DE69124009D1 - Dünnfilmtransistor und Verfahren zur Herstellung - Google Patents
Dünnfilmtransistor und Verfahren zur HerstellungInfo
- Publication number
- DE69124009D1 DE69124009D1 DE69124009T DE69124009T DE69124009D1 DE 69124009 D1 DE69124009 D1 DE 69124009D1 DE 69124009 T DE69124009 T DE 69124009T DE 69124009 T DE69124009 T DE 69124009T DE 69124009 D1 DE69124009 D1 DE 69124009D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- thin film
- film transistor
- transistor
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
- H01L29/66757—Lateral single gate single channel transistors with non-inverted structure, i.e. the channel layer is formed before the gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
- H01L29/78621—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2150151A JPH0442579A (ja) | 1990-06-08 | 1990-06-08 | 薄膜トランジスタ及び製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69124009D1 true DE69124009D1 (de) | 1997-02-20 |
DE69124009T2 DE69124009T2 (de) | 1997-05-22 |
Family
ID=15490616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69124009T Expired - Lifetime DE69124009T2 (de) | 1990-06-08 | 1991-06-04 | Dünnfilmtransistor und Verfahren zur Herstellung |
Country Status (6)
Country | Link |
---|---|
US (2) | US5208476A (de) |
EP (1) | EP0460605B1 (de) |
JP (1) | JPH0442579A (de) |
KR (1) | KR920001763A (de) |
DE (1) | DE69124009T2 (de) |
TW (1) | TW204414B (de) |
Families Citing this family (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0459763B1 (de) * | 1990-05-29 | 1997-05-02 | Semiconductor Energy Laboratory Co., Ltd. | Dünnfilmtransistoren |
US7154147B1 (en) * | 1990-11-26 | 2006-12-26 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and driving method for the same |
US8106867B2 (en) | 1990-11-26 | 2012-01-31 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and driving method for the same |
US5289030A (en) | 1991-03-06 | 1994-02-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device with oxide layer |
JP2794678B2 (ja) | 1991-08-26 | 1998-09-10 | 株式会社 半導体エネルギー研究所 | 絶縁ゲイト型半導体装置およびその作製方法 |
JPH04334054A (ja) * | 1991-05-09 | 1992-11-20 | Mitsubishi Electric Corp | 半導体装置、電界効果トランジスタおよびその製造方法 |
JP3255942B2 (ja) * | 1991-06-19 | 2002-02-12 | 株式会社半導体エネルギー研究所 | 逆スタガ薄膜トランジスタの作製方法 |
JP2845303B2 (ja) * | 1991-08-23 | 1999-01-13 | 株式会社 半導体エネルギー研究所 | 半導体装置とその作製方法 |
US6849872B1 (en) * | 1991-08-26 | 2005-02-01 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor |
JP3173854B2 (ja) * | 1992-03-25 | 2001-06-04 | 株式会社半導体エネルギー研究所 | 薄膜状絶縁ゲイト型半導体装置の作製方法及び作成された半導体装置 |
US6624450B1 (en) | 1992-03-27 | 2003-09-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for forming the same |
JP3437863B2 (ja) * | 1993-01-18 | 2003-08-18 | 株式会社半導体エネルギー研究所 | Mis型半導体装置の作製方法 |
US5953582A (en) * | 1993-02-10 | 1999-09-14 | Seiko Epson Corporation | Active matrix panel manufacturing method including TFTS having variable impurity concentration levels |
JPH06275640A (ja) * | 1993-03-22 | 1994-09-30 | Semiconductor Energy Lab Co Ltd | 薄膜トランジスタおよびその作製方法 |
US5858821A (en) * | 1993-05-12 | 1999-01-12 | Micron Technology, Inc. | Method of making thin film transistors |
US6190933B1 (en) * | 1993-06-30 | 2001-02-20 | The United States Of America As Represented By The Secretary Of The Navy | Ultra-high resolution liquid crystal display on silicon-on-sapphire |
SG64308A1 (en) * | 1993-07-26 | 1999-04-27 | Seiko Epson Corp | Thin-film semiconductor device method of fabricating thin-film semiconductor device and display system using the same |
JP3173926B2 (ja) | 1993-08-12 | 2001-06-04 | 株式会社半導体エネルギー研究所 | 薄膜状絶縁ゲイト型半導体装置の作製方法及びその半導体装置 |
US6331717B1 (en) | 1993-08-12 | 2001-12-18 | Semiconductor Energy Laboratory Co. Ltd. | Insulated gate semiconductor device and process for fabricating the same |
US5719065A (en) | 1993-10-01 | 1998-02-17 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device with removable spacers |
DE4435461C2 (de) * | 1993-10-06 | 2001-09-20 | Micron Technology Inc N D Ges | Dünnfilmtransistor und dessen Herstellverfahren |
KR970004484B1 (ko) * | 1993-12-16 | 1997-03-28 | 금성일렉트론 주식회사 | 반도체 소자의 ldd mosfet 제조방법 |
GB9406900D0 (en) * | 1994-04-07 | 1994-06-01 | Philips Electronics Uk Ltd | Manufacture of electronic devices comprising thin -film transistors |
DE19500380C2 (de) * | 1994-05-20 | 2001-05-17 | Mitsubishi Electric Corp | Aktivmatrix-Flüssigkristallanzeige und Herstellungsverfahren dafür |
JP2878137B2 (ja) * | 1994-06-29 | 1999-04-05 | シャープ株式会社 | 増幅型光電変換素子、それを用いた増幅型固体撮像装置、及び増幅型光電変換素子の製造方法 |
US5548132A (en) | 1994-10-24 | 1996-08-20 | Micron Technology, Inc. | Thin film transistor with large grain size DRW offset region and small grain size source and drain and channel regions |
KR0146899B1 (ko) * | 1994-11-28 | 1998-09-15 | 김광호 | 액정 디스플레이 박막트랜지스터소자 및 제조 방법 |
US5567958A (en) * | 1995-05-31 | 1996-10-22 | Motorola, Inc. | High-performance thin-film transistor and SRAM memory cell |
US5920085A (en) * | 1996-02-03 | 1999-07-06 | Samsung Electronics Co., Ltd. | Multiple floating gate field effect transistors and methods of operating same |
KR0177785B1 (ko) * | 1996-02-03 | 1999-03-20 | 김광호 | 오프셋 구조를 가지는 트랜지스터 및 그 제조방법 |
KR100219117B1 (ko) * | 1996-08-24 | 1999-09-01 | 구자홍 | 박막트랜지스터 액정표시장치 및 그 제조방법 |
JP3525316B2 (ja) * | 1996-11-12 | 2004-05-10 | 株式会社半導体エネルギー研究所 | アクティブマトリクス型表示装置 |
US6187639B1 (en) * | 1997-04-21 | 2001-02-13 | Taiwan Semiconductor Manufacturing Company | Method to prevent gate oxide damage by post poly definition implantation |
US6140160A (en) | 1997-07-28 | 2000-10-31 | Micron Technology, Inc. | Method for fabricating a simplified CMOS polysilicon thin film transistor and resulting structure |
US5940691A (en) * | 1997-08-20 | 1999-08-17 | Micron Technology, Inc. | Methods of forming SOI insulator layers and methods of forming transistor devices |
US6043507A (en) * | 1997-09-24 | 2000-03-28 | Micron Technology, Inc. | Thin film transistors and methods of making |
US6344378B1 (en) * | 1999-03-01 | 2002-02-05 | Micron Technology, Inc. | Field effect transistors, field emission apparatuses, thin film transistors, and methods of forming field effect transistors |
JP4141138B2 (ja) * | 2001-12-21 | 2008-08-27 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
US6768180B2 (en) * | 2002-04-04 | 2004-07-27 | C. Andre T. Salama | Superjunction LDMOST using an insulator substrate for power integrated circuits |
KR100980904B1 (ko) * | 2002-06-07 | 2010-09-07 | 소니 주식회사 | 표시 장치와 그 제조 방법, 및 투사형 표시 장치 |
US20040169176A1 (en) * | 2003-02-28 | 2004-09-02 | Peterson Paul E. | Methods of forming thin film transistors and related systems |
TWI326790B (en) * | 2005-02-16 | 2010-07-01 | Au Optronics Corp | Method of fabricating a thin film transistor of a thin film transistor liquid crystal display and method of fabricating a transistor liquid crystal display |
US8354674B2 (en) * | 2007-06-29 | 2013-01-15 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device wherein a property of a first semiconductor layer is different from a property of a second semiconductor layer |
US8896065B2 (en) * | 2008-04-14 | 2014-11-25 | Sharp Laboratories Of America, Inc. | Top gate thin film transistor with independent field control for off-current suppression |
KR101675113B1 (ko) | 2010-01-08 | 2016-11-11 | 삼성전자주식회사 | 트랜지스터 및 그 제조방법 |
KR101084261B1 (ko) * | 2010-03-17 | 2011-11-16 | 삼성모바일디스플레이주식회사 | 박막 트랜지스터, 이를 구비한 표시 장치, 및 그 제조 방법들 |
US9082663B2 (en) | 2011-09-16 | 2015-07-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
US8952379B2 (en) | 2011-09-16 | 2015-02-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
WO2013039126A1 (en) | 2011-09-16 | 2013-03-21 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
US10002968B2 (en) | 2011-12-14 | 2018-06-19 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and display device including the same |
US9653614B2 (en) | 2012-01-23 | 2017-05-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
KR102490881B1 (ko) * | 2014-12-26 | 2023-01-25 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
CN105810748B (zh) * | 2014-12-31 | 2018-12-21 | 清华大学 | N型薄膜晶体管 |
KR102518726B1 (ko) | 2015-10-19 | 2023-04-10 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
KR20210053353A (ko) | 2018-10-09 | 2021-05-11 | 마이크론 테크놀로지, 인크 | 수소 배리어 재료를 갖는 종형 트랜지스터를 포함하는 디바이스, 및 관련 방법 |
DE112021004465T5 (de) | 2020-08-27 | 2023-06-07 | Semiconductor Energy Laboratory Co., Ltd. | Halbleitervorrichtung, Anzeigevorrichtung und elektronische Vorrichtung |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4198250A (en) * | 1979-02-05 | 1980-04-15 | Intel Corporation | Shadow masking process for forming source and drain regions for field-effect transistors and like regions |
JPS5856443B2 (ja) * | 1979-06-30 | 1983-12-15 | 松下電工株式会社 | 接点駆動装置 |
JPS58115864A (ja) * | 1981-12-28 | 1983-07-09 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置 |
JPH0828507B2 (ja) * | 1982-03-16 | 1996-03-21 | セイコーエプソン株式会社 | 半導体装置 |
US4603472A (en) * | 1984-04-19 | 1986-08-05 | Siemens Aktiengesellschaft | Method of making MOS FETs using silicate glass layer as gate edge masking for ion implantation |
JPS60224275A (ja) * | 1984-04-20 | 1985-11-08 | Nec Corp | 絶縁基板mis型電界効果トランジスタの製造方法 |
KR890004962B1 (ko) * | 1985-02-08 | 1989-12-02 | 가부시끼가이샤 도오시바 | 반도체장치 및 그 제조방법 |
JPS61216364A (ja) * | 1985-03-20 | 1986-09-26 | Fujitsu Ltd | 半導体装置 |
US4751196A (en) * | 1985-04-01 | 1988-06-14 | Motorola Inc. | High voltage thin film transistor on PLZT and method of manufacture thereof |
JPS6347981A (ja) * | 1986-08-18 | 1988-02-29 | Alps Electric Co Ltd | 薄膜トランジスタおよびその製造方法 |
JP2678596B2 (ja) * | 1986-09-30 | 1997-11-17 | セイコーエプソン株式会社 | 薄膜トランジスタ |
JPS63124033A (ja) * | 1986-11-13 | 1988-05-27 | Nec Corp | 薄膜トランジスタ基板 |
US4762398A (en) * | 1987-01-26 | 1988-08-09 | Hosiden Electronics Co., Ltd. | Pixel transistor free of parasitic capacitance fluctuations from misalignment |
JPS6461061A (en) * | 1987-09-01 | 1989-03-08 | Fujitsu Ltd | A-si thin film transistor |
JPS6467970A (en) * | 1987-09-08 | 1989-03-14 | Fujitsu Ltd | Thin film transistor |
GB8721193D0 (en) * | 1987-09-09 | 1987-10-14 | Wright S W | Semiconductor devices |
JPS6489464A (en) * | 1987-09-30 | 1989-04-03 | Toshiba Corp | Semiconductor device and manufacture thereof |
US4965213A (en) * | 1988-02-01 | 1990-10-23 | Texas Instruments Incorporated | Silicon-on-insulator transistor with body node to source node connection |
JPH025572A (ja) * | 1988-06-24 | 1990-01-10 | Matsushita Electron Corp | 半導体装置 |
JP2755614B2 (ja) * | 1988-09-29 | 1998-05-20 | 株式会社東芝 | 半導体装置の製造方法 |
US4951113A (en) * | 1988-11-07 | 1990-08-21 | Xerox Corporation | Simultaneously deposited thin film CMOS TFTs and their method of fabrication |
US5037766A (en) * | 1988-12-06 | 1991-08-06 | Industrial Technology Research Institute | Method of fabricating a thin film polysilicon thin film transistor or resistor |
US4998146A (en) * | 1989-05-24 | 1991-03-05 | Xerox Corporation | High voltage thin film transistor |
JPH03109739A (ja) * | 1989-09-25 | 1991-05-09 | Ricoh Co Ltd | 薄膜半導体装置の製法 |
-
1990
- 1990-06-08 JP JP2150151A patent/JPH0442579A/ja active Pending
-
1991
- 1991-04-20 TW TW080103075A patent/TW204414B/zh not_active IP Right Cessation
- 1991-05-31 US US07/708,154 patent/US5208476A/en not_active Expired - Lifetime
- 1991-06-04 KR KR1019910009192A patent/KR920001763A/ko not_active Application Discontinuation
- 1991-06-04 DE DE69124009T patent/DE69124009T2/de not_active Expired - Lifetime
- 1991-06-04 EP EP91109110A patent/EP0460605B1/de not_active Expired - Lifetime
-
1994
- 1994-01-18 US US08/184,619 patent/US5482870A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0460605B1 (de) | 1997-01-08 |
US5208476A (en) | 1993-05-04 |
JPH0442579A (ja) | 1992-02-13 |
EP0460605A1 (de) | 1991-12-11 |
KR920001763A (ko) | 1992-01-30 |
TW204414B (de) | 1993-04-21 |
DE69124009T2 (de) | 1997-05-22 |
US5482870A (en) | 1996-01-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69124009D1 (de) | Dünnfilmtransistor und Verfahren zur Herstellung | |
DE69111963D1 (de) | Dünnfilm-Transistor und Verfahren zur Herstellung. | |
DE69102324D1 (de) | Dünnfilm magnetisches Material und Verfahren zur Herstellung. | |
DE68913444D1 (de) | Dünnfilm-SOI-MOSFET und Verfahren zur Herstellung. | |
DE69212383D1 (de) | Dünnfilmtransistor und Verfahren zu seiner Herstellung | |
DE69105571D1 (de) | Elektrolumineszente Dünnschichtvorrichtung und Verfahren zur Herstellung derselben. | |
DE69413860D1 (de) | Transistoren und Verfahren zur Herstellung | |
DE69326123D1 (de) | Dünnfilmtransistor und verfahren zur herstellung eines dünnfilmtransistors | |
DE69515189D1 (de) | SOI-Substrat und Verfahren zur Herstellung | |
DE69522370D1 (de) | SiGe-Dünnfilm-Halbleiteranordnung mit SiGe Schichtstruktur und Verfahren zur Herstellung | |
DE68925715D1 (de) | Verbundfolie und Verfahren zur Herstellung | |
DE69428014D1 (de) | Verfahren zur Herstellung eines Dünnschichttransistors | |
DE68916875D1 (de) | Bildanzeigegerät und Verfahren zur Herstellung desselben. | |
DE3751206D1 (de) | Dünnschicht-Elektrolumineszentenvorrichtung und Verfahren zur Herstellung derselben. | |
DE69117374D1 (de) | SiC-Dünnschichtthermistor und Verfahren und Herstellungsverfahren. | |
DE69211218D1 (de) | Dünnfilm Feldeffektanordnung mit einer LDD-Struktur und Verfahren zur Herstellung | |
DE69327559D1 (de) | Dünnfilm aus polysilizium und verfahren zu seiner herstellung | |
DE69118511D1 (de) | EPROM und Verfahren zur Herstellung | |
DE69320572D1 (de) | Dünnfilm-Halbleiteranordnung und Verfahren zur ihrer Herstellung | |
DE69327416D1 (de) | Organischer magnetischer Film und Verfahren zur Herstellung desselben | |
DE69712684D1 (de) | Verfahren zur Herstellung eines Dünnschichttransistors | |
DE69218501D1 (de) | Dünnfilm-Transistoren und Verfahren zur Herstellung | |
DE69229314D1 (de) | Halbleiteranordnung und Verfahren zur Herstellung | |
DE69226757D1 (de) | Filmkondensator und Verfahren zur Herstellung | |
DE69227536D1 (de) | Antistatische Folie und Verfahren zur Herstellung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |