JP2009033111A5 - - Google Patents

Download PDF

Info

Publication number
JP2009033111A5
JP2009033111A5 JP2008137409A JP2008137409A JP2009033111A5 JP 2009033111 A5 JP2009033111 A5 JP 2009033111A5 JP 2008137409 A JP2008137409 A JP 2008137409A JP 2008137409 A JP2008137409 A JP 2008137409A JP 2009033111 A5 JP2009033111 A5 JP 2009033111A5
Authority
JP
Japan
Prior art keywords
exposure
liquid
predetermined member
movable
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008137409A
Other languages
English (en)
Other versions
JP2009033111A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008137409A priority Critical patent/JP2009033111A/ja
Priority claimed from JP2008137409A external-priority patent/JP2009033111A/ja
Publication of JP2009033111A publication Critical patent/JP2009033111A/ja
Publication of JP2009033111A5 publication Critical patent/JP2009033111A5/ja
Pending legal-status Critical Current

Links

Claims (1)

  1. 露光用液体を介して露光光で基板を露光する露光装置であって、
    前記露光光を射出する光学素子と、
    前記光学素子の射出側で移動可能な可動部材と、
    前記可動部材に搭載された所定部材と、
    前記所定部材を振動させることによって前記所定部材上のクリーニング用液体に振動を与える振動発生装置と、を備え、
    前記所定部材の表面の少なくとも一部は、前記露光用液体と前記クリーニング用液体の少なくとも一方に対して撥液性である露光装置。
JP2008137409A 2007-05-28 2008-05-27 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法 Pending JP2009033111A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008137409A JP2009033111A (ja) 2007-05-28 2008-05-27 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007140474 2007-05-28
JP2007177217 2007-07-05
JP2008137409A JP2009033111A (ja) 2007-05-28 2008-05-27 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法

Publications (2)

Publication Number Publication Date
JP2009033111A JP2009033111A (ja) 2009-02-12
JP2009033111A5 true JP2009033111A5 (ja) 2011-05-12

Family

ID=40075059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008137409A Pending JP2009033111A (ja) 2007-05-28 2008-05-27 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法

Country Status (5)

Country Link
US (2) US8189168B2 (ja)
JP (1) JP2009033111A (ja)
KR (1) KR20100031694A (ja)
TW (1) TW200903589A (ja)
WO (1) WO2008146819A1 (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036709A1 (nl) 2008-04-24 2009-10-27 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
EP2131242A1 (en) * 2008-06-02 2009-12-09 ASML Netherlands B.V. Substrate table, lithographic apparatus and device manufacturing method
NL2004540A (en) 2009-05-14 2010-11-18 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
WO2011055860A1 (en) 2009-11-09 2011-05-12 Nikon Corporation Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing method
NL2005610A (en) 2009-12-02 2011-06-06 Asml Netherlands Bv Lithographic apparatus and surface cleaning method.
US20120019804A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, cleaning apparatus, device fabricating method, program, and storage medium
US20120019803A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program, and storage medium
US20120019802A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, immersion exposure apparatus, device fabricating method, program, and storage medium
US9632426B2 (en) * 2011-01-18 2017-04-25 Taiwan Semiconductor Manufacturing Company, Ltd. In-situ immersion hood cleaning
US10727365B2 (en) * 2012-07-30 2020-07-28 Technion Research & Development Foundation Limited Energy conversion system
JP7411641B2 (ja) * 2018-09-12 2024-01-11 ラム リサーチ コーポレーション 粒子測定方法および粒子測定装置
WO2020064265A1 (en) 2018-09-24 2020-04-02 Asml Netherlands B.V. A process tool and an inspection method
CN109622545B (zh) * 2019-01-11 2024-06-04 夏绎 一种在超声波发射面与清洗物表面之间保持清洗水的结构
US11032941B2 (en) * 2019-03-28 2021-06-08 Intel Corporation Modular thermal energy management designs for data center computing

Family Cites Families (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57117238A (en) 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP2753930B2 (ja) 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
US5825043A (en) 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
CN1244018C (zh) 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
US6262796B1 (en) 1997-03-10 2001-07-17 Asm Lithography B.V. Positioning device having two object holders
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
JPH1116816A (ja) 1997-06-25 1999-01-22 Nikon Corp 投影露光装置、該装置を用いた露光方法、及び該装置を用いた回路デバイスの製造方法
JPH11162831A (ja) * 1997-11-21 1999-06-18 Nikon Corp 投影露光装置及び投影露光方法
WO1999027568A1 (fr) * 1997-11-21 1999-06-03 Nikon Corporation Graveur de motifs a projection et procede de sensibilisation a projection
JPH11176727A (ja) 1997-12-11 1999-07-02 Nikon Corp 投影露光装置
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
CN100578876C (zh) 1998-03-11 2010-01-06 株式会社尼康 紫外激光装置以及使用该紫外激光装置的曝光装置和曝光方法
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JPH11307430A (ja) * 1998-04-23 1999-11-05 Canon Inc 露光装置およびデバイス製造方法ならびに駆動装置
JP4505989B2 (ja) 1998-05-19 2010-07-21 株式会社ニコン 収差測定装置並びに測定方法及び該装置を備える投影露光装置並びに該方法を用いるデバイス製造方法、露光方法
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US20020041377A1 (en) 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
JP4714403B2 (ja) 2001-02-27 2011-06-29 エーエスエムエル ユーエス,インコーポレイテッド デュアルレチクルイメージを露光する方法および装置
TW550635B (en) * 2001-03-09 2003-09-01 Toshiba Corp Manufacturing system of electronic devices
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
CN100462844C (zh) 2002-08-23 2009-02-18 株式会社尼康 投影光学系统、微影方法、曝光装置及使用此装置的方法
CN101349876B (zh) 2002-11-12 2010-12-01 Asml荷兰有限公司 光刻装置和器件制造方法
CN100568101C (zh) 2002-11-12 2009-12-09 Asml荷兰有限公司 光刻装置和器件制造方法
EP2495613B1 (en) 2002-11-12 2013-07-31 ASML Netherlands B.V. Lithographic apparatus
EP1429188B1 (en) 2002-11-12 2013-06-19 ASML Netherlands B.V. Lithographic projection apparatus
US7110081B2 (en) * 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121818A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR20120127755A (ko) * 2002-12-10 2012-11-23 가부시키가이샤 니콘 노광장치 및 디바이스 제조방법
CN100370533C (zh) 2002-12-13 2008-02-20 皇家飞利浦电子股份有限公司 用于照射层的方法和用于将辐射导向层的装置
JP4364806B2 (ja) 2002-12-19 2009-11-18 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 層上にスポットを照射する方法及び装置
KR101506408B1 (ko) 2003-02-26 2015-03-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101861493B1 (ko) 2003-04-11 2018-05-28 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
SG10201803122UA (en) * 2003-04-11 2018-06-28 Nikon Corp Immersion lithography apparatus and device manufacturing method
TWI474380B (zh) * 2003-05-23 2015-02-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US7317504B2 (en) * 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261741A3 (en) 2003-06-11 2011-05-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP3862678B2 (ja) * 2003-06-27 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
WO2005010611A2 (en) 2003-07-08 2005-02-03 Nikon Corporation Wafer table for immersion lithography
JP4444920B2 (ja) 2003-09-19 2010-03-31 株式会社ニコン 露光装置及びデバイス製造方法
WO2005031820A1 (ja) 2003-09-26 2005-04-07 Nikon Corporation 投影露光装置及び投影露光装置の洗浄方法、メンテナンス方法並びにデバイスの製造方法
KR101682884B1 (ko) 2003-12-03 2016-12-06 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법, 그리고 광학 부품
EP1697798A2 (en) 2003-12-15 2006-09-06 Carl Zeiss SMT AG Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
EP3252533B1 (en) 2004-02-04 2019-04-10 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
JP2005286068A (ja) 2004-03-29 2005-10-13 Canon Inc 露光装置及び方法
KR101342303B1 (ko) 2004-06-21 2013-12-16 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법
JP4677833B2 (ja) * 2004-06-21 2011-04-27 株式会社ニコン 露光装置、及びその部材の洗浄方法、露光装置のメンテナンス方法、メンテナンス機器、並びにデバイス製造方法
JP2006032750A (ja) * 2004-07-20 2006-02-02 Canon Inc 液浸型投影露光装置、及びデバイス製造方法
US7224427B2 (en) 2004-08-03 2007-05-29 Taiwan Semiconductor Manufacturing Company, Ltd. Megasonic immersion lithography exposure apparatus and method
JP4772306B2 (ja) * 2004-09-06 2011-09-14 株式会社東芝 液浸光学装置及び洗浄方法
CN101052916B (zh) 2004-09-30 2010-05-12 株式会社尼康 投影光学设备和曝光装置
JP2006147639A (ja) * 2004-11-16 2006-06-08 Canon Inc 露光装置
KR101339887B1 (ko) 2004-12-06 2013-12-10 가부시키가이샤 니콘 메인터넌스 방법, 메인터넌스 기기, 노광 장치, 및디바이스 제조 방법
US7880860B2 (en) * 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060250588A1 (en) 2005-05-03 2006-11-09 Stefan Brandl Immersion exposure tool cleaning system and method
JP2006313766A (ja) * 2005-05-06 2006-11-16 Nikon Corp 基板保持装置及びステージ装置並びに露光装置
JP5045008B2 (ja) * 2005-07-08 2012-10-10 株式会社ニコン 液浸露光用基板、露光方法及びデバイス製造方法
KR20080053497A (ko) * 2005-09-21 2008-06-13 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
JP2007116073A (ja) * 2005-09-21 2007-05-10 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
JP2007102580A (ja) * 2005-10-05 2007-04-19 Nikon Corp 位置決め手法、及び位置決め装置
US7986395B2 (en) * 2005-10-24 2011-07-26 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and methods
TW200815933A (en) * 2006-05-23 2008-04-01 Nikon Corp Maintenance method, exposure method and apparatus, and device manufacturing method
US8564759B2 (en) * 2006-06-29 2013-10-22 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for immersion lithography
US7841352B2 (en) * 2007-05-04 2010-11-30 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method

Similar Documents

Publication Publication Date Title
JP2009033111A5 (ja)
JP2012156539A5 (ja) 露光装置、デバイス製造方法、及びクリーニング方法
WO2008146819A1 (ja) 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
JP2009522448A5 (ja)
ATE520252T1 (de) Abbildungsvorrichtung und optische vorrichtung
JP2010093298A5 (ja)
JP2012129556A5 (ja) 露光装置、デバイス製造方法、及び露光方法。
JP2014169475A5 (ja)
JP2009006727A5 (ja)
TW200614347A (en) Projection optical device and exposure apparatus
DE602006014643D1 (de) Bilderzeugende Vorrichtung mit Verschlussarmeinheit
JP2012134555A5 (ja) 液浸部材、液浸露光装置、液浸露光方法、及びデバイス製造方法
EP2458656A3 (en) Light emitting apparatus
DE602008000765D1 (de) Optisches Bildmessgerät
JP2010528467A5 (ja)
JP2013543127A5 (ja)
JP2011223036A5 (ja) 露光装置及びデバイス製造方法
JP2015528132A5 (ja)
JP2015084324A5 (ja) 発光装置
JP2010182555A5 (ja)
DE602006010635D1 (de) Lichtemittierende integrierte Schaltung, optischer Kopf und Bilderzeugungsgerät der diesen verwendet
NL1033000A1 (nl) Componentplaatsingseenheid alsmede componentplaatsingsinrichting die is voorzien van een dergelijke componentplaatsingseenheid.
JP2015116820A5 (ja) 印刷ヘッド装置及び印刷システム
JP2015509668A5 (ja)
JP2011500370A5 (ja)