JPH11224946A5 - - Google Patents

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Publication number
JPH11224946A5
JPH11224946A5 JP1998039560A JP3956098A JPH11224946A5 JP H11224946 A5 JPH11224946 A5 JP H11224946A5 JP 1998039560 A JP1998039560 A JP 1998039560A JP 3956098 A JP3956098 A JP 3956098A JP H11224946 A5 JPH11224946 A5 JP H11224946A5
Authority
JP
Japan
Prior art keywords
region
impurity
semiconductor device
channel
conductivity type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998039560A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11224946A (ja
JP4236722B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP03956098A priority Critical patent/JP4236722B2/ja
Priority claimed from JP03956098A external-priority patent/JP4236722B2/ja
Priority to US09/246,014 priority patent/US6486014B1/en
Publication of JPH11224946A publication Critical patent/JPH11224946A/ja
Priority to US10/278,441 priority patent/US6624455B2/en
Priority to US10/667,899 priority patent/US7671425B2/en
Publication of JPH11224946A5 publication Critical patent/JPH11224946A5/ja
Application granted granted Critical
Publication of JP4236722B2 publication Critical patent/JP4236722B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP03956098A 1998-02-05 1998-02-05 半導体装置の作製方法 Expired - Fee Related JP4236722B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP03956098A JP4236722B2 (ja) 1998-02-05 1998-02-05 半導体装置の作製方法
US09/246,014 US6486014B1 (en) 1998-02-05 1999-02-04 Semiconductor device and method of manufacturing the same
US10/278,441 US6624455B2 (en) 1998-02-05 2002-10-22 Semiconductor device and method of manufacturing the same including drain pinned along channel width
US10/667,899 US7671425B2 (en) 1998-02-05 2003-09-23 Semiconductor device and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03956098A JP4236722B2 (ja) 1998-02-05 1998-02-05 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JPH11224946A JPH11224946A (ja) 1999-08-17
JPH11224946A5 true JPH11224946A5 (enExample) 2005-08-11
JP4236722B2 JP4236722B2 (ja) 2009-03-11

Family

ID=12556469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03956098A Expired - Fee Related JP4236722B2 (ja) 1998-02-05 1998-02-05 半導体装置の作製方法

Country Status (2)

Country Link
US (3) US6486014B1 (enExample)
JP (1) JP4236722B2 (enExample)

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US7245018B1 (en) * 1999-06-22 2007-07-17 Semiconductor Energy Laboratory Co., Ltd. Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof
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US8742481B2 (en) 2011-08-16 2014-06-03 Micron Technology, Inc. Apparatuses and methods comprising a channel region having different minority carrier lifetimes

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