JPS55123188A - Spectral bragg reflection mirror - Google Patents
Spectral bragg reflection mirrorInfo
- Publication number
- JPS55123188A JPS55123188A JP2996879A JP2996879A JPS55123188A JP S55123188 A JPS55123188 A JP S55123188A JP 2996879 A JP2996879 A JP 2996879A JP 2996879 A JP2996879 A JP 2996879A JP S55123188 A JPS55123188 A JP S55123188A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type gaas
- spectral
- reflection mirror
- bragg reflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To make it unnecessary to use a special container that maintains the temperature constant by reducing the temperature dependence of the Bragg condition, by using, as a material for a waveguide path layer constituting a spectral Bragg reflection mirror, a substance having different signs for refraction coefficient and temperature variation. CONSTITUTION:On an n-type GaAs substrate 16 are laminated and grown in succession an n-type GaAs layer 15, a p-type GaAs layer 14 which becomes a light waveguide layer, a p-type Ga0.7Al0.3As layer 13 and a p-type GaAs layer 12. Next, by vacuum evaporation, n side electrode 1 is fitted on the layer 12, and n side electrode 5 is fitted on the back side of the substrate 16. By operating photolithography and chemical etching, only the region II, which becomes a spectral Bragg reflection mirror, is retained and the rest are removed up to the surface of the layer 14. Subsequently, the exposed surface of the layer 14 is coated with a photoresist film, and by the two light flux interference method using an ultraviolet laser, interference stripes are formed on the surface of the photoresist film. By operating chemical etching, these interference stripes are transferred to the surface of layer 14. Next, silicate glass 18 containing TiO2 is evaporated on the resultant indented surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2996879A JPS55123188A (en) | 1979-03-16 | 1979-03-16 | Spectral bragg reflection mirror |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2996879A JPS55123188A (en) | 1979-03-16 | 1979-03-16 | Spectral bragg reflection mirror |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55123188A true JPS55123188A (en) | 1980-09-22 |
Family
ID=12290758
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2996879A Pending JPS55123188A (en) | 1979-03-16 | 1979-03-16 | Spectral bragg reflection mirror |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55123188A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57183090A (en) * | 1981-05-02 | 1982-11-11 | Agency Of Ind Science & Technol | Semiconductor laser device |
EP1610426A4 (en) * | 2003-03-31 | 2006-07-26 | Nippon Telegraph & Telephone | Optical semiconductor device and optical semiconductor integrated circuit |
JP2007294883A (en) * | 2006-03-30 | 2007-11-08 | Anritsu Corp | Semiconductor laser device, semiconductor laser module and raman amplifier fabricated using the same |
-
1979
- 1979-03-16 JP JP2996879A patent/JPS55123188A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57183090A (en) * | 1981-05-02 | 1982-11-11 | Agency Of Ind Science & Technol | Semiconductor laser device |
JPH0373152B2 (en) * | 1981-05-02 | 1991-11-20 | Kogyo Gijutsuin | |
EP1610426A4 (en) * | 2003-03-31 | 2006-07-26 | Nippon Telegraph & Telephone | Optical semiconductor device and optical semiconductor integrated circuit |
US7471864B2 (en) | 2003-03-31 | 2008-12-30 | Nippon Telegraph And Telephone Corporation | Optical semiconductor device and optical semiconductor integrated circuit |
US7474817B2 (en) | 2003-03-31 | 2009-01-06 | Nippon Telegraph And Telephone Corporation. | Optical semiconductor device and optical semiconductor integrated circuit |
US7738520B2 (en) | 2003-03-31 | 2010-06-15 | Nippon Telegraph And Telephone Corporation | Optical semiconductor device and optical semiconductor integrated circuit |
JP2007294883A (en) * | 2006-03-30 | 2007-11-08 | Anritsu Corp | Semiconductor laser device, semiconductor laser module and raman amplifier fabricated using the same |
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