JP2013122580A - 液晶表示装置、el表示装置、及びその作製方法 - Google Patents
液晶表示装置、el表示装置、及びその作製方法 Download PDFInfo
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- JP2013122580A JP2013122580A JP2012238507A JP2012238507A JP2013122580A JP 2013122580 A JP2013122580 A JP 2013122580A JP 2012238507 A JP2012238507 A JP 2012238507A JP 2012238507 A JP2012238507 A JP 2012238507A JP 2013122580 A JP2013122580 A JP 2013122580A
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Abstract
【解決手段】島状の半導体層を形成するためのフォトリソグラフィ工程及びエッチング工程を省略して、フォトマスクの枚数を増やすことなく作製する。具体的に液晶表示装置でいえば、ゲート電極を形成する工程、エッチング工程等によるダメージを低減するための保護層を形成する工程、ソース電極及びドレイン電極を形成する工程、コンタクトホールを形成する工程、画素電極を形成する工程、の5つのフォトリソグラフィ工程で作製する。そして本発明の一態様の液晶表示装置は、コンタクトホールを形成する工程と同時に形成される、半導体層を分断するための溝部を有する。
【選択図】図1
Description
本実施の形態では、フォトマスク数及びフォトリソグラフィ工程数を削減した液晶表示装置の画素構成および作製方法の一例について、図1乃至図10を用いて説明する。
本実施の形態では、フォトマスク数及びフォトリソグラフィ工程数を削減したEL表示装置の画素構成および作製方法の一例について、図13乃至図22を用いて説明する。
実施の形態1で例示したトランジスタを用いた表示装置の一形態を図11に示す。
実施の形態2で例示したトランジスタを用いた表示装置の一形態を図23に示す。
本実施の形態においては、上記実施の形態で説明した表示装置を具備する電子機器の例について説明する。
101 基板
102 画素領域
103 端子部
104 端子部
105 端子
105_i 端子
106 端子
106_j 端子
107 端子
110 画素
111 トランジスタ
112 液晶素子
113 容量素子
114 電極
120 画素
130 画素
200 基板
201 下地層
202 ゲート電極
203 配線
204 ゲート絶縁層
205 半導体層
206A 電極
206B 電極
207 絶縁層
208 開口部
210 画素電極
212 配線
212_i 配線
216 配線
216_j 配線
219 開口部
220 開口部
221 電極
222 電極
230 溝部
231 端部
232 端部
240 溝部
251 溝部
252 溝部
253 溝部
254 溝部
255 溝部
256 溝部
257 溝部
258 溝部
301 開口部
302 開口部
351 保護層
400 半導体装置
401 基板
402 画素領域
403 端子部
404 端子部
405 端子
405_i 端子
406 端子
406_j 端子
407 端子
408 端子
410 画素
411 トランジスタ
412 トランジスタ
413 容量素子
414 EL素子
420 画素
430 画素
500 基板
501 下地層
502 ゲート電極
503 配線
504 ゲート絶縁層
505 半導体層
506A 電極
506B 電極
507 絶縁層
508 開口部
510 電極
512 配線
512_i 配線
513 配線
514 隔壁層
516 配線
516_j 配線
519 開口部
520 開口部
521 電極
522 電極
530 溝部
540 溝部
542 ゲート電極
544 電極
546A 電極
546B 電極
551 溝部
552 溝部
553 溝部
554 溝部
555 溝部
562 EL層
563 配線
565 開口部
601 開口部
602 開口部
603 開口部
604 開口部
605 開口部
606 開口部
607 開口部
651 保護層
2702 筐体
2704 筐体
2705 表示部
2707 表示部
2712 軸部
2721 電源端子
2723 操作キー
2725 スピーカー
2800 筐体
2801 筐体
2802 表示パネル
2803 スピーカー
2804 マイクロフォン
2805 操作キー
2806 ポインティングデバイス
2807 カメラ用レンズ
2808 外部接続端子
2810 太陽電池セル
2811 外部メモリスロット
3001 本体
3002 筐体
3003 表示部
3004 キーボード
3021 本体
3022 スタイラス
3023 表示部
3024 操作ボタン
3025 外部インターフェイス
3051 本体
3053 接眼部
3054 操作スイッチ
3055 表示部(B)
3056 バッテリー
3057 表示部(A)
4001 基板
4002 画素部
4003 信号線駆動回路
4004 走査線駆動回路
4005 シール材
4006 基板
4008 液晶層
4010 トランジスタ
4013 液晶素子
4015 電極
4016 配線
4018a FPC
4018b FPC
4019 異方性導電層
4020 入力端子
4030 電極
4031 電極
4032 絶縁層
4033 絶縁層
4035 スペーサー
4040 溝部
5001 基板
5002 画素部
5003 信号線駆動回路
5004 走査線駆動回路
5005 シール材
5006 基板
5008 EL層
5009 隔壁層
5010 トランジスタ
5013 EL素子
5015 電極
5016 配線
5018a FPC
5018b FPC
5019 異方性導電層
5020 入力端子
5030 電極
5031 電極
5040 溝部
9601 筐体
9603 表示部
9605 スタンド
Claims (24)
- ゲート電極と、半導体層と、保護層と、第1電極と、第2電極と、を有するトランジスタと、
前記ゲート電極に電気的に接続する第1の配線と、前記第1電極に電気的に接続する第2の配線と、前記第2電極に電気的に接続する画素電極と、容量配線と、溝部と、を有し、
前記半導体層上には前記保護層が接して設けられており、前記半導体層及び前記保護層は、前記第1の配線と、前記第2の配線と、前記画素電極と、前記容量配線と、に重畳して設けられており、
前記第1電極及び前記第2電極は、前記保護層に形成された開口部で前記半導体層に電気的に接続しており、
前記溝部は、前記第1の配線上に、前記第1の配線の線幅方向に横切って形成され、
また前記溝部は、前記容量配線上に、前記容量配線の線幅方向に横切って形成され、
また前記溝部は、前記第2の配線が延在する方向と平行な方向において、前記画素電極の端部を越えて形成されていることを特徴とする液晶表示装置。 - 請求項1において、
前記溝部の底面に半導体層がないことを特徴とする液晶表示装置。 - 請求項1または請求項2において、
前記溝部の側面に半導体層を有することを特徴とする液晶表示装置。 - 請求項1乃至請求項3のいずれか一項において、
前記溝部は、配向膜と重畳していることを特徴とする液晶表示装置。 - 請求項1乃至請求項4のいずれか一項において、
前記溝部の少なくとも一部が、前記画素電極と重畳していることを特徴とする液晶表示装置。 - 請求項1乃至請求項5のいずれか一項において、
前記半導体層は、酸化物半導体であることを特徴とする液晶表示装置。 - 請求項1乃至請求項6のいずれか一項において、
前記保護層は、絶縁性を有する酸化物であることを特徴とする液晶表示装置。 - 請求項7において、前記絶縁性を有する酸化物は、インジウム、ガリウム及び亜鉛を含む酸化物半導体において、前記ガリウムの一部をチタン、ジルコニウム、ハフニウム、またはゲルマニウムより選ばれる少なくとも一種の元素に置換した材料であることを特徴とする液晶表示装置。
- 基板上に、第1のフォトリソグラフィ工程によりゲート電極を形成し、
前記ゲート電極上にゲート絶縁層を形成し、
前記ゲート絶縁層上に半導体層を形成し、
第2のフォトリソグラフィ工程により、前記半導体層上に開口部を有する保護層を形成し、
第3のフォトリソグラフィ工程により、前記保護層上に、前記半導体層に前記開口部で接する第1電極及び第2電極を形成し、
前記第1電極及び前記第2電極上に絶縁層を形成し、第4のフォトリソグラフィ工程により、前記第2電極と重なる前記絶縁層の一部を選択的に除去して行う開口部の形成と、前記絶縁層、前記半導体層、前記ゲート絶縁層の一部を除去して行う溝部の形成を行い、
第5のフォトリソグラフィ工程により、前記絶縁層上に画素電極を形成することを特徴とする液晶表示装置の作製方法。 - 請求項9において、
前記基板と、前記ゲート電極の間に、下地層が形成されることを特徴とする液晶表示装置の作製方法。 - 請求項9または請求項10において、
前記半導体層は、酸化物半導体を含むことを特徴とする液晶表示装置の作製方法。 - 請求項9乃至請求項11のいずれか一項において、
前記開口部の形成後に、前記保護層の開口部で露出する前記半導体層の表面を洗浄する工程を有することを特徴とする液晶表示装置の作製方法。 - 第1のトランジスタと、
第2のトランジスタと、
前記第1のトランジスタのゲート電極に電気的に接続する第1の配線と、前記第1のトランジスタのソースまたはドレインとなる電極の一方に電気的に接続する第2の配線と、前記第2のトランジスタのソースまたはドレインとなる電極の一方に電気的に接続する第3の配線と、前記第1のトランジスタのソースまたはドレインとなる電極の他方と前記第2のトランジスタのゲート電極とを電気的に接続する第4の配線と、前記第2のトランジスタのソースまたはドレインとなる電極の他方に電気的に接続するEL素子と、前記第1のトランジスタのソースまたはドレインとなる電極の他方と前記第3の配線とが重畳する領域に形成される容量素子と、溝部と、を有し、
前記第1のトランジスタ及び前記第2のトランジスタの半導体層上には、保護層が接して設けられており、前記半導体層及び前記保護層は、前記第1の配線と、前記第2の配線と、前記第3の配線と、前記第4の配線と、前記EL素子と、に重畳して設けられており、
前記第1のトランジスタ及び前記第2のトランジスタのソースまたはドレインとなる電極は、前記保護層に形成された開口部で前記半導体層に電気的に接続しており、
前記溝部は、前記第1の配線上に、前記第1の配線の線幅方向に横切って形成され、
また前記溝部は、前記第2の配線及び前記第3の配線が延在する方向と平行な方向において、前記第2のトランジスタのゲート電極の線幅方向に横切って形成されていることを特徴とするEL表示装置。 - 請求項13において、
前記溝部の底面に半導体層がないことを特徴とするEL表示装置。 - 請求項13または請求項14において、
前記溝部の側面に半導体層を有することを特徴とするEL表示装置。 - 請求項13乃至請求項15のいずれか一項において、
前記溝部は、隔壁層と重畳していることを特徴とするEL表示装置。 - 請求項13乃至請求項16のいずれか一項において、
前記EL素子の一方の電極と前記第4の配線とが同じ層に形成されていることを特徴とするEL表示装置。 - 請求項13乃至請求項17のいずれか一項において、
前記半導体層は、酸化物半導体であることを特徴とするEL表示装置。 - 請求項13乃至請求項18のいずれか一項において、
前記保護層は、絶縁性を有する酸化物であることを特徴とするEL表示装置。 - 請求項19において、前記絶縁性を有する酸化物は、インジウム、ガリウム及び亜鉛を含む酸化物半導体において、前記ガリウムの一部をチタン、ジルコニウム、ハフニウム、またはゲルマニウムより選ばれる少なくとも一種の元素に置換した材料であることを特徴とするEL表示装置。
- 基板上に、第1のフォトリソグラフィ工程によりゲート電極を形成し、
前記ゲート電極上にゲート絶縁層を形成し、
前記ゲート絶縁層上に半導体層を形成し、
第2のフォトリソグラフィ工程により、前記半導体層上に開口部を有する保護層を形成し、
第3のフォトリソグラフィ工程により、前記保護層上に、前記半導体層に前記保護層の開口部で接するソース電極及びドレイン電極を形成し、
前記ソース電極及び前記ドレイン電極上に絶縁層を形成し、第4のフォトリソグラフィ工程により、前記絶縁層の一部を選択的に除去して行う開口部の形成と、前記絶縁層、前記半導体層、前記ゲート絶縁層の一部を除去して行う溝部の形成を行い、
第5のフォトリソグラフィ工程により、前記絶縁層の開口部及び前記絶縁層上に、EL素子の一方の電極を形成し、
第6のフォトリソグラフィ工程により、前記EL素子の一方の電極上の一部、及び前記絶縁層上に、前記EL素子のEL層を色毎に塗り分けるための隔壁層を形成することを特徴とするEL表示装置の作製方法。 - 請求項21において、
前記基板と、前記ゲート電極の間に、下地層が形成されることを特徴とするEL表示装置の作製方法。 - 請求項21または請求項22において、
前記半導体層は、酸化物半導体を含むことを特徴とするEL表示装置の作製方法。 - 請求項21乃至請求項23のいずれか一項において、
前記開口部の形成後に、前記保護層の開口部で露出する前記半導体層の表面を洗浄する工程を有することを特徴とするEL表示装置の作製方法。
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TW201734614A (zh) | 2017-10-01 |
TW201329593A (zh) | 2013-07-16 |
TWI664481B (zh) | 2019-07-01 |
JP6689326B2 (ja) | 2020-04-28 |
JP7326409B2 (ja) | 2023-08-15 |
JP2022027822A (ja) | 2022-02-14 |
JP6076038B2 (ja) | 2017-02-08 |
TW202247296A (zh) | 2022-12-01 |
US20170162608A1 (en) | 2017-06-08 |
US20130120702A1 (en) | 2013-05-16 |
TWI762096B (zh) | 2022-04-21 |
CN106972031B (zh) | 2021-08-24 |
CN103107174A (zh) | 2013-05-15 |
JP2018186296A (ja) | 2018-11-22 |
JP2023159142A (ja) | 2023-10-31 |
CN106972031A (zh) | 2017-07-21 |
TWI828102B (zh) | 2024-01-01 |
TW202131395A (zh) | 2021-08-16 |
TWI587054B (zh) | 2017-06-11 |
CN103107174B (zh) | 2018-05-25 |
TWI728537B (zh) | 2021-05-21 |
TW201907488A (zh) | 2019-02-16 |
TWI677925B (zh) | 2019-11-21 |
JP2017108145A (ja) | 2017-06-15 |
JP2020129664A (ja) | 2020-08-27 |
US20210202542A1 (en) | 2021-07-01 |
US9576982B2 (en) | 2017-02-21 |
TW202027172A (zh) | 2020-07-16 |
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