CN101595562A - 堆叠封装 - Google Patents

堆叠封装 Download PDF

Info

Publication number
CN101595562A
CN101595562A CNA2007800504745A CN200780050474A CN101595562A CN 101595562 A CN101595562 A CN 101595562A CN A2007800504745 A CNA2007800504745 A CN A2007800504745A CN 200780050474 A CN200780050474 A CN 200780050474A CN 101595562 A CN101595562 A CN 101595562A
Authority
CN
China
Prior art keywords
sub
microelectronic element
component
edge
rear surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CNA2007800504745A
Other languages
English (en)
Other versions
CN101595562B (zh
Inventor
B·哈巴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeia Semiconductor Solutions LLC
Original Assignee
Tessera LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tessera LLC filed Critical Tessera LLC
Publication of CN101595562A publication Critical patent/CN101595562A/zh
Application granted granted Critical
Publication of CN101595562B publication Critical patent/CN101595562B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0657Stacked arrangements of devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L24/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/0401Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001Internal layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001Internal layers
    • H01L2224/05005Structure
    • H01L2224/05009Bonding area integrally formed with a via connection of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001Internal layers
    • H01L2224/05099Material
    • H01L2224/051Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/05138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/05144Gold [Au] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001Internal layers
    • H01L2224/05099Material
    • H01L2224/051Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/05138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/05147Copper [Cu] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0556Disposition
    • H01L2224/05568Disposition the whole external layer protruding from the surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0556Disposition
    • H01L2224/0557Disposition the external layer being disposed on a via connection of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/1302Disposition
    • H01L2224/13025Disposition the bump connector being disposed on a via connection of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/14Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
    • H01L2224/1401Structure
    • H01L2224/1403Bump connectors having different sizes, e.g. different diameters, heights or widths
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • H01L2224/16146Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked the bump connector connecting to a via connection in the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/17Structure, shape, material or disposition of the bump connectors after the connecting process of a plurality of bump connectors
    • H01L2224/1701Structure
    • H01L2224/1703Bump connectors having different sizes, e.g. different diameters, heights or widths
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/17Structure, shape, material or disposition of the bump connectors after the connecting process of a plurality of bump connectors
    • H01L2224/171Disposition
    • H01L2224/1718Disposition being disposed on at least two different sides of the body, e.g. dual array
    • H01L2224/17181On opposite sides of the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L2224/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • H01L2224/2405Shape
    • H01L2224/24051Conformal with the semiconductor or solid-state device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L2224/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • H01L2224/241Disposition
    • H01L2224/24135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/24145Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73267Layer and HDI connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/94Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06541Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/481Internal lead connections, e.g. via connections, feedthrough structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)
  • Dicing (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

一种微电子组件(34),包括带有第一后表面(16)的第一微电子元件(12)。该组件进一步包括带有第二后表面(16a)的第二微电子元件(12a)。第二微电子元件(12a)连接于第一微电子元件(12)以形成堆叠封装(34)。第一微电子元件(12)的第一后表面(16)面向第二微电子元件(12a)的第二后表面(16a)。

Description

堆叠封装
相关申请交叉参考
[0001]本国际申请要求2006年12月28日提交的美国申请11/648172的优先权。
技术领域
[0002]本发明通常涉及堆叠微电子封装,尤其涉及以晶片级制造的堆叠微电子封装以及制作此种封装的方法。
背景技术
[0003]半导体芯片是带有触点的扁平体,所述触点设在与芯片自身内部电路相连的前表面上。半导体芯片典型地用衬底封装以形成具有与芯片触点电连接的端子的微电子封装。这种封装接着被连接于测试设备以确定被封装的装置是否符合所要求的性能标准。一旦被测试,封装可能被连接到更大的线路,如,电脑或手机等电子产品内的线路。
[0004]根据与用于形成封装的工艺的适配性来选择用于封装半导体芯片的衬底材料。如,在焊接或其它结合操作中,对衬底施加很强的热。相应地,金属引线架已被使用作为衬底。层叠衬底也用于封装微电子装置。这些可以衬底包括两个或四个玻璃纤维和环氧树酯的交错层,其中,连续的玻璃纤维层可在横切如正交方向上被敷设。可选择地,耐热化合物如双马来酰亚胺-三嗪树脂(BT)可被加入这样的层叠衬底中。
[0005]窄带已被用作衬底来提供更细的微电子封装。这样的窄带典型地以薄片或薄片卷的形式提供。如,通常使用单侧或双侧的聚酰亚胺上覆铜的薄片。聚酰亚胺基薄膜提供了优质的热和化学稳定性以及低介电常数,同时具有高抗拉强度、延展性及挠性的铜已被优选用于柔韧线路和芯片级封装应用中。但是,这样的窄带相对较昂贵,特别是与引线架和层叠衬底相比较而言。
[0006]微电子封装也包括晶片级封装,其提供了一种用于当模具仍然为晶片形式时被制造的半导体部件的封装。该晶片经受许多额外的加工步骤以形成封装结构并且晶片被切成块以释放单个模具,不需要额外的制造步骤。晶片级加工提供了这样的优点:即封装加工成本在晶片上的不同模具间被分割,导致在模具和部件之间形成了较低的价格差异。而且,封装占地面积大致相似于模具的尺寸,结果导致印制电路板(PCB)上最终要与模具连接的区域的高效利用。基于这些特点,以此方式封装的模具通常被称为晶片级芯片级封装(WLCSP)。
[0007]为了节省空间,某些常规设计已在封装内堆叠了多个微电子芯片。这样就使得封装在衬底上占用的表面积小于堆叠内的芯片的总表面积。
[0008]尽管有以上诸多优点,但仍须一种改进的晶片级封装特别是堆叠晶片级封装,其可靠且制造成本低。
发明内容
[0009]本发明涉及一种包括带有第一后表面的第一微电子元件的微电子组件。该组件进一步包括带有第二后表面的第二微电子元件。第二微电子元件连接于第一微电子元件以形成堆叠封装。第一微电子元件的第一后表面面向第二微电子元件的第二后表面。
[0010]此外,该组件包括至少一个桥接元件。第一微电子元件和第二微电子元件每个都带有前表面和多个在前表面处暴露出的触点。所述至少一个桥接元件在第一微电子元件的所述多个触点与第二微电子元件的所述多个触点之间延伸以将二者电连接。
[0011]一方面,第一微电子元件包括从第一微电子元件的前表面延伸到后表面的第一边缘和第二边缘。并且所述至少一个桥接元件设置在第一边缘和第二边缘的外部。还可包括暴露在第一微电子元件和第二微电子元件各自的前表面上的多个轨迹。所述多个轨迹中至少一些从第一微电子元件上的所述多个触点的至少一些延伸到所述至少一个桥接元件,并且所述多个轨迹中的至少一些从第二微电子元件的所述多个触点的至少一些延伸到所述至少一个桥接元件。
[0012]某些实施例中的微电子组件包括一种粘合剂,其将第一微电子元件和第二微电子元件连接起来。另一方面,第一微电子元件包括第一边缘和第二边缘。至少一个桥接元件位于第一边缘和第二边缘之间。此外,第二微电子元件也可带有第一边缘和第二边缘,从而所述至少一个桥接元件位于第二微电子元件的第一边缘和第二边缘之间。
[0013]另一方面,第一微电子元件包括多个从前表面延伸到后表面的通孔,并且所述至少一个桥接元件设置在所述多个通孔中的至少一个内。
[0014]该组件进一步包括带有前表面和后表面的第三微电子元件和带有后表面的第四微电子元件。第三和第四微电子元件连接在一起以使第三微电子元件的后表面面向第四微电子元件的后表面。第三微电子元件也连接在第一、二(the first second)微电子元件上以使第三微电子元件的前表面面向第二微电子元件的前表面。
[0015]本发明还涉及一种组装堆叠微电子组件的方法,该方法包括以下步骤:通过将包括多个微电子元件的第一子组件堆叠到包括多个微电子元件的第二子组件上,形成微电子组件。第一子组件和第二子组件的后表面相互面对。接下来,将在第一子组件前表面处暴露的多个触点与在第二子组件的前表面处暴露的多个触点相连。
[0016]第一子组件和第二子组件每个都包括锯道,它们在形成微电子组件的步骤期间是对齐的。并且此方法可包括穿过第一和第二子组件的锯道来切割形成独立堆叠单元。第一子组件和第二子组件的所述多个微电子元件中至少有一些带有轨迹,轨迹从各个触点延伸到相应的第一子组件和第二子组件的各个锯道,从而在切割步骤后轨迹暴露。
附图说明
[0017]图1A是根据本发明一个实施例的子组件的俯视图;
[0018]图1B是图1A中子组件的横截面图;
[0019]图2是互相连接以形成堆叠组件的多个子组件的横截面图;
[0020]图3是图2中的堆叠组件被切成独立单元后的横截面图;
[0021]图4是图3中的独立单元互相上下堆叠的横截面图;
[0022]图5A是根据本发明一个实施例的子组件的俯视图;
[0023]图5B是图5A中的子组件的横截面图;
[0024]图6是图5B中的子组件在组装后期的横截面图;
[0025]图7是相互连接以形成堆叠组件的多个图6所示子组件的横截面图;
[0026]图8是图7中的堆叠组件已被切成独立单元后的横截面图;并且
[0027]图9是图8中的独立单元互相上下堆叠的横截面图。
具体实施方式
[0028]现在参照图1A和1B,其分别示出了晶片或第一子组件10的俯视图和横截面图。正如图中所示,第一晶片或子组件10的一部分包括多个微电子元件12,每个都一个挨一个排列并且互相邻近。第一子组件优选包括多排的微电子元件12,其沿着X-轴和Y-轴以各列和各行对齐。微电子元件12通过使用常规的半导体工艺技术彼此一体地形成。本发明也适用于再造的晶片。
[0029]每个微电子元件12包括前表面14和相反地面向的后表面16。微电子元件12也包括第一边缘18、第二边缘20、第三边缘19和第四边缘21,所有这些边缘都从微电子元件12的前表面14延伸到后表面16。正如图1A和1B所示,某个微电子元件12的第一边缘18连接于第二且相邻的微电子元件12的第二边缘20上。因此,位于第一子组件10中部的微电子元件12在四个边缘处被相邻微电子元件12划界,如图1A所示。位于晶片的第一末端11、第二末端13、第三末端15或第四末端17处的微电子元件12具有至少一个不被另外的微电子元件阻碍的边缘。
[0030]尽管这些边缘在图中被描述旨在使阐述更清晰,但实际上,这些边缘是不可视的。相反,在这个阶段,相邻的微电子元件12彼此接触的边缘或带是锯道或带,在此晶片能被切割而不损坏各独立微电子元件。举例说明,如图1B所示,微电子元件12’的第二边缘20’邻接微电子元件12”的第一边缘18”且形成了锯道23。相似地,贯穿晶片10,锯道23位于微电子元件12互相邻接的位置处。第一晶片/子组件10包括少至1个或多至如所期望那么多的微电子元件。
[0031]在子组件10内的每个微电子元件12包括暴露在它们的各自前表面16处的多个触点22。此外,触点22连接于从触点22延伸到微电子元件的一条边缘的轨迹24。如,微电子元件12’包括触点22’和轨迹24’,该轨迹从触点22’延伸到微电子元件12’的第一边缘18’。类似地,微电子12”包括触点22”和轨迹24”,轨迹从触点22”延伸到微电子元件12”的第二边缘20”。在一实施例中,轨迹24’和24”实际上是在相邻微电子元件12’、12”的触点22’和22”之间延伸的整体结构。因此,轨迹24’和24”在微电子元件12’和12”的连接点处或在锯道23’处相遇。但是,并不要求轨迹真正地互相接触,相反这些轨迹24简单地朝着微电子元件12的相应末端延伸并且进入锯道的宽度中。
[0032]正如图2所示,为产生一种堆叠组件30,第一子组件10位于第二晶片/子组件10A下方。第二子组件10A与第一子组件10类似地构成,并且因此类似元件将被注明相同的附图标记,除非另外指定。
[0033]如图2所示,第二组件10A是倒置的以使在微电子元件12A的前表面14A处暴露的触点22A朝向与子组件10的触点22相反的相反方向。因此,如图2所示,子组件10A的后表面16A面向子组件10的后表面16。当定位各个子组件10、10A时,微电子元件12与微电子元件12A对齐。每个微电子元件12、12A的各自的第一、第二、第三和第四边缘沿着各自的纵轴对齐。且每个子组件10、10A的各个锯道23、23A也对齐。堆叠组件30由多个微电子元件12、12A组成,这些元件以不同的行和列被定向和对齐。
[0034]为了连接两个子组件10、10a,粘性层32位于后表面16、16A之间且粘附在那里。粘性层32优选由粘合剂、环氧树脂或类似物组成,并且一旦凝固,在两个子组件10、10A之间保持连接以使子组件互相连接且形成堆叠组件30。两个子组件10、10A可使用其他方法进行连接,这些方法不涉及粘合剂的使用,如直接将子组件10的后表面16连接于第二子组件10A的后表面16A。可使用如焊接结合、共熔结合、扩散结合或其它已知的结合方法。
[0035]下一步,堆叠组件30被图中未示出的机械切割工具切割成独立堆叠单元34。此种机械切割工具的实施例可在美国专利6646289和6972480中找到,其公开内容在此并入作为参考。堆叠组件30在与各独立子组件10、10A的锯道23、23A和微电子元件12、12A的各边缘对应的位置处被切割。因为远离触点22、22A的轨迹24、24A末端位于锯道23、23A内,所以堆叠组件30的切割引起了这些末端的暴露。
[0036]每个独立堆叠单元34包括微电子元件12A,其位于微电子元件12上部且被粘性层32与其相连。微电子元件12、12A的各自前表面14、14A朝向相反,与微电子元件的各个触点22、22A的定位方式一样。此外,独立堆叠单元34包括第一侧壁36和第二侧壁38,第一侧壁和第二侧壁在微电子元件12和12A的各自前表面14、14A之间延伸。邻近侧壁36、38的是在切割过程后显露出的轨迹24、24A的末端。
[0037]桥接元件如轨迹桥40形成于侧壁36和38上。轨迹桥40从轨迹40跨过侧壁36或侧壁38延伸到轨迹24A,并且因此使设在独立堆叠单元34的相对表面上的两个轨迹电性互连。轨迹桥延伸到大约微电子元件的边缘和粘性层32的边缘,该粘性层在切割过程后显露。由于有轨迹桥40的作用,触点22与触点22A可电通信。在轨迹桥40形成前,介电层41可设置在微电子元件和粘性层的显露的边缘上,从而在需要时将轨迹桥与微电子元件体电隔离。
[0038]仍然根据图3,成团的传导材料42可被沉积在触点22上以使独立堆叠单元34电连接到衬底如线路板等。该成团的传导材料42可以是焊球或类似材料。
[0039]根据本发明的一方面,独立堆叠单元34和34’互相上下堆叠,使独立堆叠单元34的触点与独立堆叠单元34’的触点电连接,如图4所示。例如,为了电连接独立堆叠单元34、34’,暴露在堆叠单元34的下表面52处的触点50与暴露在堆叠单元34’的顶表面54’处的触点50’对齐。触点50和50’然后可通过使用成团的传导材料56如焊料被电连接或通过使用本领域技术人员已知的其它方法互相连接。
[0040]本发明的一方面,提供包括多个微电子元件112的子组件110,如图5A和5B所示。子组件110与子组件10构成相似且包括许多相同的特征。由于这个原因,除非被指定,类似元件将用相同的附图标记表示。子组件110的微电子元件112包括前表面114和相反地面对的后表面116。
[0041]此外,每个微电子元件112包括在前表面114和后表面116之间延伸的第一边缘118、第二边缘120、第三边缘119、和第四边缘121。位置是第一微电子元件的一边缘邻接第二微电子元件的一边缘形成锯道123。如参考子组件10所描述的,锯道可被穿通切断而不破坏子组件110的独立微电子元件112。尽管为了清晰地描述,图5A到5B中示出了分界线,但实际上相邻微电子元件112之间的清楚分隔不可辨认。每个微电子元件112还包括多个暴露在各自前表面114处的触点122。虽然子组件110被描述为带有四列和三排微电子元件,但微电子元件的数量可少至1个或多至任意所需的数目。
[0042]下一步,参考图6,子组件110经受机械切割工序,其穿过每个微电子元件112钻出通孔130。通孔从每个微电子元件的后表面116延伸到前表面114。且每个通孔130优选与暴露在每个微电子元件112的前表面114上的触点122对齐,以使触点122不仅暴露在前表面114处也暴露在后表面116处。
[0043]在通孔130形成后,其被传导材料131如金属所填充。传导材料131例如可由铜或铜金合金形成。
[0044]如图7所示,可通过将第一子组件110连接于第二子组件110’而组装堆叠组件132。第二子组件110’具有类似于子组件110的构造,并且除非被指定,相同的特征采用相同的附图标记。为了形成堆叠组件132,第二子组件110’被倒置以使第二子组件的微电子元件112’的后表面116’面向微电子元件112的后表面116。当两个子组件对齐时,子组件110的锯道123与第二子组件110’的锯道123’对齐,并且每个子组件的通孔130、130’也对齐。通过将通孔130与通孔130’对齐,微电子元件112的触点122与第二子组件的触点122’对齐,并且每个通孔130、130’的传导材料131、131’互相接近。
[0045]为了将第二子组件110’连接于子组件110,第二传导材料137可被采用。如,成团的第二传导材料137如焊料设置在通孔130内或周围,邻近微电子元件112的后表面116且与通孔内包含的传导材料131相接触。接着子组件110接近第二子组件110’以使第二传导材料137邻近通孔130’并且与第二子组件的传导材料131’接触。如图7所示,这种构造导致触点122通过设置在通孔130、130’内的各种传导材料电连接于触点122’,且因此传导材料131、131’用作触点122、122’之间的电桥。回填物如密封剂材料134或粘结剂可被置于两个子组件110、110’之间以给堆叠组件132提供额外的刚度。
[0046]在可选择的实施例中,虽然图中未示出,子组件110的传导材料131可直接粘附于第二子组件110’的传导材料131’。例如,如果传导材料130、130’是铜,在每个通孔130、130’内的铜被回流且使其与对齐的通孔内的铜接触。一旦固化,在相邻通孔130、130’内的铜不仅形成了子组件之间的连接区域,而且也形成触点122、122’之间的电连接。
[0047]现准备将堆叠组件132切成独立堆叠单元140。为此,先前描述的类似机械工具(在图中未示)被带到接近每个子组件110、110’的锯道123、123’。该机械工具在对应于锯道123、123’的位置处穿过堆叠组件132,因此将堆叠组件切成独立堆叠单元140。当然,如果堆叠组件132由仅包括单个微电子元件的子组件构成,就不需要切割步骤了。成团的焊料142或其它传导材料被设置在暴露的触点122或122’上以使独立堆叠单元140连接于衬底如线路板。
[0048]如果需要,堆叠组件132也可连接于线路板而不必将组件切成独立单元。
[0049]根据本发明的一方面,独立堆叠单元140、140’可相互上下堆叠,同时使独立堆叠单元140的触点电连接于独立堆叠单元140’的触点。例如,为了电连接独立堆叠单元140、140’,暴露在堆叠单元140下表面152处的触点150与暴露在堆叠单元140’的顶表面154’处的触点150’对齐。接着触点150和150’可使用成团的传导材料156如焊料电连接或通过使用本领域技术人员已知的其它方法互相连接。整个组件160可连接于衬底如图9所示的包括传导垫172的线路板170。
[0050]虽然本发明已经参照特定实施例进行了描述,但要了解到这些实施例对本发明的原理和应用来说仅为示例性的。因此要了解,可对示例性的实施例作出改进并且可发明其它装置,这些都不脱离被所附权利要求所界定的本发明的精神和范围。

Claims (19)

1.一种微电子组件,包括:
带有第一后表面的第一微电子元件;
带有第二后表面的第二微电子元件,该第二微电子元件连接于第一微电子元件以形成堆叠封装;其中第一微电子元件的第一后表面面向第二微电子元件的第二后表面;且
至少一个桥接元件,其中第一微电子元件和第二微电子元件每个都具有前表面和暴露于前表面处的多个触点,其中所述至少一个桥接元件在第一微电子元件的所述多个触点与第二微电子元件的所述多个触点之间延伸以将二者电连接。
2.如权利要求1所述的微电子组件,其特征在于,第一微电子元件包括从第一微电子元件的前表面延伸到后表面的第一边缘和第二边缘,其中所述至少一个桥接元件设置在第一边缘和第二边缘的外部。
3.如权利要求2所述的微电子组件,其特征在于,进一步包括暴露在第一微电子元件和第二微电子元件的各个前表面上的多个轨迹,所述多个轨迹中至少一些从第一微电子元件的所述多个触点中的至少一些延伸到所述至少一个桥接元件,并且所述多个轨迹中至少一些从第二微电子元件的所述多个触点中的至少一些延伸到所述至少一个桥接元件。
4.如权利要求3所述的微电子组件,其特征在于,进一步包括将第一微电子元件粘附于第二微电子元件的粘结剂。
5.如权利要求1所述的微电子组件,其特征在于,第一微电子元件包括第一边缘和第二边缘,其中所述至少一个桥接元件位于第一边缘和第二边缘之间。
6.如权利要求5所述的微电子组件,其特征在于,第二微电子元件带有第一边缘和第二边缘,并且其中所述至少一个桥接元件位于第二微电子元件的第一边缘和第二边缘之间。
7.如权利要求6所述的微电子组件,其特征在于,第一微电子元件包括从前表面延伸到后表面的多个通孔,其中所述至少一个桥接元件设置在所述多个通孔的至少一个内。
8.如权利要求1所述的微电子组件,其特征在于,进一步包括带有前表面和后表面的第三微电子元件以及带有后表面的第四微电子元件,其中第三和第四微电子元件被连接以使第三微电子元件的后表面面向第四微电子元件的后表面,第三微电子元件还连接于第一、二微电子元件以使第三微电子元件的前表面面向第二微电子元件的前表面。
9.一种组装堆叠微电子组件的方法,包括如下步骤:
通过将包括多个微电子元件的第一子组件堆叠到包括多个微电子元件的第二子组件上形成微电子组件,其中,第一、第二子组件的后表面互相面对;
将暴露在第一子组件的前表面处的多个触点电连接于暴露在第二子组件的前表面处的多个触点。
10.如权利要求9所述的方法,其特征在于,第一子组件和第二子组件每个都包括锯道,所述锯道在形成微电子组件的步骤中被对齐。
11.如权利要求10所述的方法,其特征在于,进一步包括穿过第一和第二子组件的锯道进行切割以形成独立堆叠单元,其中第一和第二子组件的所述多个微电子元件的至少一些具有从各个触点延伸到相应第一和第二子组件的锯道的轨迹,从而在切割步骤后暴露出轨迹。
12.如权利要求11所述的方法,其特征在于,将第一子组件的所述多个触点电连接于第二子组件的触点的步骤包括在第一和第二子组件的轨迹之间形成桥接元件。
13.如权利要求12所述的方法,其特征在于,所述桥接元件被设置在第一和第二子组件的微电子元件的边缘上。
14.一种组装堆叠封装的方法,包括根据权利要求12的形成第一独立堆叠单元和第二独立堆叠单元的步骤,进一步包括将第一独立堆叠单元的至少一些触点电连接到第二独立堆叠单元的至少一些触点。
15.如权利要求9所述的方法,其特征在于,进一步包括在第一子组件和第二子组件内形成多个通孔,其中多个通孔从第一和第二子组件的后表面延伸到两个所述子组件的前表面,且与第一和第二子组件的所述触点对齐从而将触点暴露于各个子组件的后表面。
16.如权利要求15所述的方法,其特征在于,传导材料被沉积到所述多个轨迹内。
17.如权利要求16所述的方法,其特征在于,在形成微电子组件之前,第一子组件的所述多个通孔内的传导材料与第二组件的所述多个通孔内的传导材料对齐。
18.如权利要求17所述的方法,其特征在于,将第一子组件的所述触点电连接到第二子组件的所述触点的步骤包括将位于第一子组件的所述多个通孔内的传导材料电连接到第二子组件的所述多个通孔内的传导材料。
19.如权利要求18所述的方法,其特征在于,进一步包括在预定位置处切割微电子组件以形成独立堆叠单元。
CN2007800504745A 2006-12-28 2007-12-20 堆叠封装 Active CN101595562B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/648,172 2006-12-28
US11/648,172 US7952195B2 (en) 2006-12-28 2006-12-28 Stacked packages with bridging traces
PCT/US2007/026095 WO2008085391A2 (en) 2006-12-28 2007-12-20 Stacked packages

Publications (2)

Publication Number Publication Date
CN101595562A true CN101595562A (zh) 2009-12-02
CN101595562B CN101595562B (zh) 2011-09-21

Family

ID=39488194

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800504745A Active CN101595562B (zh) 2006-12-28 2007-12-20 堆叠封装

Country Status (6)

Country Link
US (2) US7952195B2 (zh)
EP (1) EP2097925B1 (zh)
JP (1) JP5567346B2 (zh)
KR (1) KR101454332B1 (zh)
CN (1) CN101595562B (zh)
WO (1) WO2008085391A2 (zh)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7901989B2 (en) 2006-10-10 2011-03-08 Tessera, Inc. Reconstituted wafer level stacking
US8513789B2 (en) 2006-10-10 2013-08-20 Tessera, Inc. Edge connect wafer level stacking with leads extending along edges
US7829438B2 (en) 2006-10-10 2010-11-09 Tessera, Inc. Edge connect wafer level stacking
US7759166B2 (en) * 2006-10-17 2010-07-20 Tessera, Inc. Microelectronic packages fabricated at the wafer level and methods therefor
US7952195B2 (en) * 2006-12-28 2011-05-31 Tessera, Inc. Stacked packages with bridging traces
US8723332B2 (en) * 2007-06-11 2014-05-13 Invensas Corporation Electrically interconnected stacked die assemblies
KR101458538B1 (ko) 2007-07-27 2014-11-07 테세라, 인코포레이티드 적층형 마이크로 전자 유닛, 및 이의 제조방법
KR101533663B1 (ko) 2007-08-03 2015-07-03 테세라, 인코포레이티드 재구성된 웨이퍼를 이용한 스택 패키지
US8043895B2 (en) 2007-08-09 2011-10-25 Tessera, Inc. Method of fabricating stacked assembly including plurality of stacked microelectronic elements
WO2009035849A2 (en) 2007-09-10 2009-03-19 Vertical Circuits, Inc. Semiconductor die mount by conformal die coating
US8178978B2 (en) 2008-03-12 2012-05-15 Vertical Circuits, Inc. Support mounted electrically interconnected die assembly
US7863159B2 (en) 2008-06-19 2011-01-04 Vertical Circuits, Inc. Semiconductor die separation method
US9153517B2 (en) 2008-05-20 2015-10-06 Invensas Corporation Electrical connector between die pad and z-interconnect for stacked die assemblies
WO2009154761A1 (en) 2008-06-16 2009-12-23 Tessera Research Llc Stacking of wafer-level chip scale packages having edge contacts
US8466542B2 (en) 2009-03-13 2013-06-18 Tessera, Inc. Stacked microelectronic assemblies having vias extending through bond pads
CN102473697B (zh) 2009-06-26 2016-08-10 伊文萨思公司 曲折配置的堆叠裸片的电互连
JP5425584B2 (ja) * 2009-10-15 2014-02-26 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
US9147583B2 (en) 2009-10-27 2015-09-29 Invensas Corporation Selective die electrical insulation by additive process
US7915083B1 (en) * 2009-10-28 2011-03-29 Headway Technologies, Inc. Method of manufacturing layered chip package
TWI544604B (zh) 2009-11-04 2016-08-01 英維瑟斯公司 具有降低應力電互連的堆疊晶粒總成
US8541887B2 (en) 2010-09-03 2013-09-24 Headway Technologies, Inc. Layered chip package and method of manufacturing same
US8441112B2 (en) * 2010-10-01 2013-05-14 Headway Technologies, Inc. Method of manufacturing layered chip package
US8618646B2 (en) 2010-10-12 2013-12-31 Headway Technologies, Inc. Layered chip package and method of manufacturing same
US8652877B2 (en) 2010-12-06 2014-02-18 Headway Technologies, Inc. Method of manufacturing layered chip package
US8653639B2 (en) * 2011-06-09 2014-02-18 Headway Technologies, Inc. Layered chip package and method of manufacturing same
US9007520B2 (en) 2012-08-10 2015-04-14 Nanchang O-Film Optoelectronics Technology Ltd Camera module with EMI shield
US9001268B2 (en) 2012-08-10 2015-04-07 Nan Chang O-Film Optoelectronics Technology Ltd Auto-focus camera module with flexible printed circuit extension
US9242602B2 (en) 2012-08-27 2016-01-26 Fotonation Limited Rearview imaging systems for vehicle
KR102190382B1 (ko) * 2012-12-20 2020-12-11 삼성전자주식회사 반도체 패키지
US9241400B2 (en) 2013-08-23 2016-01-19 Seagate Technology Llc Windowed reference planes for embedded conductors
US9825002B2 (en) 2015-07-17 2017-11-21 Invensas Corporation Flipped die stack
US9871019B2 (en) 2015-07-17 2018-01-16 Invensas Corporation Flipped die stack assemblies with leadframe interconnects
US9490195B1 (en) 2015-07-17 2016-11-08 Invensas Corporation Wafer-level flipped die stacks with leadframes or metal foil interconnects
US9508691B1 (en) 2015-12-16 2016-11-29 Invensas Corporation Flipped die stacks with multiple rows of leadframe interconnects
US10566310B2 (en) 2016-04-11 2020-02-18 Invensas Corporation Microelectronic packages having stacked die and wire bond interconnects
US9595511B1 (en) 2016-05-12 2017-03-14 Invensas Corporation Microelectronic packages and assemblies with improved flyby signaling operation
US9728524B1 (en) 2016-06-30 2017-08-08 Invensas Corporation Enhanced density assembly having microelectronic packages mounted at substantial angle to board

Family Cites Families (231)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4074342A (en) 1974-12-20 1978-02-14 International Business Machines Corporation Electrical package for lsi devices and assembly process therefor
US4500905A (en) 1981-09-30 1985-02-19 Tokyo Shibaura Denki Kabushiki Kaisha Stacked semiconductor device with sloping sides
JPS60160645A (ja) 1984-02-01 1985-08-22 Hitachi Ltd 積層半導体集積回路装置
US4897708A (en) 1986-07-17 1990-01-30 Laser Dynamics, Inc. Semiconductor wafer array
US4954875A (en) 1986-07-17 1990-09-04 Laser Dynamics, Inc. Semiconductor wafer array with electrically conductive compliant material
US4765864A (en) 1987-07-15 1988-08-23 Sri International Etching method for producing an electrochemical cell in a crystalline substrate
US4842699A (en) 1988-05-10 1989-06-27 Avantek, Inc. Method of selective via-hole and heat sink plating using a metal mask
US5614766A (en) * 1991-09-30 1997-03-25 Rohm Co., Ltd. Semiconductor device with stacked alternate-facing chips
AU4242693A (en) 1992-05-11 1993-12-13 Nchip, Inc. Stacked devices for multichip modules
US5322816A (en) 1993-01-19 1994-06-21 Hughes Aircraft Company Method for forming deep conductive feedthroughs
US5426072A (en) 1993-01-21 1995-06-20 Hughes Aircraft Company Process of manufacturing a three dimensional integrated circuit from stacked SOI wafers using a temporary silicon substrate
FR2704690B1 (fr) 1993-04-27 1995-06-23 Thomson Csf Procédé d'encapsulation de pastilles semi-conductrices, dispositif obtenu par ce procédé et application à l'interconnexion de pastilles en trois dimensions.
US5343071A (en) 1993-04-28 1994-08-30 Raytheon Company Semiconductor structures having dual surface via holes
DE4314907C1 (de) 1993-05-05 1994-08-25 Siemens Ag Verfahren zur Herstellung von vertikal miteinander elektrisch leitend kontaktierten Halbleiterbauelementen
IL106892A0 (en) 1993-09-02 1993-12-28 Pierre Badehi Methods and apparatus for producing integrated circuit devices
US5412539A (en) 1993-10-18 1995-05-02 Hughes Aircraft Company Multichip module with a mandrel-produced interconnecting decal
US5424245A (en) 1994-01-04 1995-06-13 Motorola, Inc. Method of forming vias through two-sided substrate
IL108359A (en) 1994-01-17 2001-04-30 Shellcase Ltd Method and device for creating integrated circular devices
US5502333A (en) 1994-03-30 1996-03-26 International Business Machines Corporation Semiconductor stack structures and fabrication/sparing methods utilizing programmable spare circuit
US5675180A (en) 1994-06-23 1997-10-07 Cubic Memory, Inc. Vertical interconnect process for silicon segments
US6228686B1 (en) * 1995-09-18 2001-05-08 Tessera, Inc. Method of fabricating a microelectronic assembly using sheets with gaps to define lead regions
IL110261A0 (en) 1994-07-10 1994-10-21 Schellcase Ltd Packaged integrated circuit
US5880010A (en) 1994-07-12 1999-03-09 Sun Microsystems, Inc. Ultrathin electronics
MY114888A (en) * 1994-08-22 2003-02-28 Ibm Method for forming a monolithic electronic module by stacking planar arrays of integrated circuit chips
DE4433845A1 (de) 1994-09-22 1996-03-28 Fraunhofer Ges Forschung Verfahren zur Herstellung einer dreidimensionalen integrierten Schaltung
DE4433846C2 (de) 1994-09-22 1999-06-02 Fraunhofer Ges Forschung Verfahren zur Herstellung einer vertikalen integrierten Schaltungsstruktur
US5466634A (en) 1994-12-20 1995-11-14 International Business Machines Corporation Electronic modules with interconnected surface metallization layers and fabrication methods therefore
JPH08306724A (ja) * 1995-04-28 1996-11-22 Matsushita Electron Corp 半導体装置およびその製造方法ならびにその実装方法
US5646067A (en) 1995-06-05 1997-07-08 Harris Corporation Method of bonding wafers having vias including conductive material
US5618752A (en) 1995-06-05 1997-04-08 Harris Corporation Method of fabrication of surface mountable integrated circuits
US5608264A (en) 1995-06-05 1997-03-04 Harris Corporation Surface mountable integrated circuit with conductive vias
US5682062A (en) 1995-06-05 1997-10-28 Harris Corporation System for interconnecting stacked integrated circuits
US5814889A (en) 1995-06-05 1998-09-29 Harris Corporation Intergrated circuit with coaxial isolation and method
US5604673A (en) 1995-06-07 1997-02-18 Hughes Electronics Low temperature co-fired ceramic substrates for power converters
US5648684A (en) 1995-07-26 1997-07-15 International Business Machines Corporation Endcap chip with conductive, monolithic L-connect for multichip stack
JP2743904B2 (ja) 1996-02-16 1998-04-28 日本電気株式会社 半導体基板およびこれを用いた半導体装置の製造方法
US5817530A (en) 1996-05-20 1998-10-06 Micron Technology, Inc. Use of conductive lines on the back side of wafers and dice for semiconductor interconnects
US6784023B2 (en) * 1996-05-20 2004-08-31 Micron Technology, Inc. Method of fabrication of stacked semiconductor devices
JP3620936B2 (ja) 1996-10-11 2005-02-16 浜松ホトニクス株式会社 裏面照射型受光デバイスおよびその製造方法
KR100214562B1 (ko) 1997-03-24 1999-08-02 구본준 적층 반도체 칩 패키지 및 그 제조 방법
US6551857B2 (en) 1997-04-04 2003-04-22 Elm Technology Corporation Three dimensional structure integrated circuits
US5915167A (en) 1997-04-04 1999-06-22 Elm Technology Corporation Three dimensional structure memory
EP0926723B1 (en) 1997-11-26 2007-01-17 STMicroelectronics S.r.l. Process for forming front-back through contacts in micro-integrated electronic devices
US6620731B1 (en) 1997-12-18 2003-09-16 Micron Technology, Inc. Method for fabricating semiconductor components and interconnects with contacts on opposing sides
US7408249B2 (en) 1998-02-06 2008-08-05 Tessera Technologies Hungary Kft. Packaged integrated circuits and methods of producing thereof
US6624505B2 (en) * 1998-02-06 2003-09-23 Shellcase, Ltd. Packaged integrated circuits and methods of producing thereof
IL123207A0 (en) 1998-02-06 1998-09-24 Shellcase Ltd Integrated circuit device
WO1999045588A2 (en) 1998-03-02 1999-09-10 Koninklijke Philips Electronics N.V. Semiconductor device comprising a glass supporting body onto which a substrate with semiconductor elements and a metallization is attached by means of an adhesive
US6982475B1 (en) 1998-03-20 2006-01-03 Mcsp, Llc Hermetic wafer scale integrated circuit structure
US6492201B1 (en) 1998-07-10 2002-12-10 Tessera, Inc. Forming microelectronic connection components by electrophoretic deposition
US6103552A (en) 1998-08-10 2000-08-15 Lin; Mou-Shiung Wafer scale packaging scheme
US6261865B1 (en) 1998-10-06 2001-07-17 Micron Technology, Inc. Multi chip semiconductor package and method of construction
KR100304959B1 (ko) * 1998-10-21 2001-09-24 김영환 칩 적층형 반도체 패키지 및 그 제조방법
SG78324A1 (en) * 1998-12-17 2001-02-20 Eriston Technologies Pte Ltd Bumpless flip chip assembly with strips-in-via and plating
US6229216B1 (en) * 1999-01-11 2001-05-08 Intel Corporation Silicon interposer and multi-chip-module (MCM) with through substrate vias
JP3228257B2 (ja) * 1999-01-22 2001-11-12 日本電気株式会社 メモリパッケージ
US6130823A (en) 1999-02-01 2000-10-10 Raytheon E-Systems, Inc. Stackable ball grid array module and method
US6204562B1 (en) 1999-02-11 2001-03-20 United Microelectronics Corp. Wafer-level chip scale package
KR100319608B1 (ko) * 1999-03-09 2002-01-05 김영환 적층형 반도체 패키지 및 그 제조방법
EP1041624A1 (en) 1999-04-02 2000-10-04 Interuniversitair Microelektronica Centrum Vzw Method of transferring ultra-thin substrates and application of the method to the manufacture of a multilayer thin film device
JP3532788B2 (ja) 1999-04-13 2004-05-31 唯知 須賀 半導体装置及びその製造方法
US20030233704A1 (en) 2000-04-17 2003-12-25 Miguel Castellote Air massage system for bathtub
JP3895595B2 (ja) 1999-05-27 2007-03-22 フラウンホーファー−ゲゼルシャフト・ツール・フェルデルング・デル・アンゲヴァンテン・フォルシュング・アインゲトラーゲネル・フェライン 背面接触により電気コンポーネントを垂直に集積する方法
JP2001035995A (ja) 1999-07-22 2001-02-09 Seiko Epson Corp 半導体チップの貫通孔形成方法
US6277669B1 (en) 1999-09-15 2001-08-21 Industrial Technology Research Institute Wafer level packaging method and packages formed
IL133453A0 (en) 1999-12-10 2001-04-30 Shellcase Ltd Methods for producing packaged integrated circuit devices and packaged integrated circuit devices produced thereby
US6376904B1 (en) 1999-12-23 2002-04-23 Rambus Inc. Redistributed bond pads in stacked integrated circuit die package
US6621155B1 (en) * 1999-12-23 2003-09-16 Rambus Inc. Integrated circuit device having stacked dies and impedance balanced transmission lines
JP3684978B2 (ja) 2000-02-03 2005-08-17 セイコーエプソン株式会社 半導体装置およびその製造方法ならびに電子機器
JP2001223323A (ja) * 2000-02-10 2001-08-17 Mitsubishi Electric Corp 半導体装置
US6498387B1 (en) 2000-02-15 2002-12-24 Wen-Ken Yang Wafer level package and the process of the same
US6344401B1 (en) 2000-03-09 2002-02-05 Atmel Corporation Method of forming a stacked-die integrated circuit chip package on a water level
US6396710B1 (en) 2000-05-12 2002-05-28 Raytheon Company High density interconnect module
JP3879816B2 (ja) 2000-06-02 2007-02-14 セイコーエプソン株式会社 半導体装置及びその製造方法、積層型半導体装置、回路基板並びに電子機器
US6472247B1 (en) 2000-06-26 2002-10-29 Ricoh Company, Ltd. Solid-state imaging device and method of production of the same
JP3405456B2 (ja) 2000-09-11 2003-05-12 沖電気工業株式会社 半導体装置,半導体装置の製造方法,スタック型半導体装置及びスタック型半導体装置の製造方法
US6693358B2 (en) 2000-10-23 2004-02-17 Matsushita Electric Industrial Co., Ltd. Semiconductor chip, wiring board and manufacturing process thereof as well as semiconductor device
JP4505983B2 (ja) 2000-12-01 2010-07-21 日本電気株式会社 半導体装置
JP3420748B2 (ja) 2000-12-14 2003-06-30 松下電器産業株式会社 半導体装置及びその製造方法
JP2002184937A (ja) * 2000-12-18 2002-06-28 Shinko Electric Ind Co Ltd 半導体装置の実装構造
US20020074637A1 (en) * 2000-12-19 2002-06-20 Intel Corporation Stacked flip chip assemblies
JP3915513B2 (ja) 2001-01-12 2007-05-16 コニカミノルタホールディングス株式会社 撮像装置
US20020098620A1 (en) 2001-01-24 2002-07-25 Yi-Chuan Ding Chip scale package and manufacturing method thereof
KR100352236B1 (ko) 2001-01-30 2002-09-12 삼성전자 주식회사 접지 금속층을 갖는 웨이퍼 레벨 패키지
JPWO2002063681A1 (ja) 2001-02-08 2004-06-10 株式会社ルネサステクノロジ 半導体集積回路装置およびその製造方法
KR100364635B1 (ko) 2001-02-09 2002-12-16 삼성전자 주식회사 칩-레벨에 형성된 칩 선택용 패드를 포함하는 칩-레벨3차원 멀티-칩 패키지 및 그 제조 방법
US6717254B2 (en) 2001-02-22 2004-04-06 Tru-Si Technologies, Inc. Devices having substrates with opening passing through the substrates and conductors in the openings, and methods of manufacture
US6498381B2 (en) 2001-02-22 2002-12-24 Tru-Si Technologies, Inc. Semiconductor structures having multiple conductive layers in an opening, and methods for fabricating same
US7115986B2 (en) 2001-05-02 2006-10-03 Micron Technology, Inc. Flexible ball grid array chip scale packages
JP3651413B2 (ja) 2001-05-21 2005-05-25 日立電線株式会社 半導体装置用テープキャリア及びそれを用いた半導体装置、半導体装置用テープキャリアの製造方法及び半導体装置の製造方法
US6528408B2 (en) 2001-05-21 2003-03-04 Micron Technology, Inc. Method for bumped die and wire bonded board-on-chip package
US6878608B2 (en) 2001-05-31 2005-04-12 International Business Machines Corporation Method of manufacture of silicon based package
US20030006494A1 (en) * 2001-07-03 2003-01-09 Lee Sang Ho Thin profile stackable semiconductor package and method for manufacturing
KR100394808B1 (ko) 2001-07-19 2003-08-14 삼성전자주식회사 웨이퍼 레벨 적층 칩 패키지 및 그 제조 방법
US6787916B2 (en) 2001-09-13 2004-09-07 Tru-Si Technologies, Inc. Structures having a substrate with a cavity and having an integrated circuit bonded to a contact pad located in the cavity
US6727576B2 (en) 2001-10-31 2004-04-27 Infineon Technologies Ag Transfer wafer level packaging
US6611052B2 (en) * 2001-11-16 2003-08-26 Micron Technology, Inc. Wafer level stackable semiconductor package
US6607941B2 (en) * 2002-01-11 2003-08-19 National Semiconductor Corporation Process and structure improvements to shellcase style packaging technology
US6743660B2 (en) 2002-01-12 2004-06-01 Taiwan Semiconductor Manufacturing Co., Ltd Method of making a wafer level chip scale package
JP4002106B2 (ja) 2002-01-16 2007-10-31 日立オムロンターミナルソリューションズ株式会社 自動取引装置
US6806559B2 (en) 2002-04-22 2004-10-19 Irvine Sensors Corporation Method and apparatus for connecting vertically stacked integrated circuit chips
TWI232560B (en) 2002-04-23 2005-05-11 Sanyo Electric Co Semiconductor device and its manufacture
JP2003318178A (ja) 2002-04-24 2003-11-07 Seiko Epson Corp 半導体装置及びその製造方法、回路基板並びに電子機器
US7340181B1 (en) 2002-05-13 2008-03-04 National Semiconductor Corporation Electrical die contact structure and fabrication method
TWI229435B (en) 2002-06-18 2005-03-11 Sanyo Electric Co Manufacture of semiconductor device
US6984545B2 (en) 2002-07-22 2006-01-10 Micron Technology, Inc. Methods of encapsulating selected locations of a semiconductor die assembly using a thick solder mask
JP2004063569A (ja) 2002-07-25 2004-02-26 Seiko Epson Corp 半導体装置及びその製造方法、回路基板並びに電子機器
US6903442B2 (en) 2002-08-29 2005-06-07 Micron Technology, Inc. Semiconductor component having backside pin contacts
US7329563B2 (en) 2002-09-03 2008-02-12 Industrial Technology Research Institute Method for fabrication of wafer level package incorporating dual compliant layers
SE0202681D0 (sv) 2002-09-10 2002-09-10 Frank Niklaus Hermetic sealing with combined adhesive bonding and sealing rings
US20040061213A1 (en) 2002-09-17 2004-04-01 Chippac, Inc. Semiconductor multi-package module having package stacked over die-up flip chip ball grid array package and having wire bond interconnect between stacked packages
JP4081666B2 (ja) 2002-09-24 2008-04-30 セイコーエプソン株式会社 半導体装置及びその製造方法、回路基板並びに電子機器
US20040104454A1 (en) 2002-10-10 2004-06-03 Rohm Co., Ltd. Semiconductor device and method of producing the same
TWI227050B (en) 2002-10-11 2005-01-21 Sanyo Electric Co Semiconductor device and method for manufacturing the same
US6656827B1 (en) 2002-10-17 2003-12-02 Taiwan Semiconductor Manufacturing Co., Ltd. Electrical performance enhanced wafer level chip scale package with ground
US6869824B2 (en) 2002-10-29 2005-03-22 Ultratera Corporation Fabrication method of window-type ball grid array semiconductor package
TWI227550B (en) 2002-10-30 2005-02-01 Sanyo Electric Co Semiconductor device manufacturing method
JP4056854B2 (ja) 2002-11-05 2008-03-05 新光電気工業株式会社 半導体装置の製造方法
DE10253163B4 (de) 2002-11-14 2015-07-23 Epcos Ag Bauelement mit hermetischer Verkapselung und Waferscale Verfahren zur Herstellung
US20050012225A1 (en) 2002-11-15 2005-01-20 Choi Seung-Yong Wafer-level chip scale package and method for fabricating and using the same
WO2004055891A1 (ja) * 2002-12-17 2004-07-01 Fujitsu Limited 半導体装置および積層型半導体装置
JP3566957B2 (ja) * 2002-12-24 2004-09-15 沖電気工業株式会社 半導体装置及びその製造方法
KR20040059742A (ko) 2002-12-30 2004-07-06 동부전자 주식회사 반도체용 멀티 칩 모듈의 패키징 방법
JP3680839B2 (ja) 2003-03-18 2005-08-10 セイコーエプソン株式会社 半導体装置および半導体装置の製造方法
JP3972846B2 (ja) 2003-03-25 2007-09-05 セイコーエプソン株式会社 半導体装置の製造方法
EP1519410A1 (en) 2003-09-25 2005-03-30 Interuniversitair Microelektronica Centrum vzw ( IMEC) Method for producing electrical through hole interconnects and devices made thereof
US6897148B2 (en) 2003-04-09 2005-05-24 Tru-Si Technologies, Inc. Electroplating and electroless plating of conductive materials into openings, and structures obtained thereby
JP4373695B2 (ja) 2003-04-16 2009-11-25 浜松ホトニクス株式会社 裏面照射型光検出装置の製造方法
SG119185A1 (en) 2003-05-06 2006-02-28 Micron Technology Inc Method for packaging circuits and packaged circuits
JP4130158B2 (ja) 2003-06-09 2008-08-06 三洋電機株式会社 半導体装置の製造方法、半導体装置
EP1482553A3 (en) 2003-05-26 2007-03-28 Sanyo Electric Co., Ltd. Semiconductor device and manufacturing method thereof
EP1636842B1 (en) 2003-06-03 2011-08-17 Casio Computer Co., Ltd. Stackable semiconductor device and method of manufacturing the same
US6972480B2 (en) 2003-06-16 2005-12-06 Shellcase Ltd. Methods and apparatus for packaging integrated circuit devices
US9530857B2 (en) 2003-06-20 2016-12-27 Tessera Advanced Technologies, Inc. Electronic device, assembly and methods of manufacturing an electronic device including a vertical trench capacitor and a vertical interconnect
KR101078621B1 (ko) 2003-07-03 2011-11-01 테쎄라 테크놀로지스 아일랜드 리미티드 집적회로 디바이스를 패키징하기 위한 방법 및 장치
JP2005045073A (ja) 2003-07-23 2005-02-17 Hamamatsu Photonics Kk 裏面入射型光検出素子
KR100537892B1 (ko) 2003-08-26 2005-12-21 삼성전자주식회사 칩 스택 패키지와 그 제조 방법
US7180149B2 (en) 2003-08-28 2007-02-20 Fujikura Ltd. Semiconductor package with through-hole
US7061085B2 (en) 2003-09-19 2006-06-13 Micron Technology, Inc. Semiconductor component and system having stiffener and circuit decal
KR100594229B1 (ko) 2003-09-19 2006-07-03 삼성전자주식회사 반도체 패키지 및 그 제조방법
JP2005101067A (ja) * 2003-09-22 2005-04-14 Sharp Corp 基板の配線構造および配線形成方法
US20050095835A1 (en) 2003-09-26 2005-05-05 Tessera, Inc. Structure and method of making capped chips having vertical interconnects
SG120123A1 (en) 2003-09-30 2006-03-28 Micron Technology Inc Castellated chip-scale packages and methods for fabricating the same
KR100621992B1 (ko) 2003-11-19 2006-09-13 삼성전자주식회사 이종 소자들의 웨이퍼 레벨 적층 구조와 방법 및 이를이용한 시스템-인-패키지
US7060601B2 (en) 2003-12-17 2006-06-13 Tru-Si Technologies, Inc. Packaging substrates for integrated circuits and soldering methods
US7049170B2 (en) 2003-12-17 2006-05-23 Tru-Si Technologies, Inc. Integrated circuits and packaging substrates with cavities, and attachment methods including insertion of protruding contact pads into cavities
US20050156330A1 (en) 2004-01-21 2005-07-21 Harris James M. Through-wafer contact to bonding pad
DE102004008135A1 (de) 2004-02-18 2005-09-22 Infineon Technologies Ag Halbleiterbauteil mit einem Stapel aus Halbleiterchips und Verfahren zur Herstellung desselben
US7160753B2 (en) 2004-03-16 2007-01-09 Voxtel, Inc. Silicon-on-insulator active pixel sensors
US7215018B2 (en) 2004-04-13 2007-05-08 Vertical Circuits, Inc. Stacked die BGA or LGA component assembly
JP4285309B2 (ja) * 2004-04-13 2009-06-24 パナソニック株式会社 電子回路モジュールの製造方法と多層電子回路モジュールおよびその製造方法
US7952189B2 (en) 2004-05-27 2011-05-31 Chang-Feng Wan Hermetic packaging and method of manufacture and use therefore
US7232754B2 (en) 2004-06-29 2007-06-19 Micron Technology, Inc. Microelectronic devices and methods for forming interconnects in microelectronic devices
KR100587081B1 (ko) 2004-06-30 2006-06-08 주식회사 하이닉스반도체 개선된 열방출 특성을 갖는 반도체 패키지
JP4211696B2 (ja) 2004-06-30 2009-01-21 ソニー株式会社 固体撮像装置の製造方法
KR100605314B1 (ko) 2004-07-22 2006-07-28 삼성전자주식회사 재배선 보호 피막을 가지는 웨이퍼 레벨 패키지의 제조 방법
DE102004039906A1 (de) 2004-08-18 2005-08-18 Infineon Technologies Ag Verfahren zur Herstellung eines elektronischen Bauelements sowie ein elektronisches Bauelement mit mindestens zwei integrierten Bausteinen
US20060043556A1 (en) 2004-08-25 2006-03-02 Chao-Yuan Su Stacked packaging methods and structures
US7378342B2 (en) 2004-08-27 2008-05-27 Micron Technology, Inc. Methods for forming vias varying lateral dimensions
US7129567B2 (en) 2004-08-31 2006-10-31 Micron Technology, Inc. Substrate, semiconductor die, multichip module, and system including a via structure comprising a plurality of conductive elements
KR100604049B1 (ko) 2004-09-01 2006-07-24 동부일렉트로닉스 주식회사 반도체 칩 패키지 및 그 제조방법
JP2006073825A (ja) 2004-09-02 2006-03-16 Toshiba Corp 半導体装置及びその実装方法
TWI288448B (en) 2004-09-10 2007-10-11 Toshiba Corp Semiconductor device and method of manufacturing the same
JP4139803B2 (ja) 2004-09-28 2008-08-27 シャープ株式会社 半導体装置の製造方法
KR100676493B1 (ko) 2004-10-08 2007-02-01 디엔제이 클럽 인코 재배선 기판을 이용한 웨이퍼 레벨 칩 스케일 패키지의제조 방법
KR100855819B1 (ko) 2004-10-08 2008-09-01 삼성전기주식회사 금속 밀봉부재가 형성된 mems 패키지
JP4873517B2 (ja) 2004-10-28 2012-02-08 オンセミコンダクター・トレーディング・リミテッド 半導体装置及びその製造方法
DE102004052921A1 (de) 2004-10-29 2006-05-11 Infineon Technologies Ag Verfahren zur Herstellung von Halbleiterbauelementen mit externen Kontaktierungen
US7462925B2 (en) * 2004-11-12 2008-12-09 Macronix International Co., Ltd. Method and apparatus for stacking electrical components using via to provide interconnection
US20060138626A1 (en) 2004-12-29 2006-06-29 Tessera, Inc. Microelectronic packages using a ceramic substrate having a window and a conductive surface region
KR20060087273A (ko) 2005-01-28 2006-08-02 삼성전기주식회사 반도체 패키지및 그 제조방법
US7675153B2 (en) 2005-02-02 2010-03-09 Kabushiki Kaisha Toshiba Semiconductor device having semiconductor chips stacked and mounted thereon and manufacturing method thereof
US7538032B2 (en) 2005-06-23 2009-05-26 Teledyne Scientific & Imaging, Llc Low temperature method for fabricating high-aspect ratio vias and devices fabricated by said method
US7449779B2 (en) 2005-03-22 2008-11-11 Tessera, Inc. Wire bonded wafer level cavity package
US7326592B2 (en) 2005-04-04 2008-02-05 Infineon Technologies Ag Stacked die package
JP4237160B2 (ja) 2005-04-08 2009-03-11 エルピーダメモリ株式会社 積層型半導体装置
JP4308797B2 (ja) 2005-05-02 2009-08-05 株式会社アドバンストシステムズジャパン 半導体パッケージおよびソケット付き回路基板
US7208345B2 (en) 2005-05-11 2007-04-24 Infineon Technologies Ag Method of manufacturing a semiconductor device comprising stacked chips and a corresponding semiconductor device
JP2007019107A (ja) 2005-07-05 2007-01-25 Shinko Electric Ind Co Ltd 半導体装置および半導体装置の製造方法
KR100629498B1 (ko) 2005-07-15 2006-09-28 삼성전자주식회사 마이크로 패키지, 멀티―스택 마이크로 패키지 및 이들의제조방법
JP4551321B2 (ja) 2005-07-21 2010-09-29 新光電気工業株式会社 電子部品実装構造及びその製造方法
US7419853B2 (en) 2005-08-11 2008-09-02 Hymite A/S Method of fabrication for chip scale package for a micro component
SG130066A1 (en) 2005-08-26 2007-03-20 Micron Technology Inc Microelectronic device packages, stacked microelectronic device packages, and methods for manufacturing microelectronic devices
US7485969B2 (en) * 2005-09-01 2009-02-03 Micron Technology, Inc. Stacked microelectronic devices and methods for manufacturing microelectronic devices
US20070052050A1 (en) 2005-09-07 2007-03-08 Bart Dierickx Backside thinned image sensor with integrated lens stack
US20070126085A1 (en) 2005-12-02 2007-06-07 Nec Electronics Corporation Semiconductor device and method of manufacturing the same
WO2007066409A1 (ja) 2005-12-09 2007-06-14 Spansion Llc 半導体装置およびその製造方法
US7981726B2 (en) 2005-12-12 2011-07-19 Intel Corporation Copper plating connection for multi-die stack in substrate package
US7632708B2 (en) 2005-12-27 2009-12-15 Tessera, Inc. Microelectronic component with photo-imageable substrate
US20070158807A1 (en) 2005-12-29 2007-07-12 Daoqiang Lu Edge interconnects for die stacking
US20070190747A1 (en) 2006-01-23 2007-08-16 Tessera Technologies Hungary Kft. Wafer level packaging to lidded chips
SG135074A1 (en) 2006-02-28 2007-09-28 Micron Technology Inc Microelectronic devices, stacked microelectronic devices, and methods for manufacturing such devices
US7741707B2 (en) 2006-02-27 2010-06-22 Stats Chippac Ltd. Stackable integrated circuit package system
US7510928B2 (en) 2006-05-05 2009-03-31 Tru-Si Technologies, Inc. Dielectric trenches, nickel/tantalum oxide structures, and chemical mechanical polishing techniques
US8102039B2 (en) 2006-08-11 2012-01-24 Sanyo Semiconductor Co., Ltd. Semiconductor device and manufacturing method thereof
US7531445B2 (en) 2006-09-26 2009-05-12 Hymite A/S Formation of through-wafer electrical interconnections and other structures using a thin dielectric membrane
US8513789B2 (en) 2006-10-10 2013-08-20 Tessera, Inc. Edge connect wafer level stacking with leads extending along edges
US7829438B2 (en) 2006-10-10 2010-11-09 Tessera, Inc. Edge connect wafer level stacking
US7901989B2 (en) 2006-10-10 2011-03-08 Tessera, Inc. Reconstituted wafer level stacking
US7759166B2 (en) 2006-10-17 2010-07-20 Tessera, Inc. Microelectronic packages fabricated at the wafer level and methods therefor
US7807508B2 (en) 2006-10-31 2010-10-05 Tessera Technologies Hungary Kft. Wafer-level fabrication of lidded chips with electrodeposited dielectric coating
US7935568B2 (en) 2006-10-31 2011-05-03 Tessera Technologies Ireland Limited Wafer-level fabrication of lidded chips with electrodeposited dielectric coating
US7663213B2 (en) 2006-11-13 2010-02-16 China Wafer Level Csp Ltd. Wafer level chip size packaged chip device with a double-layer lead structure and method of fabricating the same
US7394152B2 (en) 2006-11-13 2008-07-01 China Wafer Level Csp Ltd. Wafer level chip size packaged chip device with an N-shape junction inside and method of fabricating the same
US7791199B2 (en) 2006-11-22 2010-09-07 Tessera, Inc. Packaged semiconductor chips
US8569876B2 (en) 2006-11-22 2013-10-29 Tessera, Inc. Packaged semiconductor chips with array
US7952195B2 (en) * 2006-12-28 2011-05-31 Tessera, Inc. Stacked packages with bridging traces
US20080157327A1 (en) 2007-01-03 2008-07-03 Advanced Chip Engineering Technology Inc. Package on package structure for semiconductor devices and method of the same
EP2575166A3 (en) 2007-03-05 2014-04-09 Invensas Corporation Chips having rear contacts connected by through vias to front contacts
US20080284041A1 (en) 2007-05-18 2008-11-20 Samsung Electronics Co., Ltd. Semiconductor package with through silicon via and related method of fabrication
KR100914977B1 (ko) 2007-06-18 2009-09-02 주식회사 하이닉스반도체 스택 패키지의 제조 방법
TW200917391A (en) 2007-06-20 2009-04-16 Vertical Circuits Inc Three-dimensional circuitry formed on integrated circuit device using two-dimensional fabrication
US20110024890A1 (en) 2007-06-29 2011-02-03 Stats Chippac, Ltd. Stackable Package By Using Internal Stacking Modules
US8766910B2 (en) 2007-07-04 2014-07-01 Cypress Semiconductor Corporation Capacitive sensing control knob
KR101458538B1 (ko) 2007-07-27 2014-11-07 테세라, 인코포레이티드 적층형 마이크로 전자 유닛, 및 이의 제조방법
JP2009032929A (ja) 2007-07-27 2009-02-12 Sanyo Electric Co Ltd 半導体装置及びその製造方法
US8193615B2 (en) 2007-07-31 2012-06-05 DigitalOptics Corporation Europe Limited Semiconductor packaging process using through silicon vias
KR101387701B1 (ko) 2007-08-01 2014-04-23 삼성전자주식회사 반도체 패키지 및 이의 제조방법
KR101533663B1 (ko) 2007-08-03 2015-07-03 테세라, 인코포레이티드 재구성된 웨이퍼를 이용한 스택 패키지
US8043895B2 (en) 2007-08-09 2011-10-25 Tessera, Inc. Method of fabricating stacked assembly including plurality of stacked microelectronic elements
WO2009023462A1 (en) 2007-08-10 2009-02-19 Spansion Llc Semiconductor device and method for manufacturing thereof
KR100905784B1 (ko) 2007-08-16 2009-07-02 주식회사 하이닉스반도체 반도체 패키지용 관통 전극 및 이를 갖는 반도체 패키지
US8084854B2 (en) 2007-12-28 2011-12-27 Micron Technology, Inc. Pass-through 3D interconnect for microelectronic dies and associated systems and methods
US20100053407A1 (en) 2008-02-26 2010-03-04 Tessera, Inc. Wafer level compliant packages for rear-face illuminated solid state image sensors
US20090212381A1 (en) 2008-02-26 2009-08-27 Tessera, Inc. Wafer level packages for rear-face illuminated solid state image sensors
US7973416B2 (en) 2008-05-12 2011-07-05 Texas Instruments Incorporated Thru silicon enabled die stacking scheme
US7863721B2 (en) 2008-06-11 2011-01-04 Stats Chippac, Ltd. Method and apparatus for wafer level integration using tapered vias
WO2009154761A1 (en) 2008-06-16 2009-12-23 Tessera Research Llc Stacking of wafer-level chip scale packages having edge contacts
US20100065949A1 (en) 2008-09-17 2010-03-18 Andreas Thies Stacked Semiconductor Chips with Through Substrate Vias
KR100990943B1 (ko) 2008-11-07 2010-11-01 주식회사 하이닉스반도체 반도체 패키지
US8466542B2 (en) 2009-03-13 2013-06-18 Tessera, Inc. Stacked microelectronic assemblies having vias extending through bond pads

Also Published As

Publication number Publication date
US20080157323A1 (en) 2008-07-03
US7952195B2 (en) 2011-05-31
JP2010515259A (ja) 2010-05-06
KR20090128376A (ko) 2009-12-15
EP2097925A2 (en) 2009-09-09
WO2008085391A3 (en) 2008-09-12
WO2008085391A2 (en) 2008-07-17
JP5567346B2 (ja) 2014-08-06
KR101454332B1 (ko) 2014-10-23
US8349654B2 (en) 2013-01-08
US20110230013A1 (en) 2011-09-22
CN101595562B (zh) 2011-09-21
EP2097925B1 (en) 2020-11-04

Similar Documents

Publication Publication Date Title
CN101595562B (zh) 堆叠封装
CN102067310B (zh) 带有边缘触头的晶片级芯片规模封装的堆叠及其制造方法
US6528879B2 (en) Semiconductor device and semiconductor module
CN101587869B (zh) 可颠倒无引线封装及其堆叠和制造方法
US20050146052A1 (en) Semiconductor device and semiconductor module
CN101211901A (zh) 包含电子元件的基板
US10373894B2 (en) Package structure and the method to fabricate thereof
JP2002543618A (ja) 積重ね可能なフレックス回路用icパッケージ及びその製造方法
CN107994002B (zh) 半导体衬底及具有半导体衬底的半导体封装结构
CN103946976A (zh) 具有翻转式球接合表面的双层级引线框架及装置封装
US20120319258A1 (en) Stack frame for electrical connections and the method to fabricate thereof
CN102867801A (zh) 半导体承载件暨封装件及其制法
CN100442502C (zh) 半导体装置、电子设备及它们的制造方法,以及电子仪器
KR20010011310A (ko) 적층 패키지의 제조 방법
JP4745185B2 (ja) 半導体回路モジュールの製造方法
KR100520409B1 (ko) 볼 그리드 어레이 타입의 멀티 칩 패키지
KR20180058174A (ko) 반도체 패키지
CN111739873B (zh) 柔性基板叠层封装结构和柔性基板叠层封装方法
CN101359640A (zh) 具嵌埋半导体元件的电路板叠接结构
JP4379578B2 (ja) 半導体装置の製造方法
CN103187386B (zh) 基板结构、封装结构及其制法
EP1061574A1 (en) Semiconductor device and method for manufacturing the same
EP1949440A2 (en) Multiple die integrated circuit package
US20090189272A1 (en) Wafer Level Chip Scale Packages Including Redistribution Substrates and Methods of Fabricating the Same
CN103140027A (zh) 电路板模块及其堆栈和制作方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant