Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70058—Mask illumination systems
  • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70058—Mask illumination systems
  • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
  • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides

Definitions

• the invention relates to an optical element for an illumination system with wavelengths 19 193 nm, in particular for EUV lithography, the illumination system comprising a light source, a field plane and an exit pupil and the illumination system having a multiplicity of facets.
• the invention also provides an illumination system for wavelengths ⁇ 193 nm, in particular for EUV lithography; which is characterized in that the optical element has a plurality of facets, the facets on the optical element having such an arrangement that with this optical element a field in the field plane and the exit pupil are illuminated in a predetermined shape.
• a lighting system suitable for EUV lithography should have as few reflections as possible homogeneous, i.e. a ring field segment, for the field specified for EUV lithography. illuminate uniformly, furthermore the exit pupil for each field point after the scanning process should be illuminated up to a certain degree of filling ⁇ and the exit pupil of the lighting system should lie in the entrance pupil of the subsequent lens.
• No. 5,737,137 shows an illumination system with a plasma light source, comprising a condenser mirror, in which an illumination of a mask or a reticle to be illuminated is achieved with the aid of spherical mirrors.
• This lighting system is a lighting system with critical lighting.
• No. 5,361,292 shows an illumination system in which a plasma light source is provided and the punctiform plasma light source is imaged in a ring-shaped illuminated area with the aid of a condenser which has five aspherical mirrors arranged off-center. With the help of a special, subordinate sequence of grazing incidence mirrors, the ring-shaped illuminated area is then imaged in the entrance pupil.
• An illumination system has become known from US Pat. No. 5,581,605, in which a photon emitter is split into a plurality of secondary light sources with the aid of a honeycomb condenser. In this way, uniform or uniform illumination is achieved in the reticle plane.
• the reticle is imaged on the wafer to be exposed using conventional reduction optics. Exactly one rastered mirror with equally curved elements is provided in the illumination beam path.
• a faceted mirror element is known from US Pat. No. 4,195,913, in which the facets are arranged on the mirror surface in such a way that the multiplicity of light beams reflected by the facets overlap in one plane, so that a largely uniform energy distribution results in this plane.
• the field in the plane does not have a specific shape.
• No. 4,289,380 shows an adjustable facetted mirror which comprises a multiplicity of rectangular block segments which are tilted against one another so that the light tufts reflected by the mirror overlap in one plane. As with US 4,195,913, no statement is made about how the field looks in the plane.
• US 5,485,498 proposes a collector mirror which comprises a plurality of facets designed as plane mirrors which are arranged in such a way that the source radiation of the EUV radiation source is in a parallel bundle is redirected.
• An EUV lighting system has become known from DE 199 03807 A1 and corresponding US Pat. No. 6,198,793, which comprises two mirrors or lenses with raster elements. Such systems are also referred to as double-faceted EUV lighting systems.
• DE 199 03 807 A1 shows the basic structure of a double-faceted EUV lighting system.
• the illumination in the exit pupil of the lighting system according to DE 19903 807 is determined by the arrangement of the raster elements on the second mirror.
• EP-A-1262836 shows a reflective optical element with a multiplicity of mirror elements, the multiplicity of mirror elements splitting and deflecting a collimated beam into a multiplicity of individual beams.
• EP-A-1024408 proposes an EUV lighting system which has at least two non-imaging optical elements.
• a first collects non-imaging optical element the light of the light source and provides a predetermined light distribution for illuminating the exit pupil of the EUV lighting system, which can be present, for example, in the form of a circular ring. This collector thus does not produce an image of the light source in the finite.
• the second non-imaging optical element receives the light from the light source, which has a basic shape shaped in such a way that the light is emitted in essentially the form of plane or spherical waves.
• the basic shape of the second optical element is designed in such a way that the light source is imaged by the combination of the first and the second optical element in a conjugate plane which is either infinite or finite.
• the second non-imaging optical element is used exclusively for field shaping and comprises a multiplicity of facets or raster elements which are superimposed on the basic shape of the second optical element in order to provide uniform illumination in the field plane.
• These facets are preferably formed with an area size of 4 to 10 ⁇ m 2 and are arranged in the vicinity of the plane which is defined by the entrance pupil of the EUV lighting system.
• EP-A-1024408 additionally arranges two optical elements between this second non-imaging element and the field plane in order to achieve the desired field shape. Since each additional optical element means an increased loss of light, in particular if reflective optics are used due to the small wavelengths, the solution proposed in EP-A-1024408 is disadvantageous because of the large number of optical components. Furthermore, no information is given in EP-A-1024408 about how the deflection angle and arrangement of the facets on the second non-imaging optical element are to be selected in order to form the ring field segment in the field plane.
• EP-A-1024408 Another disadvantage of EP-A-1024408 is that two non-imaging optical elements, namely a collector and a field-forming element, are always required in order to provide light distribution in the exit pupil and to illuminate the field in the field plane.
• the object of the invention is to overcome the disadvantages of the prior art, in particular the number of components of an EUV lighting system is to be reduced and the light losses are to be minimized.
• the arrangement and the deflection angle of the facets on the optical element can be chosen such that with this optical element both a field in the field plane and that Exit pupil of a lighting system are illuminated in a predetermined manner.
• a lighting system with a very low light loss is specified with such a component.
• an illumination system with a single faceted optical component of this type, the light source or an image of the light source often being imaged essentially in the field plane and the pupil of the illumination system also being illuminated with this single optical element.
• the field to be illuminated in the field plane can be a ring field segment, the radial direction in the middle of the ring field segment defining the scanning direction of the lighting system in a scanning illumination system.
• the ring field can also be formed by the optical element itself.
• the field-shaping optical component can be dispensed with.
• the ring field segment can also be illuminated via a field-shaping optical element.
• the faceted optical element then has a simple structure.
• a grazing incidence mirror is preferably used for field formation.
• a grazing incidence mirror must have sufficiently large angles of incidence to the surface normal; which are set greater than 60 ° and preferably greater than 70 °.
• imaging optics which images the facetted optical element into the exit pupil of the illumination system, can be provided.
• the lighting system according to the invention is preferably designed as a critical lighting system.
• a critical lighting system is understood to mean one that essentially depicts the light source or an image of the light source in the field plane. From this, the arrangement and deflection angle of the facets on the optical element according to the invention are based preferably determined with the grid transformation, as described below.
• each pupil belonging to a field point is first represented by a grid.
• a number of discrete field points are selected with which a largely uniform illumination intensity is achieved in the field level in the ring field segment.
• the network grating of the pupils is traced back over each field point into the plane of the optical element, so that a facet network is created in the plane of the optical element.
• a transformation network is calculated in the plane of the optical element, for which the condition of an equal radiation intensity per cell is fulfilled.
• the facet network is then placed on the transformation network and both networks are transformed such that the transformation network is a Cartesian, i.e. becomes an equidistant and right-angled network.
• a facet is drawn around each grid point of the transformed facet network, the size of which is determined by the maximum permitted distance from the next grid point.
• the facet network is then transformed back on the transformation network.
• the angles of inclination are then in the facet network obtained last! of the individual facets defined by the assigned field points.
• the network points in the pupil and the field are optimized.
• a lighting system with a non-imaging optical element according to the invention is distinguished from the prior art in the form of EP-A-1024408 by reduced light losses.
• the lighting system according to the invention has only one faceted optical element, which covers both the field in the field plane and the field Exit pupil illuminated in a predetermined shape, for example annular, quadrupolar or circular.
• a faceted optical element the facets on the optical element have such an arrangement and such a deflection angle that both the field in the field plane and the exit pupil are illuminated in a predetermined shape.
• Such an element is also called a specular reflector. It is characterized in that an incident wave is reflected at certain locations of the reflector only at certain angles. It is not necessary to fix the position of the specular reflector, for example on the level of the entrance pupil of the lighting system, so that there are no restrictions with regard to the construction space configuration of the lighting system according to the invention.
• the specular reflector according to the invention is preferably used in a critical lighting system.
• critical lighting is lighting in which the light source or an image of the light source is essentially imaged directly into the object, which in this case is the field level becomes.
• the facets on the optical element have a hexagonal arrangement.
• One or more field-shaping optical elements or optical elements with an imaging effect can be provided in the light path between the optical element and the field plane. It would also be possible to introduce several optical elements to form an intermediate image of the ring field segment for the use of diaphragms. It is also possible for the single facetted optical element to image an image of a light source, the so-called intermediate image, essentially in multiple parts in the field plane.
• An intermediate image of a light source can be formed using a collector unit, for example. The collector unit absorbs the light from the light source and forms it into one Intermediate image.
• Grazing incidence collectors are particularly suitable as collectors, for example nested collectors as described in US-2003-0043455 A1, the disclosure content of which is fully incorporated in the present application.
• the optical element In order to set different lighting settings, for example a dipolar or annular or quadrupolar lighting setting, in the exit pupil of the lighting system or to generate different ring field segments, provision can be made for the optical element to be designed to be interchangeable, for example in an exchangeable drum. Alternatively, it is possible to hide individual faceted elements if, for example, a dipolar setting is to be set instead of a quadropolar setting. Conversely, instead of a dipolar setting, a quadropolar setting can be set by fading in certain facets of the optical element. So-called polar lighting settings, in particular a dipolar or a quadropolar lighting setting, are particularly preferred.
• the individual facets of the optical element are equipped with refractive power to compensate for an uneven illuminance of the light source.
• approximately equally sized illuminated points can be obtained in the exit pupil of the lighting system.
• the individual facets can have both positive optical refractive power and negative optical refractive power.
• Non-imaging optical elements Possible manufacturing processes for the non-imaging optical elements are gray tone lithography or direct writing lithography in conjunction with etching techniques, the assembly of the element from many small rods, which have corresponding angles of inclination on the front side, and the galvanic molding of one using gray tone lithography or direct writing lithography manufactured basic pattern.
• Figure 1 the principle of a specular reflector for a homocentric
• Pupil Figure 2 the principle of a specular reflector for a non-homocentric pupil
• Figure 3 ring-shaped field in the field plane of an illumination system
• Figure 4 a pupil network for a field point
• Figure 5 the illuminated ring field segment with arranged therein
• Element Figure 7 the faceted network, which is based on a homogeneous
• FIG. 8 Illumination results in FIG. 8: illumination system with a specular reflector as the only optical component.
• FIG. 9 projection exposure system with an illumination system according to FIG.
• FIG. 8 10 illumination system with a specular reflector and a field-forming element
• FIG. 11 projection exposure system with an illumination system according to FIG
• FIG. 10 FIG. 12 illumination system with a specular reflector and an imaging element
• FIG. 13 projection exposure system with an illumination system with an imaging and a field-shaping mirror
• FIG. 14 a projection exposure system as in FIG. 13 with a grazing incidence collector
• FIG. 15 a projection exposure system as in FIG 11 with an 8-
• FIG. 16A specular reflector with hexagonal arrangement of the facets on the mirror
• FIG. 16B section of a facet mirror according to FIG. 16A
• a tuft focused in a field plane is to be deflected in such a way that a ring field segment is formed in the field plane, as well as - viewed from a certain - * field point - for example a ring field segment - a pupil of, for example, an illumination system in a given Form, for example annular or quadrupolar, is illuminated.
• a certain amount of the incident light is directed into the pupil of the illumination system belonging to a field point of the field of an illumination system.
• This can be done, for example, using small plan facets.
• the plan facets are arranged so that the field is homogeneously illuminated in the field plane and a homogeneously filled pupil is formed for each field point, ie the pupil is filled with discrete but deliberately distributed "points".
• this principle which is also referred to as the principle of the specular reflector, is for a homocentric pupil, ie the The pupil position is identical for all field points of the field, only the ring field segment 3.
• the pupil 1 is projected back into a plane 5, for example by discrete points of the ring field segment 3.
• a kidney-shaped illumination in plane 5, which essentially corresponds to the shape of the ring field.
• small facet mirrors are now arranged in plane 5 in such a way that they homogeneously illuminate both the discrete points in the ring field segment 3 and the associated pupils 1.
• the x-y coordinate system is also shown in FIG. 1.
• the y direction is the scanning direction and the x direction is perpendicular to the scanning direction.
• FIG. 3 shows the ring field segment 3 in the field plane of the lighting system with a Cartesian coordinate system comprising an x and a y direction.
• the reference number 10 denotes a field point in the middle of the ring field segment, the reference number 12 a field point at the edge of the ring field segment.
• the y direction is the scanning direction of the lighting system; the x-direction the direction that is perpendicular to the scanning direction.
• the distance from the field point in the middle of the ring field segment 10 in the x direction is referred to as field height x.
• the arrangement of the facets and their deflection angle can be determined using grid transformation methods.
• each pupil belonging to a field point is represented by a specific grid.
• the grid is selected according to the desired setting.
• the setting can be an ouadrupole or an annular setting, for example.
• Such a network grating 20 for a circularly illuminated pupil 1 is shown in FIG.
• the grid 20 has cells 22 of the same size, the same cell size having the same area power density, i.e. Irradiance means.
• the field points are represented by a multiplicity of light source images 24 in the field plane in which the ring field segment 3 is formed.
• the network grating 20 of the pupils is traced back to each field point 24 in the field plane and any optical components, such as field-shaping or imaging optical components, to the plane of the faceted or specular reflector of the optical element according to the invention. Overlaying creates a complicated network in which different nodes are assigned to different field points.
• This network is referred to as facet network 26.
• facet network 26 is shown in FIG. 6.
• a transformation network is calculated on the specular reflector, the boundary condition having the same irradiance per cell being met.
• the facet network 26 is placed on the transformation network and both are transformed in such a way that the transformation network becomes Cartesian, ie equidistant and rectangular.
• a facet is now drawn around each grid point of the transformed facet network.
• the facet network is then transformed back to the transformation network. This then results in facets of different sizes and positions, the angle of inclination of which is defined by an assigned field point.
• the angle of inclination is set so that the incident beam z. B. is directed from the center of the light source in the direction of the assigned field point.
• the unusable incident radiation is sent through certain other facet angles into a radiation sump or no facets are attached.
• a fully illuminated exit pupil of the desired shape does not necessarily have to be obtained.
• scanning exposure i.e. Reticle mask and wafer are moved synchronously in or against the y-direction during exposure, it is rather sufficient if the desired illumination of the exit pupil is established after scan integration over a certain field height x. Therefore, the angle of inclination of each facet can also be set so that a plurality of facets each illuminate a different field point, for example within the field to be illuminated, along the scan path in the y direction, so that a fully illuminated exit pupil is only obtained after scan integration.
• FIG. 7 shows the transformed transformation network 27 that results, for example, under the boundary condition of the same irradiance per cell, without additional imaging or field-shaping components. Is shown a large number of rectangular facets, each of which illuminates a large number of discrete field points and assigned pupil locations via their individual inclination angles.
• the field points 29 projected back onto the specular reflector are identified in FIG. 7, the contour of the illuminated field in the transformed transformation network 27 being outlined for the sake of clarity. In FIG. 7, one of these back-projected field points 29 is also highlighted in order to be able to exemplify the facets 31 assigned to this field point, which are shaded here.
• the network points in the pupil can be optimized, for example by designing the network in the pupil and the field as a function of the field point, by selecting the field points differently, taking into account the uniformity in the scanning direction, so that there is minimal light loss in the radiation sump ,
• E is the intensity distribution in the xy field plane as a function of x and y. If you now want to obtain a uniform exposure, it is advantageous if the scanning energy is largely independent of the x position.
• the uniformity in the scan direction is therefore defined as follows:
• the facet parameters of the specular reflector can also be set so that the same integrated partial illumination of the exit pupil results for each integration of the illumination components of all points in the field plane that lie on a straight line running in the scanning direction.
• optical element or specular reflector in which the deflection angle and the arrangement of the facets were selected as described above, lighting systems can be built which work with only a few, in extreme cases only with a single, optical component. Since the losses due to reflection in the case of EUV radiation are considerable, such lighting systems are particularly advantageous. Illumination systems with an optical element according to the invention will be described in more detail below by way of example.
• FIG. 8 shows a first lighting system according to the invention, in which the lighting system comprises only a single optical component, namely the faceted optical element according to the invention or the specular reflector 100, which simultaneously acts as a collector for the light from the light source 102
• the specular reflector 100 of the single-mirror illumination system has an approximately kidney shape and carries out the imaging of the light source 102 into the field plane 108, the ring field formation and the illumination of the pupil 106. The calculation of the angles of inclination and the arrangement of the facets again takes place via the grid transformation.
• the specular reflector 100 according to FIG. 8 comprises, for example, several 1000 individual facets.
• the position of the pupil can be determined by the intersection of the optical axis HA of the subsequent projection objective with the heavy beam 107 a light bundle to a field point of the field to be illuminated, for example the middle field point (0,0) can be determined.
• the heavy beam is the energetic mean of all lighting beams that go through a field point.
• the exit pupil 106 of the illumination system coincides with the entrance pupil of the projection objective.
• the illumination in the pupil 106 it may be necessary to provide individual facets of the specular reflector 100 with refractive power. If, for example, the illuminance decreases due to the light source towards the edges, the facets there have to become larger in order to collect more light accordingly. It is then possible to equip them with a low refractive power so that illuminated points of the same size are again obtained in the exit pupil 106. This results in a blurring of the critical lighting at the field level, but this is irrelevant as long as the field area is not overexposed and performance is lost.
• FIG. 9 shows a projection exposure system with an illumination system from FIG. 8.
• the exit pupil 106 of the illumination system according to FIG. 8 coincides with the entrance pupil of the subsequent projection exposure lens 112.
• the following projection lens 112 is a 6-mirror projection lens with mirrors 114.1, 114.2, 114.3, 114.4, 114.5 and 114.6, as disclosed, for example, in US Pat. No. 6,353,470, the disclosure content of which is fully incorporated in the present application.
• the optical axis of the projection system is labeled HA.
• imaging systems are also conceivable, for example projection lenses with more than 6 mirrors, which project a mask arranged in the field plane onto a light-sensitive object.
• An 8-mirror projection lens as mentioned in US 2002-0154395 A1, the disclosure content of which is fully included in US Pat this application is also inserted.
• a projection exposure system with an illumination system as shown in FIG. 8 with an 8-mirror projection lens has both a high light output and very good imaging properties.
• the projection objective 112 images a mask arranged in the field plane 108, which is also referred to as a reticle, into the image plane 116, in which a light-sensitive object, for example a wafer, is arranged.
• Both the mask and the light-sensitive object can be arranged to be movable in the field or image plane, for example on so-called scan tables, which can be moved in the scanning direction.
• the specular reflector 100 to be designed kidney-shaped exhibits geometric light losses; however, these are low compared to lighting systems with multiple mirrors. In lighting systems with multiple mirrors, very high reflection losses occur; for example, normal incidence mirrors have less than 70% reflectivity per mirror.
• the shape of the reflector to be designed kidney-shaped in the lighting system according to FIG. 8 essentially corresponds to the ring field segment to be illuminated in the field plane.
• FIG. 10 shows an illumination system with a specular reflector 100 with a field-forming element 110.
• the same components as in Figure 8 are given the same reference numerals. -
• the specular reflector 100 is designed for a rectangular field.
• the ring field formation takes place via the field-forming element 110, which in the present case is a field-forming grazing-incidence mirror.
• Field mirrors with a convex shape are preferably used to illuminate a ring field segment.
• the specular reflector 100 has an elliptical shape.
• the facets have any shape and are calculated, for example, by a grid transformation.
• FIG. 11 shows a projection exposure system with an illumination system according to FIG. 10.
• the same components as in Figure 9 are given the same reference numerals.
• the facet mirrors of the specular reflector can also be arranged on a curved support in order to increase the collection efficiency.
• the light source 102 can also be collected via an imaging collector and imaged into the field plane 108 with an additional mirror.
• the light source 102 can also represent an image of the light source.
• a projection exposure system can comprise an illumination system according to the invention, which in addition to the field-forming element can additionally comprise one or more imaging elements 104.
• Such a lighting system is shown in Figure 12; while the corresponding projection exposure system is shown in Figure 13.
• the same components as in Figure 11 have the same reference numerals.
• the element with an imaging effect 104 images the specular reflector 100 into the exit pupil 106 of the lighting system.
• imaging optical elements may even be an intermediate image of the ring field segment 3 in the field plane 108 for the use of diaphragms.
• additional imaging or other mirrors can be advantageous if the beam path has to be additionally folded, for example in order to bring the light source into a more accessible installation space. This is evident in Figure 13.
• the light source is further away from the reticle mask than in the comparative example in FIG. 9. Additional mirrors for folding the beam path are particularly advantageous for light sources which require a large installation space.
• FIG. 14 shows a system according to FIG. 13, in which the specular reflector does not record the light source itself but an image Z of the light source.
• the image Z of the light source is recorded by a collector unit, for example a nested grazing-incidence collector 200, as is disclosed in US-2003-0043455 A1, the disclosure content of which is fully incorporated in the present application.
• the specular reflector 100 of the arrangement shown in FIG. 14 picks up the light of the intermediate image Z and images the image Z of the light source into the field plane 108 of the illumination system.
• the lighting system according to FIG. 14 corresponds to the lighting system according to FIG. 13.
• the same components as for the lighting system in FIG. 13 have the same reference numbers.
• FIG. 15 shows an illumination system according to FIG. 14, in which, instead of a 6-mirror projection lens 112 with six mirrors 114.1, 114.2, 114.3, 114.4, 114.5, 114.6, an 8-mirror lens as described, for example, in US 2002- 0154395 A1, the full content of which is included in the present application, is used as a projection lens.
• the 8-mirror projection lens 212 comprises 8 mirrors 214.1, 214.2, 214.214.4, 214.5, 214.6, 214.7, 214.8.
• the optical axis HA of the 8-mirror projection lens is also shown.
• the optical axis HA of the projection objective is shown in all of the systems shown in FIGS. 9-15.
• the exit pupil of an illumination system which coincides with the entrance pupil of the projection exposure system, is defined as the point of intersection of the heavy beams different field points with the optical axis HA. This can be seen particularly clearly in FIGS. 8 and 10.
• the exit pupil is marked there with reference number 106.
• the main beam angle at the reticle is negative.
• Such a system is shown in WO2004 / 010224.
• the disclosure content of WO2004 / 010224 is included in full in the present application.
• a focal length of the entrance pupil which is defined as the length of the focal beam between the field plane and the exit pupil, of approximately 1 m
• the telecentricity error in the exit pupil 106 with a point on the field in the field plane 108 between two selected target points is below 1 mrad. More than 50 target points are required on the faceted optical element 100.
• 16A and 16B show a section of the faceted optical element according to the invention with a hexagonal facet.
• the faceted optical element with hexagonal facets 130 is shown by way of example in FIG. 16A.
• Reference numeral 132 denotes a section of the faceted optical element.
• the entire faceted optical element consists of similar cells with at least 30 individual facets, which are assigned to a field point. If you calculate with more than 50 points for the pupil, you need a non-imaging optical element with about 2000 to 5000 facets. With a mirror diameter of 250 mm, you get a facet size of about 5 x 5 mm 2 - a quite macroscopic element size.
• an optical element is specified for the first time, in which the field plane and at the same time the exit pupil are illuminated by the type of arrangement of the facets and the deflection angle of the facets on the optical element.
• the invention provides a lighting system which is characterized in that it only comprises a faceted optical element.

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• Lenses (AREA)
• Microscoopes, Condenser (AREA)
• Optical Elements Other Than Lenses (AREA)
• Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Priority Applications (5)

Applications Claiming Priority (2)

Related Child Applications (1)

Publications (2)

Family

ID=33185681

Family Applications (1)

Country Status (6)

Cited By (6)

Families Citing this family (436)

Family Cites Families (24)

• 2003
  • 2003-04-17 DE DE10317667A patent/DE10317667A1/de not_active Withdrawn
• 2004
  • 2004-04-13 DE DE502004010448T patent/DE502004010448D1/de not_active Expired - Lifetime
  • 2004-04-13 CN CN2004800103036A patent/CN1774675B/zh not_active Expired - Fee Related
  • 2004-04-13 WO PCT/EP2004/003855 patent/WO2004092844A2/de not_active Ceased
  • 2004-04-13 JP JP2006505094A patent/JP2006523944A/ja active Pending
  • 2004-04-13 EP EP04726991A patent/EP1614008B1/de not_active Expired - Lifetime
• 2005
  • 2005-10-14 US US11/251,136 patent/US20060132747A1/en not_active Abandoned

Also Published As

Similar Documents

Legal Events