JPS57109944A - Image forming material - Google Patents

Image forming material

Info

Publication number
JPS57109944A
JPS57109944A JP55185092A JP18509280A JPS57109944A JP S57109944 A JPS57109944 A JP S57109944A JP 55185092 A JP55185092 A JP 55185092A JP 18509280 A JP18509280 A JP 18509280A JP S57109944 A JPS57109944 A JP S57109944A
Authority
JP
Japan
Prior art keywords
mask layer
image forming
forming material
layer
laid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55185092A
Other languages
Japanese (ja)
Other versions
JPS6355692B2 (en
Inventor
Yoshiaki Shimizu
Nobumasa Sasa
Akira Nogami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP55185092A priority Critical patent/JPS57109944A/en
Publication of JPS57109944A publication Critical patent/JPS57109944A/en
Publication of JPS6355692B2 publication Critical patent/JPS6355692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To extend the image latitude of an image forming material formed by laminating a mask layer and a photoresist layer on a support and to obtain a faithful image width by adding a specified material to the mask layer. CONSTITUTION:A mask layer contg. about 5-60wt% colorant such as carbon black or methyl violet lake, about 5-60wt% developer-soluble polymer such as polyvinyl alcohol and about 20-80wt% emulsion polymer such as polyacrylic ester is used. Said mask layer having about 0.5-8mum thickness is laid on a support such as a polyethylene terephthalate film havng an undercoat layer, and on the mask layer a photoresist layer is laid to form an image forming material.
JP55185092A 1980-12-27 1980-12-27 Image forming material Granted JPS57109944A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55185092A JPS57109944A (en) 1980-12-27 1980-12-27 Image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55185092A JPS57109944A (en) 1980-12-27 1980-12-27 Image forming material

Publications (2)

Publication Number Publication Date
JPS57109944A true JPS57109944A (en) 1982-07-08
JPS6355692B2 JPS6355692B2 (en) 1988-11-04

Family

ID=16164694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55185092A Granted JPS57109944A (en) 1980-12-27 1980-12-27 Image forming material

Country Status (1)

Country Link
JP (1) JPS57109944A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59188643A (en) * 1983-04-08 1984-10-26 Kimoto & Co Ltd Photosensitive recording material and image forming method using it
JPS60184243A (en) * 1984-03-02 1985-09-19 Kimoto & Co Ltd Photosensitive recording material and image forming method using it
JPH06295062A (en) * 1993-10-01 1994-10-21 Kimoto & Co Ltd Photosensitive process material

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5289916A (en) * 1976-01-23 1977-07-28 Fuji Photo Film Co Ltd Image formation and material therefor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5289916A (en) * 1976-01-23 1977-07-28 Fuji Photo Film Co Ltd Image formation and material therefor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59188643A (en) * 1983-04-08 1984-10-26 Kimoto & Co Ltd Photosensitive recording material and image forming method using it
JPS60184243A (en) * 1984-03-02 1985-09-19 Kimoto & Co Ltd Photosensitive recording material and image forming method using it
JPH06295062A (en) * 1993-10-01 1994-10-21 Kimoto & Co Ltd Photosensitive process material

Also Published As

Publication number Publication date
JPS6355692B2 (en) 1988-11-04

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