KR930001327A - 정상 굴절 방지 코팅막 - Google Patents

정상 굴절 방지 코팅막 Download PDF

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Publication number
KR930001327A
KR930001327A KR1019920011400A KR920011400A KR930001327A KR 930001327 A KR930001327 A KR 930001327A KR 1019920011400 A KR1019920011400 A KR 1019920011400A KR 920011400 A KR920011400 A KR 920011400A KR 930001327 A KR930001327 A KR 930001327A
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KR
South Korea
Prior art keywords
poly
acid
coating
composite
aqueous
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KR1019920011400A
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English (en)
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KR960002241B1 (ko
Inventor
알. 브룬스발드 윌리암
제이. 헤퍼런 죠지
에프. 라이온스 크리스토퍼
웸. 모로우 웨인
엘. 우드 로버트
Original Assignee
원본미기재
인터내셔널 비지네스 머신즈 코포레이션
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Publication of KR930001327A publication Critical patent/KR930001327A/ko
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Publication of KR960002241B1 publication Critical patent/KR960002241B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers

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  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)

Abstract

내용 없음

Description

정상 굴절 방비 코팅막
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (6)

  1. 수성 처리 가능한 막 형성의 플루오린을 포함하는 복합물을 포함하는 수성 현상 가능한 포트레지스트 복합물로 활용되는 굴절 방지 코팅으로 상기 복합물이 수성 현상이 가능한 포트레지스트 복합물의 굴절지수의 제곱근과 대략적으로 같은 굴절지수를 갖고 그리고 레지스트 패턴의 현상으로 제거 가능한 굴절 방지 코팅.
  2. 제1항에 있어서, 상기 수성 현상 가능한 포트레지스트 복합물로 혼합이 불가능한 솔벤트를 포함하는 굴절 방지 코팅.
  3. 제1항에 있어서, 물 또는 수성 알칼린 용액에서 용해 또는 분산 가능한 막 형성 폴리머의 2성분 체계 및 물 또는 수성 알칼린 용액에서 용해 또는 분산 가능한 저 굴절 지수 플루오로 카본 성분을 포함하는 굴절 방지 코팅.
  4. 제3항에 있어서, 상기 막 형성 폴리머 바인터가 폴리(이닐알콜), 폴리(아크릴산), 폴리(비닐피롤리돈), 폴리(비닐설폰산 Na+솔트), 폴리(비닐 메틸에테르), 폴리(에틸렌글리콜), 폴리(알파트리플루오로메틸 아클릴산), 폴리(비닐메틸에테르-코-멜릭안하드라이드), 폴리(에틸렌글리콜-코-프로필렌에글리콜) 및 폴리(메스아크릴산)으로 구성되는 군으로 부터 선택되는 굴절 방지 코팅.
  5. 제3항에 있어서, 상기 막이 퍼플루오로옥탄산-암모늄솔트, 퍼플루오로옥탄산-체트라메틸암모늄솔트, C-7 및 C-10 퍼플루오로알킬 설폰산의 암모늄솔트, 플루오리네이트 알킬 쿼터너리 암모늄 이모디데스, 퍼플루오로 아디피산 및 퍼플루오로아디피산의 쿼터너리 암모늄으로 구성되는 군으로부터 선택되는 저굴절성 지수 플루오로 카본 성분으로 이루어지는 굴절 방지 코팅.
  6. 제1항에 있어서, 상기 코팅이 하부 레지스트 복합물에 대한 노출 방사에 광학적으로 투명한 굴절 방지 코팅.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920011400A 1991-06-28 1992-06-25 반사 방지 코팅막 KR960002241B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US72277391A 1991-06-28 1991-06-28
US722,773 1991-06-28

Publications (2)

Publication Number Publication Date
KR930001327A true KR930001327A (ko) 1993-01-16
KR960002241B1 KR960002241B1 (ko) 1996-02-13

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KR1019920011400A KR960002241B1 (ko) 1991-06-28 1992-06-25 반사 방지 코팅막

Country Status (7)

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US (2) US5744537A (ko)
EP (1) EP0522990B1 (ko)
JP (1) JP2643056B2 (ko)
KR (1) KR960002241B1 (ko)
DE (1) DE69214035T2 (ko)
SG (1) SG43691A1 (ko)
TW (1) TW236004B (ko)

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