CN111694218B - 感光性树脂组合物以及电路图案的形成方法 - Google Patents
感光性树脂组合物以及电路图案的形成方法 Download PDFInfo
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- CN111694218B CN111694218B CN202010587896.3A CN202010587896A CN111694218B CN 111694218 B CN111694218 B CN 111694218B CN 202010587896 A CN202010587896 A CN 202010587896A CN 111694218 B CN111694218 B CN 111694218B
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- WOTPFVNWMLFMFW-ISLYRVAYSA-N para red Chemical compound OC1=CC=C2C=CC=CC2=C1\N=N\C1=CC=C(N(=O)=O)C=C1 WOTPFVNWMLFMFW-ISLYRVAYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000056 polyoxyethylene ether Polymers 0.000 description 1
- 229940051841 polyoxyethylene ether Drugs 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000003918 potentiometric titration Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 239000001069 triethyl citrate Substances 0.000 description 1
- VMYFZRTXGLUXMZ-UHFFFAOYSA-N triethyl citrate Natural products CCOC(=O)C(O)(C(=O)OCC)C(=O)OCC VMYFZRTXGLUXMZ-UHFFFAOYSA-N 0.000 description 1
- 235000013769 triethyl citrate Nutrition 0.000 description 1
- JEVGKYBUANQAKG-UHFFFAOYSA-N victoria blue R Chemical compound [Cl-].C12=CC=CC=C2C(=[NH+]CC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JEVGKYBUANQAKG-UHFFFAOYSA-N 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/106—Esters of polycondensation macromers
- C08F222/1063—Esters of polycondensation macromers of alcohol terminated polyethers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010587896.3A CN111694218B (zh) | 2014-05-21 | 2015-05-21 | 感光性树脂组合物以及电路图案的形成方法 |
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| JP2014105267 | 2014-05-21 | ||
| JP2014-105267 | 2014-05-21 | ||
| CN202010587896.3A CN111694218B (zh) | 2014-05-21 | 2015-05-21 | 感光性树脂组合物以及电路图案的形成方法 |
| CN201580025748.XA CN106462068B (zh) | 2014-05-21 | 2015-05-21 | 感光性树脂组合物以及电路图案的形成方法 |
| PCT/JP2015/064644 WO2015178462A1 (ja) | 2014-05-21 | 2015-05-21 | 感光性樹脂組成物及び回路パターンの形成方法 |
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| CN201580025748.XA Division CN106462068B (zh) | 2014-05-21 | 2015-05-21 | 感光性树脂组合物以及电路图案的形成方法 |
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| CN111694218A CN111694218A (zh) | 2020-09-22 |
| CN111694218B true CN111694218B (zh) | 2023-09-08 |
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| CN201580025748.XA Active CN106462068B (zh) | 2014-05-21 | 2015-05-21 | 感光性树脂组合物以及电路图案的形成方法 |
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| KR (4) | KR20160131084A (ja) |
| CN (2) | CN111694218B (ja) |
| TW (3) | TWI660241B (ja) |
| WO (1) | WO2015178462A1 (ja) |
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| JPWO2015178462A1 (ja) * | 2014-05-21 | 2017-04-20 | 旭化成株式会社 | 感光性樹脂組成物及び回路パターンの形成方法 |
| KR101990230B1 (ko) * | 2015-04-08 | 2019-06-17 | 아사히 가세이 가부시키가이샤 | 감광성 수지 조성물 |
| JP6809873B2 (ja) * | 2015-12-28 | 2021-01-06 | 旭化成株式会社 | 積層体 |
| JP6755109B2 (ja) * | 2016-03-29 | 2020-09-16 | 旭化成株式会社 | 感光性樹脂組成物、感光性樹脂積層体、レジストパターン形成方法及び導体パターン製造方法 |
| JP6985291B2 (ja) * | 2016-12-07 | 2021-12-22 | 旭化成株式会社 | 感光性樹脂組成物及び感光性樹脂積層体 |
| TWI700183B (zh) * | 2017-12-20 | 2020-08-01 | 日商旭化成股份有限公司 | 感光性樹脂積層體 |
| CN108663867A (zh) * | 2018-04-11 | 2018-10-16 | 华南师范大学 | 一种染料掺杂的激光防护膜 |
| CN112534351A (zh) * | 2018-08-09 | 2021-03-19 | 旭化成株式会社 | 感光性树脂组合物及抗蚀图案的形成方法 |
| WO2021005766A1 (ja) * | 2019-07-10 | 2021-01-14 | 昭和電工マテリアルズ株式会社 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 |
| WO2021095784A1 (ja) | 2019-11-11 | 2021-05-20 | 旭化成株式会社 | 感光性樹脂組成物及び感光性樹脂積層体 |
| KR102242551B1 (ko) * | 2019-12-31 | 2021-04-20 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
| JP7376723B2 (ja) * | 2019-12-31 | 2023-11-08 | コーロン インダストリーズ インク | 感光性樹脂組成物およびそれを用いたドライフィルムフォトレジスト、感光性エレメント、回路基板、およびディスプレイ装置 |
| JP2020190735A (ja) * | 2020-07-14 | 2020-11-26 | 旭化成株式会社 | 感光性樹脂組成物、感光性樹脂積層体、レジストパターン形成方法及び導体パターン製造方法 |
| JPWO2023054619A1 (ja) * | 2021-09-30 | 2023-04-06 |
Citations (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4332879A (en) * | 1978-12-01 | 1982-06-01 | Hughes Aircraft Company | Process for depositing a film of controlled composition using a metallo-organic photoresist |
| JPH0627673A (ja) * | 1992-03-24 | 1994-02-04 | Toshiba Corp | パターン形成方法 |
| JPH08107051A (ja) * | 1994-10-06 | 1996-04-23 | Fujitsu Ltd | 半導体装置の製造方法 |
| US5976759A (en) * | 1995-12-21 | 1999-11-02 | Wako Pure Chemical Industries, Ltd. | Polymer composition and resist material |
| JP2000109619A (ja) * | 1998-10-08 | 2000-04-18 | Japan Polychem Corp | 光崩壊性エチレン系樹脂組成物 |
| JP2001133977A (ja) * | 1999-08-25 | 2001-05-18 | Tokyo Ohka Kogyo Co Ltd | 多層型感光材料 |
| JP2001296660A (ja) * | 2000-04-17 | 2001-10-26 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
| CN1341870A (zh) * | 2000-08-30 | 2002-03-27 | 松下电器产业株式会社 | 背面投影型屏幕及背面投影型显示器 |
| CN1396627A (zh) * | 2001-07-05 | 2003-02-12 | 东京应化工业株式会社 | 光刻胶层中减小图案大小的方法 |
| JP2003241386A (ja) * | 2001-12-13 | 2003-08-27 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| JP2003329826A (ja) * | 2002-05-15 | 2003-11-19 | Sumitomo Chem Co Ltd | カラーフィルタを構成する透明膜形成用感光性樹脂組成物 |
| JP2004029702A (ja) * | 2001-11-22 | 2004-01-29 | Mitsui Chemicals Inc | 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工部品 |
| CN1476367A (zh) * | 2000-12-01 | 2004-02-18 | �����֯��ʽ���� | 研磨垫及其制造方法和研磨垫用缓冲层 |
| JP2005010318A (ja) * | 2003-06-18 | 2005-01-13 | Tamura Kaken Co Ltd | 感光性樹脂組成物及び電子部品搭載用回路基板の製造方法 |
| JP2005084092A (ja) * | 2003-09-04 | 2005-03-31 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP2005254696A (ja) * | 2004-03-12 | 2005-09-22 | Asahi Kasei Chemicals Corp | レーザー彫刻可能な円筒状印刷原版 |
| CN1717428A (zh) * | 2002-11-28 | 2006-01-04 | 太阳油墨制造株式会社 | 光固化性和热固化性树脂组合物以及使用该组合物的印刷电路板 |
| JP2006016534A (ja) * | 2004-07-02 | 2006-01-19 | Toyobo Co Ltd | ハイパーブランチ構造を有する樹脂及びそれを用いたレジスト剤 |
| CN1991584A (zh) * | 2005-12-28 | 2007-07-04 | 富士胶片电子材料有限公司 | 光固化性着色组合物和滤色镜以及液晶显示装置 |
| JP2007178450A (ja) * | 2005-12-26 | 2007-07-12 | Fujifilm Corp | パターン形成材料、及びパターン形成方法 |
| JP2007316247A (ja) * | 2006-05-24 | 2007-12-06 | Asahi Kasei Electronics Co Ltd | 感光性樹脂組成物及びガラスパターンの形成方法 |
| CN101192004A (zh) * | 2006-11-27 | 2008-06-04 | 乐凯集团第二胶片厂 | 适合于uv-ctp的免化学处理阴图感光组成物和用其制作的平印版及平印版制作方法 |
| JP2009020268A (ja) * | 2007-07-11 | 2009-01-29 | Asahi Kasei Electronics Co Ltd | 感光性樹脂組成物 |
| CN101398620A (zh) * | 2007-09-28 | 2009-04-01 | 富士胶片株式会社 | 感光性组合物、感光性薄膜、感光性层叠体、永久图案形成方法及印刷电路板 |
| CN101595406A (zh) * | 2007-01-12 | 2009-12-02 | 凸版印刷株式会社 | 着色组合物、滤色器及其制造方法 |
| JP2010002457A (ja) * | 2008-06-18 | 2010-01-07 | Toppan Printing Co Ltd | 感光性着色組成物及びカラーフィルタ基板及び半透過型液晶表示装置 |
| CN101673053A (zh) * | 2008-09-11 | 2010-03-17 | 富士胶片株式会社 | 感光性组合物和基板的加工基板的制造方法 |
| JP2010126609A (ja) * | 2008-11-26 | 2010-06-10 | Fujifilm Corp | 感光性組成物および加工基板の製造方法 |
| JP2010139845A (ja) * | 2008-12-12 | 2010-06-24 | Nissan Chem Ind Ltd | レジストパターンの形成方法 |
| CN101765645A (zh) * | 2007-08-21 | 2010-06-30 | 旭化成纤维株式会社 | 热粘合性聚氨酯薄膜 |
| CN101802713A (zh) * | 2007-10-01 | 2010-08-11 | 日产化学工业株式会社 | 形成抗蚀剂下层膜的组合物、使用该组合物的半导体装置的制造方法以及形成抗蚀剂下层膜的组合物用添加剂 |
| CN101872121A (zh) * | 2009-04-24 | 2010-10-27 | 新日铁化学株式会社 | 感光性树脂组合物和固化膜以及隔壁 |
| JP2010266803A (ja) * | 2009-05-18 | 2010-11-25 | Shin-Etsu Chemical Co Ltd | ネガ型レジスト組成物、パターン形成方法、ネガ型レジスト組成物の検査方法及び調製方法 |
| CN101910943A (zh) * | 2007-12-25 | 2010-12-08 | 旭化成电子材料株式会社 | 感光性树脂层压体 |
| CN102105998A (zh) * | 2008-05-12 | 2011-06-22 | 亚利桑那大学董事会 | 具有大的多个共轴盘反射器的太阳能聚光器装置 |
| JP2011203495A (ja) * | 2010-03-25 | 2011-10-13 | Fuji Xerox Co Ltd | 電子写真感光体、電子写真感光体の製造方法、プロセスカートリッジ、および画像形成装置 |
| CN102314086A (zh) * | 2010-06-21 | 2012-01-11 | 新日铁化学株式会社 | 黑色阻剂用感光性树脂组合物及滤色器遮光膜 |
| JP2012008537A (ja) * | 2010-05-27 | 2012-01-12 | Jsr Corp | 硬化膜形成用感放射線性樹脂組成物、硬化膜形成用感放射線性樹脂組成物の製造方法、硬化膜、硬化膜の形成方法及び表示素子 |
| CN102834273A (zh) * | 2010-03-29 | 2012-12-19 | 富士胶片株式会社 | 激光雕刻型柔性印刷版原版 |
| KR101302736B1 (ko) * | 2012-10-09 | 2013-09-03 | 기린정밀공업 (주) | Ｌｅｄ 무대 조명 장치 |
| JP2013216782A (ja) * | 2012-04-09 | 2013-10-24 | Kaneka Corp | 硬化性組成物およびその用途 |
| JP2013222061A (ja) * | 2012-04-16 | 2013-10-28 | Tokyo Ohka Kogyo Co Ltd | レジストパターン形成方法 |
| JP2014048340A (ja) * | 2012-08-29 | 2014-03-17 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3710281A1 (de) * | 1987-03-28 | 1988-10-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| JPS6425147A (en) * | 1987-07-22 | 1989-01-27 | Hitachi Chemical Co Ltd | Photosensitive resin composition |
| JPH06242603A (ja) * | 1993-02-15 | 1994-09-02 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性エレメント |
| JPH06289602A (ja) * | 1993-03-31 | 1994-10-18 | Tokyo Ohka Kogyo Co Ltd | ペリレン系色素を用いた感光性樹脂組成物 |
| JP4524844B2 (ja) * | 2000-03-23 | 2010-08-18 | 日立化成工業株式会社 | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法 |
| JP2002069110A (ja) * | 2000-09-01 | 2002-03-08 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| JP2005122122A (ja) * | 2003-09-22 | 2005-05-12 | Mitsubishi Chemicals Corp | レジスト画像形成方法 |
| JP4351519B2 (ja) * | 2003-11-26 | 2009-10-28 | 東洋インキ製造株式会社 | 感光性組成物およびカラーフィルタ |
| JP2006208829A (ja) * | 2005-01-28 | 2006-08-10 | Mitsubishi Chemicals Corp | レジスト画像形成材料、レジスト画像形成材、及びレジスト画像形成方法 |
| JP2006276482A (ja) * | 2005-03-29 | 2006-10-12 | Nichigo Morton Co Ltd | 感光性樹脂組成物及びこれを用いた感光性ドライフィルムレジスト |
| CN1892428A (zh) * | 2005-07-08 | 2007-01-10 | 长兴化学工业股份有限公司 | 可光成像组合物 |
| JP2007102117A (ja) * | 2005-10-07 | 2007-04-19 | Nippon Synthetic Chem Ind Co Ltd:The | レーザー用画像形成材、及びパターンめっき用画像形成方法 |
| JP2007310025A (ja) * | 2006-05-16 | 2007-11-29 | Fujifilm Corp | 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板 |
| KR101059408B1 (ko) * | 2006-08-03 | 2011-08-29 | 아사히 가세이 일렉트로닉스 가부시끼가이샤 | 감광성 수지 조성물 및 적층체 |
| CN101600995B (zh) * | 2007-01-31 | 2012-05-09 | 日立化成工业株式会社 | 感光性元件 |
| JP5284833B2 (ja) * | 2008-03-31 | 2013-09-11 | 富士フイルム株式会社 | フォトスペーサーの製造方法 |
| JP5051299B2 (ja) | 2008-06-02 | 2012-10-17 | 日立化成工業株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法、及びプリント配線板の製造方法 |
| JP5120093B2 (ja) * | 2008-06-19 | 2013-01-16 | Ｊｓｒ株式会社 | 感光性組成物および電極の製造方法 |
| JP5396833B2 (ja) * | 2008-11-28 | 2014-01-22 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物、液晶表示素子のスペーサーおよび保護膜ならびにそれらの形成方法 |
| JP5494645B2 (ja) | 2009-02-26 | 2014-05-21 | 日立化成株式会社 | 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP2010249884A (ja) * | 2009-04-10 | 2010-11-04 | Dupont Mrc Dryfilm Ltd | 光重合性樹脂組成物およびこれを用いた感光性フィルム |
| JP6022749B2 (ja) * | 2010-07-30 | 2016-11-09 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法、リードフレームの製造方法及びプリント配線板の製造方法 |
| KR20120043461A (ko) * | 2010-10-26 | 2012-05-04 | 황광민 | 절삭분 선별장치 |
| JP5707154B2 (ja) | 2011-01-31 | 2015-04-22 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及びその用途 |
| JP2012215787A (ja) * | 2011-04-01 | 2012-11-08 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法、並びに、プリント配線板及びその製造方法 |
| JP6019902B2 (ja) * | 2011-09-06 | 2016-11-02 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法 |
| JP6064480B2 (ja) * | 2011-10-26 | 2017-01-25 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP6229256B2 (ja) * | 2011-10-31 | 2017-11-15 | 日立化成株式会社 | 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP5948539B2 (ja) * | 2012-01-27 | 2016-07-06 | 旭化成株式会社 | 感光性樹脂組成物 |
| KR102162752B1 (ko) * | 2013-07-23 | 2020-10-07 | 히타치가세이가부시끼가이샤 | 투영 노광용 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 형성 방법, 프린트 배선판의 제조 방법 및 리드 프레임의 제조 방법 |
| JP2015143809A (ja) * | 2013-12-25 | 2015-08-06 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JPWO2015178462A1 (ja) * | 2014-05-21 | 2017-04-20 | 旭化成株式会社 | 感光性樹脂組成物及び回路パターンの形成方法 |
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- 2017-09-04 JP JP2017169781A patent/JP6470805B2/ja active Active
Patent Citations (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4332879A (en) * | 1978-12-01 | 1982-06-01 | Hughes Aircraft Company | Process for depositing a film of controlled composition using a metallo-organic photoresist |
| JPH0627673A (ja) * | 1992-03-24 | 1994-02-04 | Toshiba Corp | パターン形成方法 |
| JPH08107051A (ja) * | 1994-10-06 | 1996-04-23 | Fujitsu Ltd | 半導体装置の製造方法 |
| US5976759A (en) * | 1995-12-21 | 1999-11-02 | Wako Pure Chemical Industries, Ltd. | Polymer composition and resist material |
| JP2000109619A (ja) * | 1998-10-08 | 2000-04-18 | Japan Polychem Corp | 光崩壊性エチレン系樹脂組成物 |
| JP2001133977A (ja) * | 1999-08-25 | 2001-05-18 | Tokyo Ohka Kogyo Co Ltd | 多層型感光材料 |
| JP2001296660A (ja) * | 2000-04-17 | 2001-10-26 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
| CN1341870A (zh) * | 2000-08-30 | 2002-03-27 | 松下电器产业株式会社 | 背面投影型屏幕及背面投影型显示器 |
| CN1476367A (zh) * | 2000-12-01 | 2004-02-18 | �����֯��ʽ���� | 研磨垫及其制造方法和研磨垫用缓冲层 |
| CN1396627A (zh) * | 2001-07-05 | 2003-02-12 | 东京应化工业株式会社 | 光刻胶层中减小图案大小的方法 |
| JP2004029702A (ja) * | 2001-11-22 | 2004-01-29 | Mitsui Chemicals Inc | 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工部品 |
| JP2003241386A (ja) * | 2001-12-13 | 2003-08-27 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| JP2003329826A (ja) * | 2002-05-15 | 2003-11-19 | Sumitomo Chem Co Ltd | カラーフィルタを構成する透明膜形成用感光性樹脂組成物 |
| CN1717428A (zh) * | 2002-11-28 | 2006-01-04 | 太阳油墨制造株式会社 | 光固化性和热固化性树脂组合物以及使用该组合物的印刷电路板 |
| JP2005010318A (ja) * | 2003-06-18 | 2005-01-13 | Tamura Kaken Co Ltd | 感光性樹脂組成物及び電子部品搭載用回路基板の製造方法 |
| JP2005084092A (ja) * | 2003-09-04 | 2005-03-31 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP2005254696A (ja) * | 2004-03-12 | 2005-09-22 | Asahi Kasei Chemicals Corp | レーザー彫刻可能な円筒状印刷原版 |
| JP2006016534A (ja) * | 2004-07-02 | 2006-01-19 | Toyobo Co Ltd | ハイパーブランチ構造を有する樹脂及びそれを用いたレジスト剤 |
| JP2007178450A (ja) * | 2005-12-26 | 2007-07-12 | Fujifilm Corp | パターン形成材料、及びパターン形成方法 |
| CN1991584A (zh) * | 2005-12-28 | 2007-07-04 | 富士胶片电子材料有限公司 | 光固化性着色组合物和滤色镜以及液晶显示装置 |
| JP2007316247A (ja) * | 2006-05-24 | 2007-12-06 | Asahi Kasei Electronics Co Ltd | 感光性樹脂組成物及びガラスパターンの形成方法 |
| CN101192004A (zh) * | 2006-11-27 | 2008-06-04 | 乐凯集团第二胶片厂 | 适合于uv-ctp的免化学处理阴图感光组成物和用其制作的平印版及平印版制作方法 |
| CN101595406A (zh) * | 2007-01-12 | 2009-12-02 | 凸版印刷株式会社 | 着色组合物、滤色器及其制造方法 |
| JP2009020268A (ja) * | 2007-07-11 | 2009-01-29 | Asahi Kasei Electronics Co Ltd | 感光性樹脂組成物 |
| CN101765645A (zh) * | 2007-08-21 | 2010-06-30 | 旭化成纤维株式会社 | 热粘合性聚氨酯薄膜 |
| CN101398620A (zh) * | 2007-09-28 | 2009-04-01 | 富士胶片株式会社 | 感光性组合物、感光性薄膜、感光性层叠体、永久图案形成方法及印刷电路板 |
| CN101802713A (zh) * | 2007-10-01 | 2010-08-11 | 日产化学工业株式会社 | 形成抗蚀剂下层膜的组合物、使用该组合物的半导体装置的制造方法以及形成抗蚀剂下层膜的组合物用添加剂 |
| CN101910943A (zh) * | 2007-12-25 | 2010-12-08 | 旭化成电子材料株式会社 | 感光性树脂层压体 |
| CN102105998A (zh) * | 2008-05-12 | 2011-06-22 | 亚利桑那大学董事会 | 具有大的多个共轴盘反射器的太阳能聚光器装置 |
| JP2010002457A (ja) * | 2008-06-18 | 2010-01-07 | Toppan Printing Co Ltd | 感光性着色組成物及びカラーフィルタ基板及び半透過型液晶表示装置 |
| CN101673053A (zh) * | 2008-09-11 | 2010-03-17 | 富士胶片株式会社 | 感光性组合物和基板的加工基板的制造方法 |
| JP2010126609A (ja) * | 2008-11-26 | 2010-06-10 | Fujifilm Corp | 感光性組成物および加工基板の製造方法 |
| JP2010139845A (ja) * | 2008-12-12 | 2010-06-24 | Nissan Chem Ind Ltd | レジストパターンの形成方法 |
| CN101872121A (zh) * | 2009-04-24 | 2010-10-27 | 新日铁化学株式会社 | 感光性树脂组合物和固化膜以及隔壁 |
| JP2010266803A (ja) * | 2009-05-18 | 2010-11-25 | Shin-Etsu Chemical Co Ltd | ネガ型レジスト組成物、パターン形成方法、ネガ型レジスト組成物の検査方法及び調製方法 |
| JP2011203495A (ja) * | 2010-03-25 | 2011-10-13 | Fuji Xerox Co Ltd | 電子写真感光体、電子写真感光体の製造方法、プロセスカートリッジ、および画像形成装置 |
| CN102834273A (zh) * | 2010-03-29 | 2012-12-19 | 富士胶片株式会社 | 激光雕刻型柔性印刷版原版 |
| JP2012008537A (ja) * | 2010-05-27 | 2012-01-12 | Jsr Corp | 硬化膜形成用感放射線性樹脂組成物、硬化膜形成用感放射線性樹脂組成物の製造方法、硬化膜、硬化膜の形成方法及び表示素子 |
| CN102314086A (zh) * | 2010-06-21 | 2012-01-11 | 新日铁化学株式会社 | 黑色阻剂用感光性树脂组合物及滤色器遮光膜 |
| JP2013216782A (ja) * | 2012-04-09 | 2013-10-24 | Kaneka Corp | 硬化性組成物およびその用途 |
| JP2013222061A (ja) * | 2012-04-16 | 2013-10-28 | Tokyo Ohka Kogyo Co Ltd | レジストパターン形成方法 |
| JP2014048340A (ja) * | 2012-08-29 | 2014-03-17 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物 |
| KR101302736B1 (ko) * | 2012-10-09 | 2013-09-03 | 기린정밀공업 (주) | Ｌｅｄ 무대 조명 장치 |
Non-Patent Citations (1)
| Title |
|---|
| "聚酰胺环氧氯丙烷的合成、改性及在造纸上的应用";吴芳;《中国优秀硕士学位论文全文数据库工程科技Ⅰ辑》(第6期);第1-85页 * |
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| CN111694218A (zh) | 2020-09-22 |
| TWI660241B (zh) | 2019-05-21 |
| JP2017223993A (ja) | 2017-12-21 |
| JPWO2015178462A1 (ja) | 2017-04-20 |
| KR20190092622A (ko) | 2019-08-07 |
| WO2015178462A1 (ja) | 2015-11-26 |
| CN106462068A (zh) | 2017-02-22 |
| TWI570513B (zh) | 2017-02-11 |
| CN106462068B (zh) | 2020-07-24 |
| KR20210102494A (ko) | 2021-08-19 |
| KR20160131084A (ko) | 2016-11-15 |
| TW201820036A (zh) | 2018-06-01 |
| JP6470805B2 (ja) | 2019-02-13 |
| TWI623814B (zh) | 2018-05-11 |
| KR20220148301A (ko) | 2022-11-04 |
| TW201708959A (zh) | 2017-03-01 |
| TW201602729A (zh) | 2016-01-16 |
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