WO2014142085A1 - 粘着シートおよび加工されたデバイス関連部材の製造方法 - Google Patents
粘着シートおよび加工されたデバイス関連部材の製造方法 Download PDFInfo
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- WO2014142085A1 WO2014142085A1 PCT/JP2014/056233 JP2014056233W WO2014142085A1 WO 2014142085 A1 WO2014142085 A1 WO 2014142085A1 JP 2014056233 W JP2014056233 W JP 2014056233W WO 2014142085 A1 WO2014142085 A1 WO 2014142085A1
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- sensitive adhesive
- adhesive sheet
- adhesive layer
- functional group
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/12—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
- C09J2301/122—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present only on one side of the carrier, e.g. single-sided adhesive tape
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/408—Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2423/00—Presence of polyolefin
- C09J2423/04—Presence of homo or copolymers of ethene
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
Definitions
- the present invention relates to a pressure sensitive adhesive sheet used for back surface polishing or dicing, and a processed device using the pressure sensitive adhesive sheet, for a device related member such as a semiconductor wafer, a semiconductor package in which a plurality of semiconductor chips are resin-sealed.
- the present invention relates to a method for manufacturing a related member.
- the “dicing sheet” in the present invention includes a part of the dicing / die bonding sheet. Further, the “adhesive sheet” includes those having another base film for attaching the ring frame and an adhesive layer. Further, the “sheet” in the present invention includes the concept of “tape”.
- Device-related members such as semiconductor wafers and semiconductor packages are subjected to processing, particularly machining such as cutting and polishing, so that chip-like members formed by separating device-related members are formed, or device-related members Adjustment of the thickness is performed.
- processing particularly machining such as cutting and polishing
- chip-like members formed by separating device-related members are formed, or device-related members Adjustment of the thickness is performed.
- post-processing device-related member such as semiconductor wafers and semiconductor packages are subjected to processing, particularly machining such as cutting and polishing, so that chip-like members formed by separating device-related members are formed, or device-related members Adjustment of the thickness is performed.
- a processed device-related member is also referred to as a “post-processing device-related member”.
- the pressure-sensitive adhesive sheet temporarily attached to the device-related member is provided with the pressure-sensitive adhesive sheet by irradiation with energy rays such as ultraviolet rays, X-rays, and electron beams.
- the adhesive layer is curable.
- Such an adhesive sheet can reduce the adhesiveness to the post-processed device-related member by irradiation of energy rays, and at this time, the post-processed device-related member is peeled from the adhesive sheet (as a specific example, a chip-like member And the pressure-sensitive adhesive sheet is peeled off from the device-related member whose thickness is adjusted.
- a pressure-sensitive adhesive composition for forming a pressure-sensitive adhesive layer that is cured by irradiation with energy rays as described above a polymer having a polymerizable functional group in a side chain, an adhesive main agent and an ultraviolet curable component
- a pressure-sensitive adhesive composition is known as a component that also serves as a component (prior art document 2).
- Such a pressure-sensitive adhesive composition has an advantage that volume shrinkage at the time of curing is small.
- the pressure-sensitive adhesive composition for forming the energy ray-curable pressure-sensitive adhesive layer contains a polymer having the above-described polymerizable functional group (hereinafter also referred to as “adduct type”). Examples include a case where a polymer as a main agent and a low molecular weight component that forms a three-dimensional network structure by a curing reaction (hereinafter, also referred to as “blend type”). In the case of a blend-type pressure-sensitive adhesive composition, a low molecular weight component whose curing reaction has not sufficiently progressed becomes a residual component that is not taken into the three-dimensional network structure that causes the pressure-sensitive adhesive layer to cure.
- the adduct-type adhesive composition has a lower energy than the blend-type adhesive composition.
- the polymerization reaction does not easily proceed inside, and as a result, the pressure-sensitive adhesive layer may tend to be hard to cure.
- the mobility of the polymerizable functional group of the polymer is relatively lower, and as a result, the pressure-sensitive adhesive layer is more cured. The problem that the objective of the reduction of adhesiveness by energy ray hardening is not fully achieved becomes easy to occur.
- the prior art document 3 describes that 15 to 35 weights of photopolymerization initiator is used as a component of the pressure-sensitive adhesive composition with respect to 100 weight parts of the (meth) acrylic acid ester copolymer.
- An invention of a pressure-sensitive adhesive tape characterized by containing 0.2 to 3.0 parts by weight of a polymerization inhibitor and a polymerization inhibitor is disclosed.
- Prior art documents 4 and 5 both disclose a tape peeling method in which heat is supplementarily applied together with ultraviolet irradiation by an ultraviolet LED.
- JP 2006-040944 A Japanese Patent Laid-Open No. 05-032945 JP 2011-105854 A JP 2011-040476 A JP 2011-124480 A
- the present invention is a pressure-sensitive adhesive layer formed from a pressure-sensitive adhesive composition containing a polymer having a polymerizable functional group, but is cured even after being cured by irradiation with a small amount of radiant heat such as irradiation from an ultraviolet LED. It is an object of the present invention to provide a pressure-sensitive adhesive sheet that can sufficiently reduce the pressure-sensitive adhesiveness with respect to a device-related member and that is excellent in storage stability while suppressing generation of outgas. Moreover, this invention also makes it a subject to provide the manufacturing method of the post-process-related member related member which uses this adhesive sheet.
- the present invention provided to achieve the above object is, firstly, a pressure-sensitive adhesive sheet comprising a base material and a pressure-sensitive adhesive layer provided on one main surface side of the base material.
- the agent layer is a pressure-sensitive adhesive containing 2 parts by mass or less of the photopolymerization initiator (B) with respect to 100 parts by mass of the polymer (A) having a polymerizable functional group and the polymer (A) having the polymerizable functional group.
- the photopolymerization initiator (B) has a mass extinction coefficient (unit: ml / g ⁇ cm) at a wavelength of 365 nm of a 3% by mass methanol solution of 200 to 1000 inclusive.
- An adhesive sheet is provided.
- invention 1 using an ultraviolet light source capable of irradiating a light having a single emission peak having a maximum intensity in a range of 350 nm to 400 nm and a full width at half maximum of 5 nm to 30 nm in its emission spectrum,
- the pressure-sensitive adhesive sheet has a main surface on the opposite side to the surface facing the substrate in the pressure-sensitive adhesive layer.
- the present invention secondly includes a step of affixing the pressure-sensitive adhesive sheet described in the above inventions (inventions 1 and 2) to one surface of a device-related member, one surface of the device-related member to which the pressure-sensitive adhesive sheet is affixed,
- the pressure-sensitive adhesive provided in the pressure-sensitive adhesive sheet to be bonded to the processed device-related member, wherein the pressure-sensitive adhesive sheet is bonded to the processed device-related member by processing from the opposite surface side.
- the adhesive layer is irradiated with light having a light emission spectrum having a single emission peak having a maximum intensity in the range of 350 nm to 400 nm and a full width at half maximum of 5 nm to 30 nm.
- a step of proceeding a polymerization reaction of the polymerizable functional group contained, and a step of peeling the processed device-related member from the pressure-sensitive adhesive sheet having the cured pressure-sensitive adhesive layer To provide a manufacturing method of the processed device-related member, characterized in comprising (invention 3).
- the light source of the light beam preferably includes an ultraviolet light emitting diode (Invention 4).
- the adhesive sheet is a back grind sheet, and the processing may include polishing (Invention 5).
- the pressure-sensitive adhesive sheet may be a dicing sheet, and the processing may include cutting (Invention 6).
- the pressure-sensitive adhesive layer provided in the pressure-sensitive adhesive sheet of the present invention can be cured only by irradiation with ultraviolet rays from a light-emitting diode to sufficiently reduce the adhesiveness to a device-related member after processing, and generation of outgas is suppressed, and Excellent stability of curing performance during storage. Therefore, the pressure-sensitive adhesive sheet according to the present invention is excellent in storage stability and hardly causes a problem of contamination to the device-related member after processing. Therefore, by using the pressure-sensitive adhesive sheet according to the present invention, a post-processed device-related member having excellent quality can be manufactured with high productivity.
- a pressure-sensitive adhesive sheet 1 includes a base material 2 and a pressure-sensitive adhesive layer 3 laminated on at least one surface side of the base material 2.
- the base material 2 of the pressure-sensitive adhesive sheet 1 does not break when sticking to a device-related member that is an adherend of the pressure-sensitive adhesive sheet 1 and when peeling the device-related member after processing from the pressure-sensitive adhesive sheet 1.
- the constituent material is not particularly limited.
- the pressure-sensitive adhesive sheet 1 is used as a dicing sheet, it is preferable that the pressure-sensitive adhesive sheet 1 is not broken even in an expanding process performed after the dicing process.
- the base material 2 of the pressure-sensitive adhesive sheet 1 is usually composed of a film mainly composed of a resin material.
- films include ethylene-copolymer films such as ethylene-vinyl acetate copolymer films, ethylene- (meth) acrylic acid copolymer films, ethylene- (meth) acrylic acid ester copolymer films; Polyethylene film such as density polyethylene (LDPE) film, linear low density polyethylene (LLDPE) film, high density polyethylene (HDPE) film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, ethylene-norbornene copolymer film Polyolefin film such as norbornene resin film; polyvinyl chloride film such as polyvinyl chloride film and vinyl chloride copolymer film; polyethylene terephthalate film, polybutylene film Polyester film such as terephthalate film; polyurethane film; polyimide film; polystyrene films; polycarbonate films
- modified films such as these crosslinked films and ionomer films are also used.
- the substrate 2 may be a film made of one of these, or may be a laminated film in which two or more of these are combined.
- (meth) acrylic acid in the present specification means both acrylic acid and methacrylic acid. The same applies to other similar terms.
- the film constituting the substrate 2 preferably includes at least one of an ethylene copolymer film and a polyolefin film. It is easy to control the mechanical properties of an ethylene copolymer film in a wide range by changing the copolymerization ratio. For this reason, the base material 2 provided with an ethylene-type copolymer film is easy to satisfy
- the ethylene-based copolymer film and the polyolefin-based film are components that adversely affect the properties as the pressure-sensitive adhesive sheet (for example, in the case of a polyvinyl chloride-based film, the plasticizer contained in the film is changed from the base material 2 to the pressure-sensitive adhesive layer 3). And further distributed on the surface of the pressure-sensitive adhesive layer 3 opposite to the surface facing the substrate 2 to reduce the adhesiveness of the pressure-sensitive adhesive layer 3 to the adherend). Therefore, problems such as a decrease in the adhesiveness of the pressure-sensitive adhesive layer 3 to the adherend hardly occur. That is, an adhesive sheet using an ethylene copolymer film and a polyolefin film is excellent in chemical stability.
- the base material 2 may contain various additives such as pigments, flame retardants, plasticizers, antistatic agents, lubricants, fillers, etc. in a film mainly composed of the above-mentioned resin-based material.
- the pigment include titanium dioxide and carbon black.
- the filler include organic materials such as melamine resin, inorganic materials such as fumed silica, and metal materials such as nickel particles. The content of such additives is not particularly limited, but should be limited to a range in which the substrate 2 exhibits a desired function and does not lose smoothness and flexibility.
- the base material 2 is preferably transmissive to the irradiated ultraviolet rays.
- a substrate include an ethylene copolymer film, a polyolefin film, and a polyvinyl chloride film.
- the base material 2 when using an electron beam as an energy beam, it is preferable that the base material 2 also has the transparency of an electron beam.
- the surface of the substrate 2 on the pressure-sensitive adhesive layer 3 side is one or more selected from the group consisting of carboxyl groups and ions and salts thereof. It is preferred that a component having The above components in the substrate 2 and the components related to the pressure-sensitive adhesive layer 3 (components used for forming the pressure-sensitive adhesive layer 3 such as the component constituting the pressure-sensitive adhesive layer 3 and the crosslinking agent (C) are exemplified.) Can interact with each other chemically to reduce the possibility of delamination between them.
- the specific method for making such a component exist in a base-material adhesion surface is not specifically limited.
- the base material 2 itself is, for example, an ethylene- (meth) acrylic acid copolymer film, an ionomer resin film, etc., and the resin that constitutes the base material 2 is selected from the group consisting of carboxyl groups, and ions and salts thereof. One or two or more types may be included.
- the substrate 2 is, for example, a polyolefin-based film, and is subjected to corona treatment on the substrate adhesion surface side or provided with a primer layer. May be.
- Various coating films may be provided on the surface of the substrate 2 opposite to the substrate-coated surface.
- the thickness of the base material 2 is not limited as long as the pressure-sensitive adhesive sheet 1 can function properly in the processes related to the processing described above. Preferably they are 20 micrometers or more and 450 micrometers or less, More preferably, they are 25 micrometers or more and 400 micrometers or less, Especially preferably, they are the range of 50 micrometers or more and 350 micrometers or less.
- the breaking elongation of the substrate 2 in this embodiment is preferably 100% or more as a value measured at 23 ° C. and a relative humidity of 50%, particularly preferably 200% or more and 1000% or less.
- the elongation at break is the elongation relative to the original length of the test piece at the time of breaking the test piece in a tensile test according to JIS K7161: 1994 (ISO 527-1 1993).
- the base material 2 having a breaking elongation of 100% or more is not easily broken when the adhesive sheet 1 is stuck and peeled off.
- the tensile stress at 25% strain of the base material 2 in this embodiment is preferably 5 N / 10 mm or more and 15 N / 10 mm or less, and the maximum tensile stress is preferably 15 MPa or more and 50 MPa or less.
- the tensile stress at 25% strain and the maximum tensile stress are measured by a test based on JIS K7161: 1994.
- the tensile stress at 25% strain is less than 5 N / 10 mm, or the maximum tensile stress is less than 15 MPa
- the base material 2 is soft, there is a concern that slack may occur, and this slack may cause a conveyance error.
- the tensile stress at 25% strain exceeds 15 N / 10 mm or the maximum tensile stress is less than 50 MPa, problems such as peeling of the pressure-sensitive adhesive sheet 1 itself from the ring frame during the expanding process may easily occur. Concerned.
- the elongation at break, the tensile stress at 25% strain, and the maximum tensile stress are values measured in the longitudinal direction of the original fabric in the substrate 2.
- the pressure-sensitive adhesive layer 3 of the pressure-sensitive adhesive sheet 1 can be formed of various conventionally known pressure-sensitive adhesive compositions.
- a pressure-sensitive adhesive composition is not limited at all, but for example, a pressure-sensitive adhesive composition such as rubber, acrylic, silicone or polyvinyl ether may be used.
- the pressure-sensitive adhesive layer 3 provided in the pressure-sensitive adhesive sheet 1 according to the present embodiment contains a polymer (A) having a polymerizable functional group and a photopolymerization initiator (B), and further, a crosslinking agent (C) and the like as necessary. It is formed from the adhesive composition containing this.
- polymer (A) having a polymerizable functional group means a polymer having a structural unit having a polymerizable functional group, which is a polymerizable functional group, at the terminal and / or side chain of the main chain. Means coalescence.
- the specific type of the polymerizable functional group is not particularly limited as long as the polymerization reaction can be initiated by the photopolymerization initiator (B) described later and the polymerization reaction can proceed in a chain manner.
- specific examples include groups having an ethylenically unsaturated bond, among them (meth) acryloyl group, vinyl group and the like.
- the weight average molecular weight (Mw) of the polymer (A) having a polymerizable functional group is the pressure-sensitive adhesive composition for forming the pressure-sensitive adhesive layer 3 and, if necessary, a coating composition further containing a solvent. From the viewpoint of film-forming properties during coating, it is preferably from 10,000 to 2,000,000, and more preferably from 100,000 to 1,500,000.
- the glass transition temperature Tg of the polymer (A) having a polymerizable functional group is preferably in the range of ⁇ 70 ° C. or higher and 30 ° C. or lower, more preferably ⁇ 60 ° C. or higher and 20 ° C. or lower. The glass transition temperature can be calculated from the Fox equation.
- an acrylic polymer as a polymer (A) having a polymerizable functional group is obtained by adding an addition compound to an unadded acrylic copolymer described later, a polymer having a polymerizable functional group is used.
- the Tg of the combined (A) refers to the Tg of the non-added acrylic copolymer.
- the composition and production method thereof will be described with a specific example in which the polymer (A) having a polymerizable functional group is an acrylic polymer.
- the polymer (A) having a polymerizable functional group is an acrylic polymer
- the polymer (A) having a polymerizable functional group is produced, for example, by the following method.
- a structural unit based on an acrylic compound containing a reactive functional group such as a hydroxyl group, a carboxyl group, an amino group, a substituted amino group, or an epoxy group
- a structural unit based on an acrylic compound that does not have these reactive functional groups An unadded acrylic copolymer, which is a copolymer comprising, is prepared.
- this unadded acrylic copolymer is added to one molecule of an addition functional group and a polymerizable functional group (for example, a group having an ethylenic double bond), which are functional groups capable of reacting with the reactive functional group.
- a polymerizable functional group is added to the above non-added acrylic copolymer by reacting with a compound (also referred to as “addition compound” in this specification).
- a compound also referred to as “addition compound” in this specification.
- acrylic compound having the reactive functional group examples include (meth) acrylic acid, itaconic acid, (meth) acrylonitrile, (meth) acrylic acid ester having a reactive functional group, and the like.
- Specific examples of such (meth) acrylic acid esters include (meth) acrylates having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate; glycidyl (meth) acrylate, N-methylaminoethyl Examples include (meth) acrylate having a functional group other than hydroxyl group such as (meth) acrylate.
- (Meth) acrylic acid ester is exemplified as the acrylic compound having no reactive functional group.
- Specific examples of such (meth) acrylic acid esters include chain forms such as methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and the like. Examples include (meth) acrylate having a skeleton; (meth) acrylate having a cyclic skeleton such as cyclohexyl (meth) acrylate and isobornyl (meth) acrylate.
- the carbon number of the alkyl group is the range of 1-18.
- said non-addition acrylic copolymer may have a structural unit based on compounds other than an acrylic compound.
- examples of such compounds include olefins such as ethylene and norbornene, vinyl acetate, and styrene.
- the kind of the addition functional group that the addition compound has is appropriately set in relation to the reactive functional group and the polymerizable functional group, and an isocyanate group is exemplified as a specific example of the addition functional group.
- Specific examples of the addition compound having an isocyanate group as an addition functional group and a group having an ethylenically unsaturated bond as a polymerizable functional group include 2-methacryloyloxyethyl isocyanate, 2-acryloyloxyethyl isocyanate, 1,1 -(Bisacryloyloxymethyl) ethyl isocyanate and the like.
- 1,1- (bisacryloyloxymethyl) ethyl isocyanate has two acryloyl groups in one molecule, even if the pressure-sensitive adhesive layer is cured by irradiation with a small amount of radiant heat, it does not adhere to device-related members after processing.
- the effect of the present invention that it can be sufficiently reduced becomes even more remarkable.
- the proportion of the monomer having a reactive functional group in the whole monomer constituting the non-added acrylic copolymer is preferably 5% by mass or more and 50% by mass or less, and preferably 10% by mass or more and 40% by mass. % Or less is preferable. Further, when the number of reactive functional groups of the unadded acrylic copolymer is 100 mol%, the number of molecules of the addition compound added to this is preferably 40 mol% or more and 100 mol% or less, 60 mol % Or more and 90 mol% or less is preferable.
- the ratio of the monomer having a reactive functional group and the number of molecules of the addition compound are within such ranges, even if the pressure-sensitive adhesive layer is cured by irradiation with a small amount of radiant heat, adhesion to the device-related member after processing
- the effect of the present invention that the property can be sufficiently lowered can be further enhanced.
- Photopolymerization initiator (B) The adhesive composition for forming the adhesive layer 3 with which the adhesive sheet 1 which concerns on this embodiment is provided contains a photoinitiator (B).
- the photopolymerization initiator (B) may be composed of one type of photopolymerizable compound or a mixture of a plurality of photopolymerizable compounds, but the photopolymerization initiator (B)
- the mass absorption coefficient (unit: ml / g ⁇ cm) at a wavelength of 365 nm of a 3% by mass methanol solution has a characteristic of 200 to 1,000.
- the pressure-sensitive adhesive By having such characteristics, even if the content of the photopolymerization initiator (B) in the pressure-sensitive adhesive composition is 2 parts by mass or less with respect to 100 parts by mass of the polymer (A) having a polymerizable functional group, the pressure-sensitive adhesive When the adhesive layer 3 formed from the agent composition is irradiated with energy rays including ultraviolet rays, the polymerization reaction of the polymer (A) having a polymerizable functional group can be efficiently advanced. Thereby, after irradiating an energy ray, the adhesiveness with respect to the device related member of the adhesive layer 3 can be reduced stably.
- photopolymerization initiator (B) having the above characteristics include photoinitiators such as alkylphenone compounds, acylphosphine oxide compounds, titanocene compounds, thioxanthone compounds, and peroxide compounds, amine compounds, and quinone compounds.
- Photoinitiators such as alkylphenone compounds, acylphosphine oxide compounds, titanocene compounds, thioxanthone compounds, and peroxide compounds, amine compounds, and quinone compounds.
- Photosensitizers such as compounds, and the like.
- Examples include 2,2-dimethoxy-1,2-diphenylethane-1-one, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 1-hydroxy
- Examples include cyclohexyl phenyl ketone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyldiphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, ⁇ -chloranthraquinone, etc. It can also be used a mixture thereof.
- 2,2-dimethoxy-1,2-diphenylethane-1-one and 2,4,6-trimethylbenzoyldiphenylphosphine oxide are preferable from the viewpoint of high reactivity.
- a highly volatile compound such as benzophenone may increase the amount of outgas from the pressure-sensitive adhesive sheet 1, it is preferable not to contain it as a component of the photopolymerization initiator (B).
- Content of the photoinitiator (B) in the adhesive composition for forming the adhesive layer 3 from a viewpoint of improving the storage stability of the adhesive sheet 1 (specifically adhesive layer 3) which concerns on this embodiment.
- the content is preferably 1.5 parts by mass or less with respect to 100 parts by mass of the polymer (A) having a polymerizable functional group, More preferably, the content is 1.0 part by mass or less.
- the lower limit of the above content is not limited from the viewpoint of stably ensuring storage stability, but when it is excessively small, polymerization contained in the pressure-sensitive adhesive layer 3 when irradiated with energy rays containing ultraviolet rays.
- the content of the photopolymerization initiator (B) in the pressure-sensitive adhesive composition for forming the pressure-sensitive adhesive layer 3 is 0.01 parts by mass or more with respect to 100 parts by mass of the polymer (A) having a polymerizable functional group. It is preferable to set it as 0.1 mass part or more.
- the pressure-sensitive adhesive composition for forming the pressure-sensitive adhesive layer 3 may contain a cross-linking agent (C), if necessary.
- the polymer (A) having a polymerizable functional group has a crosslinkable functional group for reacting with the crosslinking agent (C).
- the polymer (A) having a polymerizable functional group that has reacted with the crosslinkable reactive group of the crosslinker (C) in the crosslinkable functional group exists as a cross-linked product in the pressure-sensitive adhesive layer 3.
- crosslinking agent (C) examples include, for example, epoxy compounds, isocyanate compounds, metal chelate compounds, aziridine compounds and other polyimine compounds, melamine resins, urea resins, dialdehydes, methylol polymers, metal alkoxides, metals Examples include salts. Among these, it is preferable that the crosslinking agent (C) is a polyisocyanate compound because it is easy to control the crosslinking reaction.
- the polyisocyanate compound is a compound having two or more isocyanate groups per molecule, for example, aromatic polyisocyanate such as tolylene diisocyanate, diphenylmethane diisocyanate, xylylene diisocyanate; dicyclohexylmethane-4,4′-diisocyanate, bicycloheptane
- aromatic polyisocyanate such as tolylene diisocyanate, diphenylmethane diisocyanate, xylylene diisocyanate
- dicyclohexylmethane-4,4′-diisocyanate bicycloheptane
- Alicyclic isocyanate compounds such as triisocyanate, cyclopentylene diisocyanate, cyclohexylene diisocyanate, methylcyclohexylene diisocyanate, hydrogenated xylylene diisocyanate; isocyanates having a chain skeleton such as he
- a modified product of can also be used.
- the polyisocyanate compound may be one type or a plurality of types.
- the polymer (A) having a polymerizable functional group is formed using the non-added acrylic polymer and the addition compound as described above, and the crosslinking agent (C) is a polyisocyanate compound as described above. If the addition functional group of the compound for addition is an isocyanate group, the polymer (A) having a polymerizable functional group is prepared so that the reactive functional group in the unadded acrylic polymer remains to some extent. The remaining reactive functional group can be used as a crosslinkable functional group that reacts with the crosslinking agent (C).
- the polymer (A) having a polymerizable functional group contained in the pressure-sensitive adhesive layer 3 contains a cross-linked product based on the reaction with the cross-linking agent (C), it is contained in the pressure-sensitive adhesive layer 3.
- adhesive such as storage elastic modulus (also referred to as “pre-irradiation storage elastic modulus” in this specification) before the adhesive layer 3 is irradiated with energy rays including ultraviolet rays is used. It is possible to control characteristics that affect the adhesiveness of the agent layer 3 to the device-related member.
- This crosslinking density can be adjusted by changing the content of the crosslinking agent (C) contained in the composition for forming the pressure-sensitive adhesive layer 3.
- the content of the crosslinking agent (C) of the pressure-sensitive adhesive composition for forming the pressure-sensitive adhesive layer 3 is 0.1 mass relative to 100 parts by mass of the polymer (A) having a polymerizable functional group. By setting it as a part or more, it becomes easy to control the storage elastic modulus etc. before irradiation of the adhesive layer 3 to an appropriate range. From the viewpoint of enhancing this controllability, the content of the crosslinking agent (C) is more preferably 1 part by mass or more with respect to 100 parts by mass of the polymer (A) having a polymerizable functional group. Although the upper limit of content of a crosslinking agent (C) is not specifically limited, When the content is too high, it is difficult to control the adhesiveness etc.
- the content of the crosslinking agent (C) is preferably 10 parts by mass or less and 100 parts by mass or less with respect to 100 parts by mass of the polymer (A) having a polymerizable functional group. Is more preferable.
- the pressure-sensitive adhesive composition for forming the pressure-sensitive adhesive layer 3 provided in the pressure-sensitive adhesive sheet 1 according to the present embodiment includes a polymer having no polymerizable functional group, in addition to the above components, You may contain various additives, such as a compound (low molecular weight component) which has a polymeric functional group, a storage elastic modulus regulator, coloring agents, such as a dye and a pigment, a flame retardant, and a filler.
- a polymer having no polymerizable functional group can be obtained by preparing a polymer (A) having a polymerizable functional group so as not to include a structural unit having a polymerizable functional group. For example, if the above-mentioned unadded acrylic copolymer is not reacted with an addition compound, it can be made into a polymer having no polymerizable functional group.
- the compounds having a polymerizable functional group are mutually bonded by a polymerization reaction similar to the polymerization reaction of the polymer (A) having a polymerizable functional group, or It has the function to combine with the polymer (A) which has a polymerizable functional group, and to reduce the adhesiveness with respect to the device related member of the adhesive layer 3.
- FIG. 1 the compounds having a polymerizable functional group are mutually bonded by a polymerization reaction similar to the polymerization reaction of the polymer (A) having a polymerizable functional group, or It has the function to combine with the polymer (A) which has a polymerizable functional group, and to reduce the adhesiveness with respect to the device related member of the adhesive layer 3.
- Examples of the compound having a polymerizable functional group include alkyl having a chain skeleton such as pentaerythritol tri (meth) acrylate, 1,4-butylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate ( (Meth) acrylates; alkyl (meth) acrylates having a cyclic skeleton such as dicyclopentadiene dimethoxydi (meth) acrylate, isobornyl (meth) acrylate; polyethylene glycol di (meth) acrylate, oligoester (meth) acrylate, urethane (meth) Examples include acrylate compounds such as acrylate oligomers, epoxy-modified (meth) acrylates, polyether (meth) acrylates, and itaconic acid oligomers.
- the content is 100 parts by mass of the polymer (A) having a polymerizable functional group. It is preferably more than 0 parts by mass and 30 parts by mass or less, more preferably 1 to 25 parts by mass, and still more preferably 3 to 10 parts by mass.
- Examples of storage modulus modifiers include tackifier resins and long chain alkyl acrylic oligomers.
- the content thereof is 1 part by mass or more with respect to 100 parts by mass of the polymer (A) having a polymerizable functional group, from the viewpoint of stably exhibiting the function. It is preferable to make it 5 parts by mass or more.
- the content of the storage modulus modifier is based on 100 parts by mass of the polymer (A) having a polymerizable functional group. The amount is preferably 400 parts by mass or less, and more preferably 350 parts by mass or less.
- the type of the tackifying resin is not particularly limited. Polymerized rosin, esterified rosin, disproportionated rosin, and rosin-based tackifying resins such as hydrogenated resins thereof, or terpene-based tackifying resins such as ⁇ -pinene resin may be used. Further, it may be a petroleum resin such as a hydrocarbon resin. Alternatively, aromatic tackifying resins such as coumarone resins, alkyl / phenol resins, and xylene resins may be used.
- the long-chain alkyl acrylic oligomer is an oligomer obtained by polymerizing an alkyl (meth) acrylate having 4 to 18 carbon atoms, and the specific structure of the alkyl group portion is not particularly limited.
- a specific example of the monomer for forming such an oligomer is butyl acrylate.
- the thickness of the pressure-sensitive adhesive layer 3 provided in the pressure-sensitive adhesive sheet 1 according to this embodiment is not particularly limited. From the viewpoint of appropriately maintaining the adhesiveness of the adhesive layer 3 to the device-related member, the thickness of the adhesive layer 3 is preferably 1 ⁇ m or more, more preferably 2 ⁇ m or more, and more preferably 3 ⁇ m or more. Particularly preferred. On the other hand, the thickness of the pressure-sensitive adhesive layer 3 is preferably 100 ⁇ m or less, and preferably 80 ⁇ m or less, from the viewpoint of reducing the possibility of problems during processing such as chipping in the chip-shaped member during the dicing process. More preferably, it is particularly preferably 50 ⁇ m or less.
- the adhesive strength ratio refers to the main surface opposite to the surface facing the substrate 2 in the pressure-sensitive adhesive layer 3 provided in the pressure-sensitive adhesive sheet 1 according to this embodiment, the surface to be measured, silicon The state before irradiating energy rays including ultraviolet rays with respect to the adhesive strength of the adhesive sheet 1 measured when a 180 ° peeling test is performed in accordance with JIS Z0237: 2000 with the mirror surface of the wafer as the adherend surface.
- the ultraviolet ray irradiation to the pressure-sensitive adhesive layer 3 can irradiate light having a single emission peak whose maximum intensity is in the range of 350 nm or more and 400 nm or less and whose full width at half maximum is 5 nm or more and 30 nm or less.
- the integrated light amount is set to 200 mJ / cm 2 .
- An ultraviolet LED is exemplified as such an ultraviolet light source.
- the pressure-sensitive adhesive ratio of the pressure-sensitive adhesive sheet 1 according to this embodiment is preferably 10 or more.
- the post-processing device-related member such as the chip-shaped member while reducing the possibility that the chip-shaped member scatters when the device-related member is processed, particularly machine processing, because the adhesive force ratio is 10 or more It is realized that the possibility of defective peeling is reduced in the step of peeling the film from the pressure-sensitive adhesive sheet 1.
- the pressure-sensitive adhesive strength ratio of the pressure-sensitive adhesive sheet 1 according to this embodiment is preferably 20 or more, and particularly preferably 40 or more.
- the adhesive strength ratio is preferably 200 or less, more preferably 150 or less, and particularly preferably 100 or less.
- the preferable ranges of the adhesive strength before irradiation and the adhesive strength after irradiation are the processing conditions, the conditions of the process of peeling the device-related member after processing, the material and surface state of the adherend surface of the device-related member which is the adherend ( It is appropriately set according to the degree of unevenness.
- the adhesive strength before irradiation is used from the viewpoint of more stably reducing the possibility of the chip-shaped member scattering during the cutting processing.
- Is preferably 1000 mN / 25 mm or more, more preferably 10,000 mN / 25 mm or more.
- the adhesive strength after irradiation is preferably 50 mN / 25 mm or more and 500 mN / 25 mm or less, more preferably 100 mN / 25 mm or more and 400 mN / 25 mm or less from the viewpoint of stably performing the step of peeling the chip-like member.
- the pressure-sensitive adhesive sheet 1 is a base material for the pressure-sensitive adhesive layer 3 for the purpose of protecting the pressure-sensitive adhesive layer 3 until the pressure-sensitive adhesive layer 3 is applied to a device-related member that is an adherend.
- the release surface of the release sheet may be bonded to the surface opposite to the surface facing the adherend surface.
- the configuration of the release sheet is arbitrary, and examples include a release film of a plastic film with a release agent or the like.
- Specific examples of the plastic film include polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate, and polyolefin films such as polypropylene and polyethylene.
- silicone-based, fluorine-based, long-chain alkyl-based, and the like can be used, and among these, a silicone-based material that is inexpensive and provides stable performance is preferable.
- a silicone-based material that is inexpensive and provides stable performance is preferable.
- limiting in particular about the thickness of a peeling sheet Usually, it is about 20 micrometers or more and 250 micrometers or less.
- the manufacturing method of the adhesive sheet 1 will not be specifically limited if the adhesive layer 3 formed from the above-mentioned adhesive composition can be laminated
- FIG. For example, the above-mentioned pressure-sensitive adhesive composition and, if desired, a coating composition further containing a solvent are prepared, and a die coater, curtain coater, spray coater, slit coater is formed on one surface of the substrate 1.
- the adhesive composition 3 is formed by applying the coating composition with a knife coater or the like to form a coating film, and drying the coating film on the one surface with heating or the like as necessary. can do.
- the properties of the coating composition are not particularly limited as long as it can be applied.
- the composition for forming the pressure-sensitive adhesive layer 3 may be contained as a solute, or may be contained as a dispersoid. There is also.
- the coating composition contains a cross-linking agent (C), a polymer having a polymerizable functional group in the coating film by utilizing heat in the above drying or separately providing a heat treatment ( What is necessary is just to advance the crosslinking reaction of A) and a crosslinking agent (C), and to form a crosslinked structure in the adhesive layer 3 with desired presence density.
- a cross-linking agent (C) a polymer having a polymerizable functional group in the coating film by utilizing heat in the above drying or separately providing a heat treatment ( What is necessary is just to advance the crosslinking reaction of A) and a crosslinking agent (C), and to form a crosslinked structure in the adhesive layer 3 with desired presence density.
- the obtained pressure-sensitive adhesive sheet 1 is placed in an environment of, for example, 23 ° C. and a relative humidity of 50%. Curing may be performed such as standing for days.
- a coating film is formed on the release surface of the above-described release sheet to form a coating film, which is dried to form the pressure-sensitive adhesive layer 3 and the release sheet.
- a layered product is formed, and a surface opposite to the surface facing the release sheet in the pressure-sensitive adhesive layer 3 of the layered product is attached to the base material adherence surface of the base material 1, and the adhesive sheet 1 and the release sheet A laminate may be obtained.
- the release sheet in this laminate may be peeled off as a process material, or may protect the pressure-sensitive adhesive layer 3 until being attached to a device-related member.
- the adhesive sheet 1 Before attaching the adhesive sheet 1 to the device-related member, it may be cut in advance into the same shape as that of the device-related member or a shape including the shape of the device-related member in plan view. Thereby, the effort and installation which cut the adhesive sheet 1 after sticking the adhesive sheet 1 to the device related member can be omitted.
- the pressure-sensitive adhesive sheet 1 When the pressure-sensitive adhesive sheet 1 is used as a part of a dicing die-bonding sheet, the pressure-sensitive adhesive sheet 1 obtained as described above has a side opposite to the surface facing the substrate-coated surface of the pressure-sensitive adhesive layer 3.
- the surface and a film-like adhesive serving as an adhesive for die bonding may be bonded together.
- the film-like adhesive may be cut in the same shape as the device-related member in advance before the dicing / die-bonding sheet is attached to the device-related member. Before being attached to the device, the device-related member may be preliminarily cut into a shape including the shape in plan view.
- the adhesive sheet 1 according to the present embodiment is attached to one surface of a device-related member.
- the surface of the pressure-sensitive adhesive sheet 1 on the pressure-sensitive adhesive layer 3 side (that is, the surface opposite to the surface facing the base material 2 of the pressure-sensitive adhesive layer 3) is attached to the circuit surface or back surface of the semiconductor wafer.
- Which side of the semiconductor wafer is attached depends on the process.
- the description will be made assuming that the semiconductor wafer is attached to the back side.
- the peripheral edge portion of the pressure-sensitive adhesive sheet 1 functioning as a dicing sheet is usually attached to an annular jig called a ring frame for conveyance and fixation to the apparatus by the pressure-sensitive adhesive layer 3 provided on that portion.
- the pressure-sensitive adhesive sheet 1 as a dicing sheet is placed on a dicing table using a ring frame, and dicing is performed from the semiconductor wafer side.
- the pressure-sensitive adhesive layer 3 can easily reduce the adhesiveness to the semiconductor chip even when irradiated with energy rays including ultraviolet rays having specific wavelength characteristics. If it does so, in order to make the adhesiveness after ultraviolet irradiation low before the energy ray containing an ultraviolet-ray is irradiated, it is not necessary to set adhesiveness low. Therefore, it can comprise so that it may have the outstanding adhesiveness with respect to a semiconductor wafer. Therefore, by using the pressure-sensitive adhesive sheet 1 according to this embodiment, chip scattering hardly occurs during the dicing process.
- the size of the semiconductor chip formed by a dicing process is usually 5 mm x 5 mm or less and may be about 1 mm x 1 mm in recent years, the pressure-sensitive adhesive layer 3 of the pressure-sensitive adhesive sheet 1 according to this embodiment is excellent. Therefore, it can sufficiently handle such fine pitch dicing.
- a plurality of semiconductor chips are obtained from the semiconductor wafer, and the adhesive sheet is stuck to the plurality of semiconductor chips.
- an expanding process for extending the adhesive sheet 1 in the main surface direction is performed so that a plurality of semiconductor chips arranged close to each other on the adhesive sheet 1 can be easily picked up.
- the degree of extension may be set as appropriate in consideration of the distance that the semiconductor chips arranged in close proximity should have, the tensile strength of the base material 2, and the like.
- the semiconductor chip on the adhesive layer 3 is picked up by a general-purpose means such as a suction collet.
- the picked-up semiconductor chip is used for the next process such as a transfer process.
- energy rays including ultraviolet rays are irradiated from the substrate 2 side of the pressure-sensitive adhesive sheet 1 according to the present embodiment.
- the timing of irradiation of energy rays including ultraviolet rays is not particularly limited as long as the dicing process is completed and before the pickup process is started.
- the energy ray containing ultraviolet rays is a light beam whose emission spectrum has a single emission peak having a maximum intensity in the range of 350 nm to 400 nm and a full width at half maximum of 5 nm to 30 nm. It is a light beam containing.
- An ultraviolet LED is exemplified as a light source capable of emitting such light.
- the pressure-sensitive adhesive layer 3 included in the pressure-sensitive adhesive sheet 1 contains the polymer (A) having a polymerizable functional group and the photopolymerization initiator (B), and includes a photopolymerization initiator (B ) Can cause the polymerization reaction of the polymerizable functional group of the polymer (A) having a polymerizable functional group to efficiently proceed when irradiated with light having the above emission spectrum. Therefore, the pressure-sensitive adhesive layer 3 included in the pressure-sensitive adhesive sheet 1 has excellent adhesiveness to the semiconductor chip in a state before being irradiated with the light beam, and in a state after being irradiated with the light beam. The adhesiveness of the agent layer 3 to the semiconductor chip can be sufficiently reduced. Therefore, by using the pressure-sensitive adhesive sheet 1 according to the present embodiment, it is possible to improve the workability of both the dicing process and the pick-up process when manufacturing a semiconductor chip.
- the pressure-sensitive adhesive sheet 1 as a back grind sheet is held on a processing table by vacuum suction, and machining for reducing the thickness such as grinding or polishing is performed from the semiconductor wafer side.
- the pressure-sensitive adhesive layer 3 can easily reduce the adhesiveness to the semiconductor chip even when irradiated with energy rays including ultraviolet rays having specific wavelength characteristics. If it does so, in order to make the adhesiveness after ultraviolet irradiation low before the energy ray containing an ultraviolet-ray is irradiated, it is not necessary to set adhesiveness low. Therefore, it can comprise so that it may have the outstanding adhesiveness with respect to a semiconductor wafer. Therefore, by using the pressure-sensitive adhesive sheet 1 according to the present embodiment, problems such as processing waste entering between the pressure-sensitive adhesive layer 3 and the semiconductor wafer are less likely to occur during the machining.
- the thickness of the semiconductor wafer can be reduced to about several tens of ⁇ m. Then, before peeling a semiconductor wafer from the adhesive layer 3, the irradiation of the energy ray containing an ultraviolet-ray is performed from the base material 2 side of the adhesive sheet 1 which concerns on this embodiment.
- energy rays including ultraviolet rays include light rays including light rays having a predetermined emission spectrum as described above.
- the pressure-sensitive adhesive sheet 1 is peeled off from the semiconductor wafer to obtain a semiconductor wafer as a device-related member after processing.
- the adhesiveness of the pressure-sensitive adhesive layer 3 after irradiation with energy rays including ultraviolet rays is sufficiently low, and thus the semiconductor wafer may be damaged during the above-described peeling. Has been reduced. Therefore, according to the manufacturing method according to the present embodiment, it is possible to obtain a semiconductor wafer as a post-processing device-related member with high quality and low cost.
- machining before the above-described machining, groove processing is performed in advance from the circuit surface side of the semiconductor wafer, and as a result of the above-described machining to reduce the thickness of the semiconductor wafer, a plurality of semiconductor chips are obtained from the semiconductor wafer. So-called pre-dicing processing may be performed. In this case, as a result of machining, a plurality of semiconductor chips arranged close to each other are arranged on the adhesive sheet 1. Therefore, as described above, an expanding process is performed, and then a pickup process is performed. The expanding step is preferably performed by transferring a plurality of semiconductor chips from the pressure-sensitive adhesive sheet 1 to another pressure-sensitive adhesive sheet and extending the other pressure-sensitive adhesive sheet.
- the process of reducing the adhesiveness of the pressure-sensitive adhesive layer 3 to the semiconductor chip by irradiation of the energy ray containing ultraviolet rays may be performed between the completion of machining and the transfer of the plurality of semiconductor chips.
- Example 1 (1) Preparation of coating composition A solution-state coating composition (solvent: toluene) having the following composition was prepared.
- a polymer (A) having a polymerizable functional group a copolymer obtained by copolymerizing 52 parts by mass of butyl acrylate, 20 parts by mass of methyl methacrylate and 28 parts by mass of hydroxyethyl acrylate (weight)
- a composition containing 2-methacryloyloxyethyl isocyanate in an amount corresponding to 80 mol% of the hydroxyl group of the copolymer average molecular weight: 600,000, glass transition temperature Tg: ⁇ 34 ° C., manufactured by Showa Denko KK 100 parts by mass of the polymer obtained by reacting Karenz MOI) as a solid content
- B photopolymerization initiator
- a release sheet (SP-PET 381031 manufactured by Lintec Co., Ltd.) having a silicone release agent layer formed on one main surface of a base film made of polyethylene terephthalate having a thickness of 38 ⁇ m was prepared.
- the aforementioned coating composition was applied with a knife coater so that the thickness of the finally obtained pressure-sensitive adhesive layer was 10 ⁇ m.
- the obtained coating film was allowed to dry together with the release sheet in an environment of 100 ° C. for 1 minute to dry the coating film to obtain a laminate composed of the release sheet and the pressure-sensitive adhesive layer (thickness: 10 ⁇ m).
- the thickness of the pressure-sensitive adhesive layer was measured using a constant pressure thickness measuring instrument (manufactured by Teclock Co., Ltd., PG-02).
- a base material made of an ethylene-methacrylic acid copolymer (EMAA) film having a thickness of 80 ⁇ m is used as a base material adhesion surface, and the adhesive layer side surface of the above laminate is pasted on that surface.
- a pressure-sensitive adhesive sheet comprising a base material and a pressure-sensitive adhesive layer as shown in FIG. 1 was obtained in a state where a release sheet was further laminated on the surface on the pressure-sensitive adhesive layer side.
- Example 2 [Examples 2 to 3 and Comparative Examples 1 to 6]
- Example 1 either or both of the type and blending amount of the photopolymerizable compound (B) were changed as shown in Table 1 to obtain an adhesive sheet.
- Example 7 the coating composition (solvent: toluene) of the solution state which has the following composition was prepared, and the adhesive sheet was obtained using this.
- a polymer (A) having a polymerizable functional group a copolymer obtained by copolymerizing 91 parts by mass of butyl acrylate and 9 parts by mass of acrylic acid (weight average molecular weight: 800,000, glass transition temperature Tg) : -45 ° C.) as a solid content, 100 parts by mass, ii) 1.0 part by weight of a composition containing 2,2-dimethoxy-1,2-diphenylethane-1-one and benzophenone as a photopolymerization initiator (B) (IRGACURE 500, manufactured by BASF) as a solid content; iii) 15 parts by mass of a cross-linking agent composition (manufactured by Nippon Polyurethane Co., Ltd., Coronate L) containing trimethylol
- Table 1 summarizes the photopolymerization initiator (B) contained in the pressure-sensitive adhesive compositions according to Examples and Comparative Examples. Both IRGACURE series and DAROCURE series were manufactured by BASF. DAROCURE TPO contains 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, and IRGACURE 369 contains 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1.
- the ultraviolet irradiation apparatus (The energy ray containing the ultraviolet-ray to radiate
- the polymer (A) having a polymerizable functional group was polymerized. About the laminated body after this ultraviolet irradiation, the peeling test on the same conditions as the peeling test for measuring said adhesive force before irradiation was performed, and the adhesive force after irradiation was measured (unit: mN / 25mm).
- an adhesive sheet was used in a nitrogen atmosphere using an ultraviolet irradiation device (RAD-2000m / 12, manufactured by Lintec Corporation) using a high-pressure mercury lamp (energy rays including ultraviolet rays emitted have a plurality of emission peaks).
- the polymer (A) having a polymerizable functional group contained in the pressure-sensitive adhesive layer in the laminate was polymerized by irradiating ultraviolet rays from the side (illuminance 230 mW / cm 2 , integrated light quantity 190 mJ / cm 2 ).
- the peeling test on the same conditions as the peeling test for measuring said adhesive force before irradiation was performed, and the adhesive force after irradiation was measured (unit: mN / 25mm).
- the adhesive strength ratio was determined for each of the two types of light sources.
- Table 2 shows the obtained adhesive strength before irradiation, two types of adhesive strength after irradiation, and two types of adhesive strength ratios.
- the storage stability was evaluated based on the adhesive strength reduction ratio, which is the ratio (unit:%) of the adhesive strength before irradiation after storage thus obtained to the adhesive strength before irradiation (that is, in Test Example 2).
- this adhesive force reduction rate was 70% or more, it was determined that the adhesive sheet was excellent in storage stability.
- Table 2 shows the measurement results of the adhesive strength reduction rate.
- the dicing sheet of the example satisfying the conditions of the present invention has a large adhesive force ratio, and a defect occurs in both the step of machining the device-related member and the step of peeling the device-related member after processing. Expected to be difficult.
- the rate of weight reduction based on heating is small, the amount of outgas is small, and the adhesive strength is hardly lowered by a fluorescent lamp, so that the storage stability is excellent.
- the pressure-sensitive adhesive sheet according to the present invention is suitably used as a dicing sheet or a back grind sheet for device-related members.
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Abstract
Description
それゆえ、本発明に係る粘着シートを用いることにより、品質に優れる加工後デバイス関連部材を生産性高く製造することができる。
図1に示されるように、本発明の一実施形態に係る粘着シート1は、基材2と、基材2の少なくとも一方の面側に積層された粘着剤層3とを備える。
本実施形態に係る粘着シート1の基材2は、粘着シート1の被着体であるデバイス関連部材に貼付する際、および加工後デバイス関連部材を粘着シート1から剥離する際に破断しない限り、その構成材料は特に限定されない。粘着シート1がダイシングシートとして用いられる場合には、ダイシング工程の後に行われるエキスパンド工程などにおいても破断しないことが好ましい。
エチレン系共重合体フィルムは共重合比を変えることなどによりその機械特性を広範な範囲で制御することが容易である。このため、エチレン系共重合体フィルムを備える基材2は本実施形態に係る粘着シート1の基材として求められる機械特性を満たしやすい。また、エチレン系共重合体フィルムは粘着剤層3に対する密着性が比較的高いため、粘着シートとして使用した際に基材2と粘着剤層3との界面での剥離が生じにくい。
(1)組成
本実施形態に係る粘着シート1の粘着剤層3は、従来より公知の種々の粘着剤組成物により形成され得る。このような粘着剤組成物としては、何ら限定されるものではないが、たとえばゴム系、アクリル系、シリコーン系、ポリビニルエーテル等の粘着剤組成物が用いられ得る。
本明細書において「重合性官能基を有する重合体(A)」とは、重合性を有する官能基である重合性官能基を有する構成単位を、主鎖の末端および/または側鎖に有する重合体を意味する。後述する光重合開始剤(B)により重合反応を開始させることができ、その重合反応が連鎖的に進行しうるものであれば、重合性官能基の具体的な種類は特に限定されない。例えば、エチレン性不飽和結合を有する基、中でも(メタ)アクリロイル基、ビニル基などが具体例として挙げられる。
本実施形態に係る粘着シート1が備える粘着剤層3を形成するための粘着剤組成物は、光重合開始剤(B)を含有する。かかる光重合開始剤(B)は1種類の光重合性化合物で構成されていてもよいし、複数光重合性の化合物の混合物であってもよいが、光重合開始剤(B)は、その3質量%メタノール溶液の波長365nmの質量吸光係数(単位:ml/g・cm)が200以上1000以下である特性を有する。かかる特性を有することにより、粘着剤組成物における光重合開始剤(B)の含有量を重合性官能基を有する重合体(A)100質量部に対して2質量部以下にしても、かかる粘着剤組成物から形成された粘着剤層3に対して紫外線を含むエネルギー線を照射したときに、重合性官能基を有する重合体(A)の重合反応を効率的に進行させることができる。これにより、エネルギー線を照射した後において、粘着剤層3のデバイス関連部材に対する粘着性を安定的に低下させることが可能となる。
本実施形態に係る粘着剤層3を形成するための粘着剤組成物は、必要に応じ、架橋剤(C)を含有してもよい。この場合には、重合性官能基を有する重合体(A)は架橋剤(C)と反応するための可架橋官能基を有する。そして、この可架橋官能基において架橋剤(C)の架橋性反応基と反応した重合性官能基を有する重合体(A)は、粘着剤層3内で架橋物として存在する。
本実施形態に係る粘着シート1が備える粘着剤層3を形成するための粘着剤組成物は、上記の成分に加えて、重合性官能基を有しない重合体、重合性官能基を有する化合物(低分子量成分)、貯蔵弾性率調整剤、染料や顔料などの着色剤、難燃剤、フィラー等の各種添加剤を含有してもよい。
i)厚さ
本実施形態に係る粘着シート1が備える粘着剤層3の厚さは特に限定されない。粘着剤層3のデバイス関連部材に対する粘着性を適切に維持する観点から、粘着剤層3の厚さは1μm以上とすることが好ましく、2μm以上とすることがより好ましく、3μm以上とすることが特に好ましい。一方、ダイシング工程中にチップ状部材に欠けが生じるといった加工中に不具合が生じる可能性を低減させる観点から、粘着剤層3の厚さは100μm以下とすることが好ましく、80μm以下とすることがより好ましく、50μm以下とすることが特に好ましい。
本明細書において、粘着力比とは、本実施形態に係る粘着シート1が備える粘着剤層3における基材2に対向する面と反対側の主面を測定対象面、シリコンウェハの鏡面を被着面として、JIS Z0237:2000に準拠して、180°引き剥がし試験を行ったときに測定される粘着シート1の粘着力について、紫外線を含むエネルギー線を照射する前の状態における粘着力(以下、「照射前粘着力」ともいう。)の、紫外線を含むエネルギー線を照射した後の状態における粘着力(以下、「照射後粘着力」ともいう。)に対する比(前/後)を意味する。ここで、上記の粘着剤層3への紫外線照射は、最大強度が350nm以上400nm以下の範囲にあり半値全幅が5nm以上30nm以下である単一の発光ピークをその発光スペクトルが有する光線を照射可能な紫外線光源を用いて、積算光量が200mJ/cm2となるように行われる。そのような紫外線光源として、紫外線LEDが例示される。
本実施形態に係る粘着シート1は、被着体であるデバイス関連部材に粘着剤層3を貼付するまでの間粘着剤層3を保護する目的で、粘着剤層3の基材被着面に対向する面と反対側の面に、剥離シートの剥離面が貼合されていてもよい。剥離シートの構成は任意であり、プラスチックフィルムを剥離剤等により剥離処理したものが例示される。プラスチックフィルムの具体例として、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレートなどのポリエステルフィルム、およびポリプロピレンやポリエチレンなどのポリオレフィンフィルムが挙げられる。剥離剤としては、シリコーン系、フッ素系、長鎖アルキル系などを用いることができるが、これらの中で、安価で安定した性能が得られるシリコーン系が好ましい。剥離シートの厚さについて特に制限はないが、通常20μm以上250μm以下程度である。
粘着シート1の製造方法は、前述の粘着剤組成物から形成される粘着剤層3を基材2の一の面に積層できれば、詳細な方法は特に限定されない。一例を挙げれば、前述の粘着剤組成物、および所望によりさらに溶媒を含有する塗工用組成物を調製し、基材1の一の面上に、ダイコーター、カーテンコーター、スプレーコーター、スリットコーター、ナイフコーター等によりその塗工用組成物を塗布して塗膜を形成し、当該一の面上の塗膜を必要に応じて加熱等を伴って乾燥させることにより、粘着剤層3を形成することができる。塗工用組成物は、塗布を行うことが可能であればその性状は特に限定されず、粘着剤層3を形成するための成分を溶質として含有する場合もあれば、分散質として含有する場合もある。
本実施形態に係る粘着シート1を用いて半導体ウェハから半導体チップを製造する場合および半導体ウェハの裏面を研磨する場合を具体例として、デバイス関連部材から加工後デバイス関連部材を製造する方法を以下に説明する。
まず、本実施形態に係る粘着シート1をデバイス関連部材の一の面に貼付する。具体的には、粘着シート1の粘着剤層3側の面(すなわち、粘着剤層3の基材2に対向する面と反対側の面)を半導体ウェハの回路面または裏面に貼付する。半導体ウェハのいずれの面に貼付されるかは、そのプロセスに依存する。ここでは、半導体ウェハの裏面側に貼付されたものとして説明を行う。ダイシングシートとして機能する粘着シート1の周縁部は、通常その部分に設けられた粘着剤層3により、リングフレームと呼ばれる搬送や装置への固定のための環状の治具に貼付される。
まず本実施形態に係る粘着シート1の粘着剤層3側の面(すなわち、粘着剤層3の基材2に対向する面と反対側の面)を半導体ウェハの回路面に貼付する。バックグラインドシートとして機能する粘着シート1の周縁部については、通常その余剰部分は除去される。
(1)塗工用組成物の調製
次の組成を有する溶液状態の塗工用組成物(溶媒:トルエン)を調製した。
i)重合性官能基を有する重合体(A)として、52質量部のブチルアクリレートと20質量部のメタクリル酸メチルと28質量部のアクリル酸ヒドロキシエチルを共重合して得た共重合体(重量平均分子量:60万、ガラス転移温度Tg:-34℃)に対して、この共重合体が有する水酸基の80mol%に相当する量の2-メタクリロイルオキシエチルイソシアネートを含む組成物(昭和電工社製、カレンズMOI)を反応させて得られる重合体を、固形分として100質量部、
ii)光重合開始剤(B)として2,2-ジメトキシ-1,2-ジフェニルエタン-1-オンを含む組成物(BASF社製、IRGACURE 651、3質量%メタノール溶液の状態での波長365nmの質量吸光係数:361ml/g・cm)を固形分として0.5重量部、および
iii)架橋剤(C)としてトリメチロールプロパントリレンジイソシアネート(TDI-TMP)を含有する架橋剤組成物(日本ポリウレタン社製、コロネートL)を固形分として1質量部。
厚さ38μmのポリエチレンテレフタレート製基材フィルムの一方の主面上にシリコーン系の剥離剤層が形成されてなる剥離シート(リンテック社製、SP-PET381031)を用意した。この剥離シートの剥離面上に、前述の塗工用組成物を、ナイフコーターにて、最終的に得られる粘着剤層の厚さが10μmとなるように塗布した。得られた塗膜を剥離シートごと100℃の環境下に1分間経過させることにより塗膜を乾燥させて、剥離シートと粘着剤層(厚さ:10μm)とからなる積層体を得た。粘着剤層の厚さは定圧厚さ測定器(テクロック社製、PG-02)を用いて測定した。
厚さ80μmのエチレン-メタクリル酸共重合体(EMAA)フィルムからなる基材の一方の面を基材被着面として、その面に、上記の積層体の粘着剤層側の面を貼付して、図1に示されるような基材と粘着剤層とからなる粘着シートを、粘着剤層側の面に剥離シートがさらに積層された状態で得た。
実施例1において、光重合性化合物(B)の種類および配合量のいずれか一方または両方を、表1に示されるように変化させて、粘着シートを得た。
実施例1において、次の組成を有する溶液状態の塗工用組成物(溶媒:トルエン)を調製し、これを用いて粘着シートを得た。
i)重合性官能基を有する重合体(A)として、91質量部のブチルアクリレートと9質量部のアクリル酸を共重合して得た共重合体(重量平均分子量:80万、ガラス転移温度Tg:-45℃)を、固形分として100質量部、
ii)光重合開始剤(B)として2,2-ジメトキシ-1,2-ジフェニルエタン-1-オンおよびベンゾフェノンを含む組成物(BASF社製、IRGACURE 500)を固形分として1.0重量部、
iii)架橋剤(C)としてトリメチロールプロパントリレンジイソシアネート(TDI-TMP)を含有する架橋剤組成物(日本ポリウレタン社製、コロネートL)を固形分として15質量部、および
iv)重合性化合物として、5から9官能のアクリレート混合体を含有する組成物(大日精化社製、セイカビーム14-29B)を固形分として50質量部。
上記の実施例および比較例に係る粘着剤組成物を調製する際に用いた光重合開始剤(B)のそれぞれをメタノールに溶解して、光重合開始剤(B)の3質量%メタノール溶液を得た。これらの3質量%メタノール溶液のそれぞれについて、紫外光から可視光の範囲についての吸収スペクトルを測定した。測定機器はアイグラフィックス社製UVPF-A1であった。得られた吸収スペクトルから、波長365nmにおける質量吸光係数を求めた(単位:ml/g・cm)。測定結果を表1に示した。
上記の実施例および比較例により製造した粘着シートに、23℃、相対湿度50%の環境下に7日間静置することによる養生を行った後、それぞれを切断して長さ200mm幅25mmの粘着力測定用シートを得た。上記の粘着力測定用シートのそれぞれについて、その粘着剤層側の面を半導体ウェハ(8インチ)の鏡面に貼付して、半導体ウェハと粘着力測定用シートとからなる積層体を得た。得られた積層体を23℃、相対湿度50%の雰囲気下に20分間放置した。放置後の積層体について、万能型引張試験機(株式会社オリエンテック製、TENSILON/UTM-4-100)を用いて、JIS Z0237:2000に準拠して、180°引き剥がし試験(粘着力測定用シートを引き剥がされる側の部材とした。)を行い、照射前粘着力を測定した(単位:mN/25mm)。照射前粘着力の測定結果を表2に示す。
その後、一方の積層体について、紫外線LED(発する紫外線を含むエネルギー線は、最大強度が365nmであり、半値全幅が10nmである単一の発光ピークをその発光スペクトルに有する。)による紫外線照射装置(リンテック社製、RAD-2100)を用い、窒素雰囲気下にて粘着シート側から紫外線照射(照度200mW/cm2、積算光量200mJ/cm2)して、上記の積層体における粘着剤層に含有される重合性官能基を有する重合体(A)を重合させた。この紫外線照射後の積層体について、上記の照射前粘着力を測定するための引き剥がし試験と同一の条件での引き剥がし試験を行い、照射後粘着力を測定した(単位:mN/25mm)。
上記の実施例および比較例により製造した粘着シートを10mmの直径の円形に裁断し、15mgを超えるまで積層して試料とした。得られた試料についてTG-DTA(SHIMADZU社製、DTG-60)を用いて、室温から昇温速度10℃/分で100℃まで加熱し、その後100℃で1時間保持した際の重量減少率(単位:%)を測定した。重量減少率が1%以下であれば、アウトガス量は少なく良好な粘着シートであると判定した。重量減少率の測定結果を表2に示す。
上記の実施例および比較例により製造した粘着シートに、23℃、相対湿度50%の環境下に7日間静置することによる養生を行った後、それぞれを切断して長さ200mm幅25mmの粘着力測定用シートを得た。
各粘着力測定用シートにおける基材側の面と反対側の面から50cmの距離の位置に配置された蛍光灯(出力:6mW、1灯)が点灯した状態を1週間維持した。
その後、試験例2と同様の操作により照射前粘着力を測定した。こうして求めた保管後の照射前粘着力の、保管前の(すなわち、試験例2における)照射前粘着力に対する比率(単位:%)である粘着力低減率により、保管安定性を評価した。この粘着力低減率が70%以上である場合に、保管安定性に優れる粘着シートであると判定した。粘着力低減率の測定結果を表2に示す。
2…基材
3…粘着剤層
Claims (6)
- 基材と、前記基材の一方の主面側に設けられた粘着剤層とを備えた粘着シートであって、
前記粘着剤層は、重合性官能基を有する重合体(A)および前記重合性官能基を有する重合体(A)100質量部に対して2質量部以下の光重合開始剤(B)を含有する粘着剤組成物から形成されたものであり、
前記光重合開始剤(B)は、その3質量%メタノール溶液の波長365nmの質量吸光係数(単位:ml/g・cm)が200以上1000以下であること
を特徴とする粘着シート。 - 最大強度が350nm以上400nm以下の範囲にあり半値全幅が5nm以上30nm以下である単一の発光ピークをその発光スペクトルが有する光線を照射可能な紫外線光源を用いて、積算光量が200mJ/cm2となるように紫外線を前記粘着剤層に照射したときに、
前記粘着シートは、前記粘着剤層における前記基材に対向する面と反対側の主面を測定対象面、シリコンウェハの鏡面を被着面として、JIS Z0237:2000に準拠して180°引き剥がし試験を行ったときに測定される粘着力について、前記紫外線を含むエネルギー線を照射する前の状態における粘着力の、前記紫外線を含むエネルギー線を照射した後の状態における粘着力に対する比が、10以上である、請求項1に記載の粘着シート。 - 請求項1または2に記載される粘着シートをデバイス関連部材の一の面に貼付する工程、
前記デバイス関連部材における前記粘着シートが貼付した一の面と反対側の面側から加工を行って、加工された前記デバイス関連部材に前記粘着シートが貼着した状態とする工程、
前記加工されたデバイス関連部材に貼着する前記粘着シートが備える前記粘着剤層に対して、最大強度が350nm以上400nm以下の範囲にあり半値全幅が5nm以上30nm以下である単一の発光ピークをその発光スペクトルが有する光線を含む光線を照射して、前記粘着剤層に含有される重合性官能基の重合反応を進行させる工程、および
前記硬化した粘着剤層を備えた粘着シートから前記加工されたデバイス関連部材を剥離する工程を備えること
を特徴とする加工されたデバイス関連部材の製造方法。 - 前記光線の光源は紫外線発光ダイオードを含む、請求項3に記載の加工されたデバイス関連部材の製造方法。
- 前記粘着シートはバックグラインドシートであって、前記加工は研磨加工を含む、請求項3または4に記載の加工されたデバイス関連部材の製造方法。
- 前記粘着シートはダイシングシートであって、前記加工は切断加工を含む、請求項3または4に記載の加工されたデバイス関連部材の製造方法。
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EP2975098B1 (en) | 2021-07-21 |
TW201500509A (zh) | 2015-01-01 |
MY178423A (en) | 2020-10-13 |
JPWO2014142085A1 (ja) | 2017-02-16 |
PH12015502076A1 (en) | 2016-01-18 |
CN105008481A (zh) | 2015-10-28 |
EP2975098A1 (en) | 2016-01-20 |
JP6609473B2 (ja) | 2019-11-20 |
CN105008481B (zh) | 2017-07-07 |
EP2975098A4 (en) | 2016-11-30 |
JP6580219B2 (ja) | 2019-09-25 |
KR102176802B1 (ko) | 2020-11-10 |
KR20150126905A (ko) | 2015-11-13 |
JP2018188650A (ja) | 2018-11-29 |
TWI621682B (zh) | 2018-04-21 |
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