JP3062730B2 - 不揮発性半導体記憶装置および書込み方法 - Google Patents
不揮発性半導体記憶装置および書込み方法Info
- Publication number
- JP3062730B2 JP3062730B2 JP18085996A JP18085996A JP3062730B2 JP 3062730 B2 JP3062730 B2 JP 3062730B2 JP 18085996 A JP18085996 A JP 18085996A JP 18085996 A JP18085996 A JP 18085996A JP 3062730 B2 JP3062730 B2 JP 3062730B2
- Authority
- JP
- Japan
- Prior art keywords
- data
- threshold
- memory cell
- region
- threshold value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
- G11C11/5628—Programming or writing circuits; Data input circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
- G11C11/5628—Programming or writing circuits; Data input circuits
- G11C11/5635—Erasing circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
- G11C11/5642—Sensing or reading circuits; Data output circuits
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Read Only Memory (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (11)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18085996A JP3062730B2 (ja) | 1996-07-10 | 1996-07-10 | 不揮発性半導体記憶装置および書込み方法 |
| TW086108317A TW350048B (en) | 1996-07-10 | 1997-06-16 | Non-volatile semiconductor memory and the writing method |
| TW087112838A TW381224B (en) | 1996-07-10 | 1997-06-16 | Non-volatile semiconductor memory device |
| KR1019970030562A KR980011502A (ko) | 1996-07-10 | 1997-07-02 | 불휘발성 반도체 기억장치 및 라이트방법 |
| US08/890,396 US5959882A (en) | 1996-07-10 | 1997-07-09 | Nonvolatile semiconductor memory device and data writing method therefor |
| JP29056298A JP3993323B2 (ja) | 1996-07-10 | 1998-10-13 | 不揮発性半導体記憶装置 |
| US09/342,223 US6525960B2 (en) | 1996-07-10 | 1999-06-29 | Nonvolatile semiconductor memory device including correction of erratic memory cell data |
| US09/679,867 US6320785B1 (en) | 1996-07-10 | 2000-10-05 | Nonvolatile semiconductor memory device and data writing method therefor |
| US09/984,833 US20020054506A1 (en) | 1996-07-10 | 2001-10-31 | Nonvolatile semiconductor memory device and data writing method therefor |
| US10/394,050 US6906952B2 (en) | 1996-07-10 | 2003-03-24 | Nonvolatile semiconductor memory device and data writing method therefor |
| US12/794,905 USRE44350E1 (en) | 1996-07-10 | 2010-06-07 | Nonvolatile semiconductor memory including multi-threshold voltage memory cells including voltage ranges indicating either an erase state or a two or more program state |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18085996A JP3062730B2 (ja) | 1996-07-10 | 1996-07-10 | 不揮発性半導体記憶装置および書込み方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29056298A Division JP3993323B2 (ja) | 1996-07-10 | 1998-10-13 | 不揮発性半導体記憶装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1027486A JPH1027486A (ja) | 1998-01-27 |
| JP3062730B2 true JP3062730B2 (ja) | 2000-07-12 |
Family
ID=16090611
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18085996A Expired - Fee Related JP3062730B2 (ja) | 1996-07-10 | 1996-07-10 | 不揮発性半導体記憶装置および書込み方法 |
| JP29056298A Expired - Lifetime JP3993323B2 (ja) | 1996-07-10 | 1998-10-13 | 不揮発性半導体記憶装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29056298A Expired - Lifetime JP3993323B2 (ja) | 1996-07-10 | 1998-10-13 | 不揮発性半導体記憶装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US5959882A (enExample) |
| JP (2) | JP3062730B2 (enExample) |
| KR (1) | KR980011502A (enExample) |
| TW (2) | TW350048B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11195299A (ja) * | 1996-07-10 | 1999-07-21 | Hitachi Ltd | 不揮発性半導体記憶装置 |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5978270A (en) * | 1995-08-31 | 1999-11-02 | Hitachi, Ltd. | Semiconductor non-volatile memory device and computer system using the same |
| JP4090570B2 (ja) * | 1998-06-02 | 2008-05-28 | 株式会社ルネサステクノロジ | 半導体装置、データ処理システム及び不揮発性メモリセルの閾値変更方法 |
| JP2000021185A (ja) | 1998-06-30 | 2000-01-21 | Sharp Corp | 不揮発性半導体メモリの書込み方法 |
| JP4023953B2 (ja) | 1999-06-22 | 2007-12-19 | 株式会社ルネサステクノロジ | 不揮発性半導体記憶装置 |
| USRE40110E1 (en) | 1999-09-20 | 2008-02-26 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory device for storing multivalued data |
| JP2001093288A (ja) | 1999-09-20 | 2001-04-06 | Toshiba Corp | 不揮発性半導体記憶装置 |
| JP2001126490A (ja) | 1999-10-25 | 2001-05-11 | Hitachi Ltd | 不揮発性半導体多値記憶装置の書込み方法 |
| JP4299428B2 (ja) * | 2000-01-19 | 2009-07-22 | 三星電子株式会社 | 可変容量半導体記憶装置 |
| KR100343285B1 (ko) * | 2000-02-11 | 2002-07-15 | 윤종용 | 프로그램 시간을 단축시킬 수 있는 플래시 메모리 장치의프로그램 방법 |
| US6343033B1 (en) | 2000-02-25 | 2002-01-29 | Advanced Micro Devices, Inc. | Variable pulse width memory programming |
| US6219276B1 (en) * | 2000-02-25 | 2001-04-17 | Advanced Micro Devices, Inc. | Multilevel cell programming |
| US6240015B1 (en) * | 2000-04-07 | 2001-05-29 | Taiwan Semiconductor Manufacturing Corporation | Method for reading 2-bit ETOX cells using gate induced drain leakage current |
| JP4503142B2 (ja) * | 2000-06-14 | 2010-07-14 | 株式会社ルネサステクノロジ | 半導体記憶装置 |
| JP4641338B2 (ja) * | 2000-08-29 | 2011-03-02 | ルネサスエレクトロニクス株式会社 | 不揮発性半導体記憶装置及びシステム |
| JP3922516B2 (ja) | 2000-09-28 | 2007-05-30 | 株式会社ルネサステクノロジ | 不揮発性メモリと不揮発性メモリの書き込み方法 |
| JP4082482B2 (ja) | 2000-12-11 | 2008-04-30 | 株式会社ルネサステクノロジ | 記憶システムおよびデータ処理システム |
| US6556481B1 (en) | 2001-02-21 | 2003-04-29 | Aplus Flash Technology, Inc. | 3-step write operation nonvolatile semiconductor one-transistor, nor-type flash EEPROM memory cell |
| US6620682B1 (en) | 2001-02-27 | 2003-09-16 | Aplus Flash Technology, Inc. | Set of three level concurrent word line bias conditions for a nor type flash memory array |
| JP2002269065A (ja) * | 2001-03-08 | 2002-09-20 | Mitsubishi Electric Corp | プログラム可能な不揮発性メモリを内蔵したマイクロコンピュータ |
| KR100390959B1 (ko) * | 2001-06-29 | 2003-07-12 | 주식회사 하이닉스반도체 | 센싱회로를 이용한 멀티레벨 플래시 메모리 프로그램/리드방법 |
| JP3850791B2 (ja) * | 2001-12-20 | 2006-11-29 | 株式会社東芝 | 不揮発性半導体記憶装置 |
| JP4012151B2 (ja) * | 2002-02-28 | 2007-11-21 | 株式会社ルネサステクノロジ | 不揮発性半導体記憶装置 |
| JP2003346485A (ja) * | 2002-05-23 | 2003-12-05 | Fujitsu Ltd | 不揮発性半導体記憶装置及び不揮発性半導体記憶装置の書き込み方法 |
| US6862223B1 (en) * | 2002-07-05 | 2005-03-01 | Aplus Flash Technology, Inc. | Monolithic, combo nonvolatile memory allowing byte, page and block write with no disturb and divided-well in the cell array using a unified cell structure and technology with a new scheme of decoder and layout |
| KR100476930B1 (ko) * | 2002-09-04 | 2005-03-16 | 삼성전자주식회사 | 피이크전류를 줄이는 플래쉬메모리 |
| JP2004171686A (ja) | 2002-11-20 | 2004-06-17 | Renesas Technology Corp | 不揮発性半導体記憶装置およびそのデータ消去方法 |
| EP1473739A1 (en) * | 2003-04-29 | 2004-11-03 | Dialog Semiconductor GmbH | Flash memory with pre-detection for data loss |
| JP4637512B2 (ja) | 2003-11-13 | 2011-02-23 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置 |
| JP2007149291A (ja) * | 2005-11-30 | 2007-06-14 | Sharp Corp | 不揮発性半導体記憶装置及び書き込み方法 |
| JP4233563B2 (ja) * | 2005-12-28 | 2009-03-04 | パナソニック株式会社 | 多値データを記憶する不揮発性半導体記憶装置 |
| KR100719381B1 (ko) * | 2006-03-31 | 2007-05-18 | 삼성전자주식회사 | 어드레스 설정 플래그를 갖는 멀티 레벨 셀 낸드형 플래시메모리 |
| JP4750655B2 (ja) | 2006-09-12 | 2011-08-17 | Okiセミコンダクタ株式会社 | 半導体不揮発性メモリ、データ書き込み方法、半導体不揮発性メモリの製造方法、及びデータ書き込みプログラム |
| JP2008085196A (ja) | 2006-09-28 | 2008-04-10 | Oki Electric Ind Co Ltd | 半導体不揮発性メモリ、データ書き込み方法、半導体不揮発性メモリの製造方法、及びデータ書き込みプログラム |
| US7609548B2 (en) | 2006-09-29 | 2009-10-27 | Hynix Semiconductor Inc. | Method of programming a multi level cell |
| KR100908518B1 (ko) * | 2006-09-29 | 2009-07-20 | 주식회사 하이닉스반도체 | 멀티 레벨 셀의 프로그램 방법 |
| US8189396B2 (en) | 2006-12-14 | 2012-05-29 | Mosaid Technologies Incorporated | Word line driver in a hierarchical NOR flash memory |
| JP4524486B2 (ja) * | 2007-06-01 | 2010-08-18 | ルネサスエレクトロニクス株式会社 | 不揮発性半導体記憶装置 |
| US7489543B1 (en) * | 2007-07-25 | 2009-02-10 | Micron Technology, Inc. | Programming multilevel cell memory arrays |
| US8565019B2 (en) * | 2007-11-20 | 2013-10-22 | Kabushiki Kaisha Toshiba | Method for controlling threshold value in nonvolatile semiconductor memory device |
| JP5363154B2 (ja) | 2009-03-19 | 2013-12-11 | ラピスセミコンダクタ株式会社 | 半導体不揮発性メモリ、半導体不揮発性メモリの電荷蓄積方法、及び電荷蓄積プログラム |
| JP2011070717A (ja) * | 2009-09-24 | 2011-04-07 | Toshiba Corp | 不揮発性半導体記憶装置 |
| US8429335B2 (en) * | 2009-10-13 | 2013-04-23 | Macronix International Co., Ltd. | Memory device and operation method to selectively invert data |
| JP5426600B2 (ja) * | 2011-03-30 | 2014-02-26 | 株式会社東芝 | 半導体メモリ |
| KR102363382B1 (ko) * | 2017-09-26 | 2022-02-16 | 에스케이하이닉스 주식회사 | 불휘발성 메모리 장치, 불휘발성 메모리 장치의 동작 방법 및 불휘발성 메모리 장치를 포함하는 데이터 저장 장치 |
Family Cites Families (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4435786A (en) | 1981-11-23 | 1984-03-06 | Fairchild Camera And Instrument Corporation | Self-refreshing memory cell |
| JPS59121696A (ja) | 1982-12-28 | 1984-07-13 | Toshiba Corp | 不揮発性半導体メモリ |
| JPS626493A (ja) * | 1985-06-29 | 1987-01-13 | Ricoh Co Ltd | 書込みと消去が可能な半導体メモリ装置 |
| FR2605447B1 (fr) * | 1986-10-20 | 1988-12-09 | Eurotechnique Sa | Memoire non volatile programmable electriquement |
| JPH01134793A (ja) | 1987-11-20 | 1989-05-26 | Hitachi Ltd | 不揮発性半導体記憶装置 |
| FR2630573B1 (fr) * | 1988-04-26 | 1990-07-13 | Sgs Thomson Microelectronics | Memoire programmable electriquement avec plusieurs bits d'information par cellule |
| US5163021A (en) * | 1989-04-13 | 1992-11-10 | Sundisk Corporation | Multi-state EEprom read and write circuits and techniques |
| JPH0359886A (ja) * | 1989-07-27 | 1991-03-14 | Nec Corp | 電気的に消去及び書込み可能な不揮発性メモリ |
| US5200920A (en) * | 1990-02-08 | 1993-04-06 | Altera Corporation | Method for programming programmable elements in programmable devices |
| JPH0457294A (ja) | 1990-06-22 | 1992-02-25 | Ricoh Co Ltd | プログラム可能な不揮発性半導体メモリ装置 |
| JPH04238196A (ja) | 1991-01-22 | 1992-08-26 | Nec Ic Microcomput Syst Ltd | Eprom回路 |
| JPH08249893A (ja) * | 1995-03-07 | 1996-09-27 | Toshiba Corp | 半導体記憶装置 |
| US5602789A (en) * | 1991-03-12 | 1997-02-11 | Kabushiki Kaisha Toshiba | Electrically erasable and programmable non-volatile and multi-level memory systemn with write-verify controller |
| JP3152720B2 (ja) * | 1991-03-12 | 2001-04-03 | 株式会社東芝 | 不揮発性半導体記憶装置 |
| JP2647321B2 (ja) * | 1991-12-19 | 1997-08-27 | 株式会社東芝 | 不揮発性半導体記憶装置及びこれを用いた記憶システム |
| US5490107A (en) * | 1991-12-27 | 1996-02-06 | Fujitsu Limited | Nonvolatile semiconductor memory |
| US5365486A (en) * | 1992-12-16 | 1994-11-15 | Texas Instruments Incorporated | Method and circuitry for refreshing a flash electrically erasable, programmable read only memory |
| US5555204A (en) * | 1993-06-29 | 1996-09-10 | Kabushiki Kaisha Toshiba | Non-volatile semiconductor memory device |
| US5563823A (en) * | 1993-08-31 | 1996-10-08 | Macronix International Co., Ltd. | Fast FLASH EPROM programming and pre-programming circuit design |
| JP3226677B2 (ja) * | 1993-09-21 | 2001-11-05 | 株式会社東芝 | 不揮発性半導体記憶装置 |
| KR0169267B1 (ko) * | 1993-09-21 | 1999-02-01 | 사토 후미오 | 불휘발성 반도체 기억장치 |
| JP3999822B2 (ja) * | 1993-12-28 | 2007-10-31 | 株式会社東芝 | 記憶システム |
| US5440505A (en) * | 1994-01-21 | 1995-08-08 | Intel Corporation | Method and circuitry for storing discrete amounts of charge in a single memory element |
| JPH07320488A (ja) * | 1994-05-19 | 1995-12-08 | Hitachi Ltd | 一括消去型不揮発性記憶装置とその消去方法 |
| US5450363A (en) * | 1994-06-02 | 1995-09-12 | Intel Corporation | Gray coding for a multilevel cell memory system |
| JP3199989B2 (ja) * | 1994-09-30 | 2001-08-20 | 株式会社東芝 | 不揮発性半導体記憶装置とその過書込み救済方法 |
| JP2701757B2 (ja) * | 1994-10-20 | 1998-01-21 | 日本電気株式会社 | 半導体記憶装置の書き込み方法 |
| JP2755197B2 (ja) * | 1995-01-13 | 1998-05-20 | 日本電気株式会社 | 半導体不揮発性記憶装置 |
| KR100482235B1 (ko) * | 1995-01-31 | 2005-04-14 | 가부시끼가이샤 히다치 세이사꾸쇼 | 반도체 메모리 장치 |
| JPH08316343A (ja) * | 1995-05-17 | 1996-11-29 | Toshiba Corp | 不揮発性半導体記憶装置 |
| JP3170437B2 (ja) * | 1995-09-20 | 2001-05-28 | 株式会社日立製作所 | 不揮発性半導体多値記憶装置 |
| US5687114A (en) * | 1995-10-06 | 1997-11-11 | Agate Semiconductor, Inc. | Integrated circuit for storage and retrieval of multiple digital bits per nonvolatile memory cell |
| KR0172401B1 (ko) * | 1995-12-07 | 1999-03-30 | 김광호 | 다수상태 불휘발성 반도체 메모리 장치 |
| KR0172408B1 (ko) * | 1995-12-11 | 1999-03-30 | 김광호 | 다수상태 불휘발성 반도체 메모리 및 그의 구동방법 |
| US5677869A (en) * | 1995-12-14 | 1997-10-14 | Intel Corporation | Programming flash memory using strict ordering of states |
| JPH09180473A (ja) * | 1995-12-27 | 1997-07-11 | Nec Corp | 不揮発性半導体メモリ装置 |
| US5748533A (en) * | 1996-03-26 | 1998-05-05 | Invoice Technology, Inc. | Read circuit which uses a coarse-to-fine search when reading the threshold voltage of a memory cell |
| US5777923A (en) * | 1996-06-17 | 1998-07-07 | Aplus Integrated Circuits, Inc. | Flash memory read/write controller |
| JP3740212B2 (ja) * | 1996-05-01 | 2006-02-01 | 株式会社ルネサステクノロジ | 不揮発性半導体記憶装置 |
| JP3180669B2 (ja) * | 1996-06-03 | 2001-06-25 | 日本電気株式会社 | 不揮発性半導体メモリおよびその書き込み方法 |
| US5754469A (en) * | 1996-06-14 | 1998-05-19 | Macronix International Co., Ltd. | Page mode floating gate memory device storing multiple bits per cell |
| DE69702256T2 (de) * | 1996-06-24 | 2001-01-18 | Advanced Micro Devices, Inc. | Verfahren für einen merhfachen, bits pro zelle flash eeprom, speicher mit seitenprogrammierungsmodus und leseverfahren |
| JP3062730B2 (ja) * | 1996-07-10 | 2000-07-12 | 株式会社日立製作所 | 不揮発性半導体記憶装置および書込み方法 |
| US5675537A (en) * | 1996-08-22 | 1997-10-07 | Advanced Micro Devices, Inc. | Erase method for page mode multiple bits-per-cell flash EEPROM |
| US5864569A (en) * | 1996-10-18 | 1999-01-26 | Micron Technology, Inc. | Method and apparatus for performing error correction on data read from a multistate memory |
-
1996
- 1996-07-10 JP JP18085996A patent/JP3062730B2/ja not_active Expired - Fee Related
-
1997
- 1997-06-16 TW TW086108317A patent/TW350048B/zh not_active IP Right Cessation
- 1997-06-16 TW TW087112838A patent/TW381224B/zh not_active IP Right Cessation
- 1997-07-02 KR KR1019970030562A patent/KR980011502A/ko not_active Withdrawn
- 1997-07-09 US US08/890,396 patent/US5959882A/en not_active Expired - Lifetime
-
1998
- 1998-10-13 JP JP29056298A patent/JP3993323B2/ja not_active Expired - Lifetime
-
1999
- 1999-06-29 US US09/342,223 patent/US6525960B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11195299A (ja) * | 1996-07-10 | 1999-07-21 | Hitachi Ltd | 不揮発性半導体記憶装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW350048B (en) | 1999-01-11 |
| JPH1027486A (ja) | 1998-01-27 |
| US6525960B2 (en) | 2003-02-25 |
| JP3993323B2 (ja) | 2007-10-17 |
| TW381224B (en) | 2000-02-01 |
| JPH11195299A (ja) | 1999-07-21 |
| US20020181279A1 (en) | 2002-12-05 |
| US5959882A (en) | 1999-09-28 |
| KR980011502A (ko) | 1998-04-30 |
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