TWI679492B - 護膜附接裝置 - Google Patents

護膜附接裝置 Download PDF

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Publication number
TWI679492B
TWI679492B TW104137750A TW104137750A TWI679492B TW I679492 B TWI679492 B TW I679492B TW 104137750 A TW104137750 A TW 104137750A TW 104137750 A TW104137750 A TW 104137750A TW I679492 B TWI679492 B TW I679492B
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TW
Taiwan
Prior art keywords
pellicle
stud
frame
attachment device
arm
Prior art date
Application number
TW104137750A
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English (en)
Chinese (zh)
Other versions
TW201619693A (zh
Inventor
丹 慕蘭 佛利茲 凡
Frits Van Der Meulen
馬騰 馬吉斯 馬利努斯 詹森
Maarten Mathijs Marinus Jansen
喬治 瑪紐爾 阿瑟瑞多
Jorge Manuel Azeredo Lima
德克 瑟華提思 傑卓達 布朗司
Derk Servatius Gertruda Brouns
馬克 布魯吉
Marc BRUIJN
傑洛恩 戴克斯
Jeroen Dekkers
保羅 簡森
Paul Janssen
羅納 哈莫 剛瑟 卡默
Ronald Harm Gunther Kramer
馬提亞斯 可魯依寧嘉
Matthias Kruizinga
羅博特 嘉博爾 瑪利亞 蘭博根
馬汀斯 漢德利克斯 安東尼斯 里恩德斯
Martinus Hendrikus Antonius Leenders
艾瑞克 羅勒夫 洛卜史塔
Erik Roelof Loopstra
登 波許 吉瑞特 凡
Gerrit Van Den Bosch
路 吉羅美 法蘭西歐斯 斯洛凡 凡吉兒 凡
畢兒翠斯 路意斯 瑪莉 喬瑟夫 凱翠恩 凡布魯吉
Beatrijs Louise Marie-Joseph Katrien Verbrugge
克拉克 安居落 賽薩 彼得 提
Angelo Cesar Peter De Klerk
賈寇巴斯 瑪麗亞 迪恩斯
Jacobus Maria Dings
摩理斯 理奧納多斯 裘漢那斯 詹森
Maurice Leonardus Johannes Janssen
羅蘭德 賈寇巴斯 裘漢那斯 克利斯坦
Roland Jacobus Johannes Kerstens
馬汀那斯 裘瑟夫 瑪麗亞 克斯特
Martinus Jozef Maria Kesters
米契兒 路斯
Michel Loos
吉爾特 米德兒
Geert MIDDEL
斯洛維斯特 瑪修斯 瑞吉德爾斯
Silvester Matheus Reijnders
法蘭克 裘漢那斯 克利斯坦 索爾席特
Frank Johannes Christiaan Theuerzeit
理玟努根 安妮 裘漢那斯 威爾赫瑪斯 凡
Anne Johannes Wilhelmus VAN LIEVENOOGEN
Original Assignee
荷蘭商Ａｓｍｌ荷蘭公司
Asml Netherlands B. V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荷蘭商Ａｓｍｌ荷蘭公司, Asml Netherlands B. V. filed Critical 荷蘭商Ａｓｍｌ荷蘭公司
Publication of TW201619693A publication Critical patent/TW201619693A/zh
Application granted granted Critical
Publication of TWI679492B publication Critical patent/TWI679492B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Regulation And Control Of Combustion (AREA)
TW104137750A 2014-11-17 2015-11-16 護膜附接裝置 TWI679492B (zh)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US201462080561P 2014-11-17 2014-11-17
US62/080,561 2014-11-17
US201562108348P 2015-01-27 2015-01-27
US62/108,348 2015-01-27
US201562110841P 2015-02-02 2015-02-02
US62/110,841 2015-02-02
US201562126173P 2015-02-27 2015-02-27
US62/126,173 2015-02-27
US201562149176P 2015-04-17 2015-04-17
US62/149,176 2015-04-17
US201562183342P 2015-06-23 2015-06-23
US62/183,342 2015-06-23

Publications (2)

Publication Number Publication Date
TW201619693A TW201619693A (zh) 2016-06-01
TWI679492B true TWI679492B (zh) 2019-12-11

Family

ID=54542272

Family Applications (4)

Application Number Title Priority Date Filing Date
TW104137750A TWI679492B (zh) 2014-11-17 2015-11-16 護膜附接裝置
TW104137749A TWI679491B (zh) 2014-11-17 2015-11-16 適合用於一微影製程中之遮罩總成
TW108140283A TWI724612B (zh) 2014-11-17 2015-11-16 護膜附接裝置
TW108141013A TWI724622B (zh) 2014-11-17 2015-11-16 適合用於一微影製程中之遮罩總成

Family Applications After (3)

Application Number Title Priority Date Filing Date
TW104137749A TWI679491B (zh) 2014-11-17 2015-11-16 適合用於一微影製程中之遮罩總成
TW108140283A TWI724612B (zh) 2014-11-17 2015-11-16 護膜附接裝置
TW108141013A TWI724622B (zh) 2014-11-17 2015-11-16 適合用於一微影製程中之遮罩總成

Country Status (9)

Country Link
US (5) US10558129B2 (https=)
EP (4) EP3221748B1 (https=)
JP (10) JP6837433B2 (https=)
KR (7) KR102913647B1 (https=)
CN (5) CN111458973B (https=)
CA (4) CA3177744A1 (https=)
NL (2) NL2015796A (https=)
TW (4) TWI679492B (https=)
WO (2) WO2016079051A2 (https=)

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