BR112015006206A2 - precursor de chapa de impressão litográfica e método de preparação da chapa - Google Patents

precursor de chapa de impressão litográfica e método de preparação da chapa

Info

Publication number
BR112015006206A2
BR112015006206A2 BR112015006206A BR112015006206A BR112015006206A2 BR 112015006206 A2 BR112015006206 A2 BR 112015006206A2 BR 112015006206 A BR112015006206 A BR 112015006206A BR 112015006206 A BR112015006206 A BR 112015006206A BR 112015006206 A2 BR112015006206 A2 BR 112015006206A2
Authority
BR
Brazil
Prior art keywords
lithographic printing
printing plate
plate precursor
radical
precursor
Prior art date
Application number
BR112015006206A
Other languages
English (en)
Inventor
Sato Noriaki
Nagata Yuzo
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of BR112015006206A2 publication Critical patent/BR112015006206A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08—Developable by water or the fountain solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

resumo “precursor de chapa de impressão litográfica e método de preparação da chapa” por um precursor de chapa de impressão litográfica compreendendo um su-porte tendo uma camada de gravação de imagem proporcionada neste contendo (a) um iniciador de polimerização por radical, (b) um composto polimerizável por radical, e (c) um inibidor de polimerização polifuncional, em que o inibidor de polimerização polifuncional tem, em uma molécula do mesmo, dois ou mais locais de retenção de radicais, para formar uma ligação covalente por ligar diretamente com um radical, um precursor de chapa de impressão litográfica, o qual é capaz de ser diretamente gravado a partir dos dados digitais, por exemplo, de um computador, o qual tem alta sensibilidade, e o qual pode formar uma imagem tendo uma alta qualidade de ima-gem, prevenindo uma reação de cura indesejável na área de não imagem do pro-cesso, em que o precursor de chapa de impressão litográfica pode fornecer uma chapa de impressão litográfica com elevada durabilidade da impressão, e um méto-do de preparar chapa utilizando a mesma são fornecidos.
BR112015006206A 2012-09-20 2013-08-20 precursor de chapa de impressão litográfica e método de preparação da chapa BR112015006206A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012207525 2012-09-20
PCT/JP2013/072212 WO2014045783A1 (ja) 2012-09-20 2013-08-20 平版印刷版原版及び製版方法

Publications (1)

Publication Number Publication Date
BR112015006206A2 true BR112015006206A2 (pt) 2017-07-04

Family

ID=50341107

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015006206A BR112015006206A2 (pt) 2012-09-20 2013-08-20 precursor de chapa de impressão litográfica e método de preparação da chapa

Country Status (6)

Country Link
US (1) US20150192852A1 (pt)
EP (1) EP2899034B1 (pt)
JP (1) JP5786098B2 (pt)
CN (1) CN104619512A (pt)
BR (1) BR112015006206A2 (pt)
WO (1) WO2014045783A1 (pt)

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WO2016157988A1 (ja) * 2015-03-31 2016-10-06 富士フイルム株式会社 上層膜形成用組成物、パターン形成方法、レジストパターン、及び、電子デバイスの製造方法
WO2017002702A1 (ja) * 2015-07-01 2017-01-05 Dic株式会社 安定剤化合物、液晶組成物および表示素子
WO2017038552A1 (ja) * 2015-09-04 2017-03-09 Dic株式会社 安定剤化合物、液晶組成物および表示素子
JP6358398B2 (ja) 2015-09-04 2018-07-18 Dic株式会社 液晶組成物及びそれを使用した液晶表示素子
KR20170046585A (ko) * 2015-10-21 2017-05-02 제이엔씨 주식회사 감광성 조성물
KR101985637B1 (ko) 2016-03-08 2019-06-03 디아이씨 가부시끼가이샤 액정 조성물 및 그것을 사용한 액정 표시 소자
JP6813326B2 (ja) * 2016-10-06 2021-01-13 東京応化工業株式会社 レジストパターンのラフネスを低減させるために用いられる被覆剤、及びラフネスが低減されたレジストパターンの製造方法
BR112019009802B1 (pt) 2016-11-16 2022-12-13 Fujifilm Corporation Precursor de placa de impressão planográfica em prensa e método para fabricação de placa em prensa para placa de impressão planográfica
EP3501837A1 (en) * 2017-12-21 2019-06-26 Université de Haute Alsace Thermal amplification of free radical polymerization induced by red to near-infrared irradiation
EP3793830B1 (en) * 2018-05-14 2023-03-29 Agfa Offset Bv A lithographic printing plate precursor
WO2020066377A1 (ja) * 2018-09-27 2020-04-02 富士フイルム株式会社 平版印刷版原版、及び、平版印刷版の作製方法
CN114181375B (zh) * 2021-11-25 2023-10-13 五邑大学 一种交联型醌类聚合物及其制备方法与应用

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