JPWO2023182186A1 - - Google Patents

Info

Publication number
JPWO2023182186A1
JPWO2023182186A1 JP2024510115A JP2024510115A JPWO2023182186A1 JP WO2023182186 A1 JPWO2023182186 A1 JP WO2023182186A1 JP 2024510115 A JP2024510115 A JP 2024510115A JP 2024510115 A JP2024510115 A JP 2024510115A JP WO2023182186 A1 JPWO2023182186 A1 JP WO2023182186A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024510115A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023182186A1 publication Critical patent/JPWO2023182186A1/ja
Priority to JP2025241731A priority Critical patent/JP2026026413A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00—Adhesives based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Adhesive Tapes (AREA)
JP2024510115A 2022-03-23 2023-03-16 Pending JPWO2023182186A1 (https=)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025241731A JP2026026413A (ja) 2022-03-23 2025-12-08 粘着層付きペリクル枠、ペリクル、ペリクル付きフォトマスク及び粘着層付きペリクル枠の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022047178 2022-03-23
PCT/JP2023/010465 WO2023182186A1 (ja) 2022-03-23 2023-03-16 粘着層付きペリクル枠の製造方法、保護フィルム付きペリクル枠、粘着層付きペリクル枠、ペリクル及びペリクル付きフォトマスク

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025241731A Division JP2026026413A (ja) 2022-03-23 2025-12-08 粘着層付きペリクル枠、ペリクル、ペリクル付きフォトマスク及び粘着層付きペリクル枠の製造方法

Publications (1)

Publication Number Publication Date
JPWO2023182186A1 true JPWO2023182186A1 (https=) 2023-09-28

Family

ID=88101540

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2024510115A Pending JPWO2023182186A1 (https=) 2022-03-23 2023-03-16
JP2025241731A Pending JP2026026413A (ja) 2022-03-23 2025-12-08 粘着層付きペリクル枠、ペリクル、ペリクル付きフォトマスク及び粘着層付きペリクル枠の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025241731A Pending JP2026026413A (ja) 2022-03-23 2025-12-08 粘着層付きペリクル枠、ペリクル、ペリクル付きフォトマスク及び粘着層付きペリクル枠の製造方法

Country Status (5)

Country Link
JP (2) JPWO2023182186A1 (https=)
KR (2) KR20260020210A (https=)
CN (1) CN118891583A (https=)
TW (1) TW202403441A (https=)
WO (1) WO2023182186A1 (https=)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004157229A (ja) * 2002-11-05 2004-06-03 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル及びその製造方法
JP2009025560A (ja) * 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2012108277A (ja) * 2010-11-17 2012-06-07 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2015094800A (ja) * 2013-11-11 2015-05-18 信越化学工業株式会社 ペリクルの貼り付け方法及びこの方法に用いる貼り付け装置
JP2016018008A (ja) * 2014-07-04 2016-02-01 旭化成イーマテリアルズ株式会社 ペリクル、ペリクル付フォトマスク、及び半導体素子の製造方法
WO2016079051A2 (en) * 2014-11-17 2016-05-26 Asml Netherlands B.V. Mask assembly
JP2016114883A (ja) * 2014-12-17 2016-06-23 信越化学工業株式会社 リソグラフィー用ペリクルの作製方法
WO2021018777A1 (en) * 2019-07-30 2021-02-04 Asml Netherlands B.V. Pellicle membrane
JP2021056484A (ja) * 2019-09-26 2021-04-08 エスアンドエス テック カンパニー リミテッド 極紫外線リソグラフィ用ペリクル及びその製造方法
JP2021135403A (ja) * 2020-02-27 2021-09-13 凸版印刷株式会社 ペリクル膜、ペリクル、膜、グラフェンシート及びその製造方法
JP2022031882A (ja) * 2015-02-03 2022-02-22 エーエスエムエル ネザーランズ ビー．ブイ． マスクアセンブリ及び関連する方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5411200B2 (ja) 2011-04-26 2014-02-12 信越化学工業株式会社 リソグラフィ用ペリクル

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004157229A (ja) * 2002-11-05 2004-06-03 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル及びその製造方法
JP2009025560A (ja) * 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2012108277A (ja) * 2010-11-17 2012-06-07 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2015094800A (ja) * 2013-11-11 2015-05-18 信越化学工業株式会社 ペリクルの貼り付け方法及びこの方法に用いる貼り付け装置
JP2016018008A (ja) * 2014-07-04 2016-02-01 旭化成イーマテリアルズ株式会社 ペリクル、ペリクル付フォトマスク、及び半導体素子の製造方法
WO2016079051A2 (en) * 2014-11-17 2016-05-26 Asml Netherlands B.V. Mask assembly
JP2016114883A (ja) * 2014-12-17 2016-06-23 信越化学工業株式会社 リソグラフィー用ペリクルの作製方法
JP2022031882A (ja) * 2015-02-03 2022-02-22 エーエスエムエル ネザーランズ ビー．ブイ． マスクアセンブリ及び関連する方法
WO2021018777A1 (en) * 2019-07-30 2021-02-04 Asml Netherlands B.V. Pellicle membrane
JP2021056484A (ja) * 2019-09-26 2021-04-08 エスアンドエス テック カンパニー リミテッド 極紫外線リソグラフィ用ペリクル及びその製造方法
JP2021135403A (ja) * 2020-02-27 2021-09-13 凸版印刷株式会社 ペリクル膜、ペリクル、膜、グラフェンシート及びその製造方法

Also Published As

Publication number Publication date
KR20240144378A (ko) 2024-10-02
JP2026026413A (ja) 2026-02-16
CN118891583A (zh) 2024-11-01
WO2023182186A1 (ja) 2023-09-28
KR20260020210A (ko) 2026-02-10
TW202403441A (zh) 2024-01-16

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