KR100947372B1 - High performance photo sensitive resin for flat screen and method for producing screen using the same - Google Patents
High performance photo sensitive resin for flat screen and method for producing screen using the same Download PDFInfo
- Publication number
- KR100947372B1 KR100947372B1 KR1020090053201A KR20090053201A KR100947372B1 KR 100947372 B1 KR100947372 B1 KR 100947372B1 KR 1020090053201 A KR1020090053201 A KR 1020090053201A KR 20090053201 A KR20090053201 A KR 20090053201A KR 100947372 B1 KR100947372 B1 KR 100947372B1
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- screen
- photosensitive emulsion
- photosensitive
- vinyl acetate
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/12—Stencil printing; Silk-screen printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/14—Multicolour printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/24—Stencils; Stencil materials; Carriers therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
본 발명은 평판 스크린 날염에서 스크린을 제판(무늬표현)하기 위해 사용되는 스크린 제판용 고성능 일액형 감광유제 및 이를 이용한 평판 스크린 제조방법에 관한 것이다.The present invention relates to a high performance one-component photosensitive emulsion for screen making used for making a screen (pattern representation) in flat screen printing and a method of manufacturing a flat screen using the same.
일반적으로 날염이라 함은, 염료나 안료를 점조한 호액에 넣어서 피염물을 부분적으로 인날하여 모양이나 무늬를 표현하는 가공을 말하는데, 모양을 표현하는 기법에 따라 직접 날염, 발염 날염, 방염날염으로 분류할 수 있으며, 날염용 기계와 기구등으로 분류하면 롤러날염, 자동스크린날염, 전사날염, 형지날염, 핸드스크린 날염, 특수날염 등으로 분류할 수 있다. 이중, 스크린 날염법은 다시 로터리스크린 방식과 평판 스크린 방식으로 나뉜다. In general, printing refers to a process of expressing a shape or a pattern by partially dyeing a dye by putting dyes or pigments in viscous liquid, and classifying it as direct printing, printing printing, and printing printing according to the technique of expressing a shape. If it is classified into printing machine and apparatus, it can be classified into roller printing, automatic screen printing, transfer printing, mold printing, hand screen printing, special printing, etc. The screen printing method is divided into a rotary screen method and a flat screen method.
도 1은 종래기술에 따른 평판 스크린 제조방법을 설명하는 공정도로서, 동 도면에서 보는 바와 같은 종래기술 평판 스크린의 제조 공정에 대해 살펴보면, 감 광액 배합공정(S10)과, 도포 및 건조공정(S20)과, 노광공정(S30)과, 현상공정(S40)과, 보강공정(S50)으로 이루어진다.1 is a process chart illustrating a flat screen manufacturing method according to the prior art. Referring to the manufacturing process of the prior art flat screen as shown in the drawing, a photosensitive liquid compounding step (S10), coating and drying step (S20) And an exposure step (S30), a developing step (S40), and a reinforcing step (S50).
상기 감광액 배합공정(S10)은 유제와, 감광제, 색소, 물을 배합하는 공정으로서, 이들 배합물을 여과시킨 후 8시간 동안 방치되도록 한다.The photoresist compounding step (S10) is a process of blending an oil agent, a photosensitizer, a dye, and water, so that these mixtures are filtered and left for 8 hours.
그리고, 도포 및 건조공정(S20)은 스크린을 수직 내지 10도 정도 경사지게 하여 사장된 스크린사에 감광액을 균일하게 1차 도포한 후, 온도, 습도, 시간, 풍속 등을 적절히 조절하여 건조시키는 공정이다. In addition, the coating and drying step (S20) is a step of inclining the screen vertically to about 10 degrees and uniformly applying the photoresist to the still-screen screen yarn, and then controlling temperature, humidity, time, wind speed, and the like to appropriately dry the screen. .
그리고, 상기 노광공정(S30)은 감광액을 도포한 스크린사에 제도원판을 밀착시키고 감광시켜 날염호의 체류부분의 감광막을 불용화시키는 공정이다. 노광시간의 결정은 사의 규격, 인날면적, 광원의 종류 및 강약, 광원과 피사체간의 거리 등이 따라 달라지게 된다.In addition, the exposure step (S30) is a step of insolubilizing the photoresist film in the retention portion of the printing arc by bringing the drawing disc into close contact with the screen yarn coated with the photoresist. Determination of the exposure time depends on the size of the yarn, the area of the edge, the type and intensity of the light source, and the distance between the light source and the subject.
그리고, 상기 현상공정(S40)은 노광 완료후 미감광 부분을 물로써 용해하여 제거하고 무늬를 나타내는 공정이다.In addition, the developing step (S40) is a step of dissolving and removing the unsensitized part with water after the completion of exposure and displaying a pattern.
그리고, 보강공정(S50)은 감광액의 도포만으로는 피막의 내구성이 약하여 글리옥살(glyoxal), 우레탄(uethane)과 같은 수지로 이루어진 보강제를 2차 피막하여 내구성을 향상시키는 공정이다.In addition, the reinforcing step (S50) is a step of improving the durability by coating the reinforcing agent made of a resin such as glyoxal (glyoxal), urethane (urethane) by only the application of the photosensitive liquid is weak durability.
상기 보강공정(S50) 후, 건조 및 열처리 공정을 수행하여 평판 스크린을 완성하게 된다. After the reinforcing step (S50), the drying and heat treatment process is performed to complete the flat screen.
상기한 바와 같은 종래기술은 1차 감광액의 도포만으로는 내구성이 떨어지기 때문에 1차 감광액 도포 후 보강제(hardener)를 2차 도포하여 화학적인 가교반응을 통해 피막강도를 보완하는 2액형 감광유제 방식이 사용되고 있다.In the prior art as described above, since the durability of the first photoresist is poor, only a two-part photosensitive emulsion method is used to supplement the film strength through chemical crosslinking by applying a second reinforcing agent after applying the first photoresist. have.
그러나, 상기한 바와 같은 종래기술은 보강제를 사용한 2차 피막형성 공정으로 인해, 공정이 복잡해지고 공정에 많은 시간이 소요되는 문제가 있었다.However, the prior art as described above has a problem in that the process is complicated and takes a long time due to the secondary film forming process using the reinforcing agent.
실제, 보강공정(S50)을 수행하는데 전체공정의 1/3정도(약 40～50분)의 시간이 소요되고 있는 실정이다.In fact, it takes about 1/3 of the time (about 40-50 minutes) to perform the reinforcement process (S50).
이와 같은 종래기술은, 평판 스크린의 제조공정을 지연시켜 생산성이 떨어지기 때문에 날염틀(frame) 즉, 평판 스크린을 적기에 공급하기 어려워지는 문제가 있었다.Such a prior art has a problem that it becomes difficult to supply a printing frame, that is, a flat screen in a timely manner, because productivity is reduced by delaying the manufacturing process of the flat screen.
또한, 종래기술은 회수된 보강제(hardener)에는 많은 양의 기포가 포함되어 있고, 경화된 상태에서 회수됨에 따라, 재사용이 불가능하기 때문에 대부분 폐기 처분하게 되는데, 이로 인한 자원 손실 및 금전적 손실이 큰 문제가 있었다.In addition, in the prior art, the recovered hardener contains a large amount of bubbles, and as it is recovered in a hardened state, most of them are disposed of because they cannot be reused, resulting in large resource loss and financial loss. There was.
또한, 종래기술은 미감광 부분의 불필요한 보강제(hardener)의 완벽한 제거가 어렵고, 재부착으로 인한 형 막힘 등으로 인해 첨예성이 떨어져, 제품의 품질이 저하되는 문제가 있었다.In addition, the prior art has a problem in that it is difficult to completely remove the unnecessary hardener of the unsensitized portion, sharpness due to clogging due to reattachment, and the quality of the product is deteriorated.
또한, 종래기술은 보강제의 사용으로 인한, 인체 유독 물질인 포르말린은 물론, 이소시아네이트, 글로옥살(glyoxal)과 같은 폐수를 발생시켜 환경을 파괴의 요인을 갖는 문제가 있었다.In addition, the prior art has a problem of causing environmental damage by generating wastewater, such as isocyanate, glyoxal, as well as formalin, which is a human toxic substance due to the use of a reinforcing agent.
또한, 종래기술은, 2차에 걸친 피막형성 공정으로 인해 피막의 두께가 일정치 않아 세선(細線)이 많은 디자인 작업시 어려움이 있었고, 이로 인해 제품의 경쟁력이 떨어지는 문제가 있었다.In addition, the prior art, the thickness of the film is not constant due to the second film forming process, there was a difficulty in design work with a lot of fine wires, there was a problem that the product competitiveness is low.
종래기술의 문제점을 해결하기 위해 안출된 본 발명의 목적은, 감광액 도포와 노광만으로 충분한 내구성을 가진 피막을 형성하기 위한 일액(一液)형 감광유제를 제안함과 아울러, 기존 공정시간의 1/3을 차지하는 스크린 보강(hardening)공정을 생략할 수 있도록 하는 평판 스크린 제조방법을 제공함에 있다.An object of the present invention devised to solve the problems of the prior art is to propose a one-liquid photosensitive emulsion for forming a film having sufficient durability only by applying and exposing the photoresist, and in addition to 1/1 of the existing process time. It is to provide a flat screen screen manufacturing method that can omit the screen hardening process that occupies three.
상기한 본 발명의 목적을 달성하기 위한 스크린 제판용 일액형 감광유제는, 폴리비닐알코올(PVA) 5~20중량%, 에탄올, 이소프로필알코올(IPA), 메틸메타아크릴레이트(MMA), 비닐아세테이트 모노머(VAM), 아세틱엑시드(AAc), 이소부티로니트릴(AIBN)을 반응조에 투입하고 반응조건 65~70℃에서 3시간 반응하여 제조된 폴리비닐아세테이트(PVAc) 20~40중량%, 에틸렌비닐아세테이트(EVA) 20~40중량%, 흡수파장이 340㎚~450㎚인 디아조퀴논계, 디아조페닐아민계, 벤조퀴논계, 중크롬산염계로 이루어진 군에서 선택된 1종의 UV경화형 감광제 0.5~1중량%, 염료 0.5~1중량% 및 정제수 5~30중량%로 이루어지는 것을 특징으로 한다. One-component photosensitive emulsion for screen making to achieve the above object of the present invention, polyvinyl alcohol (PVA) 5 to 20% by weight, ethanol, isopropyl alcohol (IPA), methyl methacrylate (MMA), vinyl acetate 20-40% by weight of polyvinylacetate (PVAc) prepared by adding monomer (VAM), acetic acid (AAc) and isobutyronitrile (AIBN) to a reaction tank and reacting at 65 to 70 ° C for 3 hours. Vinyl acetate (EVA) 20 to 40% by weight, one or more UV-curable photosensitive agent selected from the group consisting of diazoquinone-based, diazophenylamine-based, benzoquinone-based, dichromate-based having an absorption wavelength of 340nm ~ 450nm 0.5 ~ 1 It is characterized by consisting of 5% to 30% by weight, 0.5% to 1% by weight of the dye and purified water.
상기 본 발명의 목적 달성을 위한 스크린 제판용 고성능 일액형 감광유제를 이용한 평판 스크린 제조방법에 대해 설명하면, 폴리비닐알코올(PVA) 5~20중량%, 에탄올, 이소프로필알코올(IPA), 메틸메타아크릴레이트(MMA), 비닐아세테이트 모노머(VAM), 아세틱엑시드(AAc), 이소부티로니트릴(AIBN)을 반응조에 투입하고 반응조건 65~70℃에서 3시간 반응하여 제조된 폴리비닐아세테이트(PVAc) 20~40중량%, 에틸렌비닐아세테이트(EVA) 20~40중량%, 흡수파장이 340㎚~450㎚인 디아조퀴논계, 디아조페닐아민계, 벤조퀴논계, 중크롬산염계로 이루어진 군에서 선택된 1종의 UV 경화형 감광제 0.5~1중량%, 염료 0.5~1중량%로 이루어진 혼합물에 정제수 5~30중량% 범위 내로 배합 조정하여 감광유제를 제조하는 감광액 조정공정(s110); 상기 제조된 감광유제를 스크린에 피막두께는 9~12㎛로 피막을 형성하고, 35~40℃ 분위기에서 10분간 건조하는 도포 및 건조공정(s120); 상기 감광유제가 도포된 스크린에 제도원판을 밀착시키고 감광시켜 날염호의 체류부분의 감광막을 불용화시키는 노광공정(s130); 및 상기 노광 완료 후, 미감광된 부분을 물로써 용해하여 제거하고 무늬를 나타내는 현상공정(s140)을 포함한다. Referring to a flat screen manufacturing method using a high performance one-component photosensitive emulsion for screen making for achieving the object of the present invention, polyvinyl alcohol (PVA) 5-20% by weight, ethanol, isopropyl alcohol (IPA), methyl meth Polyvinylacetate (PVAc) prepared by adding acrylate (MMA), vinyl acetate monomer (VAM), acetic acid (AAc) and isobutyronitrile (AIBN) to the reaction tank and reacting at 65 to 70 ° C for 3 hours. ) 20-40% by weight, 20-40% by weight of ethylene vinyl acetate (EVA), diazona quinone-based, diazophenylamine-based, benzoquinone-based, dichromate-based having an absorption wavelength of 340nm ~ 450nm 1 UV-curable photosensitizer 0.5 ~ 1% by weight, the mixture consisting of 0.5 ~ 1% by weight of the mixture in the range of 5-30% by weight of purified water in the photosensitive solution adjusting process for producing a photosensitive emulsion (s110); A coating and drying step of forming a film having a film thickness of 9 to 12 μm on the screen of the prepared emulsion, and drying for 10 minutes in an atmosphere of 35 to 40 ° C. (s120); An exposure step (s130) of insolubilizing the photoresist film of the remaining portion of the printing foil by bringing the drawing disc into close contact with the screen to which the photosensitive emulsion is applied and photosensitive; And a developing step (s140) of dissolving and removing unexposed portions with water and displaying a pattern after completion of the exposure.
삭제delete
삭제delete
또한, 상기 노광공정은, 3㎾의 메탈 할로겐 램프를 피사체로부터 95㎝ 이격시킨 상태에서 60~90초 동안 실시하는 것이 바람직하다.In addition, the exposure step is preferably performed for 60 to 90 seconds in a state in which the metal halide lamp of 3 ㎾ 95 cm away from the subject.
그리고, 상기 현상공정은 50∼60℃의 온수에서 시행되도록 하는 것이 바람직하다.In addition, the developing step is preferably carried out in hot water of 50 ~ 60 ℃.
삭제delete
본 발명은 일액(一液)형 감광유제의 사용으로 인한 평판 스크린 제조공정의 단축 및 에너지 감소에 따른 비용 절감이 가능하고, 이로 인한 가격 경쟁력을 확보하게 되는 효과를 갖는다.The present invention can reduce the cost due to the shortening of the flat screen manufacturing process and the reduction of energy due to the use of a one-component photosensitive emulsion, thereby securing a price competitiveness.
상기한 본 발명은 기존의 평판 스크린 제작 시간을 줄여서 생산 납기를 단축할 수 있고, 소롯트화에 의한 능동적이고 빠른 대처가 가능하며, 다품종 생산이 가능한 효과를 갖는다.The present invention described above can shorten the production time by reducing the existing flat screen production time, it is possible to cope with active and fast by the small lot, has the effect that can produce a variety of varieties.
또한, 본 발명은 종래기술에 비하여 인체 유해 물질을 사용하지 않아 폐수 발생률을 현저히 감소시킴으로써, 친환경적인 효과를 갖게 된다.In addition, the present invention significantly reduces the waste water generation rate by not using a harmful substance to human body, compared to the prior art, it has an environmentally friendly effect.
이하, 본 발명의 바람직한 실시 예에 따른 스크린 제판용 고성능 일액형 감광유제 및 이를 이용한 평판 스크린 제조방법에 대해 첨부된 도면을 참조하여 설명하면 다음과 같다.
이하에서 사용되는 약어를 정리하면 다음과 같으며, 이하에서는 하기의 약어를 사용한다.
PVA : 폴리비닐알코올(Polyvinyl alcohol)
PVAc : 폴리비닐아세테이트(Polyvinyl acetate)
EVA : 에틸렌비닐 아세테이트(Ethylene-vinyl acetate)
IPA : 이소프로필알코올(Isopropyl alcohol)
MMA : 메틸메타크릴레이트(Methyl Methacrylate)
VAM : 비닐아세테이트모노머(Vinyl acetate monomer)
AAc : 아세틱엑시드(Acetic acid)
AIBN : 이소부티로니트릴(Isobutyronitrile(2,2'-azo-bis))Hereinafter, with reference to the accompanying drawings, a high performance one-component photosensitive emulsion for screen making and a flat screen manufacturing method using the same according to an embodiment of the present invention will be described.
The abbreviation used below is summarized as follows, and the following abbreviation is used.
PVA: Polyvinyl alcohol
PVAc: Polyvinyl Acetate
EVA: Ethylene-vinyl acetate
IPA: Isopropyl alcohol
MMA: Methyl Methacrylate
VAM: Vinyl Acetate Monomer
AAc: Acetic acid
AIBN: Isobutyronitrile (2,2'-azo-bis)
도 2는 본 발명에 따른 스크린 제판용 고성능 일액형 감광유제를 이용한 평판 스크린 제조방법을 설명하기 위한 공정도이다.Figure 2 is a process chart for explaining a flat screen manufacturing method using a high performance one-component photosensitive emulsion for screen making according to the present invention.
동 도면에서 보는 바와 같은 본 발명은 크게 감광액 조정공정(s110)과, 도포 및 건조공정(s120)과, 노광공정(s130), 및 현상공정(s140)을 포함한다.The present invention as shown in the figure largely includes a photosensitive liquid adjusting step (s110), the coating and drying step (s120), the exposure step (s130), and the developing step (s140).
상기 감광액 조정공정(s110)은 PVA, PVAc, EVA등의 폴리머(polymer)를 주재료로 하여, 감광제, 계면활성제, 염료, 물을 적정 혼합비율로 배합하여 감광유제를 제조하는 공정에 관한 것으로서, 상기 폴리머(polymer)의 중합조건 및 각 원료의 적정 혼합비율에 따라 수세성, 감광강도와 같은 물성을 만족하도록 하며, 제판 강도를 향상시키는 것이 가능하게 된다.The photoresist adjusting step (s110) relates to a process of preparing a photoresist by blending a photosensitive agent, a surfactant, a dye, and water at an appropriate mixing ratio, using a polymer such as PVA, PVAc, EVA as a main material. According to the polymerization conditions of the polymer and the appropriate mixing ratio of each raw material, it is possible to satisfy the physical properties such as water washing and photosensitive strength, and to improve the plate making strength.
상기 감광액 조정공정(s110)에 따른 감광유제의 바람직한 조성에 대해 설명하면, PVA 5~20중량%, PVAc 20~40중량%, EVA 20~40중량%, 감광제 0.5~1중량%, 염료 0.5~1중량%, 정제수를 5~30중량%로 이루어질 수 있다.Referring to the preferred composition of the photosensitive emulsion according to the photosensitive liquid adjusting step (s110), PVA 5-20% by weight, PVAc 20-40% by weight, EVA 20-40% by weight, photosensitive agent 0.5-1% by weight, dye 0.5- 1% by weight, purified water may be composed of 5 to 30% by weight.
이때, 상기 PVA 5~20중량%, PVAc 20~40중량%, EVA 20~40중량%, 감광제 0.5~1중량%, 염료 0.5~1중량%의 배합비를 고정하고, 정제수의 함량을 5~30중량% 내에서 조정함으로써, 작업성이 조정되도록 할 수 있다.At this time, the blending ratio of the PVA 5-20% by weight, PVAc 20-40% by weight, EVA 20-40% by weight, photosensitive agent 0.5-1% by weight, dye 0.5-1% by weight, and the content of purified water 5-30 By adjusting within weight%, workability can be adjusted.
여기서, 상기 PVA는 감광 주재료로서, UV 감광제와 함께 노광단계에서 경화되어 스크린 코팅막의 강도에 영향을 주며, 현상단계에서는 코팅막의 제거에 영향을 주게 된다.Here, the PVA is a photosensitive main material, which is cured in the exposure step together with the UV photosensitive agent to affect the strength of the screen coating film, and in the developing step affects the removal of the coating film.
이때, PVA 사용량이 증가하면 수세성이 증대되나, 과다투입(20중량% 이상)시 감광 감도를 저하시키게 된다.At this time, when the amount of PVA used is increased, the water washability is increased, but the photosensitive sensitivity is lowered at the time of excessive injection (20% by weight or more).
그리고, 상기 PVAc는 자체 중합한 폴리머(polymer)로서, 주원료는 에탄올(ethanol), IPA, MMA, VAM, AAc, AIBN을 반응조에 투입하고 반응조건 65~70℃에서 3시간 반응하여 제조하는데, PVA 사용량 증가에 대한 감광감도 저하를 개선시키는 역할을 수행하게 된다.In addition, the PVAc is a self-polymerized polymer, the main raw material is prepared by adding ethanol, IPA, MMA, VAM, AAc, AIBN into the reaction tank and reacting for 3 hours at 65 ~ 70 ℃ reaction conditions, PVA It will play a role to improve the decrease in sensitivity to the increase in usage.
그리고, 상기 EVA는 제판된 코팅막의 강도 및 내구성 증가에 영향을 미치게 되는데, 과다투입(40중량% 이상)시 감광감도 저하, 수세성 저하 등의 문제를 유발시키게 된다.In addition, the EVA affects the increase in strength and durability of the plated coating film, which causes problems such as deterioration in photosensitivity and flushing upon excessive injection (40 wt% or more).
그리고, 상기 감광제는 UV 경화형 감광제가 사용되는데, 디아조퀴논계, 디아조페닐아민계, 벤조페논계, 중크롬산염계가 사용될 수 있으며, 흡수파장이 340nm~450nm인 것을 사용하는 것이 바람직하다.In addition, the photosensitive agent is a UV curing photosensitive agent is used, diazoquinone-based, diazophenylamine-based, benzophenone-based, dichromate-based may be used, it is preferable to use the absorption wavelength of 340nm ~ 450nm.
상기한 바와 같은 본 발명의 감광유제의 조성에 계면활성제를 첨가하여 미노광부의 수세성을 증가시키도록 할 수도 있다.The surfactant may be added to the composition of the photosensitizer of the present invention as described above to increase the water washing property of the unexposed part.
상기한 감광액 조정공정(s110)이 끝나게 되면, 도포 및 건조공정(s120)을 수행하게 된다.When the photosensitive liquid adjusting process (s110) is finished, the coating and drying process (s120) is performed.
상기 도포 및 건조공정(s120)은 감광유제를 스크린에 도포하여 피막을 형성한 후 건조시키는 공정으로서, 피막두께는 9~12㎛로 형성하는 것이 바람직하고, 건 조조건은 35~40℃ 분위기에서 10분간 이루어지도록 하는 것이 바람직하다.The coating and drying step (s120) is a step of coating the photosensitive emulsion on a screen to form a film and drying the film. The film thickness is preferably 9 to 12 μm, and the drying conditions are in a 35 to 40 ° C. atmosphere. It is preferable to make it for 10 minutes.
상기 도포 및 건조공정(s120)이 완료되고 나면, 노광공정(s130)을 수행하도록 한다.After the coating and drying process (s120) is completed, to perform the exposure process (s130).
상기 노광공정(s130)은, 감광유제가 도포된 스크린에 제도원판을 밀착시키고 감광시켜 날염호의 체류부분의 감광막을 불용화시키는 공정이다.The exposure step (s130) is a step of insolubilizing the photoresist film in the retention portion of the printing arc by bringing the drawing disc into close contact with the screen on which the photosensitive oil is applied and then exposing it.
이때, 노광조건은 스크린 사의 규격, 인날면적, 광원의 종류, 광원의 강약, 광원과 피사체 간의 거리, 노광시간 등에 따라 달라지게 되는데, 바람직한 예로서, 3㎾의 메탈 할로겐 램프를 피사체로부터 95㎝ 이격시킨 상태에서 60~90초 동안 실시할 수 있다.In this case, the exposure conditions vary depending on the screen specifications, the area of the edge, the type of light source, the intensity of the light source, the distance between the light source and the subject, the exposure time, etc. As a preferred example, a 3 메탈 metal halogen lamp is spaced 95 cm from the subject. It can be carried out for 60 to 90 seconds.
상기 노광공정(s130)이 완료되고 나면, 현상공정(s140)을 수행하도록 한다.After the exposure process s130 is completed, the developing process s140 is performed.
상기 현상공정(s140)은 노광 완료 후, 미감광된 부분을 물로써 용해하여 제거하고 무늬를 나타내는 공정으로서, 50∼60℃의 온수에서 시행하는 것이 바람직하다.The developing step (s140) is a step of dissolving and removing the unsensitized part with water after the completion of the exposure, and displaying a pattern. Preferably, the developing step (s140) is performed in hot water at 50 to 60 ° C.
상기와 같은 공정으로 제조된 평판 스크린은 건조 및 검사과정을 거쳐 출시되도록 한다.Flat screen manufactured by the above process is to be released through the drying and inspection process.
본 발명은 날염공정에 필요한 도구인 평판 스크린 제조함에 있어서, 종래기 술에서의 하드닝 처리공정을 생략함으로써, 생산 효율을 높이는 동시에 에너지를 절약하게 된다.In the present invention, in manufacturing a flat screen, which is a tool necessary for a printing process, by eliminating the hardening treatment process in the prior art, it is possible to increase the production efficiency and save energy.
또한, 이로 인하여 날염 생산의 원가를 낮춰 제품 경쟁력을 키울 수 있고, 기존의 하드닝 처리공정의 보강제(hardener)에 첨가되는 포르말린 등의 인체 유해 물질을 사용하지 않는 환경 친화적인 이점을 갖게 된다.In addition, this lowers the cost of printing production to increase product competitiveness, and has an environmentally friendly advantage of not using a harmful substance such as formalin added to the hardener of the existing hardening treatment process (hardener).
도 1은 종래기술에 따른 평판 스크린 제조방법을 설명하는 공정도.1 is a process chart illustrating a flat screen manufacturing method according to the prior art.
도 2는 본 발명에 따른 스크린 제판용 고성능 일액형 감광유제를 이용한 평판 스크린 제조방법을 설명하기 위한 공정도.Figure 2 is a process chart for explaining a flat screen manufacturing method using a high performance one-component photosensitive emulsion for screen making according to the present invention.
Claims (7)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020090053201A KR100947372B1 (en) | 2009-06-16 | 2009-06-16 | High performance photo sensitive resin for flat screen and method for producing screen using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020090053201A KR100947372B1 (en) | 2009-06-16 | 2009-06-16 | High performance photo sensitive resin for flat screen and method for producing screen using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR100947372B1 true KR100947372B1 (en) | 2010-03-15 |
Family
ID=42183290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020090053201A KR100947372B1 (en) | 2009-06-16 | 2009-06-16 | High performance photo sensitive resin for flat screen and method for producing screen using the same |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100947372B1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102050971A (en) * | 2011-01-13 | 2011-05-11 | 广东日丰电缆股份有限公司 | Flame-retardant thermosetting nitrile/polyvinyl chloride (PVC) rubber for wires and cables |
| KR101043695B1 (en) | 2010-03-25 | 2011-06-24 | 신인찬 | Silk-screen printing porcelain enamel color directry manufacturing methods |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5785048A (en) * | 1980-11-17 | 1982-05-27 | Daicel Chem Ind Ltd | Exposed photosensitive diazo film for making screen plate |
| KR910003443A (en) * | 1989-07-28 | 1991-02-27 | 아이리인 티이 브라운 | Photosensitive Screen Printing Compositions and Methods of Forming Images thereby |
| JPH06219072A (en) * | 1992-10-27 | 1994-08-09 | Saati Spa | Production of cloth with emulsion previously applied for printing assembly and production system |
| JPH07325399A (en) * | 1994-05-30 | 1995-12-12 | Shinsei:Kk | Photosensitive emulsion |
-
2009
- 2009-06-16 KR KR1020090053201A patent/KR100947372B1/en active IP Right Grant
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5785048A (en) * | 1980-11-17 | 1982-05-27 | Daicel Chem Ind Ltd | Exposed photosensitive diazo film for making screen plate |
| KR910003443A (en) * | 1989-07-28 | 1991-02-27 | 아이리인 티이 브라운 | Photosensitive Screen Printing Compositions and Methods of Forming Images thereby |
| JPH06219072A (en) * | 1992-10-27 | 1994-08-09 | Saati Spa | Production of cloth with emulsion previously applied for printing assembly and production system |
| JPH07325399A (en) * | 1994-05-30 | 1995-12-12 | Shinsei:Kk | Photosensitive emulsion |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101043695B1 (en) | 2010-03-25 | 2011-06-24 | 신인찬 | Silk-screen printing porcelain enamel color directry manufacturing methods |
| CN102050971A (en) * | 2011-01-13 | 2011-05-11 | 广东日丰电缆股份有限公司 | Flame-retardant thermosetting nitrile/polyvinyl chloride (PVC) rubber for wires and cables |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1211836C (en) | Method for smaller pattern by thermal constraction of water-soluble resin coating on photoresist | |
| CN1385757A (en) | Antireflection coating composition | |
| CN108490738B (en) | Black matrix material composition and manufacturing method of black matrix | |
| WO2014157737A1 (en) | Process for producing polarizing film | |
| WO1992009011A1 (en) | Photosensitive resin composition and photosensitive element structure | |
| CN101464631A (en) | Photosensitive resin composition with good stripper-resistance for color filter and color filter formed using the same | |
| KR100947372B1 (en) | High performance photo sensitive resin for flat screen and method for producing screen using the same | |
| JPH10268515A (en) | Photosensitive colored composition and manufacture of color filter | |
| TW200923575A (en) | Radiation-sensitive resin composition for forming colored layer and color filter | |
| JP2017003911A (en) | Photosensitive resin composition, photosensitive film, plate material for screen printing and photosensitive resist film | |
| KR100614400B1 (en) | Photoresist composition with good anti-chemical properties | |
| KR20060038930A (en) | Positive type photosensitive resin composition | |
| JP2006240011A (en) | Mesh for screen printing and original plate for screen printing formed by using this | |
| EP0260712B1 (en) | Method for making a relief pattern of a cured resin on a transparent colored layer | |
| JP6459741B2 (en) | Manufacturing method of polarizing element and manufacturing method of display device provided with polarizing element obtained by using the method | |
| CN107450281A (en) | A kind of printing down technique of accurate high quality | |
| JP2000019729A (en) | Visible light setting resin composition and application thereof | |
| JPH0836260A (en) | Black photosensitive resin composition | |
| JP2000107678A (en) | Black matrix substrate and its production | |
| JP7451270B2 (en) | Method for processing radiation-sensitive compositions | |
| JP4467048B2 (en) | Method for producing flexographic printing plate | |
| JP4320815B2 (en) | Manufacturing method of color filter | |
| JPH10333334A (en) | Photosensitive colored composition and color filter using same | |
| JP2006330168A (en) | Photosensitive element, resist pattern forming method using the same and method for producing printed wiring board | |
| CN110824841A (en) | Method for improving yield of wafer edge device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| A302 | Request for accelerated examination | ||
| E902 | Notification of reason for refusal | ||
| E90F | Notification of reason for final refusal | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| FPAY | Annual fee payment |
Payment date: 20130305 Year of fee payment: 4 |
|
| FPAY | Annual fee payment |
Payment date: 20140304 Year of fee payment: 5 |
|
| FPAY | Annual fee payment |
Payment date: 20150305 Year of fee payment: 6 |
|
| FPAY | Annual fee payment |
Payment date: 20160224 Year of fee payment: 7 |
|
| FPAY | Annual fee payment |
Payment date: 20170303 Year of fee payment: 8 |
|
| FPAY | Annual fee payment |
Payment date: 20190226 Year of fee payment: 10 |