KR20260020210A - 점착층을 구비한 펠리클 프레임의 제조 방법, 보호 필름을 구비한 펠리클 프레임, 점착층을 구비한 펠리클 프레임, 펠리클 및 펠리클을 구비한 포토마스크 - Google Patents

점착층을 구비한 펠리클 프레임의 제조 방법, 보호 필름을 구비한 펠리클 프레임, 점착층을 구비한 펠리클 프레임, 펠리클 및 펠리클을 구비한 포토마스크

Info

Publication number
KR20260020210A
KR20260020210A KR1020267001563A KR20267001563A KR20260020210A KR 20260020210 A KR20260020210 A KR 20260020210A KR 1020267001563 A KR1020267001563 A KR 1020267001563A KR 20267001563 A KR20267001563 A KR 20267001563A KR 20260020210 A KR20260020210 A KR 20260020210A
Authority
KR
South Korea
Prior art keywords
adhesive layer
pellicle
pellicle frame
photomask
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020267001563A
Other languages
English (en)
Korean (ko)
Inventor
마사시 후지무라
겐 이토
요스케 오노
다카시 우네자키
Original Assignee
미쯔이가가꾸가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔이가가꾸가부시끼가이샤 filed Critical 미쯔이가가꾸가부시끼가이샤
Publication of KR20260020210A publication Critical patent/KR20260020210A/ko
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00—Adhesives based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Adhesive Tapes (AREA)
KR1020267001563A 2022-03-23 2023-03-16 점착층을 구비한 펠리클 프레임의 제조 방법, 보호 필름을 구비한 펠리클 프레임, 점착층을 구비한 펠리클 프레임, 펠리클 및 펠리클을 구비한 포토마스크 Pending KR20260020210A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2022-047178 2022-03-23
JP2022047178 2022-03-23
KR1020247030046A KR20240144378A (ko) 2022-03-23 2023-03-16 점착층을 구비한 펠리클 프레임의 제조 방법, 보호 필름을 구비한 펠리클 프레임, 점착층을 구비한 펠리클 프레임, 펠리클 및 펠리클을 구비한 포토마스크
PCT/JP2023/010465 WO2023182186A1 (ja) 2022-03-23 2023-03-16 粘着層付きペリクル枠の製造方法、保護フィルム付きペリクル枠、粘着層付きペリクル枠、ペリクル及びペリクル付きフォトマスク

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020247030046A Division KR20240144378A (ko) 2022-03-23 2023-03-16 점착층을 구비한 펠리클 프레임의 제조 방법, 보호 필름을 구비한 펠리클 프레임, 점착층을 구비한 펠리클 프레임, 펠리클 및 펠리클을 구비한 포토마스크

Publications (1)

Publication Number Publication Date
KR20260020210A true KR20260020210A (ko) 2026-02-10

Family

ID=88101540

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020267001563A Pending KR20260020210A (ko) 2022-03-23 2023-03-16 점착층을 구비한 펠리클 프레임의 제조 방법, 보호 필름을 구비한 펠리클 프레임, 점착층을 구비한 펠리클 프레임, 펠리클 및 펠리클을 구비한 포토마스크
KR1020247030046A Ceased KR20240144378A (ko) 2022-03-23 2023-03-16 점착층을 구비한 펠리클 프레임의 제조 방법, 보호 필름을 구비한 펠리클 프레임, 점착층을 구비한 펠리클 프레임, 펠리클 및 펠리클을 구비한 포토마스크

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020247030046A Ceased KR20240144378A (ko) 2022-03-23 2023-03-16 점착층을 구비한 펠리클 프레임의 제조 방법, 보호 필름을 구비한 펠리클 프레임, 점착층을 구비한 펠리클 프레임, 펠리클 및 펠리클을 구비한 포토마스크

Country Status (5)

Country Link
JP (2) JPWO2023182186A1 (https=)
KR (2) KR20260020210A (https=)
CN (1) CN118891583A (https=)
TW (1) TW202403441A (https=)
WO (1) WO2023182186A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012230227A (ja) 2011-04-26 2012-11-22 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004157229A (ja) * 2002-11-05 2004-06-03 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル及びその製造方法
JP4931717B2 (ja) * 2007-07-19 2012-05-16 信越化学工業株式会社 リソグラフィー用ペリクルの製造方法
JP5478463B2 (ja) * 2010-11-17 2014-04-23 信越化学工業株式会社 リソグラフィー用ペリクル
JP6025178B2 (ja) * 2013-11-11 2016-11-16 信越化学工業株式会社 ペリクルの貼り付け方法及びこの方法に用いる貼り付け装置
JP6316686B2 (ja) * 2014-07-04 2018-04-25 旭化成株式会社 ペリクル、ペリクル付フォトマスク、及び半導体素子の製造方法
CA3177744A1 (en) * 2014-11-17 2016-05-26 Asml Netherlands B.V. Apparatus
JP6293045B2 (ja) * 2014-12-17 2018-03-14 信越化学工業株式会社 リソグラフィー用ペリクルの作製方法
CN113721420B (zh) * 2015-02-03 2025-02-25 Asml荷兰有限公司 掩模组件和相关联的方法
CA3148137A1 (en) * 2019-07-30 2021-02-04 Asml Netherlands B.V. Pellicle membrane
EP3798728A1 (en) * 2019-09-26 2021-03-31 S&S Tech Co., Ltd. Pellicle for euv lithography and method for manufacturing the same
JP7596637B2 (ja) * 2020-02-27 2024-12-10 Ｔｏｐｐａｎホールディングス株式会社 ペリクル膜及びペリクル

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012230227A (ja) 2011-04-26 2012-11-22 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル

Also Published As

Publication number Publication date
KR20240144378A (ko) 2024-10-02
JP2026026413A (ja) 2026-02-16
CN118891583A (zh) 2024-11-01
WO2023182186A1 (ja) 2023-09-28
JPWO2023182186A1 (https=) 2023-09-28
TW202403441A (zh) 2024-01-16

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