KR100804714B1 - 도금장치 및 방법 - Google Patents
도금장치 및 방법 Download PDFInfo
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- KR100804714B1 KR100804714B1 KR1020010013628A KR20010013628A KR100804714B1 KR 100804714 B1 KR100804714 B1 KR 100804714B1 KR 1020010013628 A KR1020010013628 A KR 1020010013628A KR 20010013628 A KR20010013628 A KR 20010013628A KR 100804714 B1 KR100804714 B1 KR 100804714B1
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/004—Sealing devices
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/04—Removal of gases or vapours ; Gas or pressure control
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
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- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
- C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
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Abstract
Description
고정 유지 부재(54)에는 가동 유지 부재(54)의 주변부에 위치하도록 역 L 자 형상의 포올(66)이 원주방향을 따라 등간격으로 세워 설치되어 있다. 한편, 조임링(62)의 바깥 둘레면에는 복수의 돌기부(68)가 등간격으로 일체로 성형되어 있음과 동시에 이것을 회전시키기 위한 약간 긴 구멍으로 한 통기구멍(62b)이 도면에서는 3개소에 설치되어 있다. 여기서 상기 돌기부(68)의 상면 및 포올(66)의 하면은 회전방향을 따라 서로 역방향으로 경사지는 테이퍼면으로 되어 있다.
Claims (81)
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- 기판을 수납한 카세트를 탑재하는 카세트 테이블과,기판의 끝부 및 이면을 기밀하게 밀봉하여 표면을 노출시켜 유지하는 개폐 자유로운 기판홀더와,상기 기판홀더를 얹어 놓고 기판의 착탈을 행하는 기판 착탈부와,상기 카세트 테이블과 상기 기판 착탈부 사이에서 기판을 반송하는 기판 반송장치와,기판을 수직으로 세워 상기 기판홀더와 함께 수납하여 밑으로부터 도금액을 주입하여 애노드와 대면하는 기판의 표면에 도금을 실시하는 도금 탱크와,상기 기판홀더를 파지하여 승강 자유로운 반송기를 구비하고, 상기 기판 착탈부와 상기 도금 탱크 사이에서 상기 기판홀더를 반송하는 기판홀더 반송장치를 가지는 것을 특징으로 하는 도금장치.
- 제 6항에 있어서,상기 도금 탱크는 예를 들면 내부에 1매의 기판을 수납하여 도금을 실시하도록 한 복수의 도금 유닛을 내부에 공전해용 전극을 배치한 오버플로우 탱크 내에 수납하여 구성되어 있는 것을 특징으로 하는 도금장치.
- 제 7항에 있어서,상기 각 도금 유닛의 내부에 상기 애노드와 기판 사이에 위치하여 도금액을 교반하는 퍼들을 왕복이동 자유롭게 배치한 것을 특징으로 하는 도금장치.
- 제 8항에 있어서,상기 기판홀더 반송장치의 상기 도금 탱크를 사이에 끼운 반대측에 상기 퍼들을 구동하는 퍼들 구동장치를 배치한 것을 특징으로 하는 도금장치.
- 제 6항에 있어서,다른 종류의 도금을 행하는 도금 탱크를 구비하고, 이들 각 도금 탱크는 각 도금을 행하는 도금 유닛을 각 오버플로우 탱크 내에 각각 수납하여 구성되어 있는 것을 특징으로 하는 도금장치.
- 제 10항에 있어서,상기 도금 유닛의 내부에 상기 애노드와 기판 사이에 위치하여 도금액을 교반하는 퍼들을 왕복이동 자유롭게 배치한 것을 특징으로 하는 도금장치.
- 제 11항에 있어서,상기 기판홀더 반송장치의 상기 도금 탱크를 사이에 두고 반대측에 상기 퍼들을 구동하는 퍼들 구동장치를 배치한 것을 특징으로 하는 도금장치.
- 제 6항에 있어서,상기 도금 탱크의 일 측면을 따른 위치에 국소 배기덕트를 설치한 것을 특징으로 하는 도금장치.
- 제 6항에 있어서,상기 기판 착탈부와 도금 탱크 사이에 상기 기판홀더를 세로놓기로 수납하는 스토커를 배치하고, 상기 기판홀더 반송장치는 제 1 반송기와 제 2 반송기를 가지는 것을 특징으로 하는 도금장치.
- 제 14항에 있어서,상기 기판 착탈부는 상기 기판홀더에 기판을 장착하였을 때의 상기 기판과 접점과의 접촉상태를 확인하는 센서를 구비하고, 상기 제 2 반송기는 상기 기판과 접점과의 접촉상태가 양호한 것만을 다음 공정으로 반송하는 것을 특징으로 하는 도금장치.
- 제 14항에 있어서상기 기판홀더 반송장치는 상기 반송기의 이동방식으로서 리니어 모터 방식을 채용하고 있는 것을 특징으로 하는 도금장치.
- 제 14항에 있어서,상기 스토커와 상기 도금 탱크 사이에 프리습식 탱크, 블로우 탱크 및 수세 탱크를 배치한 것을 특징으로 하는 도금장치.
- 제 17항에 있어서,상기 기판 착탈부는 상기 기판홀더에 기판을 장착하였을 때의 상기 기판과 접점과의 접촉상태를 확인하는 센서를 구비하고, 상기 제 2 반송기는 상기 기판과 접점과의 접촉상태가 양호한 것만을 다음 공정으로 반송하는 것을 특징으로 하는 도금장치.
- 제 17항에 있어서,상기 기판홀더 반송장치는 상기 반송기의 이동방식으로서 리니어 모터 방식을 채용하고 있는 것을 특징으로 하는 도금장치.
- 제 6항에 있어서,상기 기판 착탈부는 상기 기판홀더를 2개 가로방향으로 슬라이드 자유롭게 병렬하여 얹어 놓을 수 있도록 구성되어 있는 것을 특징으로 하는 도금장치.
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- 제 17항에 있어서,상기 기판은 기판홀더에 유지되어 상기한 도금, 세정 및 건조처리가 실시되는 것을 특징으로 하는 도금장치.
- 제 26항에 있어서,상기 기판홀더로부터 인출한 도금 후의 기판을 세정하는 세정장치를 더 구비하는 것을 특징으로 하는 도금장치.
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- 제 6항에 있어서,상기 도금 탱크의 내부에는 캐소드가 되는 기판과 이 기판과 대면하는 애노드와의 사이에 위치하여 레귤레이션 플레이트가 배치되어 있는 것을 특징으로 하는 도금장치.
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- 제 17항에 있어서,상기 프리습식 탱크에서 프리 습식처리에 사용된 액을 탈기하는 탈기장치를 더 구비한 것을 특징으로 하는 도금장치.
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- 카세트로부터 인출한 기판을 기판홀더로 유지하는 공정과,상기 기판홀더로 유지한 기판에 프리습식 처리를 실시하는 공정과,상기 프리습식 처리 후의 기판을 기판홀더별로 도금액 중에 침지시켜 기판의 표면에 도금을 실시하는 공정과,상기 도금 후의 기판을 기판홀더별로 세정하는 공정과,상기 세정하는 공정 후의 기판을 기판홀더로부터 인출하여 기판만을 건조하는 공정을 가지는 것을 특징으로 하는 도금방법.
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- 제 70항에 있어서,상기 도금 후의 기판을, 세정처리 후에 상기 기판홀더별로 건조시키는 것을 특징으로 하는 도금방법.
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KR (1) | KR100804714B1 (ko) |
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Also Published As
Publication number | Publication date |
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TWI281516B (en) | 2007-05-21 |
EP2017374A3 (en) | 2011-04-27 |
KR20010090469A (ko) | 2001-10-18 |
JP3979847B2 (ja) | 2007-09-19 |
US20080245669A1 (en) | 2008-10-09 |
EP1229154A4 (en) | 2006-12-13 |
WO2001068952A1 (fr) | 2001-09-20 |
EP2017374A2 (en) | 2009-01-21 |
US20050082163A1 (en) | 2005-04-21 |
US7402227B2 (en) | 2008-07-22 |
US8012332B2 (en) | 2011-09-06 |
US20020027080A1 (en) | 2002-03-07 |
EP1229154A1 (en) | 2002-08-07 |
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