DE60309238D1 - Lithographische Maske, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographische Maske, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE60309238D1
DE60309238D1 DE60309238T DE60309238T DE60309238D1 DE 60309238 D1 DE60309238 D1 DE 60309238D1 DE 60309238 T DE60309238 T DE 60309238T DE 60309238 T DE60309238 T DE 60309238T DE 60309238 D1 DE60309238 D1 DE 60309238D1
Authority
DE
Germany
Prior art keywords
lithographic
making
mask
lithographic apparatus
lithographic mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60309238T
Other languages
English (en)
Other versions
DE60309238T2 (de
Inventor
Markus Franciscus Ant Eurlings
Dijsseldonk Antonius Johan Van
Marcel Mathijs Theodo Dierichs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE60309238D1 publication Critical patent/DE60309238D1/de
Application granted granted Critical
Publication of DE60309238T2 publication Critical patent/DE60309238T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/52—Reflectors

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60309238T 2002-03-08 2003-03-06 Lithographische Maske, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung Expired - Lifetime DE60309238T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02251652 2002-03-08
EP02251652 2002-03-08

Publications (2)

Publication Number Publication Date
DE60309238D1 true DE60309238D1 (de) 2006-12-07
DE60309238T2 DE60309238T2 (de) 2007-06-06

Family

ID=27838133

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60309238T Expired - Lifetime DE60309238T2 (de) 2002-03-08 2003-03-06 Lithographische Maske, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (7)

Country Link
US (1) US6927004B2 (de)
JP (1) JP3727317B2 (de)
KR (1) KR100562195B1 (de)
CN (1) CN1302337C (de)
DE (1) DE60309238T2 (de)
SG (1) SG106672A1 (de)
TW (1) TW574597B (de)

Families Citing this family (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7170587B2 (en) * 2002-03-18 2007-01-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7333178B2 (en) * 2002-03-18 2008-02-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6972843B2 (en) * 2003-08-25 2005-12-06 Intel Corporation Lithography alignment
SG112034A1 (en) * 2003-11-06 2005-06-29 Asml Netherlands Bv Optical element, lithographic apparatus comprising such optical element and device manufacturing method
DE102004017131B4 (de) * 2004-03-31 2005-12-15 Infineon Technologies Ag Lithographiemaske für die Herstellung von Halbleiterbauelementen
US20050250019A1 (en) * 2004-05-04 2005-11-10 United Microelectronics Corp. Mask device for photolithography and application thereof
US7198872B2 (en) * 2004-05-25 2007-04-03 International Business Machines Corporation Light scattering EUVL mask
US7433016B2 (en) 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070181253A1 (en) * 2006-02-03 2007-08-09 Ming Xu Image receiver media and printing process
US20070292771A1 (en) * 2006-06-20 2007-12-20 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask
US7599064B2 (en) * 2007-03-07 2009-10-06 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods
US7838178B2 (en) * 2007-08-13 2010-11-23 Micron Technology, Inc. Masks for microlithography and methods of making and using such masks
NL1036305A1 (nl) 2007-12-21 2009-06-23 Asml Netherlands Bv Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system.
NL1036702A1 (nl) 2008-04-15 2009-10-19 Asml Holding Nv Diffraction elements for alignment targets.
EP2333816A4 (de) * 2008-09-05 2014-01-22 Asahi Glass Co Ltd Reflektierender maskenrohling für euv-lithographie und herstellungsverfahren dafür
JP2011108942A (ja) * 2009-11-19 2011-06-02 Renesas Electronics Corp 反射型露光用マスク、反射型露光用マスクの製造方法、および、半導体装置の製造方法
JP5648392B2 (ja) * 2010-09-22 2015-01-07 凸版印刷株式会社 反射型フォトマスクブランクおよびその製造方法
CN102096318B (zh) * 2011-01-17 2012-05-23 南京航空航天大学 激光直写技术制备多级结构微阵列的方法
PT3384903T (pt) 2011-11-18 2020-06-25 Regeneron Pharma Micropartícula contendo proteína terapêutica revestida com polímero biodegradável para uso médico
KR20140017767A (ko) 2012-07-31 2014-02-12 삼성디스플레이 주식회사 증착용 마스크 및 이의 정렬 방법
CN102998893B (zh) * 2012-11-19 2014-06-25 京东方科技集团股份有限公司 使用反射式掩膜版的曝光装置及曝光方法
AR095196A1 (es) 2013-03-15 2015-09-30 Regeneron Pharma Medio de cultivo celular libre de suero
DE102013220190B4 (de) * 2013-10-07 2021-08-12 Dr. Johannes Heidenhain Gmbh Messteilung und lichtelektrische Positionsmesseinrichtung mit dieser Messteilung
US9529249B2 (en) * 2013-11-15 2016-12-27 Taiwan Semiconductor Manufacturing Company, Ltd. Extreme ultraviolet lithography process and mask
US9261774B2 (en) * 2013-11-22 2016-02-16 Taiwan Semiconductor Manufacturing Company, Ltd. Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity
TW202336236A (zh) 2015-03-27 2023-09-16 美商再生元醫藥公司 偵測生物污染物之組成物及方法
MA43987A (fr) 2015-05-12 2018-12-19 Regeneron Pharma Détermination de la pureté de protéine multimère
TW202340452A (zh) 2015-08-04 2023-10-16 美商再生元醫藥公司 補充牛磺酸之細胞培養基及用法
DK3389636T3 (da) 2015-12-16 2022-09-19 Regeneron Pharma Sammensætninger og fremgangsmåder til fremstilling af proteinmikropartikler
JP7325961B2 (ja) * 2016-06-03 2023-08-15 エーエスエムエル ネザーランズ ビー．ブイ． パターニングデバイス
EP3504328A1 (de) 2016-08-24 2019-07-03 Regeneron Pharmaceuticals, Inc. Wirtszellenproteinmodifikation
WO2018068012A1 (en) 2016-10-07 2018-04-12 Regeneron Pharmaceuticals, Inc. Room temperature stable lyophilized protein
KR102279529B1 (ko) * 2017-02-25 2021-07-21 에이에스엠엘 네델란즈 비.브이. 패턴화 디바이스, 그 제조 방법, 및 패턴화 디바이스 설계 방법
CN110914293B (zh) 2017-07-06 2024-08-13 里珍纳龙药品有限公司 用于制备糖蛋白的细胞培养工艺
US10642158B2 (en) * 2017-11-29 2020-05-05 Taiwan Semiconductor Manufacturing Co., Ltd. Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning
AU2018392334A1 (en) 2017-12-22 2020-05-28 Regeneron Pharmaceuticals, Inc. System and method for characterizing drug product impurities
WO2019152303A1 (en) 2018-01-31 2019-08-08 Regeneron Pharmaceuticals, Inc. Systems and methods for characterizing drug product impurities
TWI825066B (zh) 2018-02-01 2023-12-11 美商再生元醫藥公司 治療性單株抗體之品質屬性的定量及模型化
TWI786265B (zh) 2018-02-02 2022-12-11 美商再生元醫藥公司 用於表徵蛋白質二聚合之系統及方法
AU2019227531A1 (en) 2018-02-28 2020-10-15 Regeneron Pharmaceuticals, Inc. Systems and methods for identifying viral contaminants
WO2019182901A1 (en) 2018-03-19 2019-09-26 Regeneron Pharmaceuticals, Inc. Microchip capillary electrophoresis assays and reagents
DE102018204626A1 (de) * 2018-03-27 2019-04-04 Carl Zeiss Smt Gmbh Beleuchtungsmaske sowie Verfahren zu deren Herstellung
TW202016125A (zh) 2018-05-10 2020-05-01 美商再生元醫藥公司 用於定量及調節蛋白質黏度之系統與方法
BR112021002432A2 (pt) 2018-08-13 2021-05-04 Regeneron Pharmaceuticals, Inc. seleção de proteína terapêutica em condições in vivo simuladas
US11754569B2 (en) 2018-08-30 2023-09-12 Regeneron Pharmaceuticals, Inc. Methods for characterizing protein complexes
SG11202104237YA (en) 2019-01-16 2021-05-28 Regeneron Pharma Methods for identifying free thiols in proteins
AU2020212022A1 (en) 2019-01-25 2021-07-29 Regeneron Pharmaceuticals, Inc. Quantitation and identification of dimers in co-formulations
CN113646637A (zh) 2019-01-25 2021-11-12 瑞泽恩制药公司 蛋白a色谱-电喷雾电离质谱仪
US10961500B1 (en) 2019-04-23 2021-03-30 Regeneron Pharmaceuticals, Inc. Cell culture medium for eukaryotic cells
WO2020231992A1 (en) 2019-05-13 2020-11-19 Regeneron Pharmaceuticals, Inc. Improved competitive ligand binding assays
US20220323937A1 (en) 2019-09-24 2022-10-13 Regeneron Pharmaceuticals, Inc. Systems and methods for chromatography use and regeneration
CN114760986A (zh) 2019-11-25 2022-07-15 里珍纳龙药品有限公司 使用非水性乳液的持续释放调配物
BR122023021668A2 (pt) 2020-01-21 2024-01-09 Regeneron Pharmaceuticals, Inc. Método para determinar a estabilidade de uma proteína de interesse
MX2023002417A (es) 2020-08-31 2023-03-22 Regeneron Pharma Estrategias de suministro de asparagina para mejorar el rendimiento del cultivo celular y mitigar las variantes de secuencia de asparagina.
KR20230121854A (ko) 2020-12-17 2023-08-21 리제너론 파아마슈티컬스, 인크. 단백질-캡슐화 마이크로겔의 제작
WO2022204728A1 (en) 2021-03-26 2022-09-29 Regeneron Pharmaceuticals, Inc. Methods and systems for developing mixing protocols
US20230045769A1 (en) 2021-07-13 2023-02-09 Regeneron Pharmaceuticals, Inc. Mass spectrometry-based strategy for determining product-related variants of a biologic
EP4370917A1 (de) 2021-07-13 2024-05-22 Regeneron Pharmaceuticals, Inc. Charakterisierung von proteinen durch anionenaustauschchromatografie-massenspektrometrie (aex-ms)
CN113777685B (zh) * 2021-08-30 2023-07-04 同济大学 基于扫描原子光刻技术的大面积自溯源光栅制备方法
EP4402475A1 (de) 2021-09-14 2024-07-24 Regeneron Pharmaceuticals, Inc. Strategie auf nmassspektrometriebasis zur charakterisierung von spezies mit hohem molekulargewicht eines biologischen stoffes
CN118043666A (zh) 2021-09-28 2024-05-14 瑞泽恩制药公司 对定量药物和靶标浓度的测定
AU2022360838A1 (en) 2021-10-07 2024-03-28 Regeneron Pharmaceuticals, Inc. Systems and methods of ph modeling and control
EP4413359A1 (de) 2021-10-07 2024-08-14 Regeneron Pharmaceuticals, Inc. Ph-messgerät-kalibrierung und -korrektur
US20230243841A1 (en) 2021-11-01 2023-08-03 Regeneron Pharmaceuticals, Inc. Methods to prevent disulfide scrambling for ms-based proteomics
AR128824A1 (es) 2022-03-18 2024-06-19 Regeneron Pharma Métodos de análisis y cuantificación de variantes polipeptídicas de carga
US20240198253A1 (en) 2022-12-16 2024-06-20 Regeneron Pharmaceuticals, Inc. Methods and systems for assessing chromatographic column integrity
US20240245779A1 (en) 2023-01-25 2024-07-25 Regeneron Pharmaceuticals, Inc. Methods of modeling liquid protein composition stability

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE123885T1 (de) 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
JPH05198490A (ja) * 1992-01-22 1993-08-06 Fujitsu Ltd 荷電粒子ビーム露光装置
EP0637393B1 (de) 1993-02-23 1999-04-21 Interuniversitair Micro-Elektronica Centrum Vzw Phasenstruktur um die optische aufloesung fuer ein beleuchtungssystem durch projektion zu erhoehen
JP3078163B2 (ja) * 1993-10-15 2000-08-21 キヤノン株式会社 リソグラフィ用反射型マスクおよび縮小投影露光装置
US5501925A (en) 1994-05-27 1996-03-26 Litel Instruments High power masks and methods for manufacturing same
WO1996025677A1 (fr) 1995-02-17 1996-08-22 Washi Kosan Co., Ltd. Structure de surface convexe d'un grain ultra-fin
US6410193B1 (en) 1999-12-30 2002-06-25 Intel Corporation Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength

Also Published As

Publication number Publication date
CN1302337C (zh) 2007-02-28
JP2003273013A (ja) 2003-09-26
KR20040002458A (ko) 2004-01-07
SG106672A1 (en) 2004-10-29
TW200307851A (en) 2003-12-16
TW574597B (en) 2004-02-01
DE60309238T2 (de) 2007-06-06
KR100562195B1 (ko) 2006-03-20
JP3727317B2 (ja) 2005-12-14
US6927004B2 (en) 2005-08-09
US20030180632A1 (en) 2003-09-25
CN1448784A (zh) 2003-10-15

Similar Documents

Publication Publication Date Title
DE60309238D1 (de) Lithographische Maske, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60319658D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60323927D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60229680D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60223102D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60225216D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60302897D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60227304D1 (de) Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
DE60335595D1 (de) Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
DE602004025893D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60336189D1 (de) Halter, lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
DE60334428D1 (de) Halter, lithographisches Gerät und Verfahren zur Herstellung einer Vorrichtung
DE60137301D1 (de) Lithographieapparat und Verfahren zur Herstellung einer Vorrichtung
DE60138252D1 (de) Lithographischer Apparat, Verfahren zu dessen Kalibrierung und Verfahren zur Herstellung einer Vorrichtung
DE602005020720D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005002155D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005000696D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005000147D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005021180D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005004856D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005020893D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60132944D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60227218D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60322657D1 (de) Katoptrisches Projektionssystem, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
DE602005018150D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition