SG169230A1 - Sputtering target, sintered body, conductive film formed by using them, organic el device, and substrate used for the organic el device - Google Patents

Sputtering target, sintered body, conductive film formed by using them, organic el device, and substrate used for the organic el device

Info

Publication number
SG169230A1
SG169230A1 SG200700791-7A SG2007007917A SG169230A1 SG 169230 A1 SG169230 A1 SG 169230A1 SG 2007007917 A SG2007007917 A SG 2007007917A SG 169230 A1 SG169230 A1 SG 169230A1
Authority
SG
Singapore
Prior art keywords
organic
conductive film
film formed
sintered body
sputtering target
Prior art date
Application number
SG200700791-7A
Other languages
English (en)
Inventor
Inoue Kazuyoshi
Kawamura Hisayuki
Original Assignee
Idemitsu Kousan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002226429A external-priority patent/JP4448648B2/ja
Priority claimed from JP2002283405A external-priority patent/JP2004119272A/ja
Priority claimed from JP2002301633A external-priority patent/JP4308497B2/ja
Priority claimed from JP2002307906A external-priority patent/JP4428502B2/ja
Priority claimed from JP2002323388A external-priority patent/JP4241003B2/ja
Application filed by Idemitsu Kousan Co Ltd filed Critical Idemitsu Kousan Co Ltd
Publication of SG169230A1 publication Critical patent/SG169230A1/en

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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
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    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
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    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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  • Electroluminescent Light Sources (AREA)
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SG200700791-7A 2002-08-02 2003-05-26 Sputtering target, sintered body, conductive film formed by using them, organic el device, and substrate used for the organic el device SG169230A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2002226429A JP4448648B2 (ja) 2002-08-02 2002-08-02 スパッタリングターゲット及び焼結体それらを利用して製造した導電膜。
JP2002283405A JP2004119272A (ja) 2002-09-27 2002-09-27 有機ｅｌ素子及びそれに用いる基板
JP2002301633A JP4308497B2 (ja) 2002-10-16 2002-10-16 有機電界発光装置用電極基板および有機電界発光装置およびその装置の製造方法
JP2002307906A JP4428502B2 (ja) 2002-10-23 2002-10-23 有機電界発光素子用電極基板およびその製造方法並びに有機ｅｌ発光装置
JP2002323388A JP4241003B2 (ja) 2002-11-07 2002-11-07 有機電界発光素子用電極基板および有機ｅｌ発光装置

Publications (1)

Publication Number Publication Date
SG169230A1 true SG169230A1 (en) 2011-03-30

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SG200700791-7A SG169230A1 (en) 2002-08-02 2003-05-26 Sputtering target, sintered body, conductive film formed by using them, organic el device, and substrate used for the organic el device

Country Status (8)

Country Link
US (3) US7393600B2 (fr)
EP (2) EP1693483B1 (fr)
KR (2) KR101002492B1 (fr)
CN (4) CN100396813C (fr)
DE (1) DE60329638D1 (fr)
SG (1) SG169230A1 (fr)
TW (3) TW200402475A (fr)
WO (1) WO2004013372A1 (fr)

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EP1693483A3 (fr) 2006-11-22
CN1869277B (zh) 2010-09-29
KR101002537B1 (ko) 2010-12-17
KR101002492B1 (ko) 2010-12-17
CN102522509A (zh) 2012-06-27
CN101260509A (zh) 2008-09-10
US8093800B2 (en) 2012-01-10
CN102522509B (zh) 2016-01-20
CN100396813C (zh) 2008-06-25
EP1536034A1 (fr) 2005-06-01
CN1675399A (zh) 2005-09-28
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US7306861B2 (en) 2007-12-11
DE60329638D1 (de) 2009-11-19
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US20040081836A1 (en) 2004-04-29
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TWI404810B (zh) 2013-08-11
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