JP2009522448A5 - - Google Patents
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- Publication number
- JP2009522448A5 JP2009522448A5 JP2008548529A JP2008548529A JP2009522448A5 JP 2009522448 A5 JP2009522448 A5 JP 2009522448A5 JP 2008548529 A JP2008548529 A JP 2008548529A JP 2008548529 A JP2008548529 A JP 2008548529A JP 2009522448 A5 JP2009522448 A5 JP 2009522448A5
- Authority
- JP
- Japan
- Prior art keywords
- mask
- frame
- deposition
- opening
- adapting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000008021 deposition Effects 0.000 claims 8
Claims (3)
- 回転フレームと、
開口を持つマスクと、
前記マスクに張力を印加し、前記フレームにより規定される形状に前記マスクを適合させる構造を持つクランプ装置と、
を備える装置。 - 堆積領域を包含する室と、
前記室内に設けられた回転フレームアセンブリであって、
フレームと、
一つ以上の開口を持つマスクと、
前記マスクに張力を印加し、前記フレームにより規定される形状に前記マスクを適合させる構造を持つクランプ装置と、
を備えるフレームアセンブリと、
前記堆積領域内に設けられた堆積源と、
前記堆積源に対してウェブを移動させ、前記堆積源から前記マスクの前記開口を通して前記ウェブへの材料の堆積を可能にする構造を持つウェブ駆動機構と、
を備えている堆積システム。 - 回転フレームと、
前記フレーム及び前記開口を通した材料の堆積を可能にする構造を持つ開口を有するマスクと、
前記マスクに張力を印加し、前記フレームにより規定される形状に前記マスクを適合させるための手段と、
を含む開口マスクアセンブリ。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/275,354 US7763114B2 (en) | 2005-12-28 | 2005-12-28 | Rotatable aperture mask assembly and deposition system |
PCT/US2006/046683 WO2007078556A1 (en) | 2005-12-28 | 2006-12-07 | Rotatable aperture mask assembly and deposition system |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009522448A JP2009522448A (ja) | 2009-06-11 |
JP2009522448A5 true JP2009522448A5 (ja) | 2010-02-04 |
Family
ID=38228540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008548529A Withdrawn JP2009522448A (ja) | 2005-12-28 | 2006-12-07 | 回転多孔マスクアセンブリと薄膜形成システム |
Country Status (6)
Country | Link |
---|---|
US (1) | US7763114B2 (ja) |
EP (1) | EP1977024A4 (ja) |
JP (1) | JP2009522448A (ja) |
CN (1) | CN101351572A (ja) |
TW (1) | TW200731344A (ja) |
WO (1) | WO2007078556A1 (ja) |
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US20120090544A1 (en) * | 2010-10-18 | 2012-04-19 | Kim Mu-Gyeom | Thin film deposition apparatus for continuous deposition, and mask unit and crucible unit included in thin film deposition apparatus |
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KR101784467B1 (ko) * | 2011-01-10 | 2017-10-12 | 삼성디스플레이 주식회사 | 분할 마스크 및 그것을 이용한 마스크 프레임 조립체의 조립방법 |
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EP2762607B1 (en) * | 2013-01-31 | 2018-07-25 | Applied Materials, Inc. | Deposition source with adjustable electrode |
EP2765218A1 (en) * | 2013-02-07 | 2014-08-13 | Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO | Method and apparatus for depositing atomic layers on a substrate |
KR102106331B1 (ko) * | 2013-07-08 | 2020-05-06 | 삼성디스플레이 주식회사 | 마스크 조립체 및 이의 제조 방법 |
AU2013400152B2 (en) * | 2013-09-11 | 2017-06-15 | Halliburton Energy Services, Inc. | Method and apparatus for aligning components of integrated optical sensors |
KR102201107B1 (ko) * | 2013-09-11 | 2021-01-11 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 마스크 조립체의 정렬 방법 |
US11015244B2 (en) * | 2013-12-30 | 2021-05-25 | Advanced Material Solutions, Llc | Radiation shielding for a CVD reactor |
KR101677157B1 (ko) * | 2015-07-31 | 2016-11-17 | (주)아이작리서치 | 기판 처리 장치 |
KR102618351B1 (ko) * | 2016-07-19 | 2023-12-28 | 삼성디스플레이 주식회사 | 패턴위치조정기구가 구비된 마스크 프레임 조립체 및 그것을 이용한 패턴 위치 조정 방법 |
CN106148892B (zh) * | 2016-07-25 | 2019-04-02 | 京东方科技集团股份有限公司 | 一种子掩膜版的张网方法及掩膜版、基板、显示装置 |
KR102696806B1 (ko) * | 2016-09-22 | 2024-08-21 | 삼성디스플레이 주식회사 | 증착용 마스크, 표시 장치의 제조 장치 및 표시 장치의 제조 방법 |
CN106987798B (zh) * | 2017-04-17 | 2020-02-11 | 京东方科技集团股份有限公司 | 一种镀膜装置 |
US20190044068A1 (en) * | 2017-08-01 | 2019-02-07 | Wuhan China Star Optoelectronics Semiconductor Dis play Technology Co., Ltd. | Mask plate |
CN109402592B (zh) * | 2017-08-18 | 2020-06-26 | Tcl科技集团股份有限公司 | 器件侧面蒸镀装置及器件侧面蒸镀方法 |
DE102018215100A1 (de) * | 2018-05-28 | 2019-11-28 | Sms Group Gmbh | Vakuumbeschichtungsanlage, und Verfahren zum Beschichten eines bandförmigen Materials |
DE102018215101A1 (de) * | 2018-05-28 | 2019-11-28 | Sms Group Gmbh | Vakuumbeschichtungsanlage, und Verfahren zum Beschichten eines bandförmigen Materials |
NL2021997B1 (nl) * | 2018-11-14 | 2020-05-20 | Johannes Hendrikus Lagarde Kevin | Systeem en werkwijze voor het deponeren van een eerste en tweede laag op een substraat. |
CN116479422A (zh) * | 2022-01-13 | 2023-07-25 | 宁德时代新能源科技股份有限公司 | 蚀刻设备 |
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-
2005
- 2005-12-28 US US11/275,354 patent/US7763114B2/en not_active Expired - Fee Related
-
2006
- 2006-12-07 EP EP06844956A patent/EP1977024A4/en not_active Withdrawn
- 2006-12-07 CN CNA2006800497003A patent/CN101351572A/zh active Pending
- 2006-12-07 WO PCT/US2006/046683 patent/WO2007078556A1/en active Application Filing
- 2006-12-07 JP JP2008548529A patent/JP2009522448A/ja not_active Withdrawn
- 2006-12-26 TW TW095148990A patent/TW200731344A/zh unknown
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