JP4168352B2 - アルキルフェニルビスアシルホスフィンオキサイドおよび光開始剤混合物 - Google Patents

アルキルフェニルビスアシルホスフィンオキサイドおよび光開始剤混合物 Download PDF

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Publication number
JP4168352B2
JP4168352B2 JP06531797A JP6531797A JP4168352B2 JP 4168352 B2 JP4168352 B2 JP 4168352B2 JP 06531797 A JP06531797 A JP 06531797A JP 6531797 A JP6531797 A JP 6531797A JP 4168352 B2 JP4168352 B2 JP 4168352B2
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JP
Japan
Prior art keywords
group
carbon atoms
alkyl group
bis
formula
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Expired - Lifetime
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JP06531797A
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English (en)
Japanese (ja)
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JPH1029997A (ja
JPH1029997A5 (2
Inventor
ジヨウジ レパード デヴィト
ケラー マンフレッド
ヴアレット アンドレアス
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BASF Schweiz AG
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Ciba Holding AG
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Publication of JPH1029997A5 publication Critical patent/JPH1029997A5/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Molecular Biology (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Dental Preparations (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
JP06531797A 1996-03-04 1997-03-04 アルキルフェニルビスアシルホスフィンオキサイドおよび光開始剤混合物 Expired - Lifetime JP4168352B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH55896 1996-03-04
CH558/96 1996-03-04

Publications (3)

Publication Number Publication Date
JPH1029997A JPH1029997A (ja) 1998-02-03
JPH1029997A5 JPH1029997A5 (2) 2005-02-03
JP4168352B2 true JP4168352B2 (ja) 2008-10-22

Family

ID=4189800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06531797A Expired - Lifetime JP4168352B2 (ja) 1996-03-04 1997-03-04 アルキルフェニルビスアシルホスフィンオキサイドおよび光開始剤混合物

Country Status (22)

Country Link
US (2) US6020528A (2)
JP (1) JP4168352B2 (2)
KR (1) KR100474236B1 (2)
CN (1) CN1092201C (2)
AT (1) AT404729B (2)
BE (1) BE1011437A5 (2)
BR (1) BR9701154A (2)
CA (1) CA2198803C (2)
CH (1) CH691970A5 (2)
DE (2) DE19708294B4 (2)
DK (1) DK176096B1 (2)
ES (1) ES2132018B1 (2)
FR (1) FR2745575B1 (2)
GB (1) GB2310855B (2)
IT (1) IT1290006B1 (2)
NL (1) NL1005424C2 (2)
NO (1) NO309571B1 (2)
RU (1) RU2180667C2 (2)
SE (1) SE520727C2 (2)
SG (1) SG55281A1 (2)
TW (1) TW408136B (2)
ZA (1) ZA971810B (2)

Families Citing this family (172)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG53043A1 (en) * 1996-08-28 1998-09-28 Ciba Geigy Ag Molecular complex compounds as photoinitiators
EP0975693B2 (en) * 1997-04-22 2006-01-18 Koninklijke DSM N.V. Liquid curable resin composition
US6359025B1 (en) 1997-05-16 2002-03-19 Dsm N.V. Radiation-curable liquid resin composition for coating optical fibers
DE19812859A1 (de) * 1998-03-24 1999-09-30 Basf Ag Photoinitiatorgemische
SE9904080D0 (sv) * 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
WO2001021365A1 (de) * 1999-09-22 2001-03-29 Kronospan Technical Company Ltd. Vorrichtung sowie verfahren zur herstellung von fussbodenpaneelen
DE19945279C1 (de) 1999-09-22 2001-04-05 Kronospan Tech Co Ltd Vorrichtung sowie Verfahren zur Herstellung von Fußbodenpaneelen und verfahrensgemäß hergestellte Paneele
US6387981B1 (en) 1999-10-28 2002-05-14 3M Innovative Properties Company Radiopaque dental materials with nano-sized particles
US6572693B1 (en) 1999-10-28 2003-06-03 3M Innovative Properties Company Aesthetic dental materials
DE60042038D1 (de) 1999-10-28 2009-05-28 3M Innovative Properties Co Siliziumdioxid-Nanoteilchen in Form eines trockenen Pulvers
US6730156B1 (en) 1999-10-28 2004-05-04 3M Innovative Properties Company Clustered particle dental fillers
US6500877B1 (en) 1999-11-05 2002-12-31 Krohn Industries, Inc. UV curable paint compositions and method of making and applying same
EP1106627B1 (en) 1999-12-08 2003-10-29 Ciba SC Holding AG Novel phosphine oxide photoinitiator systems and curable compositions with low color
DE19961347A1 (de) 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiatorsystem mit Acylphosphinoxid-Initiatoren
US6444725B1 (en) 2000-01-21 2002-09-03 3M Innovative Properties Company Color-changing dental compositions
GB2360283B (en) 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
DE60111405T2 (de) * 2000-09-14 2006-05-11 Ciba Speciality Chemicals Holding Inc. Acylphosphinoxid-photoinitiatoren in methacrylatgiessharzen
WO2002024344A2 (de) * 2000-09-25 2002-03-28 Chemetall Gmbh Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate
US6528555B1 (en) 2000-10-12 2003-03-04 3M Innovative Properties Company Adhesive for use in the oral environment having color-changing capabilities
US6737216B2 (en) * 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
US6613812B2 (en) 2001-01-03 2003-09-02 3M Innovative Properties Company Dental material including fatty acid, dimer thereof, or trimer thereof
TW583299B (en) 2001-04-13 2004-04-11 Fuji Photo Film Co Ltd Liquid crystal composition, color filter and liquid crystal display device
CN100437354C (zh) * 2001-08-21 2008-11-26 西巴特殊化学品控股有限公司 红移单-和双-酰基氧化膦和硫化膦及其作为光引发剂的应用
US6780546B2 (en) * 2001-08-30 2004-08-24 Inphase Technologies, Inc. Blue-sensitized holographic media
EP1323784B1 (en) 2001-12-26 2005-02-16 Dainippon Ink And Chemicals, Inc. Resin composition for coating optical fiber and coated optical fiber and optical fiber unit using the same
CN1319507C (zh) 2002-01-31 2007-06-06 3M创新有限公司 牙科糊剂、牙科制品和方法
ZA200301683B (en) * 2002-03-04 2004-09-06 Ciba Sc Holding Ag Synergistic combinations of UV absorbers for pigmented polyolefins.
WO2003082929A1 (en) * 2002-04-03 2003-10-09 Dainippon Ink And Chemicals, Inc. Photoinitiator, novel compound, and photocurable composition
US8003169B2 (en) * 2002-04-19 2011-08-23 Basf Se Curing of coating induced by plasma
US20030221769A1 (en) * 2002-05-23 2003-12-04 Kutsch Wilhelm P. Transfer casting of holographic images
US7091259B2 (en) * 2002-07-03 2006-08-15 3M Innovative Properties Company Dental fillers, pastes, and compositions prepared therefrom
US20050288387A1 (en) * 2002-08-21 2005-12-29 Li Feng Acrylate dental compositions with improved viscosity and storage odor
US7025791B2 (en) * 2002-12-02 2006-04-11 Gi Dynamics, Inc. Bariatric sleeve
US6984261B2 (en) * 2003-02-05 2006-01-10 3M Innovative Properties Company Use of ceramics in dental and orthodontic applications
MXPA05011847A (es) 2003-05-06 2006-01-26 Ciba Sc Holding Ag Revestimientos fotocurados y estabilizados.
CN1842504B (zh) * 2003-08-29 2010-12-08 西巴特殊化学品控股有限公司 光纤涂料
US7032492B2 (en) * 2003-09-11 2006-04-25 Milton S. Meshirer Ammunition articles comprising light-curable moisture-preventative sealant and method of manufacturing same
NZ592917A (en) * 2003-09-15 2012-12-21 Protiva Biotherapeutics Inc Stable polyethyleneglycol (PEG) dialkyloxypropyl (DAA) lipid conjugates
US20050096427A1 (en) * 2003-10-31 2005-05-05 Basf Ag, Ultraviolet radiation curable clearcoat composition with low color and good durability
BRPI0509896B1 (pt) * 2004-04-15 2016-07-12 Ciba Sc Holding Ag "processo para curar compostos polimerizáveis etilenicamente insaturados para produção de revestimentos,coberturas de gel, compósitos ou adesivos tendo cortes espessos".
US7553670B2 (en) 2004-04-28 2009-06-30 3M Innovative Properties Company Method for monitoring a polymerization in a three-dimensional sample
US8071260B1 (en) * 2004-06-15 2011-12-06 Inphase Technologies, Inc. Thermoplastic holographic media
CA2585631A1 (en) * 2004-10-29 2006-05-04 Dainippon Ink And Chemicals, Inc. Active energy ray-curable inkjet recording ink
ATE364643T1 (de) * 2004-11-09 2007-07-15 Ipagsa Ind Sl Thermisch reaktive, nah-infrarot absorbierende polymere und ihre verwendung in wärmeempfindlichen lithographischen druckplatten
EP1838721B1 (en) * 2005-01-17 2011-12-21 Basf Se Process for preparing acylphosphanes and their oxides and sulphides
RU2301151C2 (ru) * 2005-02-08 2007-06-20 Владимир Исаакович Гласс Способ трафаретной многоцветной печати
DE102005010327A1 (de) * 2005-03-03 2006-09-07 Basf Ag Ratikalisch härtbare Beschichtungsmassen
DE502005006753D1 (de) 2005-08-01 2009-04-16 Ivoclar Vivadent Ag Photopolymerisierbare Dentalmaterialien mit Bisacylphosphinoxiden als Initiator
KR101291891B1 (ko) * 2005-09-13 2013-07-31 3디 시스템즈 인코오퍼레이티드 Ａｂｓ-유사 물품을 제조하기 위한 광경화성 조성물
DE102006016642A1 (de) * 2006-04-08 2007-10-18 Bayer Materialscience Ag UV-härtende Schutzschicht für thermoplastische Substrate
EP2035496B1 (en) * 2006-07-04 2014-07-30 Basf Se Water based concentrated product forms of photoinitiators made by a heterophase polymerization technique
JP2008037930A (ja) * 2006-08-02 2008-02-21 Toyo Ink Mfg Co Ltd 光硬化型インクジェットインキ
DE102006050153A1 (de) 2006-10-25 2008-05-08 Ivoclar Vivadent Ag Mikroverkapselte Photoinitiatoren und deren Verwendung für Dentalmaterialien
US8647426B2 (en) 2006-12-28 2014-02-11 3M Innovative Properties Company Dental filler and methods
RU2322466C1 (ru) * 2007-01-09 2008-04-20 Государственное образовательное учреждение высшего профессионального образования Волгоградский государственный технический университет (ВолгГТУ) Фотоотверждаемая композиция для покрытий
US7985785B2 (en) 2007-01-15 2011-07-26 Fujifilm Corporation Ink composition and inkjet recording method using the same
JP5255369B2 (ja) 2007-09-25 2013-08-07 富士フイルム株式会社 光硬化性コーティング組成物、オーバープリント及びその製造方法
US8076393B2 (en) 2007-09-26 2011-12-13 Fujifilm Corporation Ink composition, inkjet recording method, and printed material
JP5236238B2 (ja) 2007-09-28 2013-07-17 富士フイルム株式会社 インクジェット記録用ホワイトインク組成物
EP2053095B2 (en) 2007-09-28 2017-02-22 FUJIFILM Corporation Ink composition and inkjet recording method using the same
JP5148235B2 (ja) 2007-09-28 2013-02-20 富士フイルム株式会社 インク組成物
US8697194B2 (en) * 2008-04-10 2014-04-15 Xerox Corporation Curable overcoat compositions
JP5414367B2 (ja) 2008-06-02 2014-02-12 富士フイルム株式会社 顔料分散物及びそれを用いたインク組成物
US8378002B2 (en) 2008-07-16 2013-02-19 Fujifilm Corporation Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method
JP5623416B2 (ja) 2008-11-03 2014-11-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 光開始剤混合物
JP5297163B2 (ja) * 2008-11-25 2013-09-25 パナソニック株式会社 Ｕｖ硬化性樹脂組成物およびこれを用いた接着方法
JP5344892B2 (ja) 2008-11-27 2013-11-20 富士フイルム株式会社 インクジェット用インク組成物、及びインクジェット記録方法
NZ592674A (en) 2008-12-18 2012-08-31 Novartis Ag Method for making silicone hydrogel contact lenses
WO2010078001A1 (en) * 2008-12-30 2010-07-08 Novartis Ag Tri-functional uv-absorbing compounds and use thereof
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP2010229284A (ja) 2009-03-27 2010-10-14 Fujifilm Corp 光硬化性組成物
JP5405174B2 (ja) 2009-03-30 2014-02-05 富士フイルム株式会社 インク組成物
DE102009016025B4 (de) 2009-04-02 2014-12-11 Voco Gmbh Kunststoffmodifizierter Glasionomerzement, seine Verwendung sowie Verfahren zu seiner Herstellung
EP2421903B1 (en) * 2009-04-20 2014-11-19 ETH Zurich Polymer nanoparticles
JP5424764B2 (ja) 2009-07-28 2014-02-26 富士フイルム株式会社 顔料分散物、インク組成物、及び、インクジェット記録方法
US8431624B2 (en) 2009-09-15 2013-04-30 Novartis Ag Prepolymers suitable for making ultra-violet absorbing contact lenses
US8573390B2 (en) * 2010-03-09 2013-11-05 Xerox Corporation Material transport systems including a transport belt having resistance to laser radiation damage and methods of cutting substrates in material transport systems with laser radiation
DE102010003881A1 (de) 2010-04-12 2011-10-13 Voco Gmbh Dentale Abdeckmasse
DE102010003883A1 (de) 2010-04-12 2011-10-13 Voco Gmbh Lichthärtbares Kompositmaterial
DE102010003884A1 (de) 2010-04-12 2011-10-13 Voco Gmbh Dualhärtende, mehrkomponentige dentale Zusammensetzung
US9062082B2 (en) 2010-06-30 2015-06-23 Dsm Ip Assets B.V. D1479 stable liquid BAP photoinitiator and its use in radiation curable compositions
AU2011282603B2 (en) 2010-07-30 2014-01-30 Novartis Ag Amphiphilic polysiloxane prepolymers and uses thereof
JP5688939B2 (ja) * 2010-09-16 2015-03-25 クラレノリタケデンタル株式会社 ビスアシルホスフィンオキサイド化合物及びそれを含む重合性組成物
US8669302B2 (en) 2010-09-30 2014-03-11 Voco Gmbh Composite material comprising a monomer with a polyalicyclic structure element as a sealing material
US9079828B2 (en) 2010-09-30 2015-07-14 Voco Gmbh Polymerizable compounds comprising a polyalicylic structure element
EP2436363B1 (de) 2010-09-30 2017-01-18 VOCO GmbH Zusammensetzung umfassend ein Monomer mit einem polyalicyclischen Strukturelement zum Füllen und/oder Versiegeln eines Wurzelkanals
EP2436364B1 (de) 2010-09-30 2017-05-31 VOCO GmbH Lackzusammensetzung umfassend ein Monomer mit einem polyalicyclischen Strukturelement
EP2436365B1 (de) 2010-09-30 2017-03-08 VOCO GmbH Kompositmaterial umfassend ein Monomer mit einem polyalicyclischen Strukturelement
US8835525B2 (en) 2010-10-06 2014-09-16 Novartis Ag Chain-extended polysiloxane crosslinkers with dangling hydrophilic polymer chains
EP2625216B1 (en) 2010-10-06 2019-06-05 Novartis AG Polymerisable chain-extended polysiloxanes with pendant hydrophilic groups
CN103168067B (zh) 2010-10-06 2015-08-05 诺华股份有限公司 可水处理的含硅氧烷预聚物及其用途
EP2450025B1 (de) 2010-11-08 2012-11-28 VOCO GmbH Polymerisierbare Phosphorsäurederivate umfassend ein polyalicyclisches Strukturelement
JP2012113228A (ja) 2010-11-26 2012-06-14 Sony Corp 表示装置およびその製造方法
MY158272A (en) 2010-12-13 2016-09-30 Novartis Ag Ophthalmic lenses modified with functional groups and methods of making thereof
CN102079707B (zh) * 2011-01-25 2013-10-30 深圳市有为化学技术有限公司 均三甲苯基芳香酮化合物、其制备方法以及光引发剂
DE102011003289A1 (de) 2011-01-27 2012-08-02 Voco Gmbh Dentale provisorische Suprakonstruktionen sowie Materialien zu ihrer Herstellung und entsprechende Verfahren
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
JP5750069B2 (ja) 2011-03-24 2015-07-15 富士フイルム株式会社 液晶配向促進剤、液晶組成物、高分子材料およびフィルム
JP5774518B2 (ja) 2011-07-27 2015-09-09 富士フイルム株式会社 化合物、ヘイズ低下剤、液晶組成物、高分子材料およびフィルム
RU2627843C2 (ru) * 2011-09-08 2017-08-14 Ивоклар Вивадент Аг Стоматологические материалы на основе мономеров, способные к разъединению по требованию
DE102012001978A1 (de) 2012-02-02 2013-08-08 Voco Gmbh Dentale Kompositmaterialien enthaltend tricyclische Weichmacher
DE102012001979A1 (de) 2012-02-02 2013-08-08 Voco Gmbh Härtbares Gemisch umfassend Weichmacher mit einem polyalicyclischen Strukturelement zur Anwendung bei der Herstellung dentaler Werkstoffe
JP5827161B2 (ja) 2012-03-28 2015-12-02 富士フイルム株式会社 コレステリック液晶性混合物、フィルム、赤外反射板、積層体および合わせガラス
WO2013184090A1 (en) 2012-06-04 2013-12-12 L'oreal S.A. Fast curing cosmetic compositions for tack free surface photocuring of radically polymerizable resins with uv-led
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
DE102012214540A1 (de) 2012-08-15 2014-02-20 Helmholtz-Zentrum für Infektionsforschung GmbH Zahnfüllungsmaterialien und Zahnlacke zur Hemmung der Biofilmbildung von Streptococcus mutans und deren Herstellung
WO2014051026A1 (ja) * 2012-09-27 2014-04-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、ビスアシルホスフィンオキシド化合物、及び、モノアシルホスフィンオキシド化合物
DE102013008176A1 (de) 2012-10-05 2014-04-10 Voco Gmbh Kit und Verfahren zur indirekten chairside Herstellung von Kompositinlays
CN103333202B (zh) * 2013-06-08 2016-09-07 广东博兴新材料科技有限公司 一种基于环氧化合物的含磷酸酯基的长波吸收光引发剂及其制备方法
AU2014288876B2 (en) * 2013-07-08 2018-11-22 IGM Group B.V Liquid bisacylphosphine oxide photoinitiator
JP6169545B2 (ja) 2014-09-09 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
JP6086888B2 (ja) 2014-09-26 2017-03-01 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
JP6169548B2 (ja) 2014-09-26 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
US9649272B2 (en) 2014-10-13 2017-05-16 L'oréal Latex nail compositions having low amounts of photo-initiator
US9820931B2 (en) 2014-10-13 2017-11-21 L'oreal Latex nail compositions having low amounts of photo-initiator
US9636293B2 (en) 2014-10-13 2017-05-02 L'oréal Latex nail compositions having low amounts of photo-initiator
DE102014116402A1 (de) 2014-11-11 2016-05-12 Voco Gmbh Verwendung radikalisch härtbarer Zusammensetzungen in generativen Fertigungsverfahren
DE102014116389A1 (de) 2014-11-11 2016-05-12 Voco Gmbh Radikalisch härtbare dentale Zusammensetzungen
CN104558031B (zh) * 2014-12-09 2016-08-03 天津久联科技有限公司 一种苯基双(2,4,6-三甲基苯甲酰基)氧化膦的制备方法
CN104592298B (zh) * 2014-12-31 2016-07-06 湖北固润科技股份有限公司 一种酰基膦高效光引发剂及其制备方法
CN107636025B (zh) 2015-06-08 2021-02-02 帝斯曼知识产权资产管理有限公司 用于加成法制造的液体、混杂的紫外/可见光可辐射固化树脂组合物
EP3567428B1 (en) 2015-10-01 2021-06-23 DSM IP Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
JP6975793B2 (ja) 2016-10-17 2021-12-01 オーソボンド コーポレーション オリゴマーまたはポリマー抗菌剤を含む表面
WO2018084076A1 (ja) 2016-11-04 2018-05-11 富士フイルム株式会社 ウインドシールドガラス、ヘッドアップディスプレイシステム、およびハーフミラーフィルム
JP6867416B2 (ja) 2017-02-09 2021-04-28 富士フイルム株式会社 ハーフミラー、ハーフミラーの製造方法、および画像表示機能付きミラー
DE102017103084A1 (de) 2017-02-15 2018-08-16 Voco Gmbh Dentaler Kompositblock zur Herstellung permanenter indirekter Restaurationen im CAD/CAM Verfahren
DE102017105841A1 (de) 2017-03-17 2018-09-20 Voco Gmbh Fräsrohling zur Herstellung einer indirekten dentalen Restauration, entsprechende Verwendungen und Verfahren
US10884182B2 (en) 2017-06-02 2021-01-05 Dsm Ip Assets B.V. Thermally resistant radiation curable coatings for optical fiber
CN111051961B (zh) 2017-09-07 2021-12-24 富士胶片株式会社 投影图像显示用半反射镜膜、投影图像显示用夹层玻璃及图像显示系统
JP7364239B2 (ja) 2017-11-03 2023-10-18 コベストロ （ネザーランズ） ビー．ブイ． 液体放射線硬化性ｓａｐ組成物でコーティングされたファイバーを含む水遮断システム
DE102018103415A1 (de) 2018-02-15 2019-08-22 Voco Gmbh Dentale Formkörper mit kontinuierlichem Farbverlauf
JP6934101B2 (ja) 2018-02-23 2021-09-08 富士フイルム株式会社 画像表示用合わせガラスの製造方法、画像表示用合わせガラス、および、画像表示システム
EP3802452A1 (en) 2018-06-01 2021-04-14 DSM IP Assets B.V. Radiation curable compositions for coating optical fiber via alternative oligomers and the coatings produced therefrom
DE102018114690A1 (de) 2018-06-19 2019-12-19 Voco Gmbh Thermowirksame dentale Kompositzusammensetzung
WO2020046865A1 (en) 2018-08-30 2020-03-05 Dsm Ip Assets, B.V. Radiation curable compositions for coating optical fiber
JP7177176B2 (ja) 2018-10-17 2022-11-22 富士フイルム株式会社 投映像表示用部材、ウインドシールドガラスおよびヘッドアップディスプレイシステム
CN113165971A (zh) 2018-12-03 2021-07-23 Ms控股有限公司 用于涂布光纤的填充式可辐射固化组合物以及由其产生的涂层
JP7299920B2 (ja) 2018-12-10 2023-06-28 富士フイルム株式会社 投映像表示用部材、ウインドシールドガラスおよびヘッドアップディスプレイシステム
CN113498487B (zh) 2019-03-06 2023-07-04 富士胶片株式会社 投影图像显示用层叠膜、投影图像显示用的夹层玻璃及图像显示系统
WO2020190833A1 (en) 2019-03-18 2020-09-24 Basf Se Uv curable compositions for dirt pick-up resistance
US11932571B2 (en) 2019-05-24 2024-03-19 Covestro (Netherland) B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
JP7618588B2 (ja) 2019-05-24 2025-01-21 コベストロ （ネザーランズ） ビー．ヴィー． 強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物
EP4003927A1 (en) 2019-07-31 2022-06-01 Covestro (Netherlands) B.V. Radiation curable compositions with multi-functional long-armed oligomers for coating optical fibers
DE102019122174A1 (de) 2019-08-19 2021-02-25 Voco Gmbh Dentale polymerisierbare Zusammensetzung auf der Basis kondensierter Silane
US12252561B2 (en) 2019-08-30 2025-03-18 Stratasys, Inc. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
WO2021042013A1 (en) 2019-08-30 2021-03-04 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
EP4036644B1 (en) 2019-09-27 2025-04-23 FUJIFILM Corporation Projector for head-up display
CN117784464A (zh) 2019-12-26 2024-03-29 富士胶片株式会社 光吸收各向异性层、层叠体、光学膜、图像显示装置、背光模组
WO2021200655A1 (ja) 2020-03-30 2021-10-07 富士フイルム株式会社 反射フィルム、ウインドシールドガラスおよびヘッドアップディスプレイシステム
CN115515784A (zh) 2020-04-03 2022-12-23 科思创(荷兰)有限公司 多层光学器件
KR20220164742A (ko) 2020-04-03 2022-12-13 코베스트로 (네덜란드) 비.브이. 자가-치유 올리고머 및 이의 용도
CN115427853B (zh) 2020-04-03 2026-03-13 科思创(荷兰)有限公司 自我修复光纤和用于制造其的组合物
CN115698783A (zh) 2020-06-03 2023-02-03 富士胶片株式会社 反射膜、夹层玻璃的制造方法及夹层玻璃
WO2022123946A1 (ja) 2020-12-09 2022-06-16 富士フイルム株式会社 反射フィルム、ウインドシールドガラスおよびヘッドアップディスプレイシステム
CN116888221A (zh) 2021-02-22 2023-10-13 科思创(荷兰)有限公司 提供低光泽涂层的方法
EP4411452A4 (en) 2021-09-30 2025-02-05 FUJIFILM Corporation Head-up display system and transport
CN118176225A (zh) 2021-10-29 2024-06-11 科思创(荷兰)有限公司 可自由基固化的组合物
EP4428599A4 (en) 2021-11-05 2025-03-05 FUJIFILM Corporation VIRTUAL IMAGE DISPLAY DEVICE, HEAD-UP DISPLAY SYSTEM, AND TRANSPORTATION VEHICLE
CN113929795B (zh) * 2021-11-16 2023-03-28 上海墨之炫科技有限公司 一种酰基氧化膦类光引发剂
EP4509887A4 (en) 2022-04-15 2025-10-08 Fujifilm Corp REFLECTIVE FILM, MULTILAYER BODY, WINDSHIELD GLASS AND IMAGE DISPLAY SYSTEM
EP4511336A1 (en) 2022-04-21 2025-02-26 Covestro (Netherlands) B.V. Radiation curable compositions for coating optical fibers
EP4532577A1 (en) 2022-05-25 2025-04-09 Covestro (Netherlands) B.V. Process for providing low gloss coatings
WO2024042082A1 (en) 2022-08-24 2024-02-29 Covestro (Netherlands) B.V. Process for providing low gloss coatings
WO2025147343A1 (en) 2024-01-02 2025-07-10 Covestro Llc Ethylenically unsaturated compounds, methods for their preparation, and the use thereof in coating compositions
WO2025147337A1 (en) 2024-01-02 2025-07-10 Covestro Llc Polysilanes, methods for their preparation, and the use thereof in coating compositions
US12428514B2 (en) 2024-01-02 2025-09-30 Covestro Llc Ethylenically unsaturated compounds, methods for their preparation, and the use thereof in coating compositions
US12187852B1 (en) 2024-01-02 2025-01-07 Covestro Llc Ethylenically unsaturated oligomers, methods for their preparation, and the use thereof in coating compositions
US20250215139A1 (en) 2024-01-02 2025-07-03 Covestro Llc Ethylenically unsaturated oligomers, methods for their preparation, and the use thereof in coating compositions

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0046175A1 (en) * 1980-08-19 1982-02-24 Ames Rubber Corporation Elastomeric-coated roll and method and apparatus for making the same
DE3443221A1 (de) * 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
DE3501657A1 (de) * 1985-01-19 1986-07-24 Reich Spezialmaschinen GmbH, 7440 Nürtingen Vorrichtung zum vorritzen von werkstuecken
DE3633436A1 (de) * 1986-10-01 1988-04-14 Basf Ag Photopolymerisierbare aufzeichnungsmasse, insbesondere zur herstellung von druckplatten und reliefformen
GB8715435D0 (en) * 1987-07-01 1987-08-05 Ciba Geigy Ag Forming images
DE3801511C2 (de) * 1988-01-20 1996-11-14 Espe Stiftung Verwendung von Photoinitiatoren zur Herstellung von in zwei Schritten härtbaren Dentalmassen
DE3837569A1 (de) * 1988-11-04 1990-05-10 Espe Stiftung Mit sichtbarem licht aushaertbare dentalmassen
US4962144B1 (en) * 1988-12-30 1998-03-24 Gen Electric Composition
US5218009A (en) * 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
EP0446175A3 (en) * 1990-03-09 1991-11-21 Ciba-Geigy Ag Mixture of photoinitiators
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
NL9200052A (nl) * 1992-01-14 1993-08-02 Gen Electric Polymeermengsels en daaruit gevormde plaatvormige of filmvormige produkten.
ZA941879B (en) * 1993-03-18 1994-09-19 Ciba Geigy Curing compositions containing bisacylphosphine oxide photoinitiators
JP3452145B2 (ja) * 1993-08-23 2003-09-29 大日本インキ化学工業株式会社 粘弾性製品用光重合性組成物及び該組成物を用いた粘弾性製品の製造方法
TW381106B (en) * 1994-09-02 2000-02-01 Ciba Sc Holding Ag Alkoxyphenyl-substituted bisacylphosphine oxides
JP3785687B2 (ja) * 1995-10-05 2006-06-14 昭和電工株式会社 光硬化性組成物及びその硬化方法
DE69710657T3 (de) * 1996-08-23 2007-07-05 Showa Denko K.K. Photohärtbare Zusammensetzung und Härtungsverfahren

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