JP2009500855A - マルチ・チャンバ・ツールのためのオゾン・システム - Google Patents
マルチ・チャンバ・ツールのためのオゾン・システム Download PDFInfo
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- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 title claims abstract description 187
- 238000000034 method Methods 0.000 claims abstract description 34
- 239000007789 gas Substances 0.000 claims description 66
- 238000012545 processing Methods 0.000 claims description 35
- 230000006641 stabilisation Effects 0.000 claims description 18
- 238000011105 stabilization Methods 0.000 claims description 18
- 230000001276 controlling effect Effects 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 230000008859 change Effects 0.000 claims description 10
- 239000002019 doping agent Substances 0.000 claims description 10
- 238000004891 communication Methods 0.000 claims description 6
- 230000004913 activation Effects 0.000 claims description 5
- 239000012159 carrier gas Substances 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 2
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 230000004044 response Effects 0.000 abstract description 6
- 230000007774 longterm Effects 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000012261 overproduction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/10—Preparation of ozone
- C01B13/11—Preparation of ozone by electric discharge
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
- G05D11/135—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by sensing at least one property of the mixture
- G05D11/138—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by sensing at least one property of the mixture by sensing the concentration of the mixture, e.g. measuring pH value
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/40—Preparation of ozone by electrical discharge using several dischargers in series
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/60—Feed streams for electrical dischargers
- C01B2201/64—Oxygen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/90—Control of the process
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Control Of Non-Electrical Variables (AREA)
- Chemical Vapour Deposition (AREA)
- Flow Control (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
Claims (20)
- オゾンのフロー及び濃度を制御するシステムであって、
気体源に接続可能である調節可能な気体入力と調整可能な電力入力と複数の処理チャンバに接続可能な気体出力とを含むオゾン発生器であって、前記複数の処理チャンバはそれぞれが付勢されると当該処理チャンバを通過する所定の流率を許容するように設定されている、オゾン発生器と、
前記複数の処理チャンバを通過する全流率を測定するのに用いられるフロー・センサと、
前記フロー・センサ及び前記オゾン発生器と通信する第1のコントローラであって、前記全流率と前記所定の流率とを比較することによりイベントの発生を決定し、ルックアップテーブルに記憶されているデータに従って前記イベントの発生時に前記オゾン発生器の前記調整可能な電力入力を調整する第1のコントローラと、
前記オゾン発生器の気体出力におけるオゾンの濃度レベルを測定するのに用いられる濃度センサと、
前記濃度センサ及び前記オゾン発生器と通信し、前記イベントの発生から所与の時間が経過した時点で前記調整可能な電力入力を調整する第2のコントローラと、
を備えていることを特徴とするシステム。 - 請求項1記載のシステムにおいて、前記第2のコントローラはPIDコントローラであることを特徴とするシステム。
- 請求項2記載のシステムにおいて、前記イベントの発生の所与の時間はPIDコントローラの安定化時間と等しい又はそれよりも長いことを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記第2のコントローラは前記ルックアップテーブルに記憶されたデータを更新することを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記オゾン発生器に接続された閉ループ圧力コントローラを更に備えていることを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記調整可能な気体入力は少なくとも1つの質量流量コントローラを備えていることを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記調整可能な気体入力は少なくとも1つの質量流量計を備えていることを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記調節可能な気体入力は、酸素源気体とドーパント搬送気体との間の濃度比率を制御する比率制御装置を備えていることを特徴とするシステム。
- 請求項1記載のシステムにおいて、前記第1のコントローラは所定の流率の50パーセントよりも大きな読み出し範囲を有することを特徴とするシステム。
- 気体のフローを制御する方法であって、
前記気体のフローをある濃度で第1のチャンバに導入するステップと、
前記気体の前記フローを第2のチャンバに導入するステップと、
所定の値を用いて前記気体の製造を調節することにより、前記第1のチャンバにおける前記気体の濃度が実質的に変化せずに維持され、約15秒未満の時間間隔の後で前記第1のチャンバに搬送される濃度と実質的に同一の前記気体の濃度を前記第2のチャンバが受け取るようにするステップと、
を含むことを特徴とする方法。 - 請求項10記載の方法において、前記時間間隔は約10秒未満であることを特徴とする方法。
- 請求項10記載の方法において、前記気体はオゾン発生器において製造されたオゾンであることを特徴とする方法。
- 請求項12記載の方法において、前記所定の値を用いて、前記オゾンのフローを製造するのに用いられる前記オゾン発生器に搬送される電力を変化させるステップを更に含むことを特徴とする方法。
- 請求項10記載の方法において、予測制御アルゴリズムを用いて前記所定の値を決定するステップを更に含むことを特徴とする方法。
- オゾンのフローを制御する方法であって、
オゾンのフローをある濃度で第1のチャンバに導入するステップと、
オゾンの前記フローを第2のチャンバに導入するステップと、
オゾン発生器に搬送される電力レベルを調節してオゾンの製造速度を変更し、ある時間間隔の後では前記第2のチャンバにおけるオゾン濃度を前記第1のチャンバにおけるオゾン濃度と実質的に同一になるように維持するステップと、
前記搬送された電力レベルをメモリに記憶するステップと、
前記電力レベルを以後の調節の間の基準として用いるステップと、
を含むことを特徴とする方法。 - 複数の処理チャンバを含むシステムにおけるオゾンのフローを制御する方法であって、
予測制御アルゴリズムを用いてイベントの発生の間のオゾン発生器におけるオゾンの製造を制御するステップと、
PIDコントローラを用いて、前記イベントの発生の後でのオゾン発生器におけるオゾンの製造を制御し、前記予測制御アルゴリズムにおいて用いられたデータを更新するステップと、
を含むことを特徴とする方法。 - 請求項16記載の方法において、前記予測制御アルゴリズムは、
前記複数のチャンバの中の1つの付勢イベントを、オゾンの全フローの測定値から決定するステップと、
前記付勢イベントに対応する電力出力設定を選択するステップと、
オゾン発生器における電力を前記選択された電力出力設定に調節するステップと、
を含むことを特徴とする方法。 - オゾン発生器において製造されるオゾンのフロー及び濃度を制御するシステムであって、
気体源に接続可能である調節可能な気体入力と、
それぞれが付勢されると所定の流率の通過を許容する複数の処理チャンバにおいて用いられるために製造されるオゾンの濃度を規制する調節可能な電力入力と、
前記複数の処理チャンバを通過する全流率を測定するのに用いられるフロー・センサと、
前記フロー・センサ及び前記調節可能な電力入力と通信する第1のコントローラであって、イベントの発生を、前記全流率と前記所定の流率とを比較し前記調節可能な電力入力を前記イベントの発生時にルックアップテーブルに記憶されたデータに従って調節することによって決定する第1のコントローラと、
製造されたオゾンの濃度レベルを測定するのに用いられる濃度センサと、
前記濃度センサ及び前記調節電力入力と通信し、前記イベントの発生からある所与の時間が経過した後で前記調節可能な電力入力を調節する第2のコントローラと、
を備えていることを特徴とするシステム。 - 請求項18記載のシステムにおいて、前記イベントの発生からの前記所与の時間は前記第2のコントローラの安定化時間と等しいか又はそれよりも長いことを特徴とするシステム。
- 請求項18記載のシステムにおいて、前記イベントの発生からの前記所与の時間は約5秒ないし15秒であることを特徴とするシステム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US69780205P | 2005-07-07 | 2005-07-07 | |
US60/697,802 | 2005-07-07 | ||
PCT/US2006/026290 WO2007008561A2 (en) | 2005-07-07 | 2006-07-07 | Ozone system for multi-chamber tools |
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JP2012016611A Division JP5770650B2 (ja) | 2005-07-07 | 2012-01-30 | 気体のフローを制御する方法 |
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JP4954995B2 JP4954995B2 (ja) | 2012-06-20 |
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JP2008520378A Active JP4954995B2 (ja) | 2005-07-07 | 2006-07-07 | マルチ・チャンバ・ツールのためのオゾン・システム |
JP2012016611A Active JP5770650B2 (ja) | 2005-07-07 | 2012-01-30 | 気体のフローを制御する方法 |
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JP2012016611A Active JP5770650B2 (ja) | 2005-07-07 | 2012-01-30 | 気体のフローを制御する方法 |
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US (2) | US7892502B2 (ja) |
EP (1) | EP1899781B1 (ja) |
JP (2) | JP4954995B2 (ja) |
KR (2) | KR101255873B1 (ja) |
CN (1) | CN101243369B (ja) |
TW (1) | TWI342473B (ja) |
WO (1) | WO2007008561A2 (ja) |
Cited By (13)
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WO2011065088A1 (ja) | 2009-11-26 | 2011-06-03 | 東芝三菱電機産業システム株式会社 | オゾンガス供給システム |
WO2011065087A1 (ja) * | 2009-11-26 | 2011-06-03 | 東芝三菱電機産業システム株式会社 | オゾンガス供給システム |
WO2012127670A1 (ja) | 2011-03-24 | 2012-09-27 | 東芝三菱電機産業システム株式会社 | オゾンガス供給システム |
WO2012140747A1 (ja) | 2011-04-13 | 2012-10-18 | 東芝三菱電機産業システム株式会社 | 窒素添加レス・オゾン発生ユニット及びオゾンガス供給システム |
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Also Published As
Publication number | Publication date |
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JP4954995B2 (ja) | 2012-06-20 |
KR20080027919A (ko) | 2008-03-28 |
WO2007008561A3 (en) | 2007-02-15 |
EP1899781A2 (en) | 2008-03-19 |
US8480862B2 (en) | 2013-07-09 |
EP1899781B1 (en) | 2014-09-03 |
US20070020160A1 (en) | 2007-01-25 |
CN101243369A (zh) | 2008-08-13 |
US20110108122A1 (en) | 2011-05-12 |
KR20130007667A (ko) | 2013-01-18 |
US7892502B2 (en) | 2011-02-22 |
TW200712817A (en) | 2007-04-01 |
TWI342473B (en) | 2011-05-21 |
KR101255873B1 (ko) | 2013-04-17 |
CN101243369B (zh) | 2010-12-15 |
WO2007008561A2 (en) | 2007-01-18 |
JP5770650B2 (ja) | 2015-08-26 |
JP2012146987A (ja) | 2012-08-02 |
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