WO2011021623A1 - フルオロアルキル基含有n-置換(メタ)アクリルアミド化合物、その重合体およびその用途 - Google Patents
フルオロアルキル基含有n-置換(メタ)アクリルアミド化合物、その重合体およびその用途 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C233/45—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups
- C07C233/46—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom
- C07C233/49—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom having the carbon atom of the carboxamide group bound to a carbon atom of an acyclic unsaturated carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C233/45—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups
- C07C233/46—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom
- C07C233/47—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom having the carbon atom of the carboxamide group bound to a hydrogen atom or to a carbon atom of an acyclic saturated carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/52—Amides or imides
- C08F20/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F20/58—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing oxygen in addition to the carbonamido oxygen, e.g. N-methylolacrylamide, N-acryloylmorpholine
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
- C08J7/065—Low-molecular-weight organic substances, e.g. absorption of additives in the surface of the article
Definitions
- the present invention relates to a novel fluoroalkyl group-containing N-substituted (meth) acrylamide compound, a polymer obtained therefrom, a surface treatment agent containing the polymer, and an article having a coating containing the polymer.
- Polymers of acrylates and methacrylates containing polyfluoroalkyl groups have hydrophobic and oleophobic properties derived from polyfluoroalkyl groups, and therefore are used as various surface treatment agents.
- Useful Conventionally, for example, as a water repellent or an oil repellent (see Patent Document 1, etc.), and an epoxy resin as a sealant for an electronic component is prevented from adhering to a lead or an electrode (Patent Document) It is known to be used as a second reference).
- the fluoroalkyl group in such a surface treating agent is conventionally a perfluoroalkyl group generally having 8 or more carbon atoms.
- the risk to the living body and environment of the perfluoroalkyl group is greatly reduced when the carbon number is 6 or less.
- the perfluoroalkyl group in the polymer has 6 or less carbon atoms, the hydrophobicity and oleophobic performance are remarkably lowered, and the dynamic hydrophobicity and oleophobicity are not exhibited.
- a perfluoroalkyl group having 6 or less carbon atoms is considered to be caused by the fact that it does not form a crystal structure as in the case of 8 or more carbon atoms.
- the present invention has been proposed in view of the above situation, and contains a conventional polyfluoroalkyl group having 8 or more carbon atoms even though the carbon number of the polyfluoroalkyl group is 6 or less.
- (Meth) acrylamide compound having a specific structure capable of forming a polymer having oil repellency equivalent to that of the polymer, a polymer derived from the compound, a surface treatment agent containing the polymer, and an article having a coating containing the polymer Is intended to provide.
- the present invention provides a compound represented by the following formula (a).
- CH 2 CR 1 -CONJ-CKR 2- (CH 2 ) n -COO-Q 1 -Rf 1 (a)
- R 1 hydrogen atom or methyl group
- R 2 a hydrogen atom or a group represented by the following formula (r)
- — (CH 2 ) m —COO—Q 2 —Rf 2 (r) n and m independently of each other an integer of 0 to 4
- Rf 1 and Rf 2 independently of each other, a C 1-6 polyfluoroalkyl group or polyfluoroether group
- Q 1 and Q 2 independently of each other, a single bond or a divalent linking group
- J a hydrogen atom or an alkyl group having 1 to 3 carbon atoms
- K a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or a group represented by the formula (r).
- the —CONJ—CKR 2 — moiety in the formula may have a structure represented by the following formula (s1) or (s2).
- j and k independently of each other, a single bond or an alkylene group having 1 to 3 carbon atoms.
- the alkylene group may be substituted with a group represented by the formula (r).
- a plurality of groups represented by the formula (r) are present in the compound represented by the formula (a), they may have the same or different structures.
- both J and K are preferably hydrogen atoms, that is, the compound is preferably represented by the following formula (a1).
- the symbols in the formula have the same meaning as described above.
- —CONJ-CKR 2 — in the formula (a) is preferably a structure represented by the formula (s1), that is, the compound is represented by the following formula (a2). Is preferred.
- the symbols in the formula have the same meaning as described above.
- the polyfluoroalkyl group is preferably a perfluoroalkyl group.
- Q 1 and Q 2 are preferably linear alkylene groups.
- the present invention also provides a polymer containing a polymer unit derived from the compound.
- this invention provides the surface treating agent containing the said polymer. Moreover, this invention provides the surface treating agent as a resin adhesion prevention agent. Moreover, this invention provides the surface treating agent as a flux creeping-up prevention agent.
- this invention provides the article
- the article is preferably an electronic component.
- the polymer containing a polymer unit derived from the N-substituted (meth) acrylamide compound of the present invention not only ensures ecological and environmental safety by using a polyfluoroalkyl group having 6 or less carbon atoms, It was possible to maintain oil repellency equivalent to that of a conventional polymer containing a polymer unit derived from a polyfluoroalkyl group-containing compound having 8 or more carbon atoms. In addition, by selecting the structure, it is possible to have not only oil repellency but also resin adhesion prevention performance and IPA repellency.
- the N-substituted (meth) acrylamide compound of the present invention (hereinafter also referred to as the compound of the present invention) is a compound represented by the formula (a).
- a compound represented by the formula (a) is also referred to as a compound (a).
- the compounds represented by other formulas may be expressed similarly.
- (meth) acrylamide means both or one of acrylamide and methacrylamide.
- R 1 is a hydrogen atom or a methyl group.
- R 1 may be either a hydrogen atom or a methyl group.
- a hydrogen atom is preferred.
- the methyl group is more preferable.
- N is an integer from 0 to 4. Among these, 0 or 1 is preferable from the viewpoint of excellent oil repellency.
- R 2 is a hydrogen atom or a group represented by the following formula (r). — (CH 2 ) m —COO—Q 2 —Rf 2 (r)
- m is an integer of 0 to 4, and 0 or 1 is preferable from the viewpoint of excellent oil repellency.
- Rf 2 is a C 1-6 polyfluoroalkyl group or polyfluoroether group. Specifically, it includes those similar to the following Rf 1, may be the same or different and Rf 1.
- R 2 is preferably a group represented by the formula (r).
- Q 2 is a single bond or a divalent linking group. Specifically, it includes those similar to the following Q 1, may be the same or different and Rf 1.
- Rf 1 is a C 1-6 polyfluoroalkyl group or polyfluoroether group.
- the polyfluoroalkyl group means a partially fluoro-substituted or perfluoro-substituted alkyl group in which two to all of the hydrogen atoms of the alkyl group are substituted with fluorine atoms.
- the polyfluoroalkyl group may have a linear structure or a branched structure.
- the carbon number of a polyfluoroalkyl group is a number including a branched structure in the case of a branched structure.
- Examples of the straight chain structure include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an n-pentyl group, and an n-hexyl group.
- Examples of the branched structure include isopropyl group, s-butyl group, t-butyl group, 3-methylbutyl group, isopentyl group, neopentyl group, and isohexyl group.
- the polyfluoroether group means a group in which an etheric oxygen atom is inserted between one or more carbon-carbon atoms in the polyfluoroalkyl group.
- the number of carbon atoms of the polyfluoroalkyl group is determined so as to include all the carbon atoms to which fluorine atoms are bonded, and to minimize the number of carbon atoms contained in the group.
- Q 1 is “C 2 H 4 ”
- Rf 1 is “C 6 F 13 ”.
- Q 1 is “CH 2 ”
- Rf 1 is “CHF— CH 2 —CF 2 H ”.
- Rf 1 and formula (r) in the Rf 2 is may be either a linear structure or a branched structure, the R f group in view of increasing the packing of the R f group Is preferably a linear structure. For the same reason, in the case of a branched structure, it is preferable that the branched portion is present at the terminal portion of the R f group.
- the R f group is preferably a polyfluoroalkyl group from the viewpoint of excellent oil repellency and resin adhesion prevention performance.
- the R f group is preferably a substantially perfluorinated perfluoroalkyl group (R F group), more preferably a linear R F group.
- R f is preferably —C 6 F 13 or —C 4 F 9 from the viewpoint of being superior in oil repellency and resin adhesion prevention performance.
- Q 1 is a single bond or a divalent linking group.
- the divalent linking group include a linear or branched divalent alkylene group having 1 to 10 carbon atoms, an alkenylene group having 2 to 10 carbon atoms, a 6-membered aromatic group, and a 4 to 6-membered ring.
- a saturated or unsaturated aliphatic group, a 5- to 6-membered heterocyclic group, — (C 2 H 4 O) p —, — (C 3 H 6 O) q — (where p and q are respectively Independently, 1 to 10 (average)) or a divalent linking group represented by the following formula (q) may be mentioned.
- Y linear or branched divalent alkylene group having 1 to 10 carbon atoms, 6-membered aromatic group, 4-6-membered saturated or unsaturated aliphatic group, 5-6-membered ring A heterocyclic group, or a condensed ring group thereof;
- Z —O—, —S—, —CO—, —COO—, —COS—, —N (R) —, —SO 2 —, —PO 2 —, —N (R) —COO—, —N (R) —CO—, —N (R) —SO 2 —, —N (R) —PO 2 —.
- R a hydrogen atom, an alkyl group having 1 to 3 carbon atoms.
- the divalent linking group may have a substituent.
- substituents include a halogen atom (F, Cl, Br, I), a cyano group, an alkoxy group (methoxy, ethoxy, butoxy, octyloxy).
- Q 1 and Q 2 in the formula (r) are an alkylene group or an oxyalkylene group and have a structure in which a fluorine atom is substituted, based on the definition of determining the number of carbon atoms of the polyfluoroalkyl group, Q 1 The structure of 1 and Q 2 is also determined.
- Q 1 and Q 2 can be appropriately selected as long as they are a single bond or a divalent linking group, and are not limited to the above examples, but among these, a single bond, a linear or branched alkylene group Are preferred, and a linear alkylene group is particularly preferred.
- J is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms
- K is a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or a group represented by the formula (r).
- the —CONJ—CKR 2 — moiety in the formula may have a structure represented by the following formula (s1) or (s2).
- j and k are each independently a single bond or an alkylene group having 1 to 3 carbon atoms. However, j and k do not become a single bond at the same time.
- the alkylene group may be substituted with a group represented by the formula (r).
- a plurality of groups represented by the formula (r) are present in the formula (a), they may be the same or different structures.
- both are preferably hydrogen atoms. It is also preferable that the —CONJ—CKR 2 — moiety has a structure represented by the formula (s1).
- R 2 a hydrogen atom or a group represented by the following formula (r-1), -(CH 2 ) m -COO- (CH 2 ) q -Rf 2 (r-1) p and q are integers of 0 to 6, and n, m, R 1 , Rf 1 and Rf 2 are the same as defined in formula (a).
- R 2 a hydrogen atom or a group represented by the above formula (r-1), t is an integer of 0 to 6, and j, k, n, R 1 , Rf 1 and Rf 2 are the same as defined in the formula (a).
- Examples of the compound in which j and k are each independently an alkylene group having 1 to 3 carbon atoms include the following compounds.
- Examples of the compound in which R 2 is a hydrogen atom and j is substituted with a group represented by the formula (r) include the following compounds.
- a compound in which j and k are each independently an alkylene group having 1 to 3 carbon atoms is preferable because synthesis is easy, and among these, since a raw material is easily available, j A compound in which both and k are alkylene groups having 2 carbon atoms is particularly preferred.
- the production method of the compound (a) of the present invention is not particularly limited, but can be produced, for example, by a method comprising the following two steps. Specifically, the first step of obtaining a corresponding amino acid ester by esterification reaction of various amino acids with a fluoroalkyl group-containing alcohol, the present invention intended by (meth) acrylamide conversion of the amino acid ester obtained in the first step This is a method comprising the second step of obtaining the compound (a).
- R 2 in the compound (a) is a hydrogen atom or the same as — (CH 2 ) n —COO—Q 1 —Rf 1 — (CH 2 ) m —COO—Q 2 —
- First step The following compound (1) (amino acid) and the following compound (2) (alcohol) are removed in the presence of an acid catalyst (3) in a solvent azeotropic with water while removing the generated water.
- Second step A step of reacting the produced amino acid ester (4) with (meth) acrylic acid chloride (5) in the presence of a base to obtain the target compound (a).
- NHJ 1 -CK 1 R 3 (CH 2 ) n -COOH (1) (Wherein R 3 : H or — (CH 2 ) n —COOH) HO-Q 1 -Rf 1 (2) X ⁇ H + (3) X ⁇ + NJ 1 H 2 —CK 1 R 2 — (CH 2 ) n —COO—Q 1 —Rf 1 (4)
- CH 2 CR 1 -COCl (5)
- CH 2 CR 1 -CONJ 1 -CK 1 R 2- (CH 2 ) n -COO-Q 1 -Rf 1 (a)
- X is a conjugate base of the acid catalyst (3)
- J 1 and K 1 are each independently a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
- the —NJ 1 —CK 1 — moiety in the formula may have a structure represented by the following formula (s11) or (s21).
- j 1 and k 1 independently of each other, a single bond or an alkylene group having 1 to 3 carbon atoms. However, j 1 and k 1 do not become a single bond at the same time.
- R 2 in the desired compound (a) is - (CH 2) n -COO- Q 1 -Rf 1 different from - (CH 2) if it is m -COO-Q 2 -Rf 2 shows the amino acid ( R 3 in 1) is — (CH 2 ) m —COOH (m ⁇ n) and / or by using other alcohol HO—Q 2 —Rf 2 together with alcohol (2) It can be obtained by the same scheme.
- the compound (1) includes various amino acids, which are commercially available from Wako Pure Chemical Industries, Ltd., Tokyo Chemical Industry Co., Ltd. and the like. Among them, glycine, ⁇ -alanine, and aspartic acid are preferable when obtaining the compound (a1). Moreover, when obtaining a compound (a2), isonipecotic acid is preferable.
- the alcohol of the compound (2) is commercially available from Wako Pure Chemical Industries, Ltd., Tokyo Chemical Industry Co., Ltd. and the like. Further, it can be synthesized by a known method (Japanese Patent Publication No. 40-1905, Japanese Patent Publication No. 58-39135, Japanese Patent Publication No. 52-8807, etc.).
- Compound (3) is commercially available from Wako Pure Chemical Industries, Ltd. and Tokyo Chemical Industry Co., Ltd. Examples of the compound (3) include p-toluenesulfonic acid, hydrochloric acid, sulfuric acid and the like, and p-toluenesulfonic acid is preferable.
- the first step is preferably performed in a solvent.
- the solvent is preferably a hydrocarbon solvent that can be azeotroped with water.
- the hydrocarbon solvent include hexane, cyclohexane, heptane, benzene, toluene, xylene and the like, and cyclohexane is preferable.
- About the usage-amount of a solvent what is necessary is just the quantity which can implement reaction safely and stably. Preferably, it is in the range of 0.2 to 20 times the mass of the compound (1).
- the reaction is preferably carried out while removing water produced under reflux. It is preferable to carry out the reaction in a reactor equipped with a Dean-Stark apparatus or the like so that the generated water can be removed.
- the amount of compound (2) used is preferably 0.7 to 10 equivalents, more preferably 0.9 to 5 equivalents, relative to compound (1) when R 3 is a hydrogen atom.
- R 3 is “— (CH 2 ) m —COOH”
- the amount of compound (2) used is preferably 1.5 to 20 equivalents, more preferably 1.8 to 10 equivalents, relative to compound (1). is there.
- the usage-amount of a compound (3) is 1 equivalent or more with respect to a compound (1). More preferably, it is in the range of 1.01 to 3 equivalents relative to compound (1).
- the compound (5) is available as a reagent from Wako Pure Chemical Industries, Ltd., Tokyo Chemical Industry Co., Ltd. and the like. It can also be obtained by the method for synthesizing acid halides described in the book of organic synthesis, such as an experimental chemistry course (Maruzen).
- the amount of compound (5) to be used is preferably 0.7 to 10 equivalents, more preferably 1.0 to 5 equivalents, relative to compound (4).
- the reaction is performed in the presence of a base.
- the base include tertiary amines such as triethylamine, and inorganic salts such as sodium carbonate and sodium hydrogen carbonate. Of these, tertiary amines such as triethylamine and trimethylamine are preferable.
- the reaction may be performed using a solvent.
- solvents can be used as long as they do not affect the reaction. Examples thereof include aprotic polar solvents such as hexane, cyclohexane, benzene, toluene, methylene chloride, chloroform, acetonitrile, acetone, diethyl ether, DMF, DMSO, and various fluorinated solvents. Of these, methylene chloride, chloroform and the like are preferable from the viewpoint of excellent solubility.
- the usage-amount of a solvent is just the quantity which can implement reaction safely and stably.
- it is in the range of 0.1 to 20 times the mass of the compound (4). Since the reaction proceeds exothermically, it is preferable to slowly add the compound (4) dropwise while cooling the reactor with ice water or the like. Thereafter, after no more exotherm is observed, the reaction is preferably performed at around room temperature. Specifically, a range of 5 ° C. to 25 ° C. is preferable.
- the polymer of the present invention is a polymer containing a polymer unit (A) derived from the compound (a).
- the polymerization unit (A) derived from the compound (a) can be expressed as follows.
- the polymerization unit (A) may be derived from a single type of compound (a) or may be derived from a combination of two or more types.
- the polymer of the present invention may contain a polymer unit other than the polymer unit (A).
- the mass ratio of each polymerized unit is a value that all the raw materials used for the polymerization constitute polymerized units.
- the mass ratio of polymerized units (A) (percentage of the mass of polymerized units (A) contained therein relative to the total mass of polymerized units) is substantially equal to the mass of the compound (a) used in the polymerization. It is calculated
- the mass ratio of other polymer units in the polymer can be obtained in the same manner.
- the content of the polymerization unit (A) is preferably 5 to 100% by mass, more preferably 10 to 100% by mass, and particularly preferably 30 to 100% by mass. . This is because when the content of the polymer unit (A) in the polymer of the present invention is within the above range, the oil repellent performance of the surface treatment agent containing the polymer of the present invention is improved. Further, in the range of 10 to 100% by mass, more preferably 30 to 100% by mass, in addition to the oil repellency, the resin adhesion preventing performance of the resin adhesion preventing agent containing the polymer of the present invention is improved. It is.
- the polymerization unit (A) may be one type or two or more types. When 2 or more types of polymerization units (A) are included, the total amount is preferably within the above range.
- polymer units are not particularly limited as long as they are polymer units derived from a compound copolymerizable with compound (a). Examples thereof include a polymer unit (B) derived from a fluoro (meth) acrylate (compound (b)) having the following structure and a polymer unit (C) derived from another polymerizable compound (c).
- R b1 hydrogen atom or methyl group
- Rf b1 a polyfluoroalkyl group or polyfluoroether group having 1 to 6 carbon atoms
- Q b1 a single bond or a divalent linking group.
- examples of Rf b1 include the same structures as Rf 1 and Rf 2 of the compound (a).
- Rf b1 is preferably —C 6 F 13 or —C 4 F 9 from the standpoint of superior oil repellency and resin adhesion prevention performance.
- examples of the divalent linking group for Q b1 include the same structures as Q 1 and Q 2 of the compound (a).
- Q b1 is preferably a single bond, a linear or branched alkylene group.
- the content of the polymer unit (B) is preferably 0 to 95% by mass, more preferably 0 to 90% by mass, and particularly preferably 0 to 70% by mass. This is because when the content of the polymer unit (B) in the polymer of the present invention is within the above range, the oil repellency and resin adhesion prevention performance of the surface treatment agent containing the polymer of the present invention is improved.
- the polymerization unit (B) may be one type or two or more types. When 2 or more types of polymerization units (B) are included, the total amount is preferably within the above range.
- Compound (c) has a polymerizable group and is a compound other than compound (a) and compound (b). Specific examples include (meth) acrylic acid compounds (c1), styrene compounds (c2), and other polymerizable compounds (c3). Although the specific example of such a compound (c) is shown below, it is not limited to these.
- Examples of (c1) include acrylic acid, methacrylic acid, and (meth) acrylates represented by the following formula. CH 2 ⁇ C (R c1 ) —COO—Q c1 —R c2
- R c1 is a hydrogen atom or a methyl group
- Q c1 is a single bond or a divalent linking group
- Examples of (c1) further include polyesters of (meth) acrylic acid such as acrylic acid diesters and compounds represented by the following formula.
- CH 2 C (R c3 ) -CONR c4 -Q c2 -R c5
- R c3 is a hydrogen atom or a methyl group
- Q c2 is a single bond or a divalent linking group
- R c6 the styrene-type compound represented by a following formula is mentioned.
- R c6 —H, CH 3 , —Cl, —CHO, —COOH, —CH 2 Cl, —CH 2 NH 2 , —CH 2 N (CH 3 ) 2 , —CH 2 N + (CH 3 ) 3 Cl ⁇ , —CH 2 N + H 3 Cl ⁇ , —CH 2 CN, —CH 2 COOH, —CH 2 N (CH 2 COOH) 2 , —CH 2 SH, —CH 2 SO 3 Na or —CH 2 OCOCH 3 .
- Still other polymerizable compounds (c3) include vinyl compounds other than the above (c1) and (c2), such as vinyl chloride (CH 2 ⁇ CHCl), acrylonitrile (CH 2 ⁇ CHCN), and the like. Moreover, as a polymeric compound (c3), the compound which has the following epoxy groups is also mentioned.
- the following compounds are preferable because adhesion to the substrate is improved and performance is easily exhibited even when the concentration of the polymer is low.
- the content of the polymer unit (C) is preferably 0 to 95% by mass, and more preferably 0 to 70% by mass. This is because when the content of the polymer unit (C) in the polymer of the present invention is within the above range, the oil repellency and resin adhesion prevention performance of the surface treatment agent containing the polymer of the present invention is improved.
- the polymerization unit (C) may be one type or two or more types. When 2 or more types of polymerization units (C) are included, the total amount is preferably within the above range.
- the polymer of the present invention is not particularly limited with respect to the polymerization form.
- the polymerization form may be random, block or graft.
- polymerization initiation source is not particularly limited, and usual initiators such as organic peroxides, azo compounds and persulfates can be used.
- organic peroxides organic peroxides
- azo compounds organic peroxides
- peroxide-based initiator it is preferable to use a water-soluble azo initiator or peroxide-based initiator.
- the molecular weight of the polymer of the present invention is not particularly limited, but is preferably 5,000 to 2,000,000, and preferably 10,000 to 1,500,000 in terms of mass average molecular weight (Mw). A molecular weight in such a range is preferable because dynamic oil repellency is good.
- the surface treating agent of the present invention contains the polymer of the present invention.
- the surface treating agent of the present invention may contain a solvent.
- the solvent is not particularly limited as long as it is a solvent that dissolves and disperses the polymer, and various solvents such as water, hydrocarbon solvents, and fluorine solvents can be used. These solvents may be used alone or in combination. Of these, a fluorinated solvent is preferred.
- the fluorine-based solvent include hydrofluorocarbon (HFC) or hydrofluoroether (HFE). Specific examples of usable fluorine-based solvents are shown below, but are not limited thereto.
- m-Xylene hexafluoride (hereinafter referred to as m-XHF) p-Xylene hexafluoride CF 3 CH 2 CF 2 CH 3 CF 3 CH 2 CF 2 H C 6 F 13 OCH 3 C 6 F 13 OC 2 H 5 C 3 F 7 OCH 3 C 3 F 7 OC 2 H 5 C 6 F 13 H CF 2 HCF 2 CH 2 OCF 2 CF 2 H CF 3 CFHCCFHC 2 CH 3 CF 3 (OCF 2 CF 2 ) n (OCF 2 ) m OCF 2 H C 8 F 17 OCH 3 C 7 F 15 OCH 3 C 4 F 9 OCH 3 C 4 F 9 OC 2 H 5 C 4 F 9 CH 2 CH 3 CF 3 CH 2 OCF 2 CF 2 CF 2 H C 6 F 13 C 2 H 5 (In the above examples, m and n each independently represents 1 to 20.)
- the surface treatment agent of the present invention has functions such as oil repellency, antifouling property, lubricity (low friction), non-adhesiveness, releasability, surface transferability and the like (articles to be treated). ).
- the surface treatment agent of the present invention can be applied to the treatment of various materials.
- electric parts electronic circuits, substrates, electronic parts, etc.
- sliding parts motors, watches, HDDs, etc.
- textile products metal parts (metal molds, etc.)
- stone materials stone materials, filters, papers and the like.
- it is preferable to use for processing of electric parts and sliding parts and particularly preferable to use for processing of electronic parts such as capacitors.
- the surface treatment agent of the present invention includes, for example, an oil repellent, a solder flux scooping preventive agent, an oil barrier agent, a resin adhesion preventive agent, a moisture proof coating agent, a rust preventive agent, an antifouling agent, a release agent, However, it is not limited to these. Among these, it is preferable to use the compound (a1) as a resin adhesion inhibitor or a solder flux creeping-up inhibitor and the compound (a2) as a solder flux creeping-up inhibitor.
- the surface treatment agent of the present invention may contain components other than those described above as long as they do not adversely affect the stability, oil repellency or appearance of the composition.
- Such other components include, for example, pH control agents, rust preventives for preventing corrosion of the coating surface, and the purpose of controlling the concentration of the polymer in the liquid when the composition is used diluted.
- examples thereof include dyes for distinguishing them from treated parts, dye stabilizers, flame retardants, antifoaming agents, and antistatic agents.
- the concentration of the surface treatment agent of the present invention is properly used depending on the application.
- the concentration of the polymer of the present invention is preferably 1 to 20% by mass.
- the concentration of the polymer of the present invention is preferably 0.01 to 5% by mass.
- the concentration of the polymer of the present invention is preferably 0.01 to 1% by mass.
- the concentration of the polymer of the present invention in the surface treatment agent of the present invention may be a final concentration. For example, in the case of directly preparing the solder flux creep-up preventing agent of the present invention, a solution containing the polymer immediately after polymerization.
- a solution containing a high-concentration polymer can be appropriately diluted so that the final desired concentration is obtained.
- the diluted solution can be used as a surface treatment agent as it is.
- the article of the present invention has a coating containing the polymer of the present invention on at least a part of the surface of the article, for example, by applying the surface treatment agent of the present invention to the article.
- the coating film is formed by removing the solvent from the surface treatment agent of the present invention, and is mainly composed of the polymer of the present invention.
- “mainly” means that the coating film may be formed only from the polymer of the present invention and may contain other components as long as it does not adversely affect as described above. 95 mass% or more is preferable and, as for content of the polymer of this invention in this film, 99 mass% or more is more preferable.
- a coating method a general coating method can be adopted. For example, there are methods such as dip coating, spray coating or coating with a roller.
- the surface treatment agent of the present invention is a resin adhesion preventing agent
- the resin adhesion preventing agent is applied to a part (such as a lead wire) of an electronic component to be prevented from adhering to an epoxy resin or the like to form a film. be able to.
- the surface treatment agent of the present invention is a solder flux scooping-up inhibitor
- the flux scooping-up agent is applied to an electronic component (such as a connector) that is desired to prevent flux scooping up to form a film. Can do.
- the surface treatment agent of the present invention preferably has a hard film to be formed.
- the film is hard, the effect as various surface treatment agents is easily exhibited, and after forming the film on the surface of the article, when the article is processed such as cutting, the present invention is applied to parts such as a cutting die. This is because the polymer is difficult to adhere.
- a flux creeping-up preventing agent when the part is cut after the coating is formed, the polymer is difficult to adhere to the cutting die.
- one evaluation criterion includes one having a high glass transition temperature (Tg) and a melting point (Tm).
- Example 1 Synthesis of Compound (a-1) [First Step] In a 300 mL four-necked flask, 21.8 g (60 mmol) of 2-perfluorohexylethyl alcohol, 4.5 g (60 mmol) of glycine (manufactured by Wako Pure Chemical Industries, Ltd.) and p-toluenesulfonic acid monohydrate (Wako Pure Chemical) 11.97 g (63 mmol) (manufactured by Kogyo Co., Ltd.) and 100 g of cyclohexane were charged, and reflux was performed for 17 hours while removing generated water. The reaction solution was cooled to 40 ° C.
- Example 2 Synthesis of Compound (a-2)
- the compound (a-2) was synthesized in the same manner as in Example 1 except that methacrylic acid chloride was changed to acrylic acid chloride (manufactured by Wako Pure Chemical Industries, Ltd.).
- the 1 H-NMR and GC-MS data of the obtained compound (a-2) are shown below.
- Example 3 Synthesis of Compound (a-3)
- the compound (a-3) was synthesized in the same manner as in Example 1 except that ⁇ -alanine (manufactured by Wako Pure Chemical Industries, Ltd.) was used as the glycine. )
- the 1 H-NMR and GC-MS data of the obtained compound (a-3) are shown below.
- Example 4 Synthesis of Compound (a-4)
- the compound (a-4) was synthesized in the same manner as in Example 1 except that 4-aminobutyric acid (manufactured by Tokyo Chemical Industry Co., Ltd.) was used as the glycine. )
- the 1 H-NMR and GC-MS data of the obtained compound (a-4) are shown below.
- 1 H-NMR 300 MHz, solvent: CDCl 3 , standard substance: TMS
- Example 5 Synthesis of Compound (a-5)
- Compound (a-5) was synthesized in the same manner as in Example 1 except that glycine was changed to 6-aminohexanoic acid (manufactured by Wako Pure Chemical Industries, Ltd.).
- the 1 H-NMR and GC-MS data of the obtained compound (a-5) are shown below.
- 1 H-NMR 300 MHz, solvent: CDCl 3 , standard substance: TMS
- Example 6 Synthesis of Compound (a-6)
- Example 1 4.0 g (30 mmol) of glycine as L-aspartic acid (manufactured by Wako Pure Chemical Industries, Ltd.) and p-toluenesulfonic acid monohydrate as 6
- the compound (a-6) was obtained as a pale yellow solid by synthesizing in the same manner except that the amount was 0.0 g (32 mmol).
- the 1 H-NMR and GC-MS data of the obtained compound (a-6) are shown below.
- Example 7 Synthesis of Compound (a-7)
- the compound (a-7) was synthesized in the same manner as in Example 6 except that L-aspartic acid was changed to L-glutamic acid (manufactured by Wako Pure Chemical Industries, Ltd.), and the compound was obtained as a pale yellow viscous liquid. (A-7) was obtained.
- the 1 H-NMR and GC-MS data of the obtained compound (a-7) are shown below.
- Example 8 Synthesis of Compound (a-8)
- the compound (a-8) was synthesized in the same manner as in Example 6 except that methacrylic acid chloride was changed to acrylic acid chloride (manufactured by Wako Pure Chemical Industries, Ltd.).
- the 1 H-NMR and GC-MS data of the obtained compound (a-8) are shown below.
- Example 9 Synthesis of Compound (a-9)
- Compound (a-9) was synthesized in the same manner as in Example 1 except that glycine was changed to isonipecotic acid (manufactured by Tokyo Chemical Industry Co., Ltd.). Obtained.
- the 1 H-NMR and GC-MS data of the obtained compound (a-9) are shown below.
- Example 10 1 g of compound (a-1) obtained in Example 1, 2 g of m-XHF, and initiator V-601 (dimethyl 2,2′-azobis (2-methylpropionate) manufactured by Wako Pure Chemical Industries, Ltd.) 01 g was charged into a closed container and polymerized at 70 ° C. for 18 hours. After the reaction, reprecipitation purification was performed with methanol to obtain a polymer (1) as a white solid. A polymerization reaction was carried out in the same manner except that each compound shown in Table 2 was used in a monomer mass ratio instead of the compound (a-1) to obtain polymers (2) to (18) as white solids.
- Example 11 2.94 g of the compound (a-2) obtained in Example 2, 0.06 g of HEAA, 12 g of m-XHF, and initiator V-601 (dimethyl 2,2′-azobis (2-methylpro) produced by Wako Pure Chemical Industries, Ltd. Pionate)) 0.03 g was charged into a closed container and polymerized at 70 ° C. for 18 hours. After the reaction, reprecipitation purification was performed with methanol to obtain a polymer (19) as a white solid.
- Example 12 4.98 g of the compound (a-6) obtained in Example 6, 0.02 g of HEAA, 10 g of m-XHF, and initiator V-601 (dimethyl 2,2′-azobis (2-methylpro) produced by Wako Pure Chemical Industries, Ltd. Pionate)) 0.03 g was charged into a closed container and polymerized at 70 ° C. for 18 hours. After the reaction, reprecipitation purification was performed with methanol to obtain a polymer (20) as a white solid.
- Example 13 A polymerization reaction was carried out in the same manner as in Example 12 except that the compound (a-8) was used in place of the compound (a-6) to obtain a polymer (21) as a white solid.
- Comparative Production Example 1 Except for homopolymerization of C6FMA, polymerization was performed in the same manner as in Example 8 to obtain a comparative polymer (1) as a white solid.
- Comparative Production Example 2 Except for homopolymerization of C6FA, polymerization was carried out in the same manner as in Example 8 to obtain a comparative polymer (2) as a white solid.
- Example 14 Each of the polymers (1) to (21) obtained in Examples 10 to 13 was diluted with m-XHF to prepare 1% concentration solutions, and the surface treatment agents (1) to (21 )
- Comparative Examples 1 to 3 For the comparative polymers (1) to (3) obtained in Comparative Production Examples 1 to 3, solutions of 1% concentration were prepared in the same manner as in Example 14 to obtain comparative treatment agents (1) to (3).
- the obtained surface treatment agents (1) to (21) and comparative treatment agents (1) to (3) were measured for dynamic contact angle and evaluated for resin adhesion prevention performance.
- ⁇ Dynamic contact angle measurement method> The surface treating agents (1) to (21) and the comparative treating agents (1) to (3) were brought to room temperature, and a glass plate was immersed in each. Then, after 1 minute, it was taken out and dried at about 120 ° C. for 5 minutes to form a film. Next, 20 ⁇ l each of n-hexadecane (n-HD) or n-butyl glycidyl ether (BGE) is dropped on the coating of each glass plate on which the coating of each treatment agent is formed, and the glass plate is tilted to move. The target contact angle was measured.
- n-HD n-hexadecane
- BGE n-butyl glycidyl ether
- ⁇ Evaluation of resin adhesion prevention performance Prepare a tin-plated lead wire having a length of about 5 cm, and add 3 cm or more of each lead wire to each of the surface treatment agents (1) to (21) and the comparative treatment agents (1) to (3). Immersion for a minute to form a coating. Next, after drying at about 120 ° C. for 10 minutes, 2 cm of the film forming portion of the lead wire was immersed in the well-stirred epoxy resin composition. Then, it was pulled up at a speed of 1 mm / s and held in a vertical state in a room at about 25 degrees.
- the epoxy resin composition did not sag at all, and the epoxy resin composition remained attached to the immersed 2 cm portion was “x”, whereas the epoxy resin composition fell to the end of the lead wire Was “ ⁇ ”, and “ ⁇ ” was the case where it fell more than half but did not fall to the end.
- the results are shown in Table 3.
- the epoxy resin composition here was prepared by blending 100 parts by mass of Percoat CE-30 (manufactured by Pernox Co., Ltd.) as the main agent and 10 parts by mass of Pernox SP-30 (manufactured by Pernox Co., Ltd.) as the diluent. Things were used.
- Example 15 The polymers (2), (6), (8), (9) and (16) to (21) obtained in Examples 10 to 13 were diluted with solvents and concentrations having the compositions shown in the tables, respectively. Surface treatment agents (22) to (39) were obtained.
- the contact angle measurement method is as follows.
- the contact angle of IPA is 55 degrees or more, preferably 60 degrees or more, it is a good flux creeping-up preventing agent.
- 2-Propanol (IPA) was dropped onto a glass plate to measure the contact angle.
- OCA-20 automatic contact angle meter
- the surface treatment agent containing the polymer derived from the compound (a) of the present invention had a dynamic contact angle equivalent to that of a conventional perfluoroalkyl group having 8 or more carbon atoms. This indicates that the present invention has made it possible to provide an oil repellent having high performance while greatly reducing the risk to living bodies and the environment.
- the surface treating agent had the same repellency with respect to BGE, which is one of the components contained in the epoxy resin, and the resin adhesion preventing performance. This indicates that the present invention has made it possible to provide a resin adhesion inhibitor having high performance while greatly reducing the risk to living bodies and the environment.
- the surface treatment agent has high IPA repellency, and can maintain high IPA repellency even at a low concentration. This indicates that it is possible to provide a high-performance flux scooping preventive agent that hardly causes poor contact due to the coating and has high IPA repellency.
- the polymer derived from the compound (a) of the present invention has a high Tg and Tm, it can be seen that the surface treatment agent of the present invention is hard. This is easy to demonstrate the performance as a surface treatment agent, and when used as a flux scooping preventive agent, etc., in the cutting treatment of a part formed with a film containing the polymer of the present invention, etc. It shows that there is an effect that the adhesion of the film hardly occurs and the workability is improved.
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Abstract
Description
CH2=CR1-CONJ-CKR2-(CH2)n-COO-Q1-Rf1 (a)
式中の記号は以下の意味を示す。
R1:水素原子またはメチル基、
R2:水素原子または下記式(r)で表される基、
-(CH2)m-COO-Q2-Rf2 (r)
nおよびm:相互に独立して、0~4の整数
Rf1およびRf2:相互に独立して、炭素数1~6のポリフルオロアルキル基またはポリフルオロエーテル基、
Q1およびQ2:相互に独立して、単結合または2価の連結基、
J:水素原子または炭素数1~3のアルキル基、
K:水素原子、炭素数1~3のアルキル基または式(r)で表される基。
ただし、式中の-CONJ-CKR2-部分は、下記式(s1)または(s2)で表される構造であってもよい。
jおよびk:相互に独立して、単結合または炭素数1~3のアルキレン基。ただしjとkが同時に単結合になることはない。該アルキレン基は、式(r)で表される基で置換されていてもよい。また、式(r)で表される基は、式(a)で表される化合物中に複数存在する場合には、それぞれ同一でも異なる構造でも構わない。
CH2=CR1-CONH-CHR2-(CH2)n-COO-Q1-Rf1 (a1)
式中の記号は前記と同じ意味を示す。
式中の記号は前記と同じ意味を示す。
また、前記式(a)、式(a1)または式(a2)において、Q1およびQ2が直鎖状のアルキレン基であることが好ましい。
また、本発明は、樹脂付着防止剤としての表面処理剤を提供する。
また、本発明は、フラックス這い上がり防止剤としての表面処理剤を提供する。
本発明において、前記物品は電子部品であるのが好ましい。
-(CH2)m-COO-Q2-Rf2 (r)
ここで、mは、0~4の整数であり、撥油性に優れるという観点から、0または1が好ましい。
Rf2は、炭素数1~6のポリフルオロアルキル基またはポリフルオロエーテル基である。具体的には、下記Rf1と同様のものが挙げられ、Rf1と同一であっても異なっていてもよい。
樹脂付着防止性能がより優れるという観点から、R2は式(r)で表される基が好適である。
Q2は、単結合または2価の連結基である。具体的には、下記Q1と同様のものが挙げられ、Rf1と同一であっても異なっていてもよい。
ポリフルオロアルキル基とは、アルキル基の水素原子の2個ないし全部がフッ素原子に置換された部分フルオロ置換またはパーフルオロ置換アルキル基を意味する。ポリフルオロアルキル基は、直鎖構造または分岐構造のいずれであってもよい。なお、ポリフルオロアルキル基の炭素数は、分岐構造の場合は分岐構造も含めた数である。
直鎖構造としては、メチル基、エチル基、n-プロピル基、n-ブチル基、n-ペンチル基、n-ヘキシル基が挙げられる。分岐構造としては、イソプロピル基、s-ブチル基、t-ブチル基、3-メチルブチル基、イソペンチル基、ネオペンチル基、イソヘキシル基が挙げられる。
また、ポリフルオロエーテル基とは、上記ポリフルオロアルキル基中の1箇所以上の炭素-炭素原子間にエーテル性酸素原子が挿入された基を意味する。
例えば、式(a)において、「-Q1-Rf1」が「-C2H4-C6F13」で表される基の場合、Q1が「C2H4」であり、Rf1が「C6F13」である。同様に、「-Q1-Rf1」が「-CH2-CHF-CH2-CF2H」で表される基の場合、Q1が「CH2」であり、Rf1が「CHF-CH2-CF2H」である。
また、Rf基としては、撥油性および樹脂付着防止性能に優れるという観点から、ポリフルオロアルキル基が好ましい。さらに、Rf基は、実質的に全フッ素置換されたパーフルオロアルキル基(RF基)が好ましく、直鎖のRF基であることがより好ましい。
Rfは、撥油性能および樹脂付着防止性能により優れるという観点から、-C6F13、-C4F9であるのが好ましい。
2価の連結基としては、炭素数が1~10の直鎖状もしくは分岐状の2価のアルキレン基もしくは炭素数が2~10のアルケニレン基、6員環芳香族基、4~6員環の飽和もしくは不飽和の脂肪族基、5~6員環の複素環基、-(C2H4O)p-、-(C3H6O)q-(ここでのpおよびqはそれぞれ独立して1~10(平均))、または下記式(q)で表される2価の連結基が挙げられる。これら2価の連結基は組み合わされていても良く、環基は縮合していても良い。2価の連結基は、原子量の合計が500以下であることが好ましい。
-Y-Z- (q)
式中の記号は以下の意味を示す。
Y:炭素数が1~10の直鎖状もしくは分岐状の2価のアルキレン基、6員環芳香族基、4~6員環の飽和もしくは不飽和の脂肪族基、5~6員環の複素環基、またはこれらの縮合した環基。
Z:-O-、-S-、-CO-、-COO-、-COS-、-N(R)-、-SO2-、-PO2-、-N(R)-COO-、-N(R)-CO-、-N(R)-SO2-、-N(R)-PO2-。
R:水素原子、炭素数1~3のアルキル基。
ただし、Zの向きは逆でも構わない。
ただし、Q1および式(r)中のQ2がアルキレン基またはオキシアルキレン基であり、フッ素原子が置換した構造である場合は、前記ポリフルオロアルキル基の炭素数の決定の定義に基づき、Q1およびQ2の構造も決定される。
ただし、式中の-CONJ-CKR2-部分は、下記式(s1)または(s2)で表される構造であってもよい。
jおよびkは、相互に独立して、単結合または炭素数1~3のアルキレン基である。ただし、jとkが同時に単結合になることはない。該アルキレン基は、式(r)で表される基で置換されていてもよい。
また、式(a)中に式(r)で表される基が複数存在する場合は、それぞれ同一でも異なる構造でも構わない。
CH2=CR1-CONH-CHR2-(CH2)n-COO-Q1-Rf1 (a1)
式中の記号は前記と同じ意味を示す。
CH2=CR1-CONH-CHR2-(CH2)n-COO-(CH2)p-Rf1 (a1-1)
式中の記号は以下の意味を示す。
R2:水素原子または下記式(r-1)で表される基、
-(CH2)m-COO-(CH2)q-Rf2 (r-1)
pおよびqは0~6の整数であり、n、m、R1、Rf1およびRf2は、式(a)における定義と同じである。
R2:水素原子または上記式(r-1)で表される基、
tは0~6の整数であり、j、k、n、R1、Rf1およびRf2は、式(a)における定義と同じである。
第一工程:下記化合物(1)(アミノ酸)と、下記化合物(2)(アルコール)を、酸触媒(3)の存在下、水と共沸可能な溶媒中で、生成する水を除去しながら還流を行い、化合物(4)(アミノ酸エステル)を生成する工程。
第二工程:生成したアミノ酸エステル(4)を、塩基の存在下(メタ)アクリル酸クロライド(5)と反応させて、目的化合物(a)を得る工程。
NHJ1-CK1R3 (CH2)n-COOH (1)
(式中、R3:Hまたは-(CH2) n-COOH)
HO-Q1-Rf1 (2)
X-H+ (3)
X- +NJ1H2-CK1R2-(CH2)n -COO-Q1-Rf1 (4)
CH2=CR1-COCl (5)
CH2=CR1-CONJ1-CK1R2-(CH2)n-COO-Q1-Rf1(a)
Xは酸触媒(3)の共役塩基であり、J1およびK1は相互に独立して水素原子または炭素数1~3のアルキル基。
ただし、式中の-NJ1-CK1-部分は、下記式(s11)または(s21)で表される構造であってもよい。
j1およびk1:相互に独立して、単結合または炭素数1~3のアルキレン基。ただしj1およびk1が同時に単結合になることはない。
なお、目的化合物(a)中のR2が-(CH2)n -COO-Q1-Rf1と異なる-(CH2)m-COO-Q2-Rf2である場合には、アミノ酸(1)中のR3が-(CH2)m-COOH(m≠n)であるか、および/または、アルコール(2)とともに他のアルコールHO-Q2-Rf2を併用することにより、上記と同様のスキームにより得ることができる。
第一工程において、化合物(1)としては各種アミノ酸が挙げられ、和光純薬工業株式会社や東京化成工業株式会社等から市販品として入手できる。中でも化合物(a1)を得る場合は、グリシン、β-アラニン、アスパラギン酸が好ましい。また、化合物(a2)を得る場合は、イソニペコチン酸が好ましい。
化合物(2)のアルコールは和光純薬工業株式会社や東京化成工業株式会社等から市販品として入手可能である。また、公知の方法(特公昭40-1905、特公昭58-39135、特公昭52-8807など)にて合成することができる。化合物(2)としては、C6F13-(CH2)2-OH、C4F9-(CH2)2-OH、C2F5-(CH2)2-OH、(CF3)2CH-OHが挙げられ、C6F13-(CH2)2-OHが好ましい。
化合物(3)は和光純薬工業株式会社や東京化成工業株式会社等から市販品として入手可能である。化合物(3)としては、p-トルエンスルホン酸、塩酸、硫酸などが挙げられ、p-トルエンスルホン酸が好ましい。
溶媒としては、水と共沸可能な炭化水素系溶剤が好ましい。
炭化水素系溶剤としては、ヘキサン、シクロヘキサン、ヘプタン、ベンゼン、トルエン、キシレンなどが挙げられ、シクロヘキサンが好ましい。
溶媒の使用量については、反応が安全にかつ安定に実施できる量であればよい。好ましくは化合物(1)に対して質量で0.2~20倍量の範囲である。
反応は還流下で生成する水を除去しながら行うことが好ましい。生成する水を除去できるようにDean-Stark装置などを取り付けた反応器で行うことが好ましい。
化合物(3)の使用量は、化合物(1)に対して、1当量以上であることが好ましい。より好ましくは、化合物(1)に対して1.01~3当量の範囲である。
第二工程において、化合物(5)は和光純薬工業株式会社や東京化成工業株式会社などから試薬として入手可能である。また、実験化学講座(丸善)等、有機合成の成書に記載されている酸ハロゲン化物の合成方法にて得ることもできる。
化合物(5)の使用量は化合物(4)に対して0.7~10当量が好ましく、1.0~5当量の範囲がより好ましい。
第二工程は塩基の存在下反応を行う。塩基としては、トリエチルアミンなどの第三級アミン、炭酸ナトリウム、炭酸水素ナトリウムなどの無機塩が挙げられる。中でも、トリエチルアミン、トリメチルアミンなどの第三級アミンが好ましい。
溶媒は反応に影響しなければ各種用いることができる。例えば、ヘキサン、シクロヘキサン、ベンゼン、トルエン、塩化メチレン、クロロホルム、アセトニトリル、アセトン、ジエチルエーテル、DMF、DMSO等の非プロトン性極性溶剤、各種フッ素系溶剤などが挙げられる。中でも溶解性が優れるという観点から塩化メチレン、クロロホルム等が好ましい。
反応は発熱的に進行するので、氷水などで反応器を冷却しながら、化合物(4)をゆっくりと滴下することが好ましい。その後発熱が見られなくなった後は、室温付近で反応を行うことが好ましい。具体的には5℃~25℃の範囲が好ましい。
なお、化合物(a)から導かれる重合単位(A)は、次のように表すことができる。
本発明の重合体において、重合単位(A)の含有量は5~100質量%であることが好ましく、10~100質量%であることがより好ましく、30~100質量%であることが特に好ましい。本発明の重合体における重合単位(A)の含有量が上記範囲内であると、本発明の重合体を含む表面処理剤の撥油性能が良好になるからである。また、10~100質量%、より好ましくは30~100質量%の範囲であると、撥油性能に加えて、本発明の重合体を含む樹脂付着防止剤の樹脂付着防止性能も良好になるからである。
本発明の重合体において、重合単位(A)は、一種でも二種以上であっても良い。重合単位(A)を二種以上含む場合は、その合計量が上記範囲内であると好ましい。
式中の記号は以下の意味を示す。
Rb1:水素原子またはメチル基、
Rfb1:炭素数1~6のポリフルオロアルキル基またはポリフルオロエーテル基、
Qb1:単結合または2価の連結基。
本発明の重合体において、重合単位(B)は、一種でも二種以上であっても良い。重合単位(B)を二種以上含む場合は、その合計量が上記範囲内であると好ましい。
CH2=CH-COO-CH2-CF3
CH2=C(CH3)-COO-CH2-CF3
CH2=CH-COO-CH2-CF2CF3
CH2=C(CH3)-COO-CH2-CF2CF3
CH2=CH-COO-CH(CF3)2
CH2=C(CH3)-COO-CH(CF3)2
CH2=CH-COO-(CH2)2-(CF2)4F
CH2=C(CH3)-COO-(CH2)2-(CF2)4F
CH2=CH-COO-(CH2)2-(CF2)6F
CH2=C(CH3)-COO-(CH2)2-(CF2)6F
CH2=CH-COO-(CH2)2-(CF2)2CF(CF3)2
CH2=C(CH3)-COO-(CH2)2-(CF2)2CF(CF3)2
CH2=C(Rc1)-COO-Qc1-Rc2
式中、Rc1:水素原子またはメチル基であり、Qc1:単結合または2価の連結基であり、Rc2:-OH、-Si(OAk)3(Akは炭素数1~3の直鎖状または分岐状のアルキル基)、-CH3、-CH2CH2N(CH3)2、-(CH2)mH(m=2~20)、-CH2CH(CH3)2、-CH2-C(CH3)2-OCO-Ph、-CH2Ph、-CH2CH2OPh、-CH2N+(CH3)3Cl-、-(CH2CH2O)mCH3(m=2~20)、-(CH2)2-NCO、
である。
また、Qc1の二価の連結基としては、前記化合物(a)のQ1およびQ2と同様の構造が挙げられる。Qc1としては、単結合、直鎖状または分岐状のアルキレン基が好ましい。
CH2=C(Rc3)-CONRc4-Qc2-Rc5
式中、Rc3:水素原子またはメチル基であり、Rc4:-CmH2m+1(m=2~20)または-Hであり、Qc2:単結合または2価の連結基であり、Rc5:-H、-OH、-COOH、-CH3、-CH2CH2N(CH3)2、-(CH2)mH(m=2~20)、-CH(CH3)2、-C(CH3)3、-C(CH3)2SO3H、-CH2N+(CH3)3Clまたは-Phである。
式中、Rc6:-H、CH3、-Cl、-CHO、-COOH、-CH2Cl、-CH2NH2、-CH2N(CH3)2、-CH2N+(CH3)3Cl-、-CH2N+H3Cl-、-CH2CN、-CH2COOH、-CH2N(CH2COOH)2、-CH2SH、-CH2SO3Naまたは-CH2OCOCH3である。
また、重合性化合物(c3)としては、以下のようなエポキシ基を有する化合物も挙げられる。
CH2=CH-CONH-CH2-CH2-OH
CH2=C(CH3)-CONH-CH2-CH2-OH
CH2=CH-CONH-CH2-OH
CH2=C(CH3)-CONH-CH2-OH
CH2=CH-COO-CH2-CH2-OH
CH2=C(CH3)-COO-CH2-CH2-OH
本発明の重合体において、重合単位(C)は、一種でも二種以上であっても良い。重合単位(C)を二種以上含む場合は、その合計量が上記範囲内であると好ましい。
m-キシレンヘキサフルオリド(以下、m-XHFと記す。)
p-キシレンヘキサフルオリド
CF3CH2CF2CH3
CF3CH2CF2H
C6F13OCH3
C6F13OC2H5
C3F7OCH3
C3F7OC2H5
C6F13H
CF2HCF2CH2OCF2CF2H
CF3CFHCFHCF2CH3
CF3(OCF2CF2)n(OCF2)mOCF2H
C8F17OCH3
C7F15OCH3
C4F9OCH3
C4F9OC2H5
C4F9CH2CH3
CF3CH2OCF2CF2CF2H
C6F13C2H5
(上記例示中、m、nはそれぞれ独立に1~20を表す。)
本発明の表面処理剤における本発明の重合体の濃度は最終的濃度であればよく、例えば本発明のはんだ用フラックス這い上がり防止剤を直接調製する場合には、重合直後の重合体を含む溶液中の重合体濃度(固形分濃度)が1質量%を超えていてもなんら差し支えない。高濃度の重合体を含む溶液は、最終的に上記好ましい濃度となるように適宜に希釈することができる。希釈した溶液は、そのまま表面処理剤とすることができる。
該被膜は、本発明の表面処理剤から溶媒が除去されて形成されるものであり、主として、本発明の重合体からなるものである。ここで、主としてとは、該被膜が、本発明の重合体のみから形成されていてもよく、前記のように悪影響を与えない範囲で他の成分を含んでいてもよいことを意味する。
該被膜における、本発明の重合体の含有量は、95質量%以上が好ましく、99質量%以上がより好ましい。
被覆方法としては一般的な被覆加工方法が採用できる。例えば浸漬塗布、スプレー塗布又はローラー等による塗布等の方法がある。
本発明の表面処理剤の塗布後は、溶媒の沸点以上の温度で乾燥を行うことがより好ましい。無論、被処理物の材質などにより加熱乾燥が困難な場合には、加熱を回避して乾燥すべきである。なお、熱処理の条件は、塗布する組成物の組成や、塗布面積等に応じて選択すればよい。
本発明の表面処理剤が、はんだ用フラックス這い上がり防止剤である場合は、該フラックス這い上がり防止剤を、フラックスの這い上がりを防止したい電子部品(コネクタなど)に塗布して被膜を形成することができる。
以下の実施例および比較例において記号で示す化合物を表1に示す。
[第一工程]
300mL四つ口フラスコに2-パーフルオロヘキシルエチルアルコール21.8g(60mmol)とグリシン(和光純薬工業株式会社製)4.5g(60mmol)とp-トルエンスルホン酸一水和物(和光純薬工業株式会社製)11.97g(63mmol)とシクロヘキサン100gを仕込み、生成する水を除去しながら還流を17時間行った。反応液を40℃以下に冷却し、析出した固体を水およびアセトンで洗浄しながら減圧濾過を行った。得られた固体を真空乾燥し、グリシン2-パーフルオロヘキシルエチルエステルp-トルエンスルホン酸塩を白色の固体として27.8g得た。収率は78%であった。
[第二工程]
50mLフラスコに、第一工程で得たグリシン2-パーフルオロヘキシルエチルエステルp-トルエンスルホン酸塩5.8g(10mmol)を塩化メチレン20g中に懸濁し、0℃でトリエチルアミン(和光純薬工業株式会社製)を2.2g(22mmol)滴下した。そこへメタクリル酸クロリド(和光純薬工業株式会社製)1.0g(10mmol)をゆっくりと滴下した。室温で3時間撹拌を行い、水を加えて反応を停止した。2層にわかれた下層を分取し、1%塩酸で洗浄し硫酸ナトリウムで乾燥を行い、減圧濃縮を行うことで目的とする化合物(a-1)を淡黄色透明液体として3.9g(ガスクロマトグラフィー純度94%)得た。
得られた化合物(a-1)の1H-NMRとGC-MSのデータを以下に示す。
1H-NMR(300MHz、溶媒:CDCl3、標準物質:TMS)、σ(ppm):6.30(brs,1H,NHCO),5.78(s,1H,CH2=C),5.41(s,1H,CH2=C),4.47(t,2H,J=6.5Hz,O-CH2),4.14-4.10(m,2H,N-CH2-COO-CH2),2.60-2.43(m,2H,CH2-CF2),2.0(s,3H,CH3)
GC-MS M+=489
実施例1においてメタクリル酸クロリドをアクリル酸クロリド(和光純薬工業株式会社製)とした以外は同様に合成し、白色固体として化合物(a-2)を得た。
得られた化合物(a-2)の1H-NMRとGC-MSのデータを以下に示す。
1H-NMR(300MHz、溶媒:CDCl3、標準物質:TMS)、σ(ppm):6.34(dd,1H,J=17.0,1.4Hz,CH2=C)6.17(dd,1H,J=17.1,10.1,CH2=C),6.12(s,1H,NH),5.72(dd,1H,J=10.2,1.4Hz,CH2=CH),4.49(t,2H,J=6.5Hz,O-CH2),4.16(d,2H,J=5.3Hz,N-CH2-CO),2.43-2.60(m,2H,CH2-CF2)
GC-MS M+=475
実施例1においてグリシンをβ-アラニン(和光純薬工業株式会社製)とした以外は同様に合成し、淡黄色透明液体として化合物(a-3)を得た。
得られた化合物(a-3)の1H-NMRとGC-MSのデータを以下に示す。
1H-NMR(300MHz、溶媒:CDCl3、標準物質:TMS)、σ(ppm):6.39(brs,1H,NH)5.69(s,1H,CH2=C),5.33(s,1H,CH2=C),4.42(t,2H,J=6.5Hz,O-CH2)3.63-3.51(m,2H,N-CH2),2.62(t,2H,J=5.9Hz,CH2-CO),2.58-2.43(m,2H,CH2-CF2),1.95(s,3H,CH3)
GC-MS M+=503
実施例1においてグリシンを4-アミノ酪酸(東京化成工業株式会社製)とした以外は同様に合成し、淡黄色透明液体として化合物(a-4)を得た。
得られた化合物(a-4)の1H-NMRとGC-MSのデータを以下に示す。
1H-NMR(300MHz、溶媒:CDCl3、標準物質:TMS)、σ(ppm):6.01(brs,1H,NH),5.71(s,1H,CH2=C),5.33(s,1H,CH2=C),4.39(t,2H,J=6.5Hz,O-CH2),3.40-3.27(m,2H,N-CH2),2.56-2.23(m,4H,CH2-CO,CH2-CF2),1.96-1.83(m,5H,CH3,C-CH2-C)
GC-MS M+=517
実施例1においてグリシンを6-アミノヘキサン酸(和光純薬工業株式会社製)とした以外は同様に合成し、白色固体として化合物(a-5)を得た。
得られた化合物(a-5)の1H-NMRとGC-MSのデータを以下に示す。
1H-NMR(300MHz、溶媒:CDCl3、標準物質:TMS)、σ(ppm):5.98(brs,1H,NH),5.67(s,1H,CH2=C),5.31(s,1H,CH2=C),4.38(t,2H,J=6.5Hz,O-CH2),3.35-3.28(m,2H,N-CH2),2.56-2.29(m,4H,CH2-CO,CH2-CF2),1.96(s,3H,CH3)1.72-1.52(m,4H,-CH2-),1.32-1.43(m,2H,-CH2-)
GC-MS M+=545
実施例1においてグリシンをL-アスパラギン酸(和光純薬工業株式会社製)4.0g(30mmol)、p-トルエンスルホン酸一水和物を6.0g(32mmol)とした以外は同様に合成し、淡黄色固体として化合物(a-6)を得た。
得られた化合物(a-6)の1H-NMRとGC-MSのデータを以下に示す。
1H-NMR(300MHz、溶媒:CDCl3、標準物質:TMS)、σ(ppm):6.80(d,1H,J=7.7Hz,NH),5.77(s,1H,CH2=C),5.41(s,1H,CH2=C),4.95-4.89(m,1H,CH),4.59-4.32(m,4H,O-CH2),3.13-2.92(m,2H,CH2-CO),2.57-2.38(m,4H,CH2-CF2)1.97(s,3H,CH3)
GC-MS M+=893
実施例6においてL-アスパラギン酸をL-グルタミン酸(和光純薬工業株式会社製)とした以外は同様に合成し、淡黄色粘ちょう液体として化合物(a-7)を得た。
得られた化合物(a-7)の1H-NMRとGC-MSのデータを以下に示す。
1H-NMR(300MHz、溶媒:CDCl3、標準物質:TMS)、σ(ppm):6.66(d,1H,J=7.5Hz,NH),5.78(s,1H,CH2=C),5.41(s,1H,CH2=C),4.68(td,1H,J=7.8,5.0Hz,CH),4.53-4.37(m,4H,O-CH2),2.60-2.38(m,6H,CH2-CF2,CH2-CO),2.33-2.22(m,1H,-CH2-)2.13-2.01(m,1H,-CH2-)
GC-MS M+=907
実施例6においてメタクリル酸クロリドをアクリル酸クロリド(和光純薬工業株式会社製)とした以外は同様に合成し、白色固体として化合物(a-8)を得た。
得られた化合物(a-8)の1H-NMRとGC-MSのデータを以下に示す。
1H-NMR(300MHz、溶媒:CDCl3、標準物質:TMS)、σ(ppm):6.71(d,1H,J=7.9Hz,NH),6.36-6.12(m,2H,CH2=CH),5.73-5.65(m,1H,CH2=C),4.99-4.95(m,1H,CH),4.59-4.31(m,4H,O-CH2),3.13-2.91(m,2H,CH2-CO),2.57-2.39(m,4H,CH2-CF2)
GC-MS M+=879
実施例1においてグリシンをイソニペコチン酸(東京化成工業株式会社製)とした以外は同様に合成し、淡黄色透明液体として化合物(a-9)を得た。
得られた化合物(a-9)の1H-NMRとGC-MSのデータを以下に示す。
H-NMR(300MHz、溶媒:CDCl3、標準物質:TMS)、σ(ppm):6.62-6.53(m,1H,=CH2-CO),6.30-6.23(m,1H,CH2=C),5.71-5.67(m,1H,CH2=C),4.49-4.40(m,3H,O-CH2,N-CH2-),3.98-3.94(m,1H,N-CH2-),3.21-2.86(m,2H,N-CH2-),2.65-2.40(m,3H,CH2-CF2,CH-CO)2.34-1.62(m,4H,-CH2-)
GC-MS M+=529
実施例1で得られた化合物(a-1)1gとm-XHF2gと開始剤V-601(和光純薬工業株式会社製ジメチル2,2’-アゾビス(2-メチルプロピオナート))0.01gを密閉容器に仕込み70℃で18時間重合反応を行った。反応後、メタノールにて再沈精製を行い、白色固体として重合体(1)を得た。
化合物(a-1)に代えて表2に記載の各化合物をモノマー質量比率で用いた以外は同様にして重合反応を行い、それぞれ白色固体として重合体(2)~(18)を得た。
実施例2で得られた化合物(a-2)2.94gとHEAA0.06gとm-XHF12gと開始剤V-601(和光純薬工業株式会社製ジメチル2,2’-アゾビス(2-メチルプロピオナート))0.03gを密閉容器に仕込み70℃で18時間重合反応を行った。反応後、メタノールにて再沈精製を行い、白色固体として重合体(19)を得た。
実施例6で得られた化合物(a-6)4.98gとHEAA0.02gとm-XHF10gと開始剤V-601(和光純薬工業株式会社製ジメチル2,2’-アゾビス(2-メチルプロピオナート))0.03gを密閉容器に仕込み70℃で18時間重合反応を行った。反応後、メタノールにて再沈精製を行い、白色固体として重合体(20)を得た。
前記化合物(a-6)に代えて化合物(a-8)を用いた以外は実施例12と同様にして重合反応を行い、白色固体として重合体(21)を得た。
C6FMAの単独重合である以外は実施例8と同様に重合を行い、白色の固体として比較重合体(1)を得た。
C6FAの単独重合である以外は実施例8と同様に重合を行い、白色の固体として比較重合体(2)を得た。
CmFMA22.5gと、m-XHF52.5gと開始剤AIBN18.8mgとを密閉容器に仕込み、70℃で15時間重合反応を行った。反応後m-XHFを加え17%の溶液として比較重合体(3)を得た。
なお、比較製造例3で使用されたアルキル基の平均炭素数が9の2-パーフルオロアルキルエチルメタクリレート中、アルキル基の炭素数が6の2-パーフルオロアルキルエチルメタクリレートの含有量(GC分析による。)は、2%であった。
実施例10~実施例13で得られた各重合体(1)~(21)を、それぞれm-XHFで希釈し、1%濃度の各溶液を調製し、表面処理剤(1)~(21)を得た。
比較製造例1~3で得られた比較重合体(1)~(3)について実施例14と同様に1%濃度の溶液を調製し、比較処理剤(1)~(3)を得た。
<動的接触角測定方法>
表面処理剤(1)~(21)および比較処理剤(1)~(3)を常温とし、各々にガラス板を浸漬した。そして1分後に取り出し約120℃で5分間乾燥させ、被膜を形成させた。
次に各々の処理剤の被膜を形成した各ガラス板の被膜上に、n-ヘキサデカン(n-HD)、またはn-ブチルグリシジルエーテル(BGE)をそれぞれ20μl滴下し、ガラス板を傾斜させて動的接触角を測定した。接触角の測定には自動接触角計OCA-20[dataphysics社製]を用いた。液滴が転落し始める時のガラス板の傾斜角度を転落角、転落しているときの前進の角を前進角、後退の角を後退角とした。評価結果を表3に示す。
前進角・後退角が大きいほど、転落角が小さいほど撥性を示す。また、表中の「-」は測定不能であったことを意味する。
長さが約5cmの錫めっきしたリード線を用意し、各々のリード線の3cm以上の部分を表面処理剤(1)~(21)および比較処理剤(1)~(3)の各々に1分間浸漬し、被膜を形成した。
次に、約120℃で10分間乾燥させた後、よく攪拌したエポキシ樹脂組成物にリード線の被膜形成部分の2cmを浸漬した。そして、1mm/sのスピードで引き上げ、約25度の室内で垂直な状態で保持した。エポキシ樹脂組成物が全く垂れず、浸漬した2cmの部分にエポシキ樹脂組成物が付着したままであったものを「×」、これに対してエポキシ樹脂組成物がリード線の末端まで落ちきったものを「○」、半分以上落ちてきたが末端まで落ちなかったものを「△」とした。結果を表3に示す。
なお、ここでのエポキシ樹脂組成物は、主剤としてペルコートCE-30(ペルノックス株式会社製)100質量部と、希釈剤としてペルノックスSP-30(ペルノックス株式会社製)10質量部を配合して調合したものを用いた。
実施例10~実施例13で得られた重合体(2)、(6)、(8)、(9)、(16)~(21)をそれぞれ表に記載の組成の溶剤および濃度で希釈し、表面処理剤(22)~(39)を得た。
(比較例4~7)
比較製造例1、2で得られた比較重合体(1)、(2)を表4に記載の組成の溶剤および濃度で希釈し、比較処理剤(4)~(7)を得た。
接触角の測定方法は以下のとおりである。なお、IPAの接触角は55度以上、好ましくは60度以上であればフラックス這い上がり防止剤としては良好である。
<接触角の測定>
ガラス板を表面処理剤(22)~(39)の各々に、常温で1分間浸漬後、取出して室温で乾燥させて、這い上がり防止剤の被膜を処理した。ガラス板に、2-プロパノール(IPA)を滴下して接触角の測定を行った。接触角の測定には、自動接触角計OCA-20[dataphysics社製]を用いた。
また、該表面処理剤はエポキシ樹脂に含まれる成分のひとつであるBGEに対する撥性および樹脂付着防止性能が従来のものと同等であった。このことは、本発明が生体及び環境へのリスクが大きく低下させながらも、高い性能を有する樹脂付着防止剤の提供を可能にしたことを示す。
また、該表面処理剤は、高い撥IPA性を有し、特に低濃度においても高い撥IPA性を維持できることが分った。このことは、被膜による接触不良などを起こし難いとともに高い撥IPA性を有する、高い性能を有するフラックス這い上がり防止剤の提供を可能にしたことを示す。
また、本発明の表面処理剤は、本発明の化合物(a)から導かれる重合体が高いTgおよびTmを有することから、被膜が硬いことが分る。このことは、表面処理剤としての性能を発揮しやすいとともに、フラックス這い上がり防止剤として用いた場合など、本発明の重合体を含む被膜を形成した部品の切断処理などにおいて、切断金型への被膜の付着が生じ難く、作業性が向上するという効果を有することを示す。
Claims (11)
- 下記式(a)で表される化合物。
CH2=CR1-CONJ-CKR2-(CH2)n-COO-Q1-Rf1 (a)
式中の記号は以下の意味を示す。
R1:水素原子またはメチル基、
R2:水素原子または下記式(r)で表される基、
-(CH2)m-COO-Q2-Rf2 (r)
nおよびm:相互に独立して、0~4の整数
Rf1およびRf2:相互に独立して、炭素数1~6のポリフルオロアルキル基またはポリフルオロエーテル基、
Q1およびQ2:相互に独立して、単結合または2価の連結基、
J:水素原子または炭素数1~3のアルキル基、
K:水素原子、炭素数1~3のアルキル基または式(r)で表される基。
ただし、式中の-CONJ-CKR2-部分は、下記式(s1)または(s2)で表される構造であってもよい。
jおよびk:相互に独立して、単結合または炭素数1~3のアルキレン基。ただしjとkが同時に単結合になることはない。該アルキレン基は、式(r)で表される基で置換されていてもよい。また、式(r)で表される基が式(a)で表される化合物中に複数存在する場合には、それぞれ同一でも異なる構造でも構わない。 - 下記式(a1)で表される請求項1に記載の化合物。
CH2=CR1-CONH-CHR2-(CH2)n-COO-Q1-Rf1 (a1)
(式中の記号は前記式(a)中の記号と同じ意味を示す。) - 前記Rf1およびRf2がパーフルオロアルキル基である請求項1~3のいずれかに記載の化合物。
- 前記Q1およびQ2が直鎖状のアルキレン基である請求項1~4のいずれかに記載の化合物。
- 請求項1~5のいずれかに記載の化合物から導かれる重合単位を含む重合体。
- 請求項6に記載の重合体を含む表面処理剤。
- 樹脂付着防止剤である請求項7に記載の表面処理剤。
- フラックス這い上がり防止剤である請求項7に記載の表面処理剤。
- 表面の少なくとも一部に、請求項6に記載の重合体を含む被膜を有する物品。
- 前記の物品が電子部品である、請求項10に記載された物品。
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012111741A1 (ja) * | 2011-02-18 | 2012-08-23 | Agcセイミケミカル株式会社 | 界面活性剤、該界面活性剤を含む組成物、その用途および含フッ素化合物 |
JP2013151648A (ja) * | 2011-12-26 | 2013-08-08 | Agc Seimi Chemical Co Ltd | 混合溶剤および表面処理剤 |
JP2021055004A (ja) * | 2019-10-01 | 2021-04-08 | Agcセイミケミカル株式会社 | 硬化性組成物、塗料、硬化物、及び塗工物 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10064803B2 (en) | 2011-08-29 | 2018-09-04 | Agc Seimi Chemical Co., Ltd. | Copolymer for cosmetics, surface treatment agent for cosmetic powder, powder for cosmetics, and cosmetic preparation |
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Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS528807B2 (ja) | 1972-04-14 | 1977-03-11 | ||
JPS5839135B2 (ja) | 1978-07-03 | 1983-08-27 | ダイキン工業株式会社 | ポリフルオロアルコ−ル類の製法 |
JPS60262812A (ja) * | 1984-06-08 | 1985-12-26 | Neos Co Ltd | 付着防止剤 |
JPS619480A (ja) * | 1984-06-26 | 1986-01-17 | Neos Co Ltd | 付着防止剤 |
JPS6112777A (ja) * | 1984-06-26 | 1986-01-21 | Neos Co Ltd | 付着防止剤 |
JPH01139667A (ja) * | 1987-11-27 | 1989-06-01 | Asahi Glass Co Ltd | 樹脂付着防止剤 |
JPH03256310A (ja) | 1990-03-06 | 1991-11-15 | Seimi Chem Kk | 樹脂付着防止剤 |
JPH0693212A (ja) * | 1991-10-23 | 1994-04-05 | Neos Co Ltd | 付着防止剤 |
JPH0718247A (ja) * | 1993-06-29 | 1995-01-20 | Neos Co Ltd | 付着防止剤 |
JPH0718243A (ja) * | 1993-06-29 | 1995-01-20 | Neos Co Ltd | 付着防止剤 |
JPH08176496A (ja) * | 1995-06-22 | 1996-07-09 | Daikin Ind Ltd | 熱硬化性樹脂の付着防止剤及び付着防止方法 |
JPH10158462A (ja) * | 1996-11-28 | 1998-06-16 | Nof Corp | リード端子部用樹脂付着防止剤及びこれを施した電子部品 |
JPH10287867A (ja) | 1997-04-14 | 1998-10-27 | Seimi Chem Co Ltd | 撥水撥油性材料 |
WO2008059654A1 (fr) * | 2006-11-17 | 2008-05-22 | Agc Seimi Chemical Co., Ltd. | Composition pour empêcher un brouillage du flux pour brasage, élément électronique pour un brasage enrobé avec la composition, procédé de brasage de l'élément et produit électrique |
JP2008297482A (ja) * | 2007-06-01 | 2008-12-11 | Agc Seimi Chemical Co Ltd | 樹脂組成物、それを用いた樹脂成形体、および塗料 |
WO2009090798A1 (ja) * | 2008-01-18 | 2009-07-23 | Agc Seimi Chemical Co., Ltd. | はんだ用フラックス這い上がり防止組成物、該組成物を被覆したはんだ用電子部材、該部材のはんだ付け方法および電気製品 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3997604A (en) * | 1967-01-02 | 1976-12-14 | Produits Chimiques Ugine Kuhlmann | Mixtures of perfluoroaliphatic substituted amino compounds and the method for preparing the same |
EP0341825B1 (en) * | 1988-04-13 | 1993-11-18 | Fuji Photo Film Co., Ltd. | An electrophotographic lithographic printing plate precursor |
JP2502120B2 (ja) | 1988-04-19 | 1996-05-29 | 富士写真フイルム株式会社 | 電子写真式平版印刷用原版 |
US5219705A (en) * | 1988-07-04 | 1993-06-15 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor of direct image type |
JP2641510B2 (ja) | 1988-07-04 | 1997-08-13 | 富士写真フイルム株式会社 | 直描型平版印刷用原版 |
US4931582A (en) | 1988-11-04 | 1990-06-05 | Minnesota Mining And Manufacturing Company | Fluorinated, acrylamide-functional monomers |
US4971424A (en) | 1989-10-26 | 1990-11-20 | Minnesota Mining And Manufacturing Co. | Radiation curable cladding compositions |
JP2894865B2 (ja) * | 1991-04-24 | 1999-05-24 | 富士写真フイルム株式会社 | 電子写真式平版印刷用原版 |
US5368931A (en) * | 1991-07-10 | 1994-11-29 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor of direct image type |
JP4996837B2 (ja) | 2004-11-18 | 2012-08-08 | Agcセイミケミカル株式会社 | 潤滑オイルのバリア剤組成物およびその用途 |
ATE531778T1 (de) * | 2007-05-30 | 2011-11-15 | Asahi Glass Co Ltd | Zusammensetzung für ein schmutzabweisendes mittel,verfahren zur herstellung und damit bearbeiteter artikel |
JP2009007538A (ja) * | 2007-06-28 | 2009-01-15 | Ft-Net:Kk | フッ素系表面改質組成物 |
-
2010
- 2010-08-17 EP EP10809964.9A patent/EP2468778B1/en active Active
- 2010-08-17 US US13/391,120 patent/US9000110B2/en active Active
- 2010-08-17 KR KR1020127004050A patent/KR101730676B1/ko active IP Right Grant
- 2010-08-17 WO PCT/JP2010/063866 patent/WO2011021623A1/ja active Application Filing
- 2010-08-17 JP JP2011527679A patent/JP5719299B2/ja active Active
- 2010-08-17 CN CN201080032144.5A patent/CN102471405B/zh active Active
- 2010-08-20 TW TW099127956A patent/TW201120066A/zh unknown
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS528807B2 (ja) | 1972-04-14 | 1977-03-11 | ||
JPS5839135B2 (ja) | 1978-07-03 | 1983-08-27 | ダイキン工業株式会社 | ポリフルオロアルコ−ル類の製法 |
JPS60262812A (ja) * | 1984-06-08 | 1985-12-26 | Neos Co Ltd | 付着防止剤 |
JPS619480A (ja) * | 1984-06-26 | 1986-01-17 | Neos Co Ltd | 付着防止剤 |
JPS6112777A (ja) * | 1984-06-26 | 1986-01-21 | Neos Co Ltd | 付着防止剤 |
JPH01139667A (ja) * | 1987-11-27 | 1989-06-01 | Asahi Glass Co Ltd | 樹脂付着防止剤 |
JPH03256310A (ja) | 1990-03-06 | 1991-11-15 | Seimi Chem Kk | 樹脂付着防止剤 |
JPH0693212A (ja) * | 1991-10-23 | 1994-04-05 | Neos Co Ltd | 付着防止剤 |
JPH0718247A (ja) * | 1993-06-29 | 1995-01-20 | Neos Co Ltd | 付着防止剤 |
JPH0718243A (ja) * | 1993-06-29 | 1995-01-20 | Neos Co Ltd | 付着防止剤 |
JPH08176496A (ja) * | 1995-06-22 | 1996-07-09 | Daikin Ind Ltd | 熱硬化性樹脂の付着防止剤及び付着防止方法 |
JPH10158462A (ja) * | 1996-11-28 | 1998-06-16 | Nof Corp | リード端子部用樹脂付着防止剤及びこれを施した電子部品 |
JPH10287867A (ja) | 1997-04-14 | 1998-10-27 | Seimi Chem Co Ltd | 撥水撥油性材料 |
WO2008059654A1 (fr) * | 2006-11-17 | 2008-05-22 | Agc Seimi Chemical Co., Ltd. | Composition pour empêcher un brouillage du flux pour brasage, élément électronique pour un brasage enrobé avec la composition, procédé de brasage de l'élément et produit électrique |
JP2008297482A (ja) * | 2007-06-01 | 2008-12-11 | Agc Seimi Chemical Co Ltd | 樹脂組成物、それを用いた樹脂成形体、および塗料 |
WO2009090798A1 (ja) * | 2008-01-18 | 2009-07-23 | Agc Seimi Chemical Co., Ltd. | はんだ用フラックス這い上がり防止組成物、該組成物を被覆したはんだ用電子部材、該部材のはんだ付け方法および電気製品 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2468778A4 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012111741A1 (ja) * | 2011-02-18 | 2012-08-23 | Agcセイミケミカル株式会社 | 界面活性剤、該界面活性剤を含む組成物、その用途および含フッ素化合物 |
JP2013151648A (ja) * | 2011-12-26 | 2013-08-08 | Agc Seimi Chemical Co Ltd | 混合溶剤および表面処理剤 |
JP2021055004A (ja) * | 2019-10-01 | 2021-04-08 | Agcセイミケミカル株式会社 | 硬化性組成物、塗料、硬化物、及び塗工物 |
JP7420522B2 (ja) | 2019-10-01 | 2024-01-23 | Agcセイミケミカル株式会社 | 硬化性組成物、塗料、硬化物、及び塗工物 |
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EP2468778A1 (en) | 2012-06-27 |
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TW201120066A (en) | 2011-06-16 |
US9000110B2 (en) | 2015-04-07 |
JP5719299B2 (ja) | 2015-05-13 |
CN102471405A (zh) | 2012-05-23 |
JPWO2011021623A1 (ja) | 2013-01-24 |
KR101730676B1 (ko) | 2017-04-26 |
US20120149860A1 (en) | 2012-06-14 |
KR20120055560A (ko) | 2012-05-31 |
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