JP4717344B2 - 誘電体薄膜素子、圧電アクチュエータおよび液体吐出ヘッド - Google Patents
誘電体薄膜素子、圧電アクチュエータおよび液体吐出ヘッド Download PDFInfo
- Publication number
- JP4717344B2 JP4717344B2 JP2003411167A JP2003411167A JP4717344B2 JP 4717344 B2 JP4717344 B2 JP 4717344B2 JP 2003411167 A JP2003411167 A JP 2003411167A JP 2003411167 A JP2003411167 A JP 2003411167A JP 4717344 B2 JP4717344 B2 JP 4717344B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- piezoelectric
- intermediate layer
- layer
- orientation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/079—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing using intermediate layers, e.g. for growth control
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/704—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
- H10N30/706—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings characterised by the underlying bases, e.g. substrates
- H10N30/708—Intermediate layers, e.g. barrier, adhesion or growth control buffer layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/03—Specific materials used
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
- H10N30/8554—Lead-zirconium titanate [PZT] based
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003411167A JP4717344B2 (ja) | 2003-12-10 | 2003-12-10 | 誘電体薄膜素子、圧電アクチュエータおよび液体吐出ヘッド |
TW93137804A TWI249437B (en) | 2003-12-10 | 2004-12-07 | Dielectric thin film element, piezoelectric actuator and liquid discharge head, and method for manufacturing the same |
US11/006,639 US7279825B2 (en) | 2003-12-10 | 2004-12-08 | Dielectric thin film element, piezoelectric actuator and liquid discharge head, and method for manufacturing the same |
CNB2004101002725A CN100374299C (zh) | 2003-12-10 | 2004-12-10 | 介电体薄膜元件、压电致动器、液体排出头及其制造方法 |
KR20040103936A KR100643825B1 (ko) | 2003-12-10 | 2004-12-10 | 유전체 박막 소자, 압전 액추에이터 및 액체 토출 헤드와그 제조 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003411167A JP4717344B2 (ja) | 2003-12-10 | 2003-12-10 | 誘電体薄膜素子、圧電アクチュエータおよび液体吐出ヘッド |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005175099A JP2005175099A (ja) | 2005-06-30 |
JP2005175099A5 JP2005175099A5 (enrdf_load_stackoverflow) | 2006-08-03 |
JP4717344B2 true JP4717344B2 (ja) | 2011-07-06 |
Family
ID=34650425
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003411167A Expired - Lifetime JP4717344B2 (ja) | 2003-12-10 | 2003-12-10 | 誘電体薄膜素子、圧電アクチュエータおよび液体吐出ヘッド |
Country Status (5)
Country | Link |
---|---|
US (1) | US7279825B2 (enrdf_load_stackoverflow) |
JP (1) | JP4717344B2 (enrdf_load_stackoverflow) |
KR (1) | KR100643825B1 (enrdf_load_stackoverflow) |
CN (1) | CN100374299C (enrdf_load_stackoverflow) |
TW (1) | TWI249437B (enrdf_load_stackoverflow) |
Cited By (2)
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---|---|---|---|---|
KR101305271B1 (ko) * | 2012-03-22 | 2013-09-06 | 한국기계연구원 | 자기전기 복합체 |
US9956774B2 (en) | 2015-12-17 | 2018-05-01 | Ricoh Company, Ltd. | Electromechanical transducer element, liquid discharge head, liquid discharge device, method for producing electromechanical transducer film, and method for producing liquid discharge head |
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EP1588437B1 (en) * | 2003-01-31 | 2011-12-14 | Canon Kabushiki Kaisha | Piezoelectric element |
TWI255057B (en) * | 2004-02-27 | 2006-05-11 | Canon Kk | Dielectric element, piezoelectric element, ink jet head and ink jet recording apparatus and manufacturing method of same |
JP2005244133A (ja) * | 2004-02-27 | 2005-09-08 | Canon Inc | 誘電体素子、圧電素子、インクジェットヘッド及びインクジェット記録装置、並びにこれらの製造方法 |
US7677696B2 (en) * | 2004-03-31 | 2010-03-16 | Canon Kabushiki Kaisha | Liquid discharge head |
US7497962B2 (en) * | 2004-08-06 | 2009-03-03 | Canon Kabushiki Kaisha | Method of manufacturing liquid discharge head and method of manufacturing substrate for liquid discharge head |
US7235917B2 (en) * | 2004-08-10 | 2007-06-26 | Canon Kabushiki Kaisha | Piezoelectric member element and liquid discharge head comprising element thereof |
JP5164052B2 (ja) * | 2005-01-19 | 2013-03-13 | キヤノン株式会社 | 圧電体素子、液体吐出ヘッド及び液体吐出装置 |
EP1717874B1 (en) * | 2005-04-28 | 2010-05-05 | Brother Kogyo Kabushiki Kaisha | Method of producing piezoelectric actuator |
JP4793568B2 (ja) * | 2005-07-08 | 2011-10-12 | セイコーエプソン株式会社 | アクチュエータ装置、液体噴射ヘッド及び液体噴射装置 |
US7998362B2 (en) * | 2005-08-23 | 2011-08-16 | Canon Kabushiki Kaisha | Piezoelectric substance, piezoelectric element, liquid discharge head using piezoelectric element, liquid discharge apparatus, and production method of piezoelectric element |
US7591543B2 (en) * | 2005-08-23 | 2009-09-22 | Canon Kabushiki Kaisha | Piezoelectric member, piezoelectric member element, liquid discharge head in use thereof, liquid discharge apparatus and method of manufacturing piezoelectric member |
US7528532B2 (en) * | 2005-08-23 | 2009-05-05 | Canon Kabushiki Kaisha | Piezoelectric substance and manufacturing method thereof, piezoelectric element and liquid discharge head using such piezoelectric element and liquid discharge apparatus |
US20070046153A1 (en) * | 2005-08-23 | 2007-03-01 | Canon Kabushiki Kaisha | Piezoelectric substrate, piezoelectric element, liquid discharge head and liquid discharge apparatus |
US7521845B2 (en) * | 2005-08-23 | 2009-04-21 | Canon Kabushiki Kaisha | Piezoelectric substance, piezoelectric element, liquid discharge head using piezoelectric element, and liquid discharge apparatus |
US8142678B2 (en) * | 2005-08-23 | 2012-03-27 | Canon Kabushiki Kaisha | Perovskite type oxide material, piezoelectric element, liquid discharge head and liquid discharge apparatus using the same, and method of producing perovskite type oxide material |
US7528530B2 (en) * | 2005-08-23 | 2009-05-05 | Canon Kabushiki Kaisha | Piezoelectric substance, piezoelectric substance element, liquid discharge head, liquid discharge device and method for producing piezoelectric substance |
US7703479B2 (en) * | 2005-10-17 | 2010-04-27 | The University Of Kentucky Research Foundation | Plasma actuator |
US7567022B2 (en) * | 2005-10-20 | 2009-07-28 | Canon Kabushiki Kaisha | Method for forming perovskite type oxide thin film, piezoelectric element, liquid discharge head, and liquid discharge apparatus |
KR100795012B1 (ko) | 2005-11-07 | 2008-01-15 | 삼성전기주식회사 | 복수 층으로 구성된 전극을 갖는 멤스 구조물 및 그 제조방법 |
JP2007250626A (ja) * | 2006-03-14 | 2007-09-27 | Seiko Epson Corp | 圧電素子の製造方法、アクチュエータ装置の製造方法、液体噴射ヘッドの製造方法、液体噴射装置の製造方法および圧電素子 |
US7984977B2 (en) * | 2006-07-14 | 2011-07-26 | Canon Kabushiki Kaisha | Piezoelectric element, manufacturing method for piezoelectric body, and liquid jet head |
JP5300184B2 (ja) * | 2006-07-18 | 2013-09-25 | キヤノン株式会社 | 圧電体、圧電体素子、圧電体素子を用いた液体吐出ヘッド及び液体吐出装置 |
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JP6343958B2 (ja) * | 2013-08-05 | 2018-06-20 | セイコーエプソン株式会社 | 液体噴射装置 |
JP2016032007A (ja) | 2014-07-28 | 2016-03-07 | 株式会社リコー | 圧電膜の製造方法、圧電素子の製造方法、液体吐出ヘッド及び画像形成装置 |
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EP1588437B1 (en) | 2003-01-31 | 2011-12-14 | Canon Kabushiki Kaisha | Piezoelectric element |
US7059711B2 (en) * | 2003-02-07 | 2006-06-13 | Canon Kabushiki Kaisha | Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head |
US7215067B2 (en) * | 2003-02-07 | 2007-05-08 | Canon Kabushiki Kaisha | Ferroelectric thin film element, piezoelectric actuator and liquid discharge head |
US7262544B2 (en) * | 2004-01-09 | 2007-08-28 | Canon Kabushiki Kaisha | Dielectric element, piezoelectric element, ink jet head and method for producing the same head |
JP2005244133A (ja) * | 2004-02-27 | 2005-09-08 | Canon Inc | 誘電体素子、圧電素子、インクジェットヘッド及びインクジェット記録装置、並びにこれらの製造方法 |
JP4344942B2 (ja) * | 2004-12-28 | 2009-10-14 | セイコーエプソン株式会社 | インクジェット式記録ヘッドおよび圧電アクチュエーター |
JP5044902B2 (ja) * | 2005-08-01 | 2012-10-10 | 日立電線株式会社 | 圧電薄膜素子 |
US20070029592A1 (en) * | 2005-08-04 | 2007-02-08 | Ramamoorthy Ramesh | Oriented bismuth ferrite films grown on silicon and devices formed thereby |
-
2003
- 2003-12-10 JP JP2003411167A patent/JP4717344B2/ja not_active Expired - Lifetime
-
2004
- 2004-12-07 TW TW93137804A patent/TWI249437B/zh not_active IP Right Cessation
- 2004-12-08 US US11/006,639 patent/US7279825B2/en not_active Expired - Fee Related
- 2004-12-10 KR KR20040103936A patent/KR100643825B1/ko not_active Expired - Fee Related
- 2004-12-10 CN CNB2004101002725A patent/CN100374299C/zh not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101305271B1 (ko) * | 2012-03-22 | 2013-09-06 | 한국기계연구원 | 자기전기 복합체 |
US9956774B2 (en) | 2015-12-17 | 2018-05-01 | Ricoh Company, Ltd. | Electromechanical transducer element, liquid discharge head, liquid discharge device, method for producing electromechanical transducer film, and method for producing liquid discharge head |
Also Published As
Publication number | Publication date |
---|---|
TWI249437B (en) | 2006-02-21 |
US20050127780A1 (en) | 2005-06-16 |
TW200531751A (en) | 2005-10-01 |
CN1628977A (zh) | 2005-06-22 |
KR100643825B1 (ko) | 2006-11-10 |
CN100374299C (zh) | 2008-03-12 |
US7279825B2 (en) | 2007-10-09 |
KR20050056891A (ko) | 2005-06-16 |
JP2005175099A (ja) | 2005-06-30 |
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