社 集積型光制御素子およびその作製方法、並びにそれを備えた光集積回路素子および光集積回路装置
JPH08211342A (ja) 1995-02-03 1996-08-20 Hitachi Ltd 半導体光機能素子
US5617436A (en) * 1995-06-07 1997-04-01 Cornell Research Foundation, Inc. Strain-compensated multiple quantum well laser structures
JP2713256B2 (ja) * 1995-07-21 1998-02-16 日本電気株式会社 光通信等に用いる波長可変半導体レーザ
JPH0992924A (ja) * 1995-09-25 1997-04-04 Nippon Telegr & Teleph Corp <Ntt> 半導体レーザ
GB2310316A (en) * 1996-02-15 1997-08-20 Sharp Kk Semiconductor laser
JPH09331102A (ja) * 1996-06-12 1997-12-22 Canon Inc レーザ出射端面が傾いている波長多重光源
US6075799A (en) * 1996-08-28 2000-06-13 Canon Kabushiki Kaisha Polarization selective semiconductor laser, optical transmitter using the same, optical communication system using the same and fabrication method of the same
JP4117854B2 (ja) 1997-06-20 2008-07-16 シャープ株式会社 導波路型光集積回路素子及びその製造方法
DE69722462T2 (de) * 1997-08-04 2004-02-19 International Business Machines Corp. Gekrümmter lichtwellenleiter zur verbindung von monomode-lichtwellenleitern
JP3337403B2 (ja) 1997-09-19 2002-10-21 日本電信電話株式会社 周波数安定化レーザ
US6195478B1 (en) 1998-02-04 2001-02-27 Agilent Technologies, Inc. Planar lightwave circuit-based optical switches using micromirrors in trenches
JP3479220B2 (ja) * 1998-07-03 2003-12-15 日本電気株式会社 光集積モジュール
JP2000124554A (ja) * 1998-10-13 2000-04-28 Hitachi Cable Ltd 高消光比半導体光増幅器及びそれを用いた光スイッチ
JP2000223787A (ja) * 1999-01-29 2000-08-11 Canon Inc 半導体レーザー
US6501776B1 (en) * 1999-01-29 2002-12-31 Canon Kabushiki Kaisha Temperature-insensitive semiconductor laser
JP2000223784A (ja) * 1999-01-29 2000-08-11 Canon Inc 波長安定化半導体レーザー
JP3054707B1 (ja) 1999-03-19 2000-06-19 東京大学長 光アイソレ―タ
JP2001021775A (ja) 1999-07-09 2001-01-26 Sumitomo Electric Ind Ltd 光学装置
JP3485260B2 (ja) * 2000-06-30 2004-01-13 日本電信電話株式会社 分布反射光導波路及びこれを含む光素子
JP2002076513A (ja) 2000-09-01 2002-03-15 Fujitsu Ltd 温度無依存分布ブラッグ反射型ミラー及び面型光学素子
JP2002182051A (ja) * 2000-10-04 2002-06-26 Sumitomo Electric Ind Ltd 光導波路モジュール
JP3908923B2 (ja) * 2001-05-01 2007-04-25 日本電信電話株式会社 光部品、光部品の設計方法および光モジュール
US6580740B2 (en) * 2001-07-18 2003-06-17 The Furukawa Electric Co., Ltd. Semiconductor laser device having selective absorption qualities
EP1283571B1 (de) * 2001-08-06 2015-01-14 nanoplus GmbH Nanosystems and Technologies Laser mit schwach gekoppeltem Gitterbereich
US20030044119A1 (en) 2001-08-28 2003-03-06 Takashi Sasaki Optical waveguide module
US6711323B1 (en) 2002-04-08 2004-03-23 Jamshid Nayyer Wide deflection-angle optical switches and method of fabrication

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JP2009016883A (ja) 2009-01-22
EP1813975B1 (de) 2010-08-25
US20070223856A1 (en) 2007-09-27
WO2004088802A1 (ja) 2004-10-14
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KR20070041635A (ko) 2007-04-18
JP4669540B2 (ja) 2011-04-13
US7474817B2 (en) 2009-01-06
KR100804371B1 (ko) 2008-02-15
JP2009020538A (ja) 2009-01-29
EP1813974B1 (de) 2019-02-27
EP1813975A2 (de) 2007-08-01
US7471864B2 (en) 2008-12-30
US7738520B2 (en) 2010-06-15
EP1813975A3 (de) 2007-10-17
US20070223857A1 (en) 2007-09-27
EP1813974A2 (de) 2007-08-01
KR20050040943A (ko) 2005-05-03
KR100681714B1 (ko) 2007-02-15
US20060050752A1 (en) 2006-03-09
KR20060110012A (ko) 2006-10-23
EP1610426A1 (de) 2005-12-28
EP1813974A3 (de) 2007-10-31
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