JPS5785048A - Exposed photosensitive diazo film for making screen plate - Google Patents

Exposed photosensitive diazo film for making screen plate

Info

Publication number
JPS5785048A
JPS5785048A JP16223080A JP16223080A JPS5785048A JP S5785048 A JPS5785048 A JP S5785048A JP 16223080 A JP16223080 A JP 16223080A JP 16223080 A JP16223080 A JP 16223080A JP S5785048 A JPS5785048 A JP S5785048A
Authority
JP
Japan
Prior art keywords
diazo compound
screen plate
layers
emulsion
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16223080A
Other languages
Japanese (ja)
Other versions
JPS6259293B2 (en
Inventor
Tetsuo Ishihara
Keiji Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Corp
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Corp, Daicel Chemical Industries Ltd filed Critical Daicel Corp
Priority to JP16223080A priority Critical patent/JPS5785048A/en
Publication of JPS5785048A publication Critical patent/JPS5785048A/en
Publication of JPS6259293B2 publication Critical patent/JPS6259293B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain a screen plate superior in photosensitivity, printing resistance, etc., by providing a layer containing a low concentration diazo compound on a layer containing a high concentration diazo compound of a photosensitive composition consisting of polyvinyl alochol, a polyvinylacetate type emulsion, and a diazo compound. CONSTITUTION:A highly photosensitive composition consists of 70-30pts.wt. polyvinyl alcohol (PVA) having 1,000-3,000 average polymerization degree and 78-98mol% saponification degree, 30-70pts.wt. (as emulsion solid matter) emulsion composed of polyvinyl acetate and a vinyl acetate-ethylenically unsaturated monomer copolymer, and 5-12pts.wt. diazo compound. This composition is coated on a plastic film 1, such as polyester film, in >=1 layers to form >=5mum thick layers 2. A low photosensitivity layer 3 consisting of 70-40pts.wt. PVA having 500-3,000 average polymerization degree and 78-90mol% saponification degree, 30-60pts.wt. (as solid) of said polyvinyl acetate type emulsion, and 2-5pts.wt. diazo compound is coated on the layer 2 in >=1 layers to form a 10-30mum thick a photosensitive diazo film for making a screen plate, thus permitting a printing plate superior in printing resistance, resolution, etc. to be obtained.
JP16223080A 1980-11-17 1980-11-17 Exposed photosensitive diazo film for making screen plate Granted JPS5785048A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16223080A JPS5785048A (en) 1980-11-17 1980-11-17 Exposed photosensitive diazo film for making screen plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16223080A JPS5785048A (en) 1980-11-17 1980-11-17 Exposed photosensitive diazo film for making screen plate

Publications (2)

Publication Number Publication Date
JPS5785048A true JPS5785048A (en) 1982-05-27
JPS6259293B2 JPS6259293B2 (en) 1987-12-10

Family

ID=15750438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16223080A Granted JPS5785048A (en) 1980-11-17 1980-11-17 Exposed photosensitive diazo film for making screen plate

Country Status (1)

Country Link
JP (1) JPS5785048A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108538A (en) * 1981-12-23 1983-06-28 Nippon Kankoushi Kogyo Kk Laminate photosensitive resin film used for textile printing
JPS59102228A (en) * 1982-12-06 1984-06-13 Toray Ind Inc Photosensitive resin plate material
JPS59216137A (en) * 1983-05-24 1984-12-06 Daicel Chem Ind Ltd Photosensitive emulsion for coating on plastic film
JPS6117142A (en) * 1984-07-04 1986-01-25 Agency Of Ind Science & Technol Photosensitive composition for screen plate making
EP0174588A2 (en) * 1984-09-11 1986-03-19 Hoechst Aktiengesellschaft Light-sensitive registration material and process for its production
JPS61124690A (en) * 1984-11-14 1986-06-12 フエルト・リユーシユ・アクチエンゲゼルシヤフト Method and apparatus for producing screen printing cloth forscreen printing drum
JPS61501596A (en) * 1984-03-02 1986-07-31 セリコル　グル−プ　リミテツド Composition for screen printing
WO1987003706A2 (en) * 1985-12-05 1987-06-18 Vickers Plc Improvements in or relating to radiation sensitive devices
JPS63297040A (en) * 1987-05-29 1988-12-05 Process Rabo Micron:Kk Production and device of ps plate for screen printing
JPS6478248A (en) * 1987-09-18 1989-03-23 Shinetsu Chemical Co Photosensitive resin composition for screen printing
JPS6480943A (en) * 1987-09-22 1989-03-27 Shinetsu Chemical Co Aqueous dispersion of photosensitive resin for screen printing
JPH01246548A (en) * 1988-03-29 1989-10-02 Nobukatsu Isato Method for relief printing of image line or pattern on ceramic product by screen printing
JPH036565A (en) * 1989-06-02 1991-01-14 Goou Kagaku Kogyo Kk Photosensitive resin composition for screen processing
KR100947372B1 (en) * 2009-06-16 2010-03-15 주식회사 태영테크폴 High performance photo sensitive resin for flat screen and method for producing screen using the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003077215A2 (en) 2002-03-08 2003-09-18 Glen Research Corporation Fluorescent nitrogenous base and nucleosides incorporating same

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108538A (en) * 1981-12-23 1983-06-28 Nippon Kankoushi Kogyo Kk Laminate photosensitive resin film used for textile printing
JPS59102228A (en) * 1982-12-06 1984-06-13 Toray Ind Inc Photosensitive resin plate material
JPH0363739B2 (en) * 1982-12-06 1991-10-02 Toray Industries
JPS59216137A (en) * 1983-05-24 1984-12-06 Daicel Chem Ind Ltd Photosensitive emulsion for coating on plastic film
JPS61501596A (en) * 1984-03-02 1986-07-31 セリコル　グル−プ　リミテツド Composition for screen printing
JPS6117142A (en) * 1984-07-04 1986-01-25 Agency Of Ind Science & Technol Photosensitive composition for screen plate making
EP0174588A2 (en) * 1984-09-11 1986-03-19 Hoechst Aktiengesellschaft Light-sensitive registration material and process for its production
JPS61124690A (en) * 1984-11-14 1986-06-12 フエルト・リユーシユ・アクチエンゲゼルシヤフト Method and apparatus for producing screen printing cloth forscreen printing drum
WO1987003706A3 (en) * 1985-12-05 1987-09-11 Vickers Plc Improvements in or relating to radiation sensitive devices
WO1987003706A2 (en) * 1985-12-05 1987-06-18 Vickers Plc Improvements in or relating to radiation sensitive devices
JPS63297040A (en) * 1987-05-29 1988-12-05 Process Rabo Micron:Kk Production and device of ps plate for screen printing
JPS6478248A (en) * 1987-09-18 1989-03-23 Shinetsu Chemical Co Photosensitive resin composition for screen printing
JPS6480943A (en) * 1987-09-22 1989-03-27 Shinetsu Chemical Co Aqueous dispersion of photosensitive resin for screen printing
JPH01246548A (en) * 1988-03-29 1989-10-02 Nobukatsu Isato Method for relief printing of image line or pattern on ceramic product by screen printing
JPH036565A (en) * 1989-06-02 1991-01-14 Goou Kagaku Kogyo Kk Photosensitive resin composition for screen processing
KR100947372B1 (en) * 2009-06-16 2010-03-15 주식회사 태영테크폴 High performance photo sensitive resin for flat screen and method for producing screen using the same

Also Published As

Publication number Publication date
JPS6259293B2 (en) 1987-12-10

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