KR102913647B1 - 장치 - Google Patents

장치

Info

Publication number
KR102913647B1
KR102913647B1 KR1020237019875A KR20237019875A KR102913647B1 KR 102913647 B1 KR102913647 B1 KR 102913647B1 KR 1020237019875 A KR1020237019875 A KR 1020237019875A KR 20237019875 A KR20237019875 A KR 20237019875A KR 102913647 B1 KR102913647 B1 KR 102913647B1
Authority
KR
South Korea
Prior art keywords
pellicle
stud
patterning device
frame
pellicle frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020237019875A
Other languages
English (en)
Korean (ko)
Other versions
KR20230092024A (ko
Inventor
프리츠 반 델 뭴른
프리츠 반 델 ’ƒ른
마틴 마티아스 마리누스 얀센
조르제 마누엘 아제레도 리마
데르크 세르바티우스 게르트루다 브룬스
마르크 브루인
에로엔 데커스
폴 얀센
로날드 햄 군터 크라머
마티아스 크루이진가
로버트 가브리엘 마리아 란스베르겐
마르티누스 헨드리쿠스 안토니우스 렌더르스
에릭 로엘로프 룹스트라
게릿 반 덴 보쉬
제롬 프랑수아 실베인 비르질 반 루
베아트리스 루이즈 마리-요셉 카트리엔 버브러지
안젤로 세자르 피터 데 클레르크
야코버스 마리아 딩스
모리스 레오나르도 요하네스 얀센
롤랜드 야코버스 요하네스 커스텐스
마르티누 요제프 마리아 케스터스
마이클 루스
그리트 미들
실베스터 마테우스 레인델스
프랭크 요하네스 크리스티안 데에르제이트
앤 요하네스 빌헬무스 반 리에베누젠
Original Assignee
에이에스엠엘 네델란즈 비.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 에이에스엠엘 네델란즈 비.브이. filed Critical 에이에스엠엘 네델란즈 비.브이.
Publication of KR20230092024A publication Critical patent/KR20230092024A/ko
Application granted granted Critical
Publication of KR102913647B1 publication Critical patent/KR102913647B1/ko
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Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Regulation And Control Of Combustion (AREA)
KR1020237019875A 2014-11-17 2015-11-16 장치 Active KR102913647B1 (ko)

Applications Claiming Priority (14)

Application Number Priority Date Filing Date Title
US201462080561P 2014-11-17 2014-11-17
US62/080,561 2014-11-17
US201562108348P 2015-01-27 2015-01-27
US62/108,348 2015-01-27
US201562110841P 2015-02-02 2015-02-02
US62/110,841 2015-02-02
US201562126173P 2015-02-27 2015-02-27
US62/126,173 2015-02-27
US201562149176P 2015-04-17 2015-04-17
US62/149,176 2015-04-17
US201562183342P 2015-06-23 2015-06-23
US62/183,342 2015-06-23
KR1020227044822A KR102544701B1 (ko) 2014-11-17 2015-11-16 장치
PCT/EP2015/076688 WO2016079052A2 (en) 2014-11-17 2015-11-16 Apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020227044822A Division KR102544701B1 (ko) 2014-11-17 2015-11-16 장치

Publications (2)

Publication Number Publication Date
KR20230092024A KR20230092024A (ko) 2023-06-23
KR102913647B1 true KR102913647B1 (ko) 2026-01-16

Family

ID=54542272

Family Applications (7)

Application Number Title Priority Date Filing Date
KR1020237019875A Active KR102913647B1 (ko) 2014-11-17 2015-11-16 장치
KR1020227035015A Active KR102589077B1 (ko) 2014-11-17 2015-11-16 마스크 조립체
KR1020227044822A Active KR102544701B1 (ko) 2014-11-17 2015-11-16 장치
KR1020197035271A Active KR102544694B1 (ko) 2014-11-17 2015-11-16 장치
KR1020177016691A Active KR102634793B1 (ko) 2014-11-17 2015-11-16 마스크 조립체
KR1020177016716A Active KR102548823B1 (ko) 2014-11-17 2015-11-16 장치
KR1020237034540A Active KR102873584B1 (ko) 2014-11-17 2015-11-16 마스크 조립체

Family Applications After (6)

Application Number Title Priority Date Filing Date
KR1020227035015A Active KR102589077B1 (ko) 2014-11-17 2015-11-16 마스크 조립체
KR1020227044822A Active KR102544701B1 (ko) 2014-11-17 2015-11-16 장치
KR1020197035271A Active KR102544694B1 (ko) 2014-11-17 2015-11-16 장치
KR1020177016691A Active KR102634793B1 (ko) 2014-11-17 2015-11-16 마스크 조립체
KR1020177016716A Active KR102548823B1 (ko) 2014-11-17 2015-11-16 장치
KR1020237034540A Active KR102873584B1 (ko) 2014-11-17 2015-11-16 마스크 조립체

Country Status (9)

Country Link
US (5) US10558129B2 (https=)
EP (4) EP3221748B1 (https=)
JP (10) JP6837433B2 (https=)
KR (7) KR102913647B1 (https=)
CN (5) CN111458973B (https=)
CA (4) CA3177744A1 (https=)
NL (2) NL2015796A (https=)
TW (4) TWI679492B (https=)
WO (2) WO2016079051A2 (https=)

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* Cited by examiner, † Cited by third party
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JP6921412B2 (ja) * 2018-01-25 2021-08-18 株式会社ブイ・テクノロジー ペリクルフレーム把持装置及びペリクルフレーム把持方法
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JP7061494B2 (ja) * 2018-03-28 2022-04-28 三井化学株式会社 検査方法、ペリクルの製造方法、および検査装置
KR20250021636A (ko) * 2018-07-04 2025-02-13 에이에스엠엘 네델란즈 비.브이. 위치설정 및 클램핑 경화를 위한 장치
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KR102898051B1 (ko) * 2020-03-13 2025-12-10 삼성전자주식회사 펠리클 전사 장치 및 펠리클 전사 방법
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KR102279897B1 (ko) 2021-02-18 2021-07-21 주식회사 에프에스티 다액형 경화성 조성물의 도포 방법
KR102581086B1 (ko) 2021-03-16 2023-09-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 막
KR20220148472A (ko) * 2021-04-29 2022-11-07 주식회사 에프에스티 펠리클 조립체
KR102624936B1 (ko) 2021-05-21 2024-01-15 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 극자외선 리소그라피용 펠리클 프레임용 실링재
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JP7689216B2 (ja) スタッド取り付け装置及びスタッド取り付け方法

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