CA3177744A1 - Apparatus - Google Patents

Apparatus

Info

Publication number
CA3177744A1
CA3177744A1 CA3177744A CA3177744A CA3177744A1 CA 3177744 A1 CA3177744 A1 CA 3177744A1 CA 3177744 A CA3177744 A CA 3177744A CA 3177744 A CA3177744 A CA 3177744A CA 3177744 A1 CA3177744 A1 CA 3177744A1
Authority
CA
Canada
Prior art keywords
stud
pellicle
patterning device
pellicle frame
attachment apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CA3177744A
Other languages
English (en)
French (fr)
Inventor
Frits Van Der Meulen
Maarten Mathijs Marinus Jansen
Jorge Manuel Azeredo Lima
Derk Servatius Gertruda Brouns
Marc BRUIJN
Jeroen Dekkers
Paul Janssen
Ronald Harm Gunther Kramer
Matthias Kruizinga
Robert Gabriel Maria Lansbergen
Martinus Hendrikus Antonius Leenders
Erik Roelof Loopstra
Gerrit Van Den Bosch
Jerome Francois Sylvain Virgile Van Loo
Beatrijs Louise Marie-Joseph Katrien Verbrugge
Angelo Cesar Peter De Klerk
Jacobus Maria Dings
Maurice Leonardus Johannes Janssen
Roland Jacobus Johannes Kerstens
Martinus Jozef Maria Kesters
Michel Loos
Geert MIDDEL
Silvester Matheus Reijnders
Frank Johannes Christiaan Theuerzeit
Anne Johannes Wilhelmus VAN LIEVENOOGEN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of CA3177744A1 publication Critical patent/CA3177744A1/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Regulation And Control Of Combustion (AREA)
CA3177744A 2014-11-17 2015-11-16 Apparatus Pending CA3177744A1 (en)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US201462080561P 2014-11-17 2014-11-17
US62/080,561 2014-11-17
US201562108348P 2015-01-27 2015-01-27
US62/108,348 2015-01-27
US201562110841P 2015-02-02 2015-02-02
US62/110,841 2015-02-02
US201562126173P 2015-02-27 2015-02-27
US62/126,173 2015-02-27
US201562149176P 2015-04-17 2015-04-17
US62/149,176 2015-04-17
US201562183342P 2015-06-23 2015-06-23
US62/183,342 2015-06-23
CA2968159A CA2968159C (en) 2014-11-17 2015-11-16 Apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CA2968159A Division CA2968159C (en) 2014-11-17 2015-11-16 Apparatus

Publications (1)

Publication Number Publication Date
CA3177744A1 true CA3177744A1 (en) 2016-05-26

Family

ID=54542272

Family Applications (4)

Application Number Title Priority Date Filing Date
CA3177744A Pending CA3177744A1 (en) 2014-11-17 2015-11-16 Apparatus
CA2968159A Active CA2968159C (en) 2014-11-17 2015-11-16 Apparatus
CA3206173A Pending CA3206173A1 (en) 2014-11-17 2015-11-16 Mask assembly
CA2968151A Active CA2968151C (en) 2014-11-17 2015-11-16 Mask assembly

Family Applications After (3)

Application Number Title Priority Date Filing Date
CA2968159A Active CA2968159C (en) 2014-11-17 2015-11-16 Apparatus
CA3206173A Pending CA3206173A1 (en) 2014-11-17 2015-11-16 Mask assembly
CA2968151A Active CA2968151C (en) 2014-11-17 2015-11-16 Mask assembly

Country Status (9)

Country Link
US (5) US10558129B2 (https=)
EP (4) EP3221748B1 (https=)
JP (10) JP6837433B2 (https=)
KR (7) KR102913647B1 (https=)
CN (5) CN111458973B (https=)
CA (4) CA3177744A1 (https=)
NL (2) NL2015796A (https=)
TW (4) TWI679492B (https=)
WO (2) WO2016079051A2 (https=)

Families Citing this family (78)

* Cited by examiner, † Cited by third party
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CA3177744A1 (en) 2014-11-17 2016-05-26 Asml Netherlands B.V. Apparatus
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US11143952B2 (en) 2017-09-28 2021-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle removal method
KR20250036267A (ko) * 2017-10-27 2025-03-13 에이에스엠엘 네델란즈 비.브이. 펠리클 프레임 및 펠리클 조립체
US11106127B2 (en) * 2017-11-08 2021-08-31 Taiwan Semiconductor Manufacturing Co., Ltd. Structure of pellicle-mask structure with vent structure
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JP6921412B2 (ja) * 2018-01-25 2021-08-18 株式会社ブイ・テクノロジー ペリクルフレーム把持装置及びペリクルフレーム把持方法
PL3530511T3 (pl) 2018-02-27 2020-11-16 Joseph Vögele AG Sposób rekonfiguracji układu operacyjnego dla maszyny budowlanej
JP6968259B2 (ja) 2018-03-05 2021-11-17 三井化学株式会社 ペリクル、露光原版、露光装置、及び半導体装置の製造方法
JP7019472B2 (ja) * 2018-03-22 2022-02-15 三井化学株式会社 カーボンナノチューブ自立膜の製造方法、およびペリクルの製造方法
JP7061494B2 (ja) * 2018-03-28 2022-04-28 三井化学株式会社 検査方法、ペリクルの製造方法、および検査装置
KR20250021636A (ko) * 2018-07-04 2025-02-13 에이에스엠엘 네델란즈 비.브이. 위치설정 및 클램핑 경화를 위한 장치
CN108950475B (zh) * 2018-07-25 2020-11-10 京东方科技集团股份有限公司 张网结构、张网装置及张网方法
US11016383B2 (en) * 2018-08-31 2021-05-25 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle for an EUV lithography mask and a method of manufacturing thereof
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WO2020099072A1 (en) 2018-11-16 2020-05-22 Asml Netherlands B.V. A pellicle for euv lithography
US11137693B2 (en) * 2018-11-30 2021-10-05 Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) Pellicle holder, pellicle inspection apparatus, and pellicle inspection method
KR102243367B1 (ko) * 2018-11-30 2021-04-23 한양대학교 산학협력단 펠리클 홀더, 펠리클 검사 장치, 및 펠리클 검사 방법
KR102714101B1 (ko) * 2018-12-10 2024-10-04 어플라이드 머티어리얼스, 인코포레이티드 극자외선 리소그래피 애플리케이션에서 포토마스크로부터의 부착 피처 제거
EP3671342B1 (en) * 2018-12-20 2021-03-17 IMEC vzw Induced stress for euv pellicle tensioning
KR102172722B1 (ko) 2018-12-26 2020-11-02 주식회사 에프에스티 초극자외선 리소그라피용 펠리클의 검사에 사용되는 캡슐
KR20200088528A (ko) 2019-01-14 2020-07-23 주식회사 에프에스티 펠리클 장착 시스템, 스터드 부착 장치, 펠리클 부착 장치 및 펠리클 부착 방법
KR20200088529A (ko) 2019-01-14 2020-07-23 주식회사 에프에스티 초극자외선 리소그라피용 펠리클 검사 시스템
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CN113557475B (zh) * 2019-03-13 2024-09-17 Asml控股股份有限公司 用于光刻设备的静电夹具
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KR102242356B1 (ko) * 2019-08-05 2021-04-20 주식회사 에프에스티 일체화된 프레임과 멤브레인을 포함하는 펠리클, 그 제조방법, 펠리클을 포함하는 노광장치 및 펠리클의 제조장치
KR102273266B1 (ko) * 2019-10-23 2021-07-06 주식회사 에프에스티 일체화된 프레임과 멤브레인을 포함하는 펠리클의 제조방법
KR102898051B1 (ko) * 2020-03-13 2025-12-10 삼성전자주식회사 펠리클 전사 장치 및 펠리클 전사 방법
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KR102668456B1 (ko) 2020-12-07 2024-05-23 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임
KR102512243B1 (ko) 2020-12-16 2023-03-21 주식회사 에프에스티 극자외선 리소그라피용 다공성 펠리클 프레임
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KR102581084B1 (ko) 2021-02-04 2023-09-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임
KR102279897B1 (ko) 2021-02-18 2021-07-21 주식회사 에프에스티 다액형 경화성 조성물의 도포 방법
KR102581086B1 (ko) 2021-03-16 2023-09-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 막
KR20220148472A (ko) * 2021-04-29 2022-11-07 주식회사 에프에스티 펠리클 조립체
KR102624936B1 (ko) 2021-05-21 2024-01-15 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 극자외선 리소그라피용 펠리클 프레임용 실링재
KR102662985B1 (ko) * 2021-06-30 2024-05-03 주식회사 에프에스티 펠리클 조립체
KR102734637B1 (ko) 2021-08-26 2024-11-27 미쯔이가가꾸가부시끼가이샤 펠리클막, 펠리클, 노광 원판, 노광 장치 및 펠리클막의 제조 방법
KR102691250B1 (ko) 2021-09-14 2024-08-05 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 그 제조방법
WO2023110313A1 (en) 2021-12-17 2023-06-22 Asml Netherlands B.V. Method and system for preventing degradation of a material of an optical component for euv-lithography
JPWO2023182186A1 (https=) * 2022-03-23 2023-09-28
US20250224662A1 (en) 2022-04-05 2025-07-10 Asml Netherlands B.V. Pellicle for euv lithography
EP4273626A1 (en) 2022-05-04 2023-11-08 ASML Netherlands B.V. Device and method for measuring contamination and lithographic apparatus provided with said device
CN115032860A (zh) * 2022-06-08 2022-09-09 豪威集成电路(成都)有限公司 光罩及半导体晶圆的制造方法
EP4336258A1 (en) * 2022-09-12 2024-03-13 ASML Netherlands B.V. Pellicle and methods for forming pellicle for use in a lithographic apparatus
CN119856116A (zh) * 2022-09-12 2025-04-18 Asml荷兰有限公司 用于在光刻设备中使用的表膜和用于形成该表膜的方法
KR102690337B1 (ko) * 2022-12-19 2024-08-05 주식회사 에프에스티 3d 탄성 픽스쳐를 포함하는 펠리클 마운팅 어셈블리 및 이를 이용한 펠리클 마운팅 방법과 이를 이용한 펠리클 디 마운팅 방법, 이를 포함한 euv 노광 장치
CN120731396A (zh) 2023-03-06 2025-09-30 Asml荷兰有限公司 允许表膜与图案形成装置之间的区域中压力增加的、用于支撑光刻设备中的表膜的系统
JP2024126348A (ja) * 2023-03-07 2024-09-20 富士フイルムビジネスイノベーション株式会社 画像読み取り装置および画像形成システム
CN116609958B (zh) * 2023-05-17 2025-09-19 安徽晶海纳光电科技有限公司 一种化学气相沉积工艺用的扩散板整形装置及整形方法
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