JP5513305B2 - スルホニウム塩の製造方法およびそれによって製造されたスルホニウム塩 - Google Patents

スルホニウム塩の製造方法およびそれによって製造されたスルホニウム塩 Download PDF

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Publication number
JP5513305B2
JP5513305B2 JP2010178942A JP2010178942A JP5513305B2 JP 5513305 B2 JP5513305 B2 JP 5513305B2 JP 2010178942 A JP2010178942 A JP 2010178942A JP 2010178942 A JP2010178942 A JP 2010178942A JP 5513305 B2 JP5513305 B2 JP 5513305B2
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group
reaction
chemical formula
sulfonium salt
producing
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Japanese (ja)
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JP2011074064A (ja
Inventor
ジョン−ヒ ハン
ヒュン−サン ジョー
ジン−ボン シン
ジン−ホ キム
スン−ボ コ
スン−ジュン ユン
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Kumho Petrochemical Co Ltd
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Korea Kumho Petrochemical Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C303/00Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
    • C07C303/32Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of salts of sulfonic acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01Sulfonic acids
    • C07C309/02Sulfonic acids having sulfo groups bound to acyclic carbon atoms
    • C07C309/03Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C309/07Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton
    • C07C309/12Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F1/00Compounds containing elements of Groups 1 or 11 of the Periodic Table
    • C07F1/02Lithium compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
JP2010178942A 2009-10-01 2010-08-09 スルホニウム塩の製造方法およびそれによって製造されたスルホニウム塩 Active JP5513305B2 (ja)

Applications Claiming Priority (2)

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KR10-2009-0094100 2009-10-01
KR1020090094100A KR101115581B1 (ko) 2009-10-01 2009-10-01 술포니움 염의 제조 방법 및 이를 이용하여 제조된 술포니움 염

Publications (2)

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JP2011074064A JP2011074064A (ja) 2011-04-14
JP5513305B2 true JP5513305B2 (ja) 2014-06-04

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JP2010178942A Active JP5513305B2 (ja) 2009-10-01 2010-08-09 スルホニウム塩の製造方法およびそれによって製造されたスルホニウム塩

Country Status (5)

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JP (1) JP5513305B2 (ko)
KR (1) KR101115581B1 (ko)
CN (1) CN102030687B (ko)
SG (1) SG169935A1 (ko)
TW (1) TWI423951B (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6303507B2 (ja) * 2014-01-08 2018-04-04 宇部興産株式会社 非水電解液およびそれを用いた蓄電デバイス
JP6927176B2 (ja) * 2017-10-16 2021-08-25 信越化学工業株式会社 レジスト材料及びパターン形成方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3504542B2 (ja) * 1998-08-25 2004-03-08 三洋化成工業株式会社 5−スルホイソフタル酸ジグリコールエステル金属塩のグリコール溶液の製造方法
JP4103523B2 (ja) * 2002-09-27 2008-06-18 Jsr株式会社 レジスト組成物
US7304175B2 (en) * 2005-02-16 2007-12-04 Sumitomo Chemical Company, Limited Salt suitable for an acid generator and a chemically amplified resist composition containing the same
TWI394004B (zh) * 2005-03-30 2013-04-21 Sumitomo Chemical Co 適合作為酸產生劑之鹽及含有該鹽之化學放大型光阻組成物
JP5070802B2 (ja) * 2005-10-28 2012-11-14 住友化学株式会社 化学増幅型レジスト組成物の酸発生剤用の塩
CN1955846B (zh) * 2005-10-28 2011-12-07 住友化学株式会社 适合于酸生成剂的盐和含有该盐的化学放大型抗蚀剂组合物
KR101334631B1 (ko) * 2005-11-21 2013-11-29 스미또모 가가꾸 가부시키가이샤 산 발생제용으로 적합한 염 및 이를 함유하는 화학 증폭형레지스트 조성물
JP5374836B2 (ja) * 2006-06-09 2013-12-25 住友化学株式会社 化学増幅型レジスト組成物の酸発生剤用の塩
TWI421635B (zh) * 2006-06-09 2014-01-01 Sumitomo Chemical Co 適合作為酸產生劑之鹽及含該鹽之化學放大正型光阻組成物
JP2008024672A (ja) * 2006-07-24 2008-02-07 Lion Corp α―スルホ脂肪酸アルキルエステル塩の製造方法
JP2008290980A (ja) * 2007-05-25 2008-12-04 Tokyo Ohka Kogyo Co Ltd 化合物、酸発生剤、レジスト組成物およびレジストパターン形成方法
JP5145776B2 (ja) * 2007-05-31 2013-02-20 セントラル硝子株式会社 新規スルホン酸塩、スルホン酸オニウム塩及びスルホン酸誘導体とその製造方法
JP5347349B2 (ja) * 2007-09-18 2013-11-20 セントラル硝子株式会社 2−ブロモ−2,2−ジフルオロエタノール及び2−(アルキルカルボニルオキシ)−1,1−ジフルオロエタンスルホン酸塩類の製造方法
JP5681339B2 (ja) * 2007-10-02 2015-03-04 東京応化工業株式会社 化合物の製造方法
JP5124260B2 (ja) * 2007-12-21 2013-01-23 東京応化工業株式会社 化合物の製造方法
TWI403846B (zh) * 2008-02-22 2013-08-01 Tokyo Ohka Kogyo Co Ltd 正型光阻組成物,光阻圖型之形成方法及高分子化合物
JP5190352B2 (ja) * 2008-12-25 2013-04-24 住友化学株式会社 エステル化合物の製造方法及びエステル交換反応用触媒
JP2010222327A (ja) * 2009-03-25 2010-10-07 Sumitomo Chemical Co Ltd 塩の製造方法

Also Published As

Publication number Publication date
KR20110036432A (ko) 2011-04-07
TW201113246A (en) 2011-04-16
KR101115581B1 (ko) 2012-03-06
TWI423951B (zh) 2014-01-21
SG169935A1 (en) 2011-04-29
CN102030687A (zh) 2011-04-27
CN102030687B (zh) 2013-12-18
JP2011074064A (ja) 2011-04-14

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