CN113025992B - 组合物和使用所述组合物沉积含硅膜的方法 - Google Patents
组合物和使用所述组合物沉积含硅膜的方法 Download PDFInfo
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- CN113025992B CN113025992B CN202110244436.5A CN202110244436A CN113025992B CN 113025992 B CN113025992 B CN 113025992B CN 202110244436 A CN202110244436 A CN 202110244436A CN 113025992 B CN113025992 B CN 113025992B
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110244436.5A CN113025992B (zh) | 2014-10-24 | 2015-10-23 | 组合物和使用所述组合物沉积含硅膜的方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462068248P | 2014-10-24 | 2014-10-24 | |
| US62/068,248 | 2014-10-24 | ||
| PCT/US2015/057045 WO2016065221A1 (en) | 2014-10-24 | 2015-10-23 | Compositions and methods using same for deposition of silicon-containing films |
| CN202110244436.5A CN113025992B (zh) | 2014-10-24 | 2015-10-23 | 组合物和使用所述组合物沉积含硅膜的方法 |
| CN201580067222.8A CN107257867B (zh) | 2014-10-24 | 2015-10-23 | 组合物和使用所述组合物沉积含硅膜的方法 |
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