CN1265155C - 无尘室 - Google Patents

无尘室 Download PDF

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Publication number
CN1265155C
CN1265155C CNB011456167A CN01145616A CN1265155C CN 1265155 C CN1265155 C CN 1265155C CN B011456167 A CNB011456167 A CN B011456167A CN 01145616 A CN01145616 A CN 01145616A CN 1265155 C CN1265155 C CN 1265155C
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CN
China
Prior art keywords
dust free
free room
ffu
control
information
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB011456167A
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English (en)
Chinese (zh)
Other versions
CN1401949A (zh
Inventor
横山诚
小野惠一
田村史之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of CN1401949A publication Critical patent/CN1401949A/zh
Application granted granted Critical
Publication of CN1265155C publication Critical patent/CN1265155C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F11/00—Control or safety arrangements
    • F24F11/30—Control or safety arrangements for purposes related to the operation of the system, e.g. for safety or monitoring
    • F24F11/32—Responding to malfunctions or emergencies
    • F24F11/39—Monitoring filter performance
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F11/00—Control or safety arrangements
    • F24F11/70—Control systems characterised by their outputs; Constructional details thereof
    • F24F11/72—Control systems characterised by their outputs; Constructional details thereof for controlling the supply of treated air, e.g. its pressure
    • F24F11/74—Control systems characterised by their outputs; Constructional details thereof for controlling the supply of treated air, e.g. its pressure for controlling air flow rate or air velocity
    • F24F11/77—Control systems characterised by their outputs; Constructional details thereof for controlling the supply of treated air, e.g. its pressure for controlling air flow rate or air velocity by controlling the speed of ventilators
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F11/00—Control or safety arrangements
    • F24F11/70—Control systems characterised by their outputs; Constructional details thereof
    • F24F11/72—Control systems characterised by their outputs; Constructional details thereof for controlling the supply of treated air, e.g. its pressure
    • F24F11/79—Control systems characterised by their outputs; Constructional details thereof for controlling the supply of treated air, e.g. its pressure for controlling the direction of the supplied air
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B30/00—Energy efficient heating, ventilation or air conditioning [HVAC]
    • Y02B30/70—Efficient control or regulation technologies, e.g. for control of refrigerant flow, motor or heating

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ventilation (AREA)
  • Air Conditioning Control Device (AREA)
CNB011456167A 2001-08-24 2001-12-20 无尘室 Expired - Fee Related CN1265155C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP253771/2001 2001-08-24
JP2001253771A JP4038352B2 (ja) 2001-08-24 2001-08-24 クリーンルーム
JP253771/01 2001-08-24

Related Child Applications (3)

Application Number Title Priority Date Filing Date
CN2006100049329A Division CN1982800B (zh) 2001-08-24 2001-12-20 风扇过滤器单元控制系统
CNA2006100049314A Division CN1975277A (zh) 2001-08-24 2001-12-20 风扇过滤器单元控制系统
CNB2005100079673A Division CN100504224C (zh) 2001-08-24 2001-12-20 无尘室

Publications (2)

Publication Number Publication Date
CN1401949A CN1401949A (zh) 2003-03-12
CN1265155C true CN1265155C (zh) 2006-07-19

Family

ID=19082040

Family Applications (4)

Application Number Title Priority Date Filing Date
CNA2006100049314A Pending CN1975277A (zh) 2001-08-24 2001-12-20 风扇过滤器单元控制系统
CNB2005100079673A Expired - Fee Related CN100504224C (zh) 2001-08-24 2001-12-20 无尘室
CNB011456167A Expired - Fee Related CN1265155C (zh) 2001-08-24 2001-12-20 无尘室
CN2006100049329A Expired - Fee Related CN1982800B (zh) 2001-08-24 2001-12-20 风扇过滤器单元控制系统

Family Applications Before (2)

Application Number Title Priority Date Filing Date
CNA2006100049314A Pending CN1975277A (zh) 2001-08-24 2001-12-20 风扇过滤器单元控制系统
CNB2005100079673A Expired - Fee Related CN100504224C (zh) 2001-08-24 2001-12-20 无尘室

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2006100049329A Expired - Fee Related CN1982800B (zh) 2001-08-24 2001-12-20 风扇过滤器单元控制系统

Country Status (4)

Country Link
US (2) US6607435B2 (ja)
JP (1) JP4038352B2 (ja)
CN (4) CN1975277A (ja)
TW (1) TW580553B (ja)

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TW580553B (en) 2004-03-21
CN100504224C (zh) 2009-06-24
US6607435B2 (en) 2003-08-19
US20030045226A1 (en) 2003-03-06
CN1651831A (zh) 2005-08-10
CN1982800A (zh) 2007-06-20
CN1401949A (zh) 2003-03-12
CN1982800B (zh) 2010-06-16
JP2003065577A (ja) 2003-03-05
US6755734B2 (en) 2004-06-29
US20030040269A1 (en) 2003-02-27
CN1975277A (zh) 2007-06-06

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