TW202403441A - 帶黏著層的防護膜框的製造方法、帶保護膜的防護膜框、帶黏著層的防護膜框、防護膜及帶防護膜的光罩 - Google Patents

帶黏著層的防護膜框的製造方法、帶保護膜的防護膜框、帶黏著層的防護膜框、防護膜及帶防護膜的光罩 Download PDF

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Publication number
TW202403441A
TW202403441A TW112110506A TW112110506A TW202403441A TW 202403441 A TW202403441 A TW 202403441A TW 112110506 A TW112110506 A TW 112110506A TW 112110506 A TW112110506 A TW 112110506A TW 202403441 A TW202403441 A TW 202403441A
Authority
TW
Taiwan
Prior art keywords
protective film
adhesive layer
frame
photomask
precursor
Prior art date
Application number
TW112110506A
Other languages
English (en)
Chinese (zh)
Inventor
藤村真史
伊藤健
小野陽介
畦崎崇
Original Assignee
日商三井化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三井化學股份有限公司 filed Critical 日商三井化學股份有限公司
Publication of TW202403441A publication Critical patent/TW202403441A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00—Adhesives based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Adhesive Tapes (AREA)
TW112110506A 2022-03-23 2023-03-21 帶黏著層的防護膜框的製造方法、帶保護膜的防護膜框、帶黏著層的防護膜框、防護膜及帶防護膜的光罩 TW202403441A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022047178 2022-03-23
JP2022-047178 2022-03-23

Publications (1)

Publication Number Publication Date
TW202403441A true TW202403441A (zh) 2024-01-16

Family

ID=88101540

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112110506A TW202403441A (zh) 2022-03-23 2023-03-21 帶黏著層的防護膜框的製造方法、帶保護膜的防護膜框、帶黏著層的防護膜框、防護膜及帶防護膜的光罩

Country Status (5)

Country Link
JP (2) JPWO2023182186A1 (https=)
KR (2) KR20260020210A (https=)
CN (1) CN118891583A (https=)
TW (1) TW202403441A (https=)
WO (1) WO2023182186A1 (https=)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004157229A (ja) * 2002-11-05 2004-06-03 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル及びその製造方法
JP4931717B2 (ja) * 2007-07-19 2012-05-16 信越化学工業株式会社 リソグラフィー用ペリクルの製造方法
JP5478463B2 (ja) * 2010-11-17 2014-04-23 信越化学工業株式会社 リソグラフィー用ペリクル
JP5411200B2 (ja) 2011-04-26 2014-02-12 信越化学工業株式会社 リソグラフィ用ペリクル
JP6025178B2 (ja) * 2013-11-11 2016-11-16 信越化学工業株式会社 ペリクルの貼り付け方法及びこの方法に用いる貼り付け装置
JP6316686B2 (ja) * 2014-07-04 2018-04-25 旭化成株式会社 ペリクル、ペリクル付フォトマスク、及び半導体素子の製造方法
CA3177744A1 (en) * 2014-11-17 2016-05-26 Asml Netherlands B.V. Apparatus
JP6293045B2 (ja) * 2014-12-17 2018-03-14 信越化学工業株式会社 リソグラフィー用ペリクルの作製方法
CN113721420B (zh) * 2015-02-03 2025-02-25 Asml荷兰有限公司 掩模组件和相关联的方法
CA3148137A1 (en) * 2019-07-30 2021-02-04 Asml Netherlands B.V. Pellicle membrane
EP3798728A1 (en) * 2019-09-26 2021-03-31 S&S Tech Co., Ltd. Pellicle for euv lithography and method for manufacturing the same
JP7596637B2 (ja) * 2020-02-27 2024-12-10 Ｔｏｐｐａｎホールディングス株式会社 ペリクル膜及びペリクル

Also Published As

Publication number Publication date
KR20240144378A (ko) 2024-10-02
JP2026026413A (ja) 2026-02-16
CN118891583A (zh) 2024-11-01
WO2023182186A1 (ja) 2023-09-28
JPWO2023182186A1 (https=) 2023-09-28
KR20260020210A (ko) 2026-02-10

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