JPS5289916A - Image formation and material therefor - Google Patents

Image formation and material therefor

Info

Publication number
JPS5289916A
JPS5289916A JP703176A JP703176A JPS5289916A JP S5289916 A JPS5289916 A JP S5289916A JP 703176 A JP703176 A JP 703176A JP 703176 A JP703176 A JP 703176A JP S5289916 A JPS5289916 A JP S5289916A
Authority
JP
Japan
Prior art keywords
image formation
material therefor
forming
layer
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP703176A
Other languages
Japanese (ja)
Inventor
Isamu Hatanaka
Hisatake Ono
Katsuharu Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP703176A priority Critical patent/JPS5289916A/en
Publication of JPS5289916A publication Critical patent/JPS5289916A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To enable a light sensitive material to form a high density image and be used for repeated operation, by forming a coating layer made by dispersing carbon black into a film-forming, solvent-soluble polymer on a transparent support, and further, providing a photoresist layer on this layer.
JP703176A 1976-01-23 1976-01-23 Image formation and material therefor Pending JPS5289916A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP703176A JPS5289916A (en) 1976-01-23 1976-01-23 Image formation and material therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP703176A JPS5289916A (en) 1976-01-23 1976-01-23 Image formation and material therefor

Publications (1)

Publication Number Publication Date
JPS5289916A true JPS5289916A (en) 1977-07-28

Family

ID=11654660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP703176A Pending JPS5289916A (en) 1976-01-23 1976-01-23 Image formation and material therefor

Country Status (1)

Country Link
JP (1) JPS5289916A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120031A (en) * 1979-02-26 1980-09-16 Shipley Co Photographic formation of visible image
JPS56110934A (en) * 1980-02-06 1981-09-02 Daicel Chem Ind Ltd Processing solution for photosensitive laminate having alcohol-soluble polyamide layer
JPS5719733A (en) * 1980-07-09 1982-02-02 Toyobo Co Ltd Image reproducing material
JPS57109944A (en) * 1980-12-27 1982-07-08 Konishiroku Photo Ind Co Ltd Image forming material
JPS57147629A (en) * 1981-03-07 1982-09-11 Konishiroku Photo Ind Co Ltd Image forming material
JPS5837638A (en) * 1981-07-31 1983-03-04 Konishiroku Photo Ind Co Ltd Image forming material
JPS58174946A (en) * 1982-03-31 1983-10-14 Konishiroku Photo Ind Co Ltd Image forming material
JPS58174939A (en) * 1982-03-18 1983-10-14 Konishiroku Photo Ind Co Ltd Image forming material
JPS61141438A (en) * 1984-12-14 1986-06-28 Kimoto & Co Ltd Image forming material containing non-silver salt
JPS61198153A (en) * 1985-02-27 1986-09-02 Daicel Chem Ind Ltd Image recording material
FR2600434A1 (en) * 1986-06-23 1987-12-24 Fuji Photo Film Co Ltd Material for forming an image
JPH06295062A (en) * 1993-10-01 1994-10-21 Kimoto & Co Ltd Photosensitive process material

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120031A (en) * 1979-02-26 1980-09-16 Shipley Co Photographic formation of visible image
JPS56110934A (en) * 1980-02-06 1981-09-02 Daicel Chem Ind Ltd Processing solution for photosensitive laminate having alcohol-soluble polyamide layer
JPS6332373B2 (en) * 1980-07-09 1988-06-29 Toyo Boseki
JPS5719733A (en) * 1980-07-09 1982-02-02 Toyobo Co Ltd Image reproducing material
JPS57109944A (en) * 1980-12-27 1982-07-08 Konishiroku Photo Ind Co Ltd Image forming material
JPS6355692B2 (en) * 1980-12-27 1988-11-04 Konishiroku Photo Ind
JPS57147629A (en) * 1981-03-07 1982-09-11 Konishiroku Photo Ind Co Ltd Image forming material
JPS5837638A (en) * 1981-07-31 1983-03-04 Konishiroku Photo Ind Co Ltd Image forming material
JPS58174939A (en) * 1982-03-18 1983-10-14 Konishiroku Photo Ind Co Ltd Image forming material
JPH0215056B2 (en) * 1982-03-18 1990-04-10 Konishiroku Photo Ind
JPS58174946A (en) * 1982-03-31 1983-10-14 Konishiroku Photo Ind Co Ltd Image forming material
JPH0215057B2 (en) * 1982-03-31 1990-04-10 Konishiroku Photo Ind
JPS61141438A (en) * 1984-12-14 1986-06-28 Kimoto & Co Ltd Image forming material containing non-silver salt
JPS61198153A (en) * 1985-02-27 1986-09-02 Daicel Chem Ind Ltd Image recording material
FR2600434A1 (en) * 1986-06-23 1987-12-24 Fuji Photo Film Co Ltd Material for forming an image
JPH06295062A (en) * 1993-10-01 1994-10-21 Kimoto & Co Ltd Photosensitive process material

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