JP2017027088A5 - - Google Patents

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JP2017027088A5
JP2017027088A5 JP2016219762A JP2016219762A JP2017027088A5 JP 2017027088 A5 JP2017027088 A5 JP 2017027088A5 JP 2016219762 A JP2016219762 A JP 2016219762A JP 2016219762 A JP2016219762 A JP 2016219762A JP 2017027088 A5 JP2017027088 A5 JP 2017027088A5
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Claims (13)

  1. 投影光学系の終端部の光学素子を囲むように配置された流路形成部材の下方に基板を配置することと、
    前記流路形成部材に設けられた液体供給口からの液体供給と前記流路形成部材に設けられた液体回収口からの液体回収とを行いつつ、前記基板の表面の一部に液浸領域を形成することと、
    前記基板の表面の一部に形成された前記液浸領域の液体と前記投影光学系とを介して前記基板を露光することと、を含み、
    前記光学素子と前記流路形成部材との間には間隙が形成され、
    前記間隙を形成する、前記光学素子と前記流路形成部材の少なくとも一方の面の少なくとも一部は撥液処理されている露光方法。
  2. 前記流路形成部材は、前記光学素子の先端部を内部に配置可能な穴部を有し、
    前記光学素子と間隙を介して対向する前記穴部の内側面の少なくとも一部が撥液処理されている請求項1記載の露光方法。
  3. 前記撥液処理されている部分は、前記間隙の下端部より上方に離れている請求項1又は2記載の露光方法。
  4. 前記撥液処理されている部分は、フッ素系化合物の膜、またはシリコン化合物の膜、または合成樹脂の膜を含む請求項1〜3のいずれか一項記載の露光方法。
  5. 前記光学素子は、前記間隙よりも上方で支持部材に支持されている請求項1〜4のいずれか一項記載の露光方法。
  6. 前記流路形成部材は、前記光学素子を支持する支持部材とは別の支持部材に支持されている請求項5記載の露光方法。
  7. 投影光学系の終端部の光学素子を囲むように配置された流路形成部材の下方に基板を配置することと、
    前記流路形成部材に設けられた液体供給口からの液体供給と前記流路形成部材に設けられた液体回収口からの液体回収とを行いつつ、前記基板の表面の一部に液浸領域を形成することと、
    前記基板の表面の一部に形成された前記液浸領域の液体と前記投影光学系とを介して前記基板を露光することと、を含み、
    前記光学素子は、前記光学素子の側面と前記流路形成部材の内側面との間に形成される間隙よりも上方で支持部材に支持され、
    前記流路形成部材は、前記光学素子を支持する支持部材とは別の支持部材に支持されている露光方法。
  8. 前記液体供給口および前記液体回収口は、前記基板の表面が対向可能に前記流路形成部材に設けられている請求項1〜7のいずれか一項記載の露光方法。
  9. 投影光学系の終端部の光学素子を囲むように配置された流路形成部材の下方に基板を配置することと、
    前記流路形成部材に設けられた液体供給口からの液体供給と前記流路形成部材に設けられた液体回収口からの液体回収とを行いつつ、前記基板の表面の一部に液浸領域を形成することと、
    前記基板の表面の一部に形成された前記液浸領域の液体と前記投影光学系とを介して前記基板を露光することと、を含み、
    前記光学素子は、前記光学素子の側面と前記流路形成部材の内側面との間に形成される間隙よりも上方で支持部材に支持され、
    前記液体供給口と前記液体回収口は、前記基板の表面が対向可能に前記流路形成部材に設けられている露光方法。
  10. 前記流路形成部材の流路には、バッファ空間が形成され、
    前記液体供給口への液体供給は、前記バッファ空間を介して行われる請求項1〜8のいずれか一項記載の露光方法。
  11. 基板上の一部に液浸領域を形成し、該液浸領域を形成する液体と投影光学系とを介してパターンの像を基板上に投影することによって前記基板を露光する露光装置であって、
    前記基板表面に対向するように配置された供給口を有する液体供給機構を備え、
    前記液体供給機構の流路にはバッファ空間が形成されており、
    前記バッファ空間に所定量以上の液体を貯めてから前記供給口への液体供給が行われる。
  12. 請求項1〜11のいずれか一項に記載の露光方法を用いて基板を露光することを含むデバイス製造方法。
  13. 前記基板は、半導体ウエハを含む請求項12記載のデバイス製造方法。
JP2016219762A 2003-07-09 2016-11-10 露光方法、及びデバイス製造方法 Expired - Fee Related JP6466894B2 (ja)

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