AU2002350358A1 - Temperature measurement and heat-treating methods and systems - Google Patents

Temperature measurement and heat-treating methods and systems

Info

Publication number
AU2002350358A1
AU2002350358A1 AU2002350358A AU2002350358A AU2002350358A1 AU 2002350358 A1 AU2002350358 A1 AU 2002350358A1 AU 2002350358 A AU2002350358 A AU 2002350358A AU 2002350358 A AU2002350358 A AU 2002350358A AU 2002350358 A1 AU2002350358 A1 AU 2002350358A1
Authority
AU
Australia
Prior art keywords
systems
heat
temperature measurement
treating methods
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002350358A
Other languages
English (en)
Inventor
David Malcolm Camm
Shawna Kervin
Marcel Edmond Lefrancois
Greg Stuart
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mattson Technology Canada Inc
Original Assignee
Vortek Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vortek Industries Ltd filed Critical Vortek Industries Ltd
Publication of AU2002350358A1 publication Critical patent/AU2002350358A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0612—Production flow monitoring, e.g. for increasing throughput
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiation Pyrometers (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AU2002350358A 2001-12-26 2002-12-23 Temperature measurement and heat-treating methods and systems Abandoned AU2002350358A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US34211501P 2001-12-26 2001-12-26
US60/342,115 2001-12-26
PCT/CA2002/001987 WO2003060447A1 (en) 2001-12-26 2002-12-23 Temperature measurement and heat-treating methods and systems

Publications (1)

Publication Number Publication Date
AU2002350358A1 true AU2002350358A1 (en) 2003-07-30

Family

ID=23340390

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002350358A Abandoned AU2002350358A1 (en) 2001-12-26 2002-12-23 Temperature measurement and heat-treating methods and systems

Country Status (7)

Country Link
US (2) US7445382B2 (https=)
JP (3) JP2005515425A (https=)
KR (2) KR101067901B1 (https=)
CN (2) CN100416243C (https=)
AU (1) AU2002350358A1 (https=)
DE (1) DE10297622B4 (https=)
WO (1) WO2003060447A1 (https=)

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JP2011117979A (ja) 2011-06-16
DE10297622T5 (de) 2005-01-05
CN101324470B (zh) 2011-03-30
WO2003060447A8 (en) 2003-12-04
KR20100039455A (ko) 2010-04-15
JP5133278B2 (ja) 2013-01-30
US20050063453A1 (en) 2005-03-24
JP2005515425A (ja) 2005-05-26
JP2009092676A (ja) 2009-04-30
CN1608199A (zh) 2005-04-20
CN100416243C (zh) 2008-09-03
JP5166562B2 (ja) 2013-03-21
KR101067902B1 (ko) 2011-09-27
US7445382B2 (en) 2008-11-04
US7616872B2 (en) 2009-11-10
CN101324470A (zh) 2008-12-17
KR20040066930A (ko) 2004-07-27
DE10297622B4 (de) 2018-06-14
WO2003060447A1 (en) 2003-07-24
KR101067901B1 (ko) 2011-09-28

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