CN102057760A - 等离子体处理装置及等离子体处理方法 - Google Patents

等离子体处理装置及等离子体处理方法 Download PDF

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Publication number
CN102057760A
CN102057760A CN2009801212828A CN200980121282A CN102057760A CN 102057760 A CN102057760 A CN 102057760A CN 2009801212828 A CN2009801212828 A CN 2009801212828A CN 200980121282 A CN200980121282 A CN 200980121282A CN 102057760 A CN102057760 A CN 102057760A
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mentioned
coaxitron
inner conductor
plasma processing
coaxial tube
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Chinese (zh)
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平山昌树
大见忠弘
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Tohoku University NUC
Tokyo Electron Ltd
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Tohoku University NUC
Tokyo Electron Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • H01J37/32229Waveguides

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
CN2009801212828A 2008-06-11 2009-06-03 等离子体处理装置及等离子体处理方法 Pending CN102057760A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008-153423 2008-06-11
JP2008153423A JP5421551B2 (ja) 2008-06-11 2008-06-11 プラズマ処理装置及びプラズマ処理方法
PCT/JP2009/060158 WO2009150978A1 (ja) 2008-06-11 2009-06-03 プラズマ処理装置及びプラズマ処理方法

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CN102057760A true CN102057760A (zh) 2011-05-11

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CN2009801212828A Pending CN102057760A (zh) 2008-06-11 2009-06-03 等离子体处理装置及等离子体处理方法

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US (1) US8327796B2 (enExample)
JP (1) JP5421551B2 (enExample)
KR (2) KR101229843B1 (enExample)
CN (1) CN102057760A (enExample)
TW (1) TW201012315A (enExample)
WO (1) WO2009150978A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107208833A (zh) * 2015-01-28 2017-09-26 日新电机株式会社 管路保持连接结构以及具备所述结构的高频天线装置
CN108140528A (zh) * 2015-04-02 2018-06-08 韦费德.莱尔希 晶片用的等离子体处理装置

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* Cited by examiner, † Cited by third party
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