JP2005513788A - 有機誘電体を有する有機電界効果トランジスタ - Google Patents
有機誘電体を有する有機電界効果トランジスタ Download PDFInfo
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- JP2005513788A JP2005513788A JP2003553638A JP2003553638A JP2005513788A JP 2005513788 A JP2005513788 A JP 2005513788A JP 2003553638 A JP2003553638 A JP 2003553638A JP 2003553638 A JP2003553638 A JP 2003553638A JP 2005513788 A JP2005513788 A JP 2005513788A
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- dielectric constant
- field effect
- organic
- effect device
- insulating material
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- H—ELECTRICITY
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- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
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- C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
- C09B69/109—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing other specific dyes
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- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
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- H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
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- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
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- H01L21/0212—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC the material being fluoro carbon compounds, e.g.(CFx) n, (CHxFy) n or polytetrafluoroethylene
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- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
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- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
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- H10K10/462—Insulated gate field-effect transistors [IGFETs]
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- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/474—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a multilayered structure
- H10K10/476—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a multilayered structure comprising at least one organic layer and at least one inorganic layer
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- C08G2261/31—Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
- C08G2261/314—Condensed aromatic systems, e.g. perylene, anthracene or pyrene
- C08G2261/3142—Condensed aromatic systems, e.g. perylene, anthracene or pyrene fluorene-based, e.g. fluorene, indenofluorene, or spirobifluorene
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- C08G2261/316—Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain bridged by heteroatoms, e.g. N, P, Si or B
- C08G2261/3162—Arylamines
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- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/32—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain
- C08G2261/322—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed
- C08G2261/3223—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed containing one or more sulfur atoms as the only heteroatom, e.g. thiophene
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- C08G2261/90—Applications
- C08G2261/92—TFT applications
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- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
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- H01L21/02183—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing tantalum, e.g. Ta2O5
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
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- H01L21/02186—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing titanium, e.g. TiO2
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Thin Film Transistor (AREA)
- Formation Of Insulating Films (AREA)
- Electroluminescent Light Sources (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0130321A GB0130321D0 (en) | 2001-12-19 | 2001-12-19 | Electronic devices |
| GB0130451A GB0130451D0 (en) | 2001-12-20 | 2001-12-20 | Electronic devices |
| GB0220504A GB0220504D0 (en) | 2002-09-03 | 2002-09-03 | Electronic devices |
| PCT/GB2002/005248 WO2003052841A1 (en) | 2001-12-19 | 2002-11-21 | Organic field effect transistor with an organic dielectric |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011109287A Division JP5727294B2 (ja) | 2001-12-19 | 2011-05-16 | 有機誘電体を有する有機電界効果トランジスタ |
| JP2011109286A Division JP5727293B2 (ja) | 2001-12-19 | 2011-05-16 | 有機誘電体を有する有機電界効果トランジスタ |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2005513788A true JP2005513788A (ja) | 2005-05-12 |
Family
ID=27256358
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003553638A Pending JP2005513788A (ja) | 2001-12-19 | 2002-11-21 | 有機誘電体を有する有機電界効果トランジスタ |
| JP2011109286A Expired - Lifetime JP5727293B2 (ja) | 2001-12-19 | 2011-05-16 | 有機誘電体を有する有機電界効果トランジスタ |
| JP2011109287A Expired - Lifetime JP5727294B2 (ja) | 2001-12-19 | 2011-05-16 | 有機誘電体を有する有機電界効果トランジスタ |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011109286A Expired - Lifetime JP5727293B2 (ja) | 2001-12-19 | 2011-05-16 | 有機誘電体を有する有機電界効果トランジスタ |
| JP2011109287A Expired - Lifetime JP5727294B2 (ja) | 2001-12-19 | 2011-05-16 | 有機誘電体を有する有機電界効果トランジスタ |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7029945B2 (enExample) |
| EP (3) | EP1459392B1 (enExample) |
| JP (3) | JP2005513788A (enExample) |
| KR (1) | KR100949304B1 (enExample) |
| AT (1) | ATE525757T1 (enExample) |
| AU (1) | AU2002343058A1 (enExample) |
| CA (1) | CA2469912A1 (enExample) |
| NO (1) | NO20043049L (enExample) |
| WO (1) | WO2003052841A1 (enExample) |
Cited By (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004241528A (ja) * | 2003-02-05 | 2004-08-26 | Ricoh Co Ltd | 有機半導体装置及びそれを有する表示素子 |
| JP2006173616A (ja) * | 2004-12-17 | 2006-06-29 | Samsung Electronics Co Ltd | 有機薄膜トランジスタ表示板及びその製造方法 |
| JP2006261493A (ja) * | 2005-03-18 | 2006-09-28 | Toppan Printing Co Ltd | 薄膜トランジスタおよびその製造方法 |
| WO2006129718A1 (ja) * | 2005-05-31 | 2006-12-07 | Incorporated National University Iwate University | 有機薄膜トランジスタ |
| JP2007165824A (ja) * | 2005-12-15 | 2007-06-28 | Lg Philips Lcd Co Ltd | 薄膜トランジスタアレイ基板及びその製造方法 |
| JP2007311377A (ja) * | 2006-05-16 | 2007-11-29 | Sony Corp | 薄膜トランジスタの製造方法および薄膜トランジスタならびに表示装置 |
| JP2007318024A (ja) * | 2006-05-29 | 2007-12-06 | Dainippon Printing Co Ltd | 有機半導体素子、および、有機半導体素子の製造方法 |
| JP2007318025A (ja) * | 2006-05-29 | 2007-12-06 | Dainippon Printing Co Ltd | 有機半導体素子、および、有機半導体素子の製造方法 |
| WO2008065927A1 (fr) * | 2006-11-27 | 2008-06-05 | Zeon Corporation | Transistor à film fin organique, élément électronique composite organique, procédé de fabrication d'un tel transistor et d'un tel élément, écran d'affichage et mémoire |
| JP2008244022A (ja) * | 2007-03-26 | 2008-10-09 | Kyushu Univ | 有機半導体素子およびその製造方法 |
| JP2009224689A (ja) * | 2008-03-18 | 2009-10-01 | Sanyo Electric Co Ltd | 有機トランジスタ及びその製造方法 |
| JP2010041039A (ja) * | 2008-07-31 | 2010-02-18 | Commiss Energ Atom | 有機トランジスタ及びこのようなトランジスタの誘電層の製造方法 |
| WO2010026798A1 (ja) * | 2008-09-03 | 2010-03-11 | ブラザー工業株式会社 | 酸化物薄膜トランジスタ、及びその製造方法 |
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Also Published As
| Publication number | Publication date |
|---|---|
| NO20043049L (no) | 2004-07-15 |
| EP1459392A1 (en) | 2004-09-22 |
| CA2469912A1 (en) | 2003-06-26 |
| KR100949304B1 (ko) | 2010-03-23 |
| KR20040063176A (ko) | 2004-07-12 |
| ATE525757T1 (de) | 2011-10-15 |
| US20050104058A1 (en) | 2005-05-19 |
| WO2003052841A1 (en) | 2003-06-26 |
| JP5727293B2 (ja) | 2015-06-03 |
| EP2207217A1 (en) | 2010-07-14 |
| AU2002343058A1 (en) | 2003-06-30 |
| JP2011254075A (ja) | 2011-12-15 |
| EP2204861A1 (en) | 2010-07-07 |
| JP2011243986A (ja) | 2011-12-01 |
| US7029945B2 (en) | 2006-04-18 |
| EP1459392B1 (en) | 2011-09-21 |
| JP5727294B2 (ja) | 2015-06-03 |
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