JP2009522448A5 - - Google Patents

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Publication number
JP2009522448A5
JP2009522448A5 JP2008548529A JP2008548529A JP2009522448A5 JP 2009522448 A5 JP2009522448 A5 JP 2009522448A5 JP 2008548529 A JP2008548529 A JP 2008548529A JP 2008548529 A JP2008548529 A JP 2008548529A JP 2009522448 A5 JP2009522448 A5 JP 2009522448A5
Authority
JP
Japan
Prior art keywords
mask
frame
deposition
opening
adapting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2008548529A
Other languages
English (en)
Other versions
JP2009522448A (ja
Filing date
Publication date
Priority claimed from US11/275,354 external-priority patent/US7763114B2/en
Application filed filed Critical
Publication of JP2009522448A publication Critical patent/JP2009522448A/ja
Publication of JP2009522448A5 publication Critical patent/JP2009522448A5/ja
Withdrawn legal-status Critical Current

Links

Claims (3)

  1. 回転フレームと、
    開口を持つマスクと、
    前記マスクに張力を印加し、前記フレームにより規定される形状に前記マスクを適合させる構造を持つクランプ装置と、
    を備える装置。
  2. 堆積領域を包含する室と、
    前記室内に設けられた回転フレームアセンブリであって、
    フレームと、
    一つ以上の開口を持つマスクと、
    前記マスクに張力を印加し、前記フレームにより規定される形状に前記マスクを適合させる構造を持つクランプ装置と、
    を備えるフレームアセンブリと、
    前記堆積領域内に設けられた堆積源と、
    前記堆積源に対してウェブを移動させ、前記堆積源から前記マスクの前記開口を通して前記ウェブへの材料の堆積を可能にする構造を持つウェブ駆動機構と、
    を備えている堆積システム。
  3. 回転フレームと、
    前記フレーム及び前記開口を通した材料の堆積を可能にする構造を持つ開口を有するマスクと、
    前記マスクに張力を印加し、前記フレームにより規定される形状に前記マスクを適合させるための手段と、
    を含む開口マスクアセンブリ。
JP2008548529A 2005-12-28 2006-12-07 回転多孔マスクアセンブリと薄膜形成システム Withdrawn JP2009522448A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/275,354 US7763114B2 (en) 2005-12-28 2005-12-28 Rotatable aperture mask assembly and deposition system
PCT/US2006/046683 WO2007078556A1 (en) 2005-12-28 2006-12-07 Rotatable aperture mask assembly and deposition system

Publications (2)

Publication Number Publication Date
JP2009522448A JP2009522448A (ja) 2009-06-11
JP2009522448A5 true JP2009522448A5 (ja) 2010-02-04

Family

ID=38228540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008548529A Withdrawn JP2009522448A (ja) 2005-12-28 2006-12-07 回転多孔マスクアセンブリと薄膜形成システム

Country Status (6)

Country Link
US (1) US7763114B2 (ja)
EP (1) EP1977024A4 (ja)
JP (1) JP2009522448A (ja)
CN (1) CN101351572A (ja)
TW (1) TW200731344A (ja)
WO (1) WO2007078556A1 (ja)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009538989A (ja) 2006-05-30 2009-11-12 フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. パルス化大気圧グロー放電を使用する堆積の方法及び装置
WO2008100139A1 (en) 2007-02-13 2008-08-21 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
JP5597551B2 (ja) * 2008-02-01 2014-10-01 フジフィルム マニュファクチュアリング ヨーロッパ ビー.ヴィ. 移動基材のプラズマ表面処理の装置、方法および当該方法の使用
EP2241165B1 (en) 2008-02-08 2011-08-31 Fujifilm Manufacturing Europe B.V. Method for manufacturing a multi_layer stack structure with improved wvtr barrier property
CN102016103B (zh) * 2008-02-15 2012-10-24 松下电器产业株式会社 薄膜形成方法及成膜装置
KR100953495B1 (ko) * 2008-05-21 2010-04-16 건국대학교 산학협력단 롤투롤 방식 인쇄 방법 및 장치
JP2010168654A (ja) * 2008-12-26 2010-08-05 Ulvac Japan Ltd マスク装置
US8349143B2 (en) * 2008-12-30 2013-01-08 Intermolecular, Inc. Shadow masks for patterned deposition on substrates
US20100252606A1 (en) * 2009-04-03 2010-10-07 United Solar Ovonic Llc Roll-to-roll deposition apparatus with improved web transport system
EP2360293A1 (en) * 2010-02-11 2011-08-24 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method and apparatus for depositing atomic layers on a substrate
US20120090544A1 (en) * 2010-10-18 2012-04-19 Kim Mu-Gyeom Thin film deposition apparatus for continuous deposition, and mask unit and crucible unit included in thin film deposition apparatus
CN102169927A (zh) * 2010-12-31 2011-08-31 东莞市万丰纳米材料有限公司 一种led芯片图形衬底制备装置
KR101784467B1 (ko) * 2011-01-10 2017-10-12 삼성디스플레이 주식회사 분할 마스크 및 그것을 이용한 마스크 프레임 조립체의 조립방법
WO2013096951A1 (en) * 2011-12-23 2013-06-27 Solexel, Inc. High productivity spray processing for semiconductor metallization and interconnects
DE102012017186A1 (de) * 2012-08-30 2014-03-06 Wieland-Werke Ag Maske für ein Beschichtungssystem, Beschichtungssystem und Verfahren zur Herstellung eines beschichteten Substrats
US20140166989A1 (en) * 2012-12-17 2014-06-19 Universal Display Corporation Manufacturing flexible organic electronic devices
EP2762607B1 (en) * 2013-01-31 2018-07-25 Applied Materials, Inc. Deposition source with adjustable electrode
EP2765218A1 (en) * 2013-02-07 2014-08-13 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO Method and apparatus for depositing atomic layers on a substrate
KR102106331B1 (ko) * 2013-07-08 2020-05-06 삼성디스플레이 주식회사 마스크 조립체 및 이의 제조 방법
AU2013400152B2 (en) * 2013-09-11 2017-06-15 Halliburton Energy Services, Inc. Method and apparatus for aligning components of integrated optical sensors
KR102201107B1 (ko) * 2013-09-11 2021-01-11 삼성디스플레이 주식회사 증착 장치 및 이를 이용한 마스크 조립체의 정렬 방법
US11015244B2 (en) * 2013-12-30 2021-05-25 Advanced Material Solutions, Llc Radiation shielding for a CVD reactor
KR101677157B1 (ko) * 2015-07-31 2016-11-17 (주)아이작리서치 기판 처리 장치
KR102618351B1 (ko) * 2016-07-19 2023-12-28 삼성디스플레이 주식회사 패턴위치조정기구가 구비된 마스크 프레임 조립체 및 그것을 이용한 패턴 위치 조정 방법
CN106148892B (zh) * 2016-07-25 2019-04-02 京东方科技集团股份有限公司 一种子掩膜版的张网方法及掩膜版、基板、显示装置
KR102696806B1 (ko) * 2016-09-22 2024-08-21 삼성디스플레이 주식회사 증착용 마스크, 표시 장치의 제조 장치 및 표시 장치의 제조 방법
CN106987798B (zh) * 2017-04-17 2020-02-11 京东方科技集团股份有限公司 一种镀膜装置
US20190044068A1 (en) * 2017-08-01 2019-02-07 Wuhan China Star Optoelectronics Semiconductor Dis play Technology Co., Ltd. Mask plate
CN109402592B (zh) * 2017-08-18 2020-06-26 Tcl科技集团股份有限公司 器件侧面蒸镀装置及器件侧面蒸镀方法
DE102018215100A1 (de) * 2018-05-28 2019-11-28 Sms Group Gmbh Vakuumbeschichtungsanlage, und Verfahren zum Beschichten eines bandförmigen Materials
DE102018215101A1 (de) * 2018-05-28 2019-11-28 Sms Group Gmbh Vakuumbeschichtungsanlage, und Verfahren zum Beschichten eines bandförmigen Materials
NL2021997B1 (nl) * 2018-11-14 2020-05-20 Johannes Hendrikus Lagarde Kevin Systeem en werkwijze voor het deponeren van een eerste en tweede laag op een substraat.
CN116479422A (zh) * 2022-01-13 2023-07-25 宁德时代新能源科技股份有限公司 蚀刻设备

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2948261A (en) * 1956-12-07 1960-08-09 Western Electric Co Apparatus for producing printed wiring by metal vaporization
US3669060A (en) * 1970-09-24 1972-06-13 Westinghouse Electric Corp Mask changing mechanism for use in the evaporation of thin film devices
US3735728A (en) * 1971-12-01 1973-05-29 Andvari Inc Apparatus for continuous vacuum deposition
US3866565A (en) * 1973-12-21 1975-02-18 David E U Ridout Vapor deposition apparatus with rotating drum mask
US3885520A (en) * 1974-03-08 1975-05-27 John F Krumme Vapor deposition apparatus with rotatable ring mask
US4096821A (en) * 1976-12-13 1978-06-27 Westinghouse Electric Corp. System for fabricating thin-film electronic components
US4344988A (en) 1978-08-01 1982-08-17 Nippon Sheet Glass Co., Ltd. Method for forming patterned coating
US4344161A (en) * 1979-02-09 1982-08-10 Kabushiki Kaisha Suwa Seikosha Electronic timepiece
US4945252A (en) * 1980-07-07 1990-07-31 Automated Packaging Systems, Inc. Continuous web registration
US4335161A (en) * 1980-11-03 1982-06-15 Xerox Corporation Thin film transistors, thin film transistor arrays, and a process for preparing the same
US4777909A (en) * 1981-02-09 1988-10-18 Applied Magnetics Corporation Carriage apparatus for indexing and accurately registering a selected stabilized mask of a plurality of stabilizing masks between a substrate and a source
US4492180A (en) * 1981-03-16 1985-01-08 Applied Magnetics Corporation Apparatus for indexing and registering a selected deposition mask to a substrate and method therefor
JPS57179952A (en) * 1981-04-24 1982-11-05 Fuji Photo Film Co Ltd Method and apparatus for magnetic recording medium
JPS596372A (ja) 1982-07-03 1984-01-13 Shinko Electric Ind Co Ltd 金属帯条の部分真空蒸着方法およびその装置
US4549843A (en) * 1983-03-15 1985-10-29 Micronix Partners Mask loading apparatus, method and cassette
US4681780A (en) * 1983-12-01 1987-07-21 Polaroid Corporation Continuously cleaned rotary coating mask
US4915057A (en) * 1985-10-23 1990-04-10 Gte Products Corporation Apparatus and method for registration of shadow masked thin-film patterns
US4746548A (en) * 1985-10-23 1988-05-24 Gte Products Corporation Method for registration of shadow masked thin-film patterns
ES2032566T3 (es) * 1987-10-07 1993-02-16 Thorn Emi Plc Aparato y metodo para revestir bandas.
US5026239A (en) * 1988-09-06 1991-06-25 Canon Kabushiki Kaisha Mask cassette and mask cassette loading device
FR2662015B1 (fr) * 1990-05-11 1995-02-17 Europ Composants Electron Dispositif de positionnement de bandes-cache dans une machine de metallisation.
JPH0927454A (ja) 1995-07-13 1997-01-28 Fuji Electric Co Ltd 選択蒸着用マスク
US6309446B1 (en) * 1997-02-17 2001-10-30 Kanebo, Ltd. Activated carbon for adsorptive storage of gaseous compound
JP2000138203A (ja) 1998-10-30 2000-05-16 Toshiba Corp X線マスク用カセット、x線マスク製造装置及び製造方法
DE19906676A1 (de) 1999-02-18 2000-08-24 Leybold Systems Gmbh Bedampfungsvorrichtung
AU3879500A (en) * 1999-03-10 2000-09-28 American Bank Note Holographics, Inc. Techniques of printing micro-structure patterns such as holograms directly onto final documents or other substrates in discrete areas thereof
US6475287B1 (en) * 2001-06-27 2002-11-05 Eastman Kodak Company Alignment device which facilitates deposition of organic material through a deposition mask
JP4336869B2 (ja) * 2001-11-27 2009-09-30 日本電気株式会社 真空成膜装置、真空成膜方法および電池用電極の製造方法
US6897164B2 (en) * 2002-02-14 2005-05-24 3M Innovative Properties Company Aperture masks for circuit fabrication
US20030151118A1 (en) * 2002-02-14 2003-08-14 3M Innovative Properties Company Aperture masks for circuit fabrication
US6821348B2 (en) * 2002-02-14 2004-11-23 3M Innovative Properties Company In-line deposition processes for circuit fabrication
US6746946B2 (en) * 2002-03-19 2004-06-08 N. Edward Berg Process and apparatus for manufacturing printed circuit boards
US6709962B2 (en) * 2002-03-19 2004-03-23 N. Edward Berg Process for manufacturing printed circuit boards
US6943066B2 (en) * 2002-06-05 2005-09-13 Advantech Global, Ltd Active matrix backplane for controlling controlled elements and method of manufacture thereof
US7132016B2 (en) * 2002-09-26 2006-11-07 Advantech Global, Ltd System for and method of manufacturing a large-area backplane by use of a small-area shadow mask
KR100909422B1 (ko) * 2002-12-31 2009-07-24 엘지디스플레이 주식회사 액정표시소자의 패턴 및 그 형성방법
US6926840B2 (en) * 2002-12-31 2005-08-09 Eastman Kodak Company Flexible frame for mounting a deposition mask
KR100534580B1 (ko) * 2003-03-27 2005-12-07 삼성에스디아이 주식회사 표시장치용 증착 마스크 및 그의 제조방법
ITTO20030691A1 (it) 2003-09-11 2005-03-12 Edison Termoelettrica Spa Metodo ed apparecchiatura per formare uno strato
US7121496B2 (en) 2003-10-23 2006-10-17 Hewlett-Packard Development Company, L.P. Method and system for correcting web deformation during a roll-to-roll process
US7153180B2 (en) * 2003-11-13 2006-12-26 Eastman Kodak Company Continuous manufacture of flat panel light emitting devices

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