JPH0215056B2 - - Google Patents
Info
- Publication number
- JPH0215056B2 JPH0215056B2 JP57041690A JP4169082A JPH0215056B2 JP H0215056 B2 JPH0215056 B2 JP H0215056B2 JP 57041690 A JP57041690 A JP 57041690A JP 4169082 A JP4169082 A JP 4169082A JP H0215056 B2 JPH0215056 B2 JP H0215056B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- copolymer
- mask layer
- present
- image forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920001577 copolymer Polymers 0.000 claims description 39
- 150000001875 compounds Chemical class 0.000 claims description 31
- 239000006185 dispersion Substances 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 21
- 229920000642 polymer Polymers 0.000 claims description 21
- 238000000576 coating method Methods 0.000 claims description 18
- 239000011248 coating agent Substances 0.000 claims description 14
- 239000000178 monomer Substances 0.000 claims description 12
- 239000003960 organic solvent Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 10
- 239000003999 initiator Substances 0.000 claims description 9
- -1 polyethylene Polymers 0.000 description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 229920005989 resin Polymers 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- 125000000217 alkyl group Chemical group 0.000 description 10
- 125000002837 carbocyclic group Chemical group 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 239000000049 pigment Substances 0.000 description 10
- 238000011282 treatment Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 150000002148 esters Chemical class 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 150000001450 anions Chemical class 0.000 description 7
- 239000000975 dye Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 5
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 5
- 239000004793 Polystyrene Substances 0.000 description 5
- 239000003086 colorant Substances 0.000 description 5
- 229920002223 polystyrene Polymers 0.000 description 5
- 239000004698 Polyethylene Substances 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000006224 matting agent Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 229920002125 Sokalan® Polymers 0.000 description 3
- 229920002472 Starch Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 229920006026 co-polymeric resin Polymers 0.000 description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- 229920003088 hydroxypropyl methyl cellulose Polymers 0.000 description 3
- 229940031704 hydroxypropyl methylcellulose phthalate Drugs 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000004816 latex Substances 0.000 description 3
- 229920000126 latex Polymers 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 125000004437 phosphorous atom Chemical group 0.000 description 3
- 230000036211 photosensitivity Effects 0.000 description 3
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical class OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 239000004584 polyacrylic acid Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 239000011118 polyvinyl acetate Substances 0.000 description 3
- 229920002689 polyvinyl acetate Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 235000019698 starch Nutrition 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- 238000012719 thermal polymerization Methods 0.000 description 3
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- LTMQZVLXCLQPCT-UHFFFAOYSA-N 1,1,6-trimethyltetralin Chemical compound C1CCC(C)(C)C=2C1=CC(C)=CC=2 LTMQZVLXCLQPCT-UHFFFAOYSA-N 0.000 description 2
- SUDVPELGFZKOMD-UHFFFAOYSA-N 1,2-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(C(C)C)C(C(C)C)=CC=C3SC2=C1 SUDVPELGFZKOMD-UHFFFAOYSA-N 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N 1,3-Dimethylbenzene Natural products CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- RBGUKBSLNOTVCD-UHFFFAOYSA-N 1-methylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C RBGUKBSLNOTVCD-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical class C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- MWKAGZWJHCTVJY-UHFFFAOYSA-N 3-hydroxyoctadecan-2-one Chemical compound CCCCCCCCCCCCCCCC(O)C(C)=O MWKAGZWJHCTVJY-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 2
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000007754 air knife coating Methods 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000008366 benzophenones Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000001768 carboxy methyl cellulose Substances 0.000 description 2
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 2
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 229920001727 cellulose butyrate Polymers 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- MGWAVDBGNNKXQV-UHFFFAOYSA-N diisobutyl phthalate Chemical compound CC(C)COC(=O)C1=CC=CC=C1C(=O)OCC(C)C MGWAVDBGNNKXQV-UHFFFAOYSA-N 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- ALOUNLDAKADEEB-UHFFFAOYSA-N dimethyl sebacate Chemical compound COC(=O)CCCCCCCCC(=O)OC ALOUNLDAKADEEB-UHFFFAOYSA-N 0.000 description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 2
- 239000001866 hydroxypropyl methyl cellulose Substances 0.000 description 2
- 235000010979 hydroxypropyl methyl cellulose Nutrition 0.000 description 2
- UFVKGYZPFZQRLF-UHFFFAOYSA-N hydroxypropyl methyl cellulose Chemical compound OC1C(O)C(OC)OC(CO)C1OC1C(O)C(O)C(OC2C(C(O)C(OC3C(C(O)C(O)C(CO)O3)O)C(CO)O2)O)C(CO)O1 UFVKGYZPFZQRLF-UHFFFAOYSA-N 0.000 description 2
- 229920003132 hydroxypropyl methylcellulose phthalate Polymers 0.000 description 2
- 229920000554 ionomer Polymers 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 229920000609 methyl cellulose Polymers 0.000 description 2
- 239000001923 methylcellulose Substances 0.000 description 2
- 235000010981 methylcellulose Nutrition 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000005033 polyvinylidene chloride Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical class OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000008107 starch Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- AFBQXBNIXGTXHL-UHFFFAOYSA-N 1,1-dichloroethene;2-methylidenebutanedioic acid;prop-2-enenitrile Chemical compound C=CC#N.ClC(Cl)=C.OC(=O)CC(=C)C(O)=O AFBQXBNIXGTXHL-UHFFFAOYSA-N 0.000 description 1
- DMZRCHJVWAKCAX-UHFFFAOYSA-N 1,2,3,3,4,4,5,5-octachlorocyclopentene Chemical compound ClC1=C(Cl)C(Cl)(Cl)C(Cl)(Cl)C1(Cl)Cl DMZRCHJVWAKCAX-UHFFFAOYSA-N 0.000 description 1
- XHXSXTIIDBZEKB-UHFFFAOYSA-N 1,2,3,4,5,6,7,8-octamethylanthracene-9,10-dione Chemical compound CC1=C(C)C(C)=C2C(=O)C3=C(C)C(C)=C(C)C(C)=C3C(=O)C2=C1C XHXSXTIIDBZEKB-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- WDCYWAQPCXBPJA-UHFFFAOYSA-N 1,3-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1 WDCYWAQPCXBPJA-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- YPCVUZDHOVMKTH-UHFFFAOYSA-N 1-(bromomethyl)phenanthrene Chemical compound C1=CC2=CC=CC=C2C2=C1C(CBr)=CC=C2 YPCVUZDHOVMKTH-UHFFFAOYSA-N 0.000 description 1
- XMWGTKZEDLCVIG-UHFFFAOYSA-N 1-(chloromethyl)naphthalene Chemical compound C1=CC=C2C(CCl)=CC=CC2=C1 XMWGTKZEDLCVIG-UHFFFAOYSA-N 0.000 description 1
- RWHFBKPHFWYOAO-UHFFFAOYSA-N 1-(diiodomethyl)anthracene Chemical compound C1=CC=C2C=C3C(C(I)I)=CC=CC3=CC2=C1 RWHFBKPHFWYOAO-UHFFFAOYSA-N 0.000 description 1
- KXJGSNRAQWDDJT-UHFFFAOYSA-N 1-acetyl-5-bromo-2h-indol-3-one Chemical compound BrC1=CC=C2N(C(=O)C)CC(=O)C2=C1 KXJGSNRAQWDDJT-UHFFFAOYSA-N 0.000 description 1
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- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- BVWUEIUNONATML-UHFFFAOYSA-N n-benzylethenamine Chemical compound C=CNCC1=CC=CC=C1 BVWUEIUNONATML-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229940085991 phosphate ion Drugs 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical class ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000001069 triethyl citrate Substances 0.000 description 1
- 235000013769 triethyl citrate Nutrition 0.000 description 1
- VMYFZRTXGLUXMZ-UHFFFAOYSA-N triethyl citrate Natural products CCOC(=O)C(O)(C(=O)OCC)C(=O)OCC VMYFZRTXGLUXMZ-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
本発明は、予め着色された染料または顔料含有
マスク層の上に感光層を設け、この感光層に像様
露光を与えた後に、表面を水処理することにより
高コントラストの画像を形成し得る画像形成材料
に関する。
従来、平版印刷原稿として用いられる非銀塩感
光材料のうち、染料や顔料を含む感光性樹脂層を
用いるタイプとしては、特開昭52−62427号、同
52−2520号公報等に開示されているものがある。
この方法では、高濃度の画像を得ようとして、
感光性樹脂層中の染料や顔料を増やすと、染料や
顔料が感光性樹脂の感光を促す活性光線を吸収す
るために、かえつて感度低下をきたしてしまう。
また、感光性樹脂層でレリーフ画像を形成する
及び/またはレリーフ画像形成後に染色するタイ
プとしては、特開昭49−22929号、同49−22930号
公報に開示されているものがある。
この方法では、染料を含有する特別の染色浴処
理が必要になること、さらに適度な濃度に仕上げ
るためには染色条件を注意深くコントロールする
必要がある。
また、予めマスク層を設け、その上に感光性樹
脂層を設けるタイプとしては、特開昭48−65927
号、同50−139720号公報に記載されているものが
ある。
この方法では、金属状のマスク層を用いる方法
で、像様露光を与えた後から、画像を形成するた
めに行なう金属層のエツチングには、特殊な酸
か、アルカリが必要であるため、処理液安定性や
公害上、労働衛生上の問題があり、好ましくな
い。
一方、特開昭47−16124号、同52−89916号公報
には高分子バインダー中に染料や顔料を混合ある
いは分散したマスク層上に感光性樹脂層を設ける
方法が開示されている。
この方法によると感光層を現像するには、やは
り特定の有機溶媒やアルカリを必要とし、公害
上、労働衛生上の問題があり、好ましくない。
そこで本発明者等は、先に水軟化性高分子化合
物を含有する感光層を有する水で現像可能な画像
形成材料を特願昭56−119332号(特開昭58−
37638号参照)等として提案した。この画像形成
材料について本発明者等は研究を続けたところ現
像に際し、長時間を要するという難点を有するこ
とが判つた。
本発明者等は以上の事実を踏まえて鋭意研究を
重ねた結果、感光層に水不溶性粒子状分散物を用
いることにより、水で現像可能であり、しかも非
常に短時間で現像できることを見出し、本発明に
到達したものである。
即ち、本発明の目的は、水により短時間で現像
可能であり、しかも感光層の皮膜強度が高く、優
れた皮膜形成能を有して、その皮膜には、ピンホ
ールが少なく、高濃度で高コントラストの画像が
安定して得られる画像形成材料を提供することに
ある。
かかる本発明の目的は、支持体上に、支持体に
近い側から(a)着色マスク層、(b)エチレン性不飽和
化合物、光重合開始剤及び水不溶性粒子状分散物
を相互に溶解ないし分散してなる感光性組成物を
塗布してなる層を有する水現像可能な画像形成材
料であつて、前記着色マスク層が水軟化性高分子
化合物を含み、かつ上記水不溶性粒子状分散物
が、主鎖または側鎖に極性基を有するモノマーと
のコポリマーであつて粒子内で分子間架橋された
ラテツクス状高分子化合物であることを特徴とす
る画像形成材料によつて達成される。
以下、本発明について説明する。
先ず、本発明の構成のうち水不溶性粒子状分散
物(以下、粒子状分散物と称する。)について説
明する。
本発明の粒子状分散物とは水不溶性であり、所
望の溶媒中において溶解、凝集、沈降が生じるこ
となく数時間以上安定な状態を保つていることの
できる分散物である。本発明に有用な粒子状分散
物は所望の溶媒中において溶解、凝集、沈降が生
じなければ、特に分散物の種類には限定されな
い。またこれらの粒子状分散物は単独で用いても
よいし、2種以上併用して用いることもできる。
このような粒子状分散物の例としては、ポリア
クリル酸エステルまたはそのコポリマー、ポリア
クリロニトリルまたはそのコポリマー、ポリスチ
レンまたはそのコポリマー、ポリエチレンまたは
そのコポリマー、ポリ塩化ビニルまたはそのコポ
リマー、ポリ塩化ビニリデンまたはそのコポリマ
ー、ポリ酢酸ビニルまたはそのコポリマー、レゾ
ール樹脂またはそのコポリマー、アイオノマー樹
脂、ポリメチルメタクリレートまたはそのコポリ
マー、ポリブタジエンまたはそのコポリマーなど
のラテツクス状高分子化合物を挙げることができ
る。
また、これらの本発明に用いられるラテツクス
状高分子化合物は主鎖または側鎖に極性基を有す
るモノマーとのコポリマーである。
好ましい極性基としては―COOR,
The present invention provides a photosensitive layer on a pre-colored dye- or pigment-containing mask layer, and after imagewise exposure to this photosensitive layer, the surface is water-treated to form a high-contrast image. Regarding forming materials. Conventionally, among the non-silver salt photosensitive materials used as lithographic printing originals, types using photosensitive resin layers containing dyes and pigments are disclosed in JP-A-52-62427 and JP-A-52-62427.
Some of these are disclosed in Publication No. 52-2520 and the like. In this method, in an attempt to obtain a high-density image,
If the amount of dye or pigment in the photosensitive resin layer is increased, the dye or pigment will absorb actinic rays that promote sensitization of the photosensitive resin, resulting in a decrease in sensitivity. Further, as a type in which a relief image is formed with a photosensitive resin layer and/or is dyed after the relief image is formed, there are those disclosed in Japanese Patent Application Laid-open Nos. 49-22929 and 49-22930. This method requires a special dye bath treatment containing the dye, and dyeing conditions must be carefully controlled to achieve the appropriate density. In addition, as a type in which a mask layer is provided in advance and a photosensitive resin layer is provided on the mask layer, Japanese Patent Application Laid-Open No. 48-65927
No. 50-139720. This method uses a metallic mask layer, and after imagewise exposure, the etching of the metallic layer to form an image requires a special acid or alkali. It is undesirable because it causes problems in terms of liquid stability, pollution, and occupational health. On the other hand, Japanese Patent Application Laid-Open Nos. 47-16124 and 52-89916 disclose a method of providing a photosensitive resin layer on a mask layer in which a dye or pigment is mixed or dispersed in a polymer binder. This method still requires a specific organic solvent or alkali to develop the photosensitive layer, which is undesirable because it poses pollution and occupational health problems. Therefore, the present inventors first developed a water-developable image forming material having a photosensitive layer containing a water-softening polymer compound in Japanese Patent Application No. 56-119332 (Japanese Unexamined Patent Application Publication No. 58-1989).
37638), etc. The inventors of the present invention continued their research on this image forming material and found that it has the disadvantage that it takes a long time to develop. Based on the above facts, the present inventors have conducted extensive research and have discovered that by using a water-insoluble particulate dispersion in the photosensitive layer, it is possible to develop with water and in a very short time. This has led to the present invention. That is, the object of the present invention is to have a photosensitive layer that can be developed in a short time with water, has high film strength, has excellent film forming ability, has few pinholes, and has a high density. An object of the present invention is to provide an image forming material that can stably obtain high contrast images. The object of the present invention is to mutually dissolve (a) a colored mask layer, (b) an ethylenically unsaturated compound, a photopolymerization initiator, and a water-insoluble particulate dispersion on a support from the side close to the support. A water-developable image forming material having a layer formed by coating a dispersed photosensitive composition, wherein the colored mask layer contains a water-softening polymer compound, and the water-insoluble particulate dispersion is This can be achieved by using an image-forming material that is a latex-like polymer compound that is a copolymer with a monomer having a polar group in its main chain or side chain and is intermolecularly cross-linked within the particles. The present invention will be explained below. First, a water-insoluble particulate dispersion (hereinafter referred to as a particulate dispersion) among the components of the present invention will be explained. The particulate dispersion of the present invention is a dispersion that is water-insoluble and can remain stable for several hours or more without dissolving, aggregating, or settling in a desired solvent. The particulate dispersion useful in the present invention is not particularly limited in type as long as it does not dissolve, agglomerate or precipitate in the desired solvent. Further, these particulate dispersions may be used alone or in combination of two or more. Examples of such particulate dispersions include polyacrylic esters or copolymers thereof, polyacrylonitrile or copolymers thereof, polystyrene or copolymers thereof, polyethylene or copolymers thereof, polyvinyl chloride or copolymers thereof, polyvinylidene chloride or copolymers thereof, Latex-like polymeric compounds such as polyvinyl acetate or a copolymer thereof, resol resin or a copolymer thereof, ionomer resin, polymethyl methacrylate or a copolymer thereof, polybutadiene or a copolymer thereof can be mentioned. Further, the latex-like polymer compound used in the present invention is a copolymer with a monomer having a polar group in the main chain or side chain. Preferred polar groups include -COOR,
【式】【formula】
【式】―SO3R,―NO2,[Formula] ―SO 3 R, ―NO 2 ,
【式】―CN,―Cl, ―Br,―I,―F,[Formula] -CN, -Cl, -Br, -I, -F,
【式】【formula】
【式】(上記一般式において、Rは
水素原子又はアルキル基又は炭素環基を表わす。)
等が挙げられる。特に好ましいのは4級窒素原子
又は4級リン原子を有するモノマーとのコポリマ
ーである。このうち、主鎖中に4級窒素原子を含
む代表例としては、一般式
〔X:アニオン
R:アルキル基又は炭素環基
n:整数〕
で表わされる、いわゆるアイオネン型のモノマー
単位を含むものがあり、また、側鎖に4級窒素原
子を含む代表例としては、一般式
〔X:アニオン
R:アルキル基又は炭素環基
n:整数〕
で表わされるメタクリロキシアルキルアンモニウ
ムのモノマー単位を含むものや、一般式
〔X:アニオン
R:アルキル基又は炭素環基〕
で表わされるビニルベンジルアンモニウムのモノ
マー単位を含むものや、さらにこのベンジルアン
モニウムのモノマー単位がアミド基を介して結合
した型のもので特開昭55−22766号公報に記載の
下記一般式
〔X:アニオン
R:アルキル基又は炭素環基〕
で表わされるものがある。
一方、4級リン原子を主鎖に含むモノマー単位
の例は下記一般式
〔X:アニオン
R,R′:アルキル基又は炭素環基〕
で示されるものがあるし、側鎖に含む例は下記一
般式
〔X:アニオン
R:アルキル基又は炭素環基〕
で示されるもの等が挙げられる。
上記一般式〜の各々において、Xで表わ
されるアニオンの具体例としては、例えば、ハロ
ゲンイオン、硫酸イオン、リン酸イオン、スルホ
ン酸イオン、酢酸イオン等が挙げられるし、R,
R′で表わされるアルキル基としては、例えば、
メチル、エチル、プロピル、イソブチル、ペンチ
ル、ヘキシル、ヘプチル、デシル等の各基が挙げ
られ、また炭素環基としては、例えば、アリー
ル、アルアルキル、シクロアルキル、例えば、ベ
ンジル、フエニル、p―メチルベンジル、シクロ
ヘキシル、シクロペンチル等の各基が挙げられ
る。そして、上記各一般式中、N又はPに結
合する、Rで表わされたアルキル基又は炭素環基
は、互いに同じでも、異つていてもよい。
これらのラテツクス状高分子化合物はエマルジ
ヨン重合によつて得ることができる。また合成さ
れたポリマーを後にラテツクス化することによつ
ても得ることができる。また油溶性のエチレン性
不飽和化合物、光重合開始剤の使用を可能ならし
めるため、これらのラテツクスは有機溶剤に分散
されていることが望ましい。さらに本発明に用い
られるこれらのラテツクスは有機溶剤に対する安
定性を高めるため粒子内で分子間架橋されてい
る。
すなわち好ましい実施態様としては、粒子状分
散物がポリアクリル酸エステルまたはそのコポリ
マー、ポリスチレンまたはそのコポリマー、ポリ
エチレンまたはそのコポリマー、ポリ塩化ビニル
またはそのコポリマー、ポリ塩化ビニリデンまた
はそのコポリマー、ポリ酢酸ビニルまたはそのコ
ポリマーのラテツクスであり、好ましくはそれら
のラテツクスが下記の一般式で表わされる極性基
を有するモノマーとのコポリマーであり
〔―COOR,[Formula] (In the above general formula, R represents a hydrogen atom, an alkyl group, or a carbocyclic group.)
etc. Particularly preferred are copolymers with monomers having a quaternary nitrogen atom or a quaternary phosphorus atom. Among these, a typical example containing a quaternary nitrogen atom in the main chain is the general formula [X: anion R: alkyl group or carbocyclic group n: integer] There are monomer units of the so-called ionene type represented by [X: anion R: alkyl group or carbocyclic group n: integer] Those containing methacryloxyalkylammonium monomer units represented by the following, and those containing the general formula [X: Anion R: Alkyl group or carbocyclic group] Those containing a vinylbenzylammonium monomer unit represented by the following formula, and those in which this benzylammonium monomer unit is further bonded via an amide group are disclosed in JP-A-55 -The following general formula described in Publication No. 22766 [X: anion R: alkyl group or carbocyclic group] On the other hand, an example of a monomer unit containing a quaternary phosphorus atom in the main chain is the following general formula [X: anion R, R': alkyl group or carbocyclic group] Examples of the side chain include the following general formula: [X: Anion R: Alkyl group or carbocyclic group] Examples include those represented by the following. In each of the above general formulas ~, specific examples of the anion represented by X include halogen ion, sulfate ion, phosphate ion, sulfonate ion, acetate ion, etc.
As the alkyl group represented by R′, for example,
Examples include methyl, ethyl, propyl, isobutyl, pentyl, hexyl, heptyl, decyl and other groups, and examples of carbocyclic groups include aryl, aralkyl, cycloalkyl, such as benzyl, phenyl, p-methylbenzyl. , cyclohexyl, cyclopentyl and the like. In each of the above general formulas, the alkyl group or carbocyclic group represented by R bonded to N or P may be the same or different. These latex-like polymer compounds can be obtained by emulsion polymerization. It can also be obtained by later converting the synthesized polymer into a latex. Furthermore, in order to enable the use of oil-soluble ethylenically unsaturated compounds and photopolymerization initiators, it is desirable that these latexes be dispersed in an organic solvent. Furthermore, these latexes used in the present invention are intermolecularly crosslinked within the particles to increase stability against organic solvents. That is, in a preferred embodiment, the particulate dispersion is polyacrylic acid ester or a copolymer thereof, polystyrene or a copolymer thereof, polyethylene or a copolymer thereof, polyvinyl chloride or a copolymer thereof, polyvinylidene chloride or a copolymer thereof, polyvinyl acetate or a copolymer thereof. These latexes are preferably copolymers with a monomer having a polar group represented by the following general formula [-COOR,
【式】【formula】
【式】【formula】
【式】【formula】
【式】―CN,―
SO3R,―NO2,―Cl,―Br,―I,―F
(上記一般式において、Rは水素原子又はアル
キル基又は炭素環基を表わす。)〕
さらに好ましいはそれらのラテツクスが主鎖ま
たは側鎖に4級窒素原子または4級リン原子を有
しさらに好ましくは粒子内で分子間架橋されてお
り、特に好ましくは分散媒として有機溶剤を用い
ていることである。
これら本発明に用いられる粒子状分散物の粒径
は10mμ〜1μの範囲が好ましい。粒径が1μより大
きいと最終的に得られる画像の解像力が悪くな
り、また粒径が10mμより小さな粒子は実質上調
整が困難である。
本発明のエチレン性不飽和化合物はモノマー、
プレポリマーすなわち二量体、三量体、四量体お
よびオリゴマー(分子量10000以下の重合物又は
重縮合物)、それらの混合物並びにそれらの共重
合体等を包含する。
本発明に用いられるエチレン性不飽和化合物と
しては、多価アルコールのアクリル酸エステル及
びメタクリル酸エステルが適当であり、エチレン
グリコール、トリエチレングリコール、テトラエ
チレングリコール、プロピレングリコール、トリ
メチロールプロパン、ペンタエリスリトール、ネ
オペンチルグリコール等のアクリル酸、メタアク
リル酸エステルを例として挙げ得る。
ビスフエノールAから変性誘導されたアクリル
酸、メタアクリル酸エステル例えばビスフエノー
ルA―エピクロルヒドリン系エポキシ樹脂プレポ
リマーとアクリル酸あるいはメタアクリル酸との
反応生成物、ビスフエノールAのアルキレンオキ
シド付加体あるいはその水素添加物のアクリル
酸、メタアクリル酸エステル等も使用し得る。
これらのエステル系とは別にメチレンビスアク
リルアミド、メチレンビスメタアクリルアミド並
びにエチレンジアミン、プロピレンジアミン、ブ
チレンジアミン、ペンタメチレンジアミン等のジ
アミンのビスアクリルまたはビスメタアクリルア
ミドも有用である。
また、ジオールモノアクリレートもしくはジオ
ールモノメタアクリレートとジイソシアネートと
の反応生成物、トリアクリルホルマールまたはト
リアリルシアヌレート等も適している。
これらのモノマー性化合物とは別に、側鎖にア
クリロイルオキシ基、メタアクリロイルオキシ基
を含む線状高分子化合物、例えばグリシジルメタ
アクリレートの開環共重合物、グリシジルメタア
クリレートのビニル共重合物のアクリル酸、メタ
クリル酸付加反応物等も使用可能である。
本発明のエチレン性不飽和化合物としては水溶
性のものも使用可能であるが、光感度及び画像の
耐水性の点から水不溶性のものが好ましい。特に
光感度の面においてペンタエリスリトールテトラ
アクリレートおよびトリメチロールプロパントリ
アクリレートが好ましいモノマーで、使用可能で
ある。
本発明に用いられる光重合開始剤としては、エ
チレン性不飽和化合物と併用するのに有効な一般
に公知のもので、次の化合物が含まれるがこれに
限定されるものではない。
具体例としては、アシロイン;ベンゾインメチ
ルエーテル、ベンゾインエチルエーテル、ベンゾ
インブチルエーテル等のアシロイン誘導体;臭化
デシル、塩化デシル、デシルアミン等;ベンゾフ
エノン、アセトフエノン、ベンジルおよびベンゾ
イルシクロブタノン等のケトン;ミヒラーのケト
ン、ジエトキシアセトフエノン、およびハロゲン
化アセト―及びベンゾフエノン等の置換ベンゾフ
エノン;チオキサントン、クロルチオキサント
ン、イソプロピルチオキサントン、ジイソプロピ
ルチオキサントン、メチルチオキサントン等のチ
オキサントン誘導体、キノン及びベンゾキノン、
アントラキノンとフエナントレンキノンのような
多核環式キノン;クロルアントラキノン、メチル
アントラキノン、オクタメチルアントラキノン、
ナフトキノン、ジクロナフトキノン等の置換多核
環式キノン;ハロゲン化脂肪族、脂環族及び芳香
族炭化水素及びそれらの混合物などで、但し、ハ
ロゲンは塩素、臭素、弗素、沃素であり、例えば
モノ―及びポリクロロベンゼン、モノ及びポリブ
ロモベンゼン、モノ―及びポリクロロキシレン、
モノ―及びポリブロモキシレン、ジクロロ無水マ
レイン酸、1―(クロロ―2―メチル)ナフタレ
ン、2,4―ジメチルベンゼン塩化モルホニル、
1―ブロモ―3―(m―フエノキシフエノキシ)
ベンゼン、2―ブロモエチルメチルエーテル、無
水クロレンデイン酸及びその対応エステル、塩化
クロロメチルナフチル、クロロメチルナフタレ
ン、ブロモメチルフエナントレン、ジ・ヨードメ
チルアントラセン、ヘキサクロロシクロペンタジ
エン、ヘキサクロロベンゼン、オクタクロロシク
ロペンテン及びそれらの化合物、ロフイン二量
体、及びN―メチル―2―ベンゾイルメチレン―
β―ナフトチアゾール、N―エチル―2―(2―
テノイル)メチレン―β―ナフトチアゾールに代
表される複素環化合物がある。本発明の光重合開
始剤としては水溶性のものも使用可能であるが、
光感度、耐水性の点から水不溶性のものが好まし
い。
本発明の粒子状分散物等を含有する光重合感光
層用組成物への添加物として所望により、熱重合
禁止剤、可塑剤、現像促進剤及び接着性改良剤な
どの各種添加剤を含有させることができる。
熱重合禁止剤の具体例としては、例えばパラメ
トキシフエノール、ヒドロキノン、アルキルもし
くはアリール置換ヒドロキノン、t―ブチルカテ
コール、ピロガロール、塩化第1銅、フエノチア
ジン、クロラニール、ナフチルアミン、β―ナフ
トール、2,6―ジ―t―ブチル―p―クレゾー
ル、ピリジン、ニトロベンゼン、ジニトロベンゼ
ン、p―トルイジン、メチレンブルー、有機酸銅
(例えば酢酸銅など)などがある。
可塑剤としては、ジメチルフタレート、ジエチ
ルフタレート、ジブチルフタレート、ジイソブチ
ルフタレート、ジオクチルフタレート、オクチル
カプリルフタレート、ジシクロヘキシルフタレー
ト、ジトリデシルフタレート、ブチルベンジルフ
タレート、ジイソデシルフタレート、ジアリール
フタレートなどのフタル酸エステル類、ジメチル
グリコールフタレート、エチルフタリルエチルグ
リコレート、メチルフタリルエチルグリコレー
ト、ブチルフタリルブチルグリコレート、トリエ
チレングリコールジカプリル酸エステルなどのグ
リコールエステル類、トリクレジルフオスフエー
ト、トリフエニルフオスフエートなどのリン酸エ
ステル類、ジイソブチルアジペート、ジオクチル
アジペート、ジメチルセバケート、ジブチルセパ
ケート、ジオクチルアゼレート、ジブチルマレー
トなどの脂肪族二塩基酸エステル類、クエン酸ト
リエチル、グリセリントリアセチルエステル、ラ
ウリン酸ブチルなどがある。
本発明の粒子状分散物を含む感光層に用いるエ
チレン性不飽和化合物の添加量は、光重合感光層
用組成物中、固型分の20〜90重量%、好ましくは
40〜70重量%である。更に、光重合開始剤添加量
は、エチレン性不飽和化合物に対して約1.0重量
%〜約100重量%、好ましくは約10重量%〜約50
重量%の範囲である。更に、必要に応じて添加さ
れる熱重合禁止剤の添加量は、光重合感光層用組
成物100重量部に対して0.001〜5重量部が望まし
い。なお、感光層の膜厚としては、0.1μm〜
7μm、好ましくは0.5μm〜4μmがよい。
次に本発明の着色マスク層について説明する。
この着色マスク層の機能は、感光層が溶媒によ
り溶解除去された領域で同一の溶媒により溶解除
去あるいは擦り除去されて着色画像を形成する層
となつている。該着色画像形成層は着色剤として
の染料、顔料が結合剤中に分散、混合あるいは溶
解して形成されており、染料は紫外線吸収剤その
他の染料(特開昭47−16124号公報に記載のもの
等)、及び顔料は有機顔料、無機顔料(顔料便
覧:日本顔料技術協会編及び上記特許に記載のも
の等)から適宜選択して用いられる。
本発明の画像形成材料を平版印刷用原稿として
用いる場合には、特にカーボンブラツクを着色剤
として用いるのが好ましい。これはカーボンブラ
ツクのカバリングパワーが高いので、同一濃度を
得るための膜厚が薄く出来、画像再現性が良好で
あることによる。
本発明の着色マスク層結合剤としては水軟化性
高分子化合物が用いられ、該水軟化性高分子化合
物とはそのヤング率が水の存在下で低下する化合
物で、その水分率が相対湿度80%(25℃)で1.5
%〜30%である高分子化合物が好ましい。好まし
い水軟化性高分子化合物の例としてはメチルセル
ロース、エチルセルロース、ブチルセルロース、
ヒドロキシエチルセルロース、カルボキシメチル
セルロース、シアノエチルセルロース、セルロー
スアセテート、セルローストリアセテート、セル
ロースアセテートブチレート、セルロースアセテ
ートフタレート、ヒドロキシプロピルメチルセル
ロースフタレート、ヒドロキシプロピルメチルセ
ルロースヘキサヒドロフタレート、ポリアクリル
酸エステル、ポリメタクリル酸エステル、ポリビ
ニルブチラール、ポリメチルビニルケトン、ナイ
ロン66、ポリアミド、ポリビニルメトキシアセタ
ール、ポリ酢酸ビニル、エポキシ樹脂、ポリウレ
タン等がある。
この他に、側鎖にカルボキシ基を有する附加重
合体、例えばメタクリル酸共重合体、アクリル酸
共重合体、イタコン酸共重合体、部分エステル化
マレイン酸共重合体、マレイン酸共重合体、クロ
トン酸共重合体等がある。
側鎖に水酸基、カルバモイル基、ジメチルアミ
ノ基を有する附加重合体も同様に用いられ、例え
ばビニルアルコール共重合体、ビニルアリールア
ルコール共重合体、メチレンジエチルマロネート
共重合体(還元物)、無水マレイン酸共重合体
(環元物)、アクリルアミド共重合体、メタクリル
アミド共重合体、N,N−ジメチルアミノメチル
メタクリレート共重合体、N,N−ジメチルアミ
ノエチルアクリレート共重合体、N,N−ジメチ
ルアミノエチルメタクリレート共重合体等があ
る。
この他にビニルピロリドン共重合体等も有用で
ある。上記共重合体におけるカルボキシ基、水酸
基、カルバモイル基、ジメチルアミノ基のモル比
率は、その他の共重合体成分の種類によつて異な
り、前述した水軟化性の定義の範囲において決め
られる。かかる高分子化合物は単独もしくは2種
以上併用して使用される。
本発明に用いるマスク層の着色剤/結合剤の比
率は、目標とする光学濃度とマスク層の水に対す
る除去性を考慮して同業者に公知の方法により定
めることができる。特に結合剤として水軟化性高
分子化合物を用い、着色剤として顔料を用いる場
合には着色剤/結合剤の比は1.0/2.0以上である
ことが望ましい。
本発明のマスク層及び粒子状分散物からなる感
光層を塗設させる支持体としては、寸度的に安定
な板状物が好適に使用できる。かかる支持体とし
ては、紙、プラスチツクス(例えばポリエチレ
ン、ポリプロピレン、ポリスチレンなど)がラミ
ネートされた紙、アルミニウム、亜鉛、銅などの
金属板、二酢酸セルロース、三酢酸セルロース、
プロピオン酸セルロース、酪酸セルロース、酢
酸・酪酸セルロース、硝酸セルロース、ポリエチ
レンテレフタレート、ポリエチレン、ポリスチレ
ン、ポリプロピレン、ポリカーボネート、ポリビ
ニルアセタールなどのようなプラスチツクスのフ
イルムなどがある。これらの支持体の中で、ポリ
エチレンテレフタレート、ポリプロピレン、ポリ
エチレンがラミネートされた紙、またはアルミニ
ウム板が好ましい。
支持体は必要に応じ表面処理される。例えばア
ルミニウム板は砂目立て処理、珪酸ソーダ、弗化
ジルコニウム酸カリウム、リン酸塩等の水溶液へ
浸漬処理、あるいは陽極酸化処理などの1又は2
以上の組合せによる表面処理がなされていること
が好ましい。
プラスチツクの表面を有する支持体の場合に
は、化学的処理、放電処理、火焔処理、紫外線処
理、高周波グロー放電処理、活性プラズマ処理な
どの1又は2以上の組合せによる表面処理がされ
ていることが好ましい。
本発明においては、マスク層の接着性改良のた
め、支持体に下塗層に設けても良い。下塗層とし
て適当な合成樹脂としては、アクリル酸エステル
樹脂、塩化ビニリデン樹脂、塩化ビニリデン―ア
クリロニトリル―イタコン酸共重合樹脂、塩化ビ
ニル―酢酸ビニル―無水マレイン酸共重合樹脂、
アクリル酸アミド又はメタクリル酸アミド誘導体
とアクリル酸又はメタクリル酸のアルキルエステ
ル、脂肪酸ビニルエステル、スチレン又はアクリ
ロニトリルとの共重合樹脂、フタル酸又はイソフ
タル酸とグリコール類とのコポリエステル樹脂、
グリシジルアクリレート又はグリシジルメタクリ
レートの重合体又は共重合体などがあり、またゼ
ラチンも下塗層成分として有効である。
下塗層を形成するための成分は上記の他にも多
数の合成樹脂が知られており、又、塗布液の調整
方法や塗布方法については、本発明が属する写真
材料製造工業界では周知の技術なので適宜それら
を応用することができる。一般には上述したごと
き合成樹脂を水または有機溶媒によつて溶液また
はラテツクス状となし、これをギーサー塗布、ロ
ール塗布、エアーナイフ塗布、スプレー塗布など
の塗布方法によつて上記支持体上に塗布する。
また本発明の粒子状分散物を含む感光層が酸素
の影響によつて起る重合阻害の防止あるいは感光
層表面の傷つき防止、さらに真空密着性改良など
のために本発明においては現像時に溶解もしくは
膨潤するオーバーコート層を設けることができ
る。このオーバーコート層は、機械的にマツト化
されたもの、あるいはマツト剤が含有される樹脂
層であつてもよい。マツト剤としては二酸化珪
素、酸化亜鉛、酸化チタン、酸化ジルコニウム、
ガラス粒子、アルミナ、でん粉、重合体粒子(た
とえばポリメチルメタアクリレート、ポリスチレ
ン、フエノール樹脂などの粒子)および米国特許
第2701245号、同第2992101号各明細書に記載され
ているマツト剤が含まれる。これらは二種以上併
用することができる。マツト剤を含有するオーバ
ーコート層に使用される樹脂は適宜選択される。
具体的に例えばアラビアゴム、ニカワ、ゼラチ
ン、カゼイン、セルローズ類(たとえばビスコー
ス、メチルセルローズ、エチルセルローズ、ヒド
ロキシエチルセルローズ、ヒドロキシプロピルメ
チルセルローズ、カルボキシメチルセルローズ
等)、でん粉類(例えば可溶性でん粉、変性でん
粉等)、ポリビニルアルコール、ポリエチレンオ
キサイド、ポリアクリル酸、ポリアクリルアミ
ド、ポリビニルメチルエーテル、ポリビニルピロ
リドン、ポリアミド等がある。これらは二種以上
併用することもできる。
次に、本発明に係る画像形成材料を製造法の具
体例を示すと、一般には、マスク層結着剤はアセ
トン、メタノール、エタノール、メチルエチルケ
トン、メチルイソブチルケトン、シクロヘキサノ
ン、β−ヒドロキシエチルメチルエーテル(メチ
ルセロソルブ)、β―アセトキシエチルメチルエ
ーテル、メチルセロソルブアセテート、ジメチル
ホルムアミド、ヘキサメチルホスホンアミド、テ
トラヒドロフラン、クロルベンゼン、トリエチレ
ングリコールなどの溶媒に可溶性である。そこで
上記の溶媒(単独溶媒又は2種以上の有機溶媒を
含む混合溶媒)から適当なものを選択し、この中
に溶解せしめてマスク層塗布液を調整する。
このようにして調整されるマスク層塗布液は、
従来から公知の各種の塗布技術に適用されるよう
な粘度に調整される。
一方、感光層の場合は水または種々の有機溶剤
を分散媒とする粒子状分散物を水または所望の有
機溶剤にて希釈し適当な粘度とし、これとエチレ
ン性不飽和化合物および光重合開始剤とを混合し
均一な塗布液を調整する。この場合、油溶性のエ
チレン性不飽和化合物及び油溶性光重合開始剤の
使用を可能ならしめるため溶媒として有機溶剤を
用いることが望ましい。好適に用いられる有機溶
剤としてはアセトン、メタノール、エタノール、
イソブチルアルコール、ノルマルブチルアルコー
ル、イソプロピルアルコール、ノルマルプロピル
アルコール、メチルエチルケトン、メチルイソブ
チルケトン、シクロヘキサノン、β―ヒドロキシ
エチルエーテル(メチルセロソルブ)、β―アセ
トキシエチルエーテル、メチルセロソルブアセテ
ート、ジメチルホルムアミド、ヘキサメチルホス
ホンアミド、テトラヒドロフラン、クロルベンゼ
ン、メチレンクロライド、クロロホルム、トリエ
チレングリコール、トルエン、トリクレン等が挙
げられる。
このように調製された塗布液は公知のホワイラ
ー塗布、デイツプ塗布、カーテン塗布、ロール塗
布、スプレー塗布、エアーナイフ塗布、ドクター
ナイフ塗布などの塗布方法のうちから選択された
方法によつて、支持体上に塗布される。
次に、本発明の作用効果について述べると、本
発明の画像形成材料を用いる画像形成方法は、上
記のようにして作られた画像形成材料を、まず活
性光線で像露光する。光源としては、例えば超高
圧水銀灯、タングステンランプ、水銀灯、キセノ
ンランプ、CRT光源、レーザー光源などの各種
の光源が用いられる。
紫外線等活性光線で像露光された感光層では、
光重合による架橋反応が進行して、水に対して不
溶化する。
光照射面は接着強化されているので、露光後の
画像形成材料は水中に浸漬し、水現像した場合、
画像未露光部は容易に、軽くラビング・擦り現像
される。このとき、感光層の未露光部とその部分
に当る下層のマスク層が除去され、ポジ―ネガの
フイルム画像が形成される。
以下に本発明の実施例を記すが、本発明の実施
態様は以下の記載に限定されるものではない。
実施例 1
厚さ100μmのポリエチレンテレフタレートフイ
ルムの片面に下記組成の塗布液を乾燥後の膜厚が
約1.5μになるように塗布し、乾燥せしめて着色マ
スク層を形成した。
(a) 着色マスク層
ヒドロキシプロピルメチルセルロースフタレ
ート〔信越化学(株)製,HP―50〕 10重量部
カーボンブラツク〔三菱化成工業(株)製,
#50〕 5重量部
メチルセロソルブ 100重量部
メタノール 100重量部
この着色マスク層上に下記本発明の感光液
〔A〕、比較感光液〔B〕,〔C〕を乾燥後の膜厚が
各々1.5μmになるように塗布した。[Formula] -CN, -SO 3 R, -NO 2 , -Cl, -Br, -I, -F (In the above general formula, R represents a hydrogen atom, an alkyl group, or a carbocyclic group.) More preferred These latexes have a quaternary nitrogen atom or a quaternary phosphorus atom in the main chain or side chain, more preferably intermolecular crosslinking within the particles, and particularly preferably an organic solvent is used as a dispersion medium. be. The particle size of these particulate dispersions used in the present invention is preferably in the range of 10 mμ to 1μ. If the particle size is larger than 1μ, the resolution of the final image will be poor, and if the particle size is smaller than 10mμ, it is practically difficult to adjust. The ethylenically unsaturated compound of the present invention is a monomer,
It includes prepolymers, ie, dimers, trimers, tetramers, oligomers (polymer or polycondensate having a molecular weight of 10,000 or less), mixtures thereof, copolymers thereof, and the like. Suitable ethylenically unsaturated compounds used in the present invention include acrylic esters and methacrylic esters of polyhydric alcohols, such as ethylene glycol, triethylene glycol, tetraethylene glycol, propylene glycol, trimethylolpropane, pentaerythritol, Examples include acrylic acid and methacrylic acid esters such as neopentyl glycol. Acrylic acid or methacrylic acid ester modified from bisphenol A, such as a reaction product of bisphenol A-epichlorohydrin epoxy resin prepolymer and acrylic acid or methacrylic acid, an alkylene oxide adduct of bisphenol A, or its hydrogen Additives such as acrylic acid and methacrylic esters may also be used. Apart from these esters, methylene bis-acrylamide, methylene bis-methacrylamide, and bis-acrylic or bis-methacrylamide of diamines such as ethylene diamine, propylene diamine, butylene diamine, and pentamethylene diamine are also useful. Also suitable are reaction products of diol monoacrylates or diol monomethacrylates with diisocyanates, triacrylic formals or triallylcyanurates, and the like. Apart from these monomeric compounds, linear polymeric compounds containing acryloyloxy or methacryloyloxy groups in their side chains, such as ring-opened copolymers of glycidyl methacrylate, acrylic acids of vinyl copolymers of glycidyl methacrylate, etc. , methacrylic acid addition reaction products, etc. can also be used. Although water-soluble compounds can be used as the ethylenically unsaturated compounds of the present invention, water-insoluble compounds are preferred from the viewpoint of photosensitivity and water resistance of images. Particularly from the viewpoint of photosensitivity, pentaerythritol tetraacrylate and trimethylolpropane triacrylate are preferred monomers and can be used. The photopolymerization initiator used in the present invention is generally known and effective for use in combination with ethylenically unsaturated compounds, and includes, but is not limited to, the following compounds. Specific examples include acyloin; acyloin derivatives such as benzoin methyl ether, benzoin ethyl ether, benzoin butyl ether; decyl bromide, decyl chloride, decylamine, etc.; ketones such as benzophenone, acetophenone, benzyl and benzoylcyclobutanone; Michler's ketone, diethoxy acetophenone and substituted benzophenones such as halogenated aceto- and benzophenones; thioxanthone derivatives such as thioxanthone, chlorthioxanthone, isopropylthioxanthone, diisopropylthioxanthone, methylthioxanthone; quinones and benzoquinones;
Polynuclear cyclic quinones such as anthraquinone and phenanthrenequinone; chloranthraquinone, methylanthraquinone, octamethylanthraquinone,
Substituted polycyclic quinones such as naphthoquinone and diclonaphthoquinone; halogenated aliphatic, alicyclic and aromatic hydrocarbons and mixtures thereof, where halogen is chlorine, bromine, fluorine, iodine, such as mono- and polychlorobenzene, mono- and polybromobenzene, mono- and polychloroxylene,
Mono- and polybromoxylene, dichloromaleic anhydride, 1-(chloro-2-methyl)naphthalene, 2,4-dimethylbenzene morphonyl chloride,
1-Bromo-3-(m-phenoxyphenoxy)
Benzene, 2-bromoethyl methyl ether, chlorendeic anhydride and its corresponding esters, chloromethylnaphthyl chloride, chloromethylnaphthalene, bromomethylphenanthrene, di-iodomethylanthracene, hexachlorocyclopentadiene, hexachlorobenzene, octachlorocyclopentene and the like. compound, lofin dimer, and N-methyl-2-benzoylmethylene-
β-naphthothiazole, N-ethyl-2-(2-
There are heterocyclic compounds represented by (tenoyl)methylene-β-naphthothiazole. Although water-soluble ones can also be used as the photopolymerization initiator of the present invention,
Water-insoluble ones are preferred from the viewpoint of photosensitivity and water resistance. If desired, various additives such as a thermal polymerization inhibitor, a plasticizer, a development accelerator, and an adhesion improver may be added to the composition for a photopolymerizable photosensitive layer containing the particulate dispersion of the present invention. be able to. Specific examples of thermal polymerization inhibitors include paramethoxyphenol, hydroquinone, alkyl- or aryl-substituted hydroquinone, t-butylcatechol, pyrogallol, cuprous chloride, phenothiazine, chloranil, naphthylamine, β-naphthol, 2,6-di Examples include -t-butyl-p-cresol, pyridine, nitrobenzene, dinitrobenzene, p-toluidine, methylene blue, and organic acid copper (such as copper acetate). Examples of plasticizers include phthalate esters such as dimethyl phthalate, diethyl phthalate, dibutyl phthalate, diisobutyl phthalate, dioctyl phthalate, octyl capryl phthalate, dicyclohexyl phthalate, ditridecyl phthalate, butyl benzyl phthalate, diisodecyl phthalate, diaryl phthalate, and dimethyl glycol phthalate. , ethyl phthalyl ethyl glycolate, methyl phthalyl ethyl glycolate, butyl phthalyl butyl glycolate, glycol esters such as triethylene glycol dicaprylate, phosphoric acids such as tricresyl phosphate, triphenyl phosphate, etc. Examples include esters, aliphatic dibasic acid esters such as diisobutyl adipate, dioctyl adipate, dimethyl sebacate, dibutyl sepacate, dioctyl azelate, and dibutyl maleate, triethyl citrate, glycerin triacetyl ester, and butyl laurate. The amount of the ethylenically unsaturated compound used in the photosensitive layer containing the particulate dispersion of the present invention is preferably 20 to 90% by weight of the solid content in the composition for the photopolymerizable photosensitive layer.
40-70% by weight. Furthermore, the amount of photopolymerization initiator added is about 1.0% to about 100% by weight, preferably about 10% to about 50% by weight, based on the ethylenically unsaturated compound.
% by weight. Further, the amount of the thermal polymerization inhibitor added as necessary is preferably 0.001 to 5 parts by weight based on 100 parts by weight of the composition for a photopolymerizable photosensitive layer. Note that the thickness of the photosensitive layer is 0.1 μm ~
7 μm, preferably 0.5 μm to 4 μm. Next, the colored mask layer of the present invention will be explained. The function of this colored mask layer is to form a colored image by being dissolved or removed by the same solvent in areas where the photosensitive layer has been dissolved and removed by the solvent. The colored image forming layer is formed by dispersing, mixing or dissolving a dye or pigment as a coloring agent in a binder. etc.), and the pigment is appropriately selected from organic pigments and inorganic pigments (such as those described in Pigment Handbook: Edited by Japan Pigment Technology Association and the above-mentioned patents). When the image-forming material of the present invention is used as an original for lithographic printing, it is particularly preferable to use carbon black as a colorant. This is because carbon black has a high covering power, so the film thickness can be reduced to obtain the same density, and image reproducibility is good. A water-softening polymer compound is used as the binder for the colored mask layer of the present invention, and the water-softening polymer compound is a compound whose Young's modulus decreases in the presence of water, and whose moisture content is 80% relative humidity. 1.5 at % (25℃)
% to 30% is preferred. Examples of preferred water-softening polymer compounds include methylcellulose, ethylcellulose, butylcellulose,
Hydroxyethyl cellulose, carboxymethyl cellulose, cyanoethyl cellulose, cellulose acetate, cellulose triacetate, cellulose acetate butyrate, cellulose acetate phthalate, hydroxypropyl methyl cellulose phthalate, hydroxypropyl methyl cellulose hexahydrophthalate, polyacrylic acid ester, polymethacrylic acid ester, polyvinyl butyral, poly Examples include methyl vinyl ketone, nylon 66, polyamide, polyvinyl methoxy acetal, polyvinyl acetate, epoxy resin, polyurethane, etc. In addition, addition polymers having carboxyl groups in their side chains, such as methacrylic acid copolymers, acrylic acid copolymers, itaconic acid copolymers, partially esterified maleic acid copolymers, maleic acid copolymers, croton There are acid copolymers, etc. Addition polymers having a hydroxyl group, carbamoyl group, or dimethylamino group in the side chain are also used, such as vinyl alcohol copolymer, vinyl aryl alcohol copolymer, methylene diethyl malonate copolymer (reduced product), maleic anhydride. Acid copolymer (ring element), acrylamide copolymer, methacrylamide copolymer, N,N-dimethylaminomethyl methacrylate copolymer, N,N-dimethylaminoethyl acrylate copolymer, N,N-dimethyl Examples include aminoethyl methacrylate copolymer. In addition to these, vinylpyrrolidone copolymers and the like are also useful. The molar ratio of carboxy groups, hydroxyl groups, carbamoyl groups, and dimethylamino groups in the above copolymer varies depending on the types of other copolymer components, and is determined within the scope of the above-mentioned definition of water softening property. Such polymer compounds may be used alone or in combination of two or more. The colorant/binder ratio of the mask layer used in the present invention can be determined by methods known to those skilled in the art, taking into account the target optical density and the water removability of the mask layer. In particular, when a water-softening polymer compound is used as the binder and a pigment is used as the colorant, the ratio of colorant/binder is desirably 1.0/2.0 or more. As the support on which the mask layer and the photosensitive layer comprising the particulate dispersion of the present invention are coated, a dimensionally stable plate-like material can be suitably used. Such supports include paper, paper laminated with plastics (eg, polyethylene, polypropylene, polystyrene, etc.), metal plates such as aluminum, zinc, copper, cellulose diacetate, cellulose triacetate,
Examples include films of plastics such as cellulose propionate, cellulose butyrate, cellulose acetate/butyrate, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, and the like. Among these supports, polyethylene terephthalate, polypropylene, polyethylene-laminated paper, or aluminum plate are preferred. The support is surface-treated if necessary. For example, aluminum plates undergo one or two treatments such as graining treatment, immersion treatment in an aqueous solution of sodium silicate, potassium fluorozirconate, phosphate, etc., or anodizing treatment.
Preferably, the surface treatment is performed in combination with the above. In the case of a support having a plastic surface, the surface may be treated by one or a combination of two or more of chemical treatment, electric discharge treatment, flame treatment, ultraviolet treatment, high frequency glow discharge treatment, activated plasma treatment, etc. preferable. In the present invention, in order to improve the adhesion of the mask layer, an undercoat layer may be provided on the support. Synthetic resins suitable for the undercoat layer include acrylic acid ester resin, vinylidene chloride resin, vinylidene chloride-acrylonitrile-itaconic acid copolymer resin, vinyl chloride-vinyl acetate-maleic anhydride copolymer resin,
Copolymer resin of acrylic acid amide or methacrylic acid amide derivative and alkyl ester of acrylic acid or methacrylic acid, fatty acid vinyl ester, styrene or acrylonitrile, copolyester resin of phthalic acid or isophthalic acid and glycols,
Examples include polymers or copolymers of glycidyl acrylate or glycidyl methacrylate, and gelatin is also effective as a component of the undercoat layer. In addition to the above-mentioned components, many synthetic resins are known as components for forming the undercoat layer, and methods for preparing the coating liquid and coating methods are well-known in the photographic material manufacturing industry to which the present invention belongs. Since they are technologies, they can be applied as appropriate. Generally, the above-mentioned synthetic resin is made into a solution or latex form with water or an organic solvent, and this is applied onto the above-mentioned support by a coating method such as Giesser coating, roll coating, air knife coating, or spray coating. . In addition, in order to prevent the photosensitive layer containing the particulate dispersion of the present invention from inhibiting polymerization caused by the influence of oxygen, to prevent scratches on the surface of the photosensitive layer, and to improve vacuum adhesion, the photosensitive layer may be dissolved or A swellable overcoat layer can be provided. This overcoat layer may be mechanically matted or a resin layer containing a matting agent. Matting agents include silicon dioxide, zinc oxide, titanium oxide, zirconium oxide,
Included are glass particles, alumina, starch, polymer particles (eg, particles of polymethyl methacrylate, polystyrene, phenolic resin, etc.) and matting agents described in US Pat. Nos. 2,701,245 and 2,992,101. Two or more of these can be used in combination. The resin used in the overcoat layer containing the matting agent is appropriately selected.
Specifically, for example, gum arabic, glue, gelatin, casein, celluloses (e.g., viscose, methylcellulose, ethylcellulose, hydroxyethylcellulose, hydroxypropylmethylcellulose, carboxymethylcellulose, etc.), starches (e.g., soluble starch, modified starch) etc.), polyvinyl alcohol, polyethylene oxide, polyacrylic acid, polyacrylamide, polyvinyl methyl ether, polyvinylpyrrolidone, polyamide, etc. Two or more of these can also be used in combination. Next, a specific example of the method for manufacturing the image forming material according to the present invention will be shown. Generally, the mask layer binder is acetone, methanol, ethanol, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, β-hydroxyethyl methyl ether ( It is soluble in solvents such as methyl cellosolve), β-acetoxyethyl methyl ether, methyl cellosolve acetate, dimethylformamide, hexamethylphosphonamide, tetrahydrofuran, chlorobenzene, and triethylene glycol. Therefore, a suitable solvent is selected from the above solvents (single solvent or a mixed solvent containing two or more organic solvents) and dissolved therein to prepare a mask layer coating solution. The mask layer coating solution prepared in this way is
The viscosity is adjusted to be applicable to various conventionally known coating techniques. On the other hand, in the case of a photosensitive layer, a particulate dispersion using water or various organic solvents as a dispersion medium is diluted with water or a desired organic solvent to give an appropriate viscosity, and this is combined with an ethylenically unsaturated compound and a photopolymerization initiator. and prepare a uniform coating solution. In this case, it is desirable to use an organic solvent as the solvent in order to enable the use of an oil-soluble ethylenically unsaturated compound and an oil-soluble photopolymerization initiator. Suitable organic solvents include acetone, methanol, ethanol,
Isobutyl alcohol, n-butyl alcohol, isopropyl alcohol, n-propyl alcohol, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, β-hydroxyethyl ether (methyl cellosolve), β-acetoxyethyl ether, methyl cellosolve acetate, dimethylformamide, hexamethylphosphonamide, tetrahydrofuran , chlorobenzene, methylene chloride, chloroform, triethylene glycol, toluene, trichlene and the like. The coating solution thus prepared is applied to a support by a coating method selected from known coating methods such as whirler coating, dip coating, curtain coating, roll coating, spray coating, air knife coating, and doctor knife coating. applied on top. Next, the effects of the present invention will be described. In the image forming method using the image forming material of the present invention, the image forming material produced as described above is first imagewise exposed to actinic light. As the light source, various light sources are used, such as an ultra-high pressure mercury lamp, a tungsten lamp, a mercury lamp, a xenon lamp, a CRT light source, and a laser light source. In the photosensitive layer imagewise exposed to active light such as ultraviolet rays,
A crosslinking reaction due to photopolymerization progresses and the material becomes insoluble in water. Since the light-irradiated surface has strengthened adhesion, when the exposed image-forming material is immersed in water and developed in water,
Unexposed areas of the image are easily developed by light rubbing. At this time, the unexposed portion of the photosensitive layer and the underlying mask layer corresponding to that portion are removed, and a positive-negative film image is formed. Examples of the present invention will be described below, but the embodiments of the present invention are not limited to the following description. Example 1 A coating solution having the following composition was applied to one side of a polyethylene terephthalate film having a thickness of 100 μm so that the film thickness after drying was approximately 1.5 μm, and dried to form a colored mask layer. (a) Colored mask layer Hydroxypropyl methyl cellulose phthalate [manufactured by Shin-Etsu Chemical Co., Ltd., HP-50] 10 parts by weight carbon black [manufactured by Mitsubishi Chemical Corporation,
#50] 5 parts by weight Methyl cellosolve 100 parts by weight Methanol 100 parts By weight The following photosensitive liquid [A] of the present invention, comparative photosensitive liquids [B] and [C] were applied on this colored mask layer to a film thickness of 1.5 after drying, respectively. It was coated to a thickness of μm.
【表】
さらにこの上に下記の組成のオーバーコート液
を膜厚約2.5μmになるように塗布して画像形成材
料の試料(A),(B),(C)を得た。
ポリビニルアルコール〔ゴーセノールGL―
05,日本合成化学(株)製〕 1重量部
水 9重量部
上記試料(A)において、(a)着色マスク層のヒドロ
キシプロピルメチルセルロースフタレートを、ポ
リビニルアルコール(ゴーセノールGL―05,日
本合成化学(株)社製)に代えたことのみ異ならせて
試料(D)を得た。
また、上記試料(A)において、(b)感光液〔A〕の
ラテツクス状高分子化合物(構造式)のメチルセ
ロソルブ10%分散液を、プライマールAC―61(ア
クリル樹脂水系エマルジヨン ロームアンドハー
ス社製 固形分50%)に代えたことのみ異ならせ
て試料(E)を得た。
上記5種類の画像形成材料の各試料を網点原稿
と重ねて3KWメタルハライドランプにより80cm
の距離から10秒間露光し、次に20℃の水中に浸漬
し軽く擦すつて現像した。この結果を下記第1表
に示した。[Table] Further, an overcoat liquid having the composition shown below was applied thereto to a film thickness of approximately 2.5 μm to obtain image forming material samples (A), (B), and (C). Polyvinyl alcohol [Gohsenol GL-
05, manufactured by Nippon Gohsen Kagaku Co., Ltd.] 1 part by weight Water 9 parts by weight In the above sample (A), (a) hydroxypropyl methyl cellulose phthalate of the colored mask layer was mixed with polyvinyl alcohol (Gosenol GL-05, Nippon Gohsen Kagaku Co., Ltd.). Sample (D) was obtained with the only difference being that the sample (manufactured by ) was replaced. In addition, in the above sample (A), a 10% methyl cellosolve dispersion of the latex-like polymer compound (structural formula) of (b) photosensitive liquid [A] was added to Primal AC-61 (acrylic resin water-based emulsion manufactured by Rohm and Haas Co., Ltd.). Sample (E) was obtained with the only difference being that the solid content was replaced with 50% solids. Each sample of the above five types of image forming materials was overlapped with a halftone original and 80 cm was measured using a 3KW metal halide lamp.
The film was exposed to light for 10 seconds from a distance of , and then developed by immersing it in water at 20°C and rubbing it lightly. The results are shown in Table 1 below.
【表】【table】
【表】
第1表から明らかなように、本発明に係る画像
形成材料は画像特性が極めて良好で、しかも短時
間で現像が可能であることがわかる。
実施例 2
トリメチロールプロパントリアクリレート
5重量部
ジイソプロピルチオキサントン 1重量部
ジメチルアミノ安息香酸イソアミル 1重量部
上記混合液20gをエマルゲン935(花王アトラス
製)3%水溶液30gに加えホモゲナイザ―(AM
―8,日本精機製作所製)で15000rpmで分散し
分散液〔A〕を得た。
次に感光層塗布液として下記を用いた外は実施
例1と同様にして本発明の試料を作成した。
上記分散液〔A〕 4重量部
コーポレンラテツクスL―2000(アイオノマ
ー樹脂33%水分散液,旭ダウ製) 1重量部
水 15重量部
この本発明の試料について実施例1と同様に露
光と現像を行つたところ鮮明な黒色画像が得られ
た。[Table] As is clear from Table 1, the image forming material according to the present invention has extremely good image properties and can be developed in a short time. Example 2 Trimethylolpropane triacrylate
5 parts by weight Diisopropylthioxanthone 1 part by weight Isoamyl dimethylaminobenzoate 1 part by weight 20 g of the above mixture was added to 30 g of a 3% aqueous solution of Emulgen 935 (manufactured by Kao Atlas) using a homogenizer (AM).
-8, manufactured by Nippon Seiki Seisakusho) at 15,000 rpm to obtain a dispersion liquid [A]. Next, a sample of the present invention was prepared in the same manner as in Example 1 except that the following was used as the photosensitive layer coating liquid. The above dispersion liquid [A] 4 parts by weight Corporene Latex L-2000 (33% aqueous dispersion of ionomer resin, manufactured by Asahi Dow) 1 part by weight water 15 parts by weight This sample of the present invention was exposed to light in the same manner as in Example 1. When developed, a clear black image was obtained.
Claims (1)
ク層、(b)エチレン性不飽和化合物、光重合開始剤
及び水不溶性粒子状分散物を相互に溶解ないし分
散してなる感光性組成物を塗布してなる層を有す
る水現像可能な画像形成材料であつて、前記着色
マスク層が水軟化性高分子化合物を含み、かつ上
記水不溶性粒子状分散物が、主鎖または側鎖に極
性基を有するモノマーとのコポリマーであつて粒
子内で分子間架橋されたラテツクス状高分子化合
物であることを特徴とする画像形成材料。 2 上記エチレン性不飽和化合物及び光重合開始
剤が有機溶剤可溶性であることを特徴とする特許
請求の範囲第1項記載の画像形成材料。[Claims] 1. On a support, from the side close to the support, (a) a colored mask layer, (b) an ethylenically unsaturated compound, a photopolymerization initiator, and a water-insoluble particulate dispersion are mutually dissolved or disposed. A water-developable image forming material having a layer formed by coating a dispersed photosensitive composition, wherein the colored mask layer contains a water-softening polymer compound, and the water-insoluble particulate dispersion is An image forming material characterized in that it is a latex-like polymer compound which is a copolymer with a monomer having a polar group in its main chain or side chain and is intermolecularly cross-linked within the particles. 2. The image forming material according to claim 1, wherein the ethylenically unsaturated compound and the photopolymerization initiator are soluble in an organic solvent.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4169082A JPS58174939A (en) | 1982-03-18 | 1982-03-18 | Image forming material |
US06/474,023 US4542088A (en) | 1982-03-18 | 1983-03-10 | Photopolymerizable compositions and image-forming materials using said compositions |
DE8383301450T DE3366376D1 (en) | 1982-03-18 | 1983-03-16 | Photopolymerizable compositions and image-forming materials using said compositions |
EP83301450A EP0089802B2 (en) | 1982-03-18 | 1983-03-16 | Photopolymerizable compositions and image-forming materials using said compositions |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4169082A JPS58174939A (en) | 1982-03-18 | 1982-03-18 | Image forming material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58174939A JPS58174939A (en) | 1983-10-14 |
JPH0215056B2 true JPH0215056B2 (en) | 1990-04-10 |
Family
ID=12615417
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4169082A Granted JPS58174939A (en) | 1982-03-18 | 1982-03-18 | Image forming material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58174939A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6093427A (en) * | 1983-10-28 | 1985-05-25 | Nippon Kayaku Co Ltd | Method for hardening photosensitive resin |
JP2559711B2 (en) * | 1986-09-12 | 1996-12-04 | 株式会社 きもと | Non-silver image forming material |
JP2545951B2 (en) * | 1988-09-26 | 1996-10-23 | 東亞合成株式会社 | Photocurable composition |
JP2596271B2 (en) * | 1991-09-10 | 1997-04-02 | 双葉電子工業株式会社 | Method for producing photosensitive composition and substrate |
JP2912140B2 (en) * | 1993-10-01 | 1999-06-28 | 株式会社きもと | Photosensitive material for plate making |
JP4820640B2 (en) * | 2005-12-20 | 2011-11-24 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS522520A (en) * | 1975-06-19 | 1977-01-10 | Napp Systems Inc | Photosensitive composition |
JPS5289916A (en) * | 1976-01-23 | 1977-07-28 | Fuji Photo Film Co Ltd | Image formation and material therefor |
JPS53137248A (en) * | 1977-03-22 | 1978-11-30 | Du Pont | Acrylic resin dispersion |
-
1982
- 1982-03-18 JP JP4169082A patent/JPS58174939A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS522520A (en) * | 1975-06-19 | 1977-01-10 | Napp Systems Inc | Photosensitive composition |
JPS5289916A (en) * | 1976-01-23 | 1977-07-28 | Fuji Photo Film Co Ltd | Image formation and material therefor |
JPS53137248A (en) * | 1977-03-22 | 1978-11-30 | Du Pont | Acrylic resin dispersion |
Also Published As
Publication number | Publication date |
---|---|
JPS58174939A (en) | 1983-10-14 |
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