BR112015014898A2 - composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem - Google Patents
composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagemInfo
- Publication number
- BR112015014898A2 BR112015014898A2 BR112015014898A BR112015014898A BR112015014898A2 BR 112015014898 A2 BR112015014898 A2 BR 112015014898A2 BR 112015014898 A BR112015014898 A BR 112015014898A BR 112015014898 A BR112015014898 A BR 112015014898A BR 112015014898 A2 BR112015014898 A2 BR 112015014898A2
- Authority
- BR
- Brazil
- Prior art keywords
- composition
- radiation sensitive
- regions
- printing
- electromagnetic spectrum
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title abstract 5
- 238000001228 spectrum Methods 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000002318 adhesion promoter Substances 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 238000012719 thermal polymerization Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
resumo patente de invenção: "composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem". a presente invenção refere-se à composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão compreendendo (a) um polímero, ou mais de um, aglutinante; (b) um composto etilenicamente insaturado; (c) um ou mais compostos absorvedores de radiações na região do espectro selecionado; (d) um sensibilizador; (e) opcionalmente um fotoacelerador; (f) um promotor de adesão; (g) um pigmento; e (h) opcionalmente inibidores térmicos de polimerização. a presente invenção refere-se ainda à chapa para impressão compreendendo a referida composição sensível à radiação, bem como ao uso da mesma e processo de revelação de imagem.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/BR2012/000519 WO2014094080A1 (pt) | 2012-12-19 | 2012-12-19 | Composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem |
Publications (2)
Publication Number | Publication Date |
---|---|
BR112015014898A2 true BR112015014898A2 (pt) | 2017-07-11 |
BR112015014898B1 BR112015014898B1 (pt) | 2021-12-07 |
Family
ID=50977425
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112015014898-0A BR112015014898B1 (pt) | 2012-12-19 | 2012-12-19 | Chapas para impressão sensível à radiação no espectro eletromagnético e gráfica e processo de revelação de imagem |
Country Status (4)
Country | Link |
---|---|
US (1) | US10254646B2 (pt) |
EP (1) | EP2937733A4 (pt) |
BR (1) | BR112015014898B1 (pt) |
WO (1) | WO2014094080A1 (pt) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016094280A1 (en) | 2014-12-08 | 2016-06-16 | 3M Innovative Properties Company | Acrylic polyvinyl acetal films, composition, and heat bondable articles |
WO2016094277A1 (en) | 2014-12-08 | 2016-06-16 | 3M Innovative Properties Company | Acrylic polyvinyl acetal films & composition |
CN108472936B (zh) | 2015-12-22 | 2020-10-27 | 3M创新有限公司 | 包括粘合剂层的丙烯酸类聚乙烯醇缩醛膜 |
CN108430769B (zh) | 2015-12-22 | 2021-07-16 | 3M创新有限公司 | 包括第二层的丙烯酸类聚乙烯醇缩醛膜 |
WO2017112458A1 (en) * | 2015-12-22 | 2017-06-29 | 3M Innovative Properties Company | Acrylic polyvinyl acetal graphic films |
EP3393795A2 (en) | 2015-12-22 | 2018-10-31 | 3M Innovative Properties Company | Acrylic films comprising a structured layer |
CN109313292B (zh) | 2016-06-07 | 2021-07-16 | 3M创新有限公司 | 用于光定向制品的丙烯酸聚乙烯醇缩醛膜 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
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US4665124A (en) | 1985-08-02 | 1987-05-12 | American Hoechst Corporation | Resin |
DE3644162A1 (de) | 1986-12-23 | 1988-07-07 | Hoechst Ag | Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
JPH03148655A (ja) * | 1989-07-29 | 1991-06-25 | Canon Inc | 画像形成媒体及び画像形成方法 |
JPH04161383A (ja) * | 1990-10-25 | 1992-06-04 | Nisshinbo Ind Inc | 昇華型感熱転写受像紙 |
US5169898A (en) | 1991-07-30 | 1992-12-08 | Eastman Kodak Company | Acid-substituted ternary acetal polymers useful in photosensitive compositions and lithographic printing plates |
US5169897A (en) | 1991-07-30 | 1992-12-08 | Eastman Kodak Company | Binary acetal polymers useful in photosensitive compositions and lithographic printing plates |
US6010824A (en) | 1992-11-10 | 2000-01-04 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same |
WO1996002021A1 (fr) | 1994-07-11 | 1996-01-25 | Konica Corporation | Element initial pour plaque lithographique et procede de preparation de ladite plaque |
DE19524851C2 (de) * | 1995-07-07 | 1998-05-07 | Sun Chemical Corp | Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten |
JPH09239942A (ja) | 1996-03-08 | 1997-09-16 | Fuji Photo Film Co Ltd | 湿し水不要平版印刷原版及びその製版方法 |
US5705309A (en) | 1996-09-24 | 1998-01-06 | Eastman Kodak Company | Photosensitive composition and element containing polyazide and an infrared absorber in a photocrosslinkable binder |
US5912105A (en) | 1996-12-23 | 1999-06-15 | Agfa-Gevaert | Thermally imageable material |
EP0855267B1 (en) | 1997-01-24 | 2002-04-17 | Fuji Photo Film Co., Ltd. | Planographic printing plate |
EP0869393B1 (en) | 1997-03-31 | 2000-05-31 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
US6218076B1 (en) | 1997-08-26 | 2001-04-17 | Showa Denko K.K. | Stabilizer for organic borate salts and photosensitive composition containing the same |
US6022668A (en) | 1998-01-19 | 2000-02-08 | Kodak Polychrome Graphics Llc | Positive-working direct write waterless lithographic printing members and methods of imaging and printing using same |
US6232038B1 (en) | 1998-10-07 | 2001-05-15 | Mitsubishi Chemical Corporation | Photosensitive composition, image-forming material and image-forming method employing it |
JP3654422B2 (ja) * | 2000-01-31 | 2005-06-02 | 三菱製紙株式会社 | 感光性組成物および感光性平版印刷版材料 |
DE10011096A1 (de) | 2000-03-09 | 2001-10-11 | Clariant Gmbh | Verwendung von carboxylgruppenhaltigen Acetalpolymeren in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten |
BR0102218B1 (pt) | 2001-05-31 | 2012-10-16 | produto sensìvel à radiação, e processo de impressão ou revelação de imagem utilizando o referido produto. | |
EP1349006B1 (en) | 2002-03-28 | 2013-09-25 | Agfa Graphics N.V. | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm. |
AU2003260206A1 (en) | 2003-09-24 | 2005-04-11 | Ibf Industria Brasileira De Filmes Ltda. | Light sensitive coating compositions useful for lithographic elements |
BRPI0400607A (pt) | 2004-01-28 | 2005-09-13 | Konica Minolta Med & Graphic | Composição fotosensìvel e placa para impressão litográfica fotosensìvel |
JP4806019B2 (ja) | 2005-07-20 | 2011-11-02 | イーストマン コダック カンパニー | 平版印刷版に適したフォトポリマー組成物 |
CN101861547B (zh) * | 2007-11-16 | 2013-10-16 | 爱克发印艺公司 | 制造平版印刷版的方法 |
-
2012
- 2012-12-19 US US14/654,313 patent/US10254646B2/en active Active
- 2012-12-19 EP EP12890281.4A patent/EP2937733A4/en not_active Withdrawn
- 2012-12-19 WO PCT/BR2012/000519 patent/WO2014094080A1/pt active Application Filing
- 2012-12-19 BR BR112015014898-0A patent/BR112015014898B1/pt active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
WO2014094080A1 (pt) | 2014-06-26 |
EP2937733A4 (en) | 2016-09-14 |
US20160026080A1 (en) | 2016-01-28 |
US10254646B2 (en) | 2019-04-09 |
EP2937733A1 (en) | 2015-10-28 |
BR112015014898B1 (pt) | 2021-12-07 |
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Legal Events
Date | Code | Title | Description |
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B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B07A | Application suspended after technical examination (opinion) [chapter 7.1 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 19/12/2012, OBSERVADAS AS CONDICOES LEGAIS. |