DE60138252D1 - Lithographischer Apparat, Verfahren zu dessen Kalibrierung und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Apparat, Verfahren zu dessen Kalibrierung und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE60138252D1
DE60138252D1 DE60138252T DE60138252T DE60138252D1 DE 60138252 D1 DE60138252 D1 DE 60138252D1 DE 60138252 T DE60138252 T DE 60138252T DE 60138252 T DE60138252 T DE 60138252T DE 60138252 D1 DE60138252 D1 DE 60138252D1
Authority
DE
Germany
Prior art keywords
calibration
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60138252T
Other languages
English (en)
Inventor
Yim Bun Patrick Kwan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60138252D1 publication Critical patent/DE60138252D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Optical Transform (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Transmission And Conversion Of Sensor Element Output (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE60138252T 2000-08-24 2001-08-22 Lithographischer Apparat, Verfahren zu dessen Kalibrierung und Verfahren zur Herstellung einer Vorrichtung Expired - Lifetime DE60138252D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP00307306 2000-08-24

Publications (1)

Publication Number Publication Date
DE60138252D1 true DE60138252D1 (de) 2009-05-20

Family

ID=8173221

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60138252T Expired - Lifetime DE60138252D1 (de) 2000-08-24 2001-08-22 Lithographischer Apparat, Verfahren zu dessen Kalibrierung und Verfahren zur Herstellung einer Vorrichtung

Country Status (5)

Country Link
US (2) US6819425B2 (de)
JP (3) JP4276801B2 (de)
KR (1) KR100592569B1 (de)
DE (1) DE60138252D1 (de)
TW (1) TW527526B (de)

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US6819425B2 (en) 2004-11-16
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TW527526B (en) 2003-04-11
JP2009164618A (ja) 2009-07-23
JP2002151405A (ja) 2002-05-24
JP2007180553A (ja) 2007-07-12
JP4966986B2 (ja) 2012-07-04
US20020041380A1 (en) 2002-04-11
JP4854499B2 (ja) 2012-01-18

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