WO2003014833A2 - Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen - Google Patents
Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen Download PDFInfo
- Publication number
- WO2003014833A2 WO2003014833A2 PCT/EP2002/008193 EP0208193W WO03014833A2 WO 2003014833 A2 WO2003014833 A2 WO 2003014833A2 EP 0208193 W EP0208193 W EP 0208193W WO 03014833 A2 WO03014833 A2 WO 03014833A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- collector
- plane
- spokes
- illuminated
- mirror
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 36
- 238000005286 illumination Methods 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000004377 microelectronic Methods 0.000 claims description 4
- 238000003384 imaging method Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000009434 installation Methods 0.000 abstract description 2
- 238000001816 cooling Methods 0.000 description 11
- 230000005855 radiation Effects 0.000 description 7
- 210000001747 pupil Anatomy 0.000 description 6
- 241000264877 Hippospongia communis Species 0.000 description 4
- 238000001015 X-ray lithography Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000009795 derivation Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/006—Systems in which light light is reflected on a plurality of parallel surfaces, e.g. louvre mirrors, total internal reflection [TIR] lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
- G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/04—Irradiation devices with beam-forming means
Definitions
- the invention relates to a collector for projection exposure systems which are operated in the scan mode along a scanning direction with a wavelength ⁇ 193 nm, preferably ⁇ 126 nm, particularly preferably wavelengths in the EUV range.
- the collector receives light emitted by a light source and illuminates an area in a plane to be illuminated.
- the collector comprises a plurality of rotationally symmetrical mirror shells, which are arranged one inside the other around a common axis of rotation.
- the invention also provides an illumination system with such a collector, a projection exposure system with an illumination system according to the invention and a method for exposing microstructures.
- No. 5,768,339 shows a collimator for X-rays, the collimator having a plurality of nested paraboloidal reflectors.
- the collimator according to US Pat. No. 5,768,339 serves to shape an isotropically emitted beam from an X-ray light source into a parallel beam.
- a nested collector for X-rays which, as in the case of US 5,768,339, serves to collimate isotropic X-rays emitted by a source to form a parallel beam.
- No. 5,763,930 shows a nested collector for a pinch plasma light source, which serves to collect the radiation emitted by the light source and to bundle it into a light guide.
- No. 5,745,547 shows several arrangements of multichannel optics which are used to bundle the radiation from a source, in particular X-ray radiation, at one point by means of multiple reflections.
- the invention proposes elliptically shaped reflectors according to US Pat. No. 5,745,547.
- X-rays are formed into a parallel output beam.
- the arrangement of nested reflectors known from WO 99/27542 is used in an X-ray proximity lithography system to refocus the light of a light source so that a virtual light source is formed.
- the nested shells can have an ellipsoidal shape.
- a nested reflector for high-energy photon sources has become known from US Pat. No. 6,064,072, which serves to shape the diverging X-rays into a bundle of rays running in parallel.
- WO 00/63922 shows a nested collector which serves to collimate the neutron beam.
- a nested collector for X-rays has become known from WO 01/08162, which is characterized by a surface roughness of the inner reflecting surface of the individual mirror shells of less than 12 arm.
- the collectors shown in WO 01/08162 also include systems with multiple reflections, in particular also Woltersystems, and are distinguished by a high resolution, as is required, for example, for X-ray lithography.
- the object of the invention is to provide a collector for an illumination system for microlithography with wavelengths ⁇ 193 nm, preferably ⁇ 126 nm, particularly preferably for wavelengths in the EUV range, which has sufficient mechanical stability and has a high light efficiency.
- impairments to the uniformity of the illumination in the field level should be avoided by the holding devices of the collector.
- this object is achieved in that, in the case of a nested collector which illuminates a plane on the image side and which has a multiplicity of mirror shells which are rotationally symmetrical about a common axis of rotation, the individual mirror shells are held by fastening devices, the fastening device comprising support spokes which are located in a radial direction
- the support spokes are arranged such that when they are projected into the plane to be illuminated on the image side, they are inclined with respect to the y direction of the local coordinate system in the image side plane.
- the y-direction is the direction of the local coordinate system, which is parallel to the scanning direction, for example a projection exposure system, which is used in the scanning
- the general rule is that the mechanical stability is improved the more support spokes are used. In order to keep the loss of light through vignetting as low as possible due to the support spokes extending in the radial direction, it is advantageous if the spokes are very narrow.
- the support spokes particularly preferably have a shape that tapers in the radial direction toward the axis of rotation. This has the advantage that a high degree of stability is achieved and, on the other hand, the loss of light is limited by shadowing effects, since the percentage of shadowed area is always approximately the same in relation to the circumference of a shell. This is achieved when the width of the supporting spoke increases in proportion to the distance from the common axis of rotation.
- the support spokes preferably have grooves into which the individual mirror shells can be inserted for holding purposes. A particularly stable
- Embodiment results when the mirror shells in the grooves are glued to the support spokes.
- the support spokes extend in the radial direction in the plane spanned by the x and y directions. On the spanned by the x and y directions
- the common axis of rotation is vertical.
- the mechanical stability of the collector is increased even further if webs which extend essentially parallel to the common axis of rotation are provided.
- the spokes taper in the direction of the axis of rotation of the collector toward the plane to be illuminated.
- the influences of the mechanical holding devices on the uniformity of the Illumination in the field level can be kept low.
- the support spokes are arranged such that when they are projected into the plane to be illuminated on the image side, they are inclined with respect to the y direction in the plane to be illuminated on the image side. It is particularly advantageous if at least one support spoke of the plurality of
- the images of all the first raster elements of the first optical element are superimposed and result in the illuminated field in the
- the raster elements are arranged on the first optical element in such a way that no raster element is arranged in the area of shading or vignetting of a spoke extending in the x direction, since first raster elements, which are also referred to as field facets, and through a supporting spoke can be completely shadowed, nothing can contribute to illuminating the field at the field level.
- additional support spokes are provided, it is particularly advantageous if the additional support spokes are arranged in such a way that the shadowing caused by these support spokes due to the projection into the plane to be illuminated on the image side runs in such a way that the large number of the first raster elements which point to it the first optical element are arranged, cut at different locations and thus vignetted.
- Shading is only of minor importance since all other field facets are fully illuminated at this point. The uniformity of the illumination in the field level is therefore only slightly affected.
- a system with 6 support spokes can achieve a uniformity of e.g. ⁇ SE (x) better than 1.5%.
- the invention also provides an EUV projection exposure system and a method for producing microelectronic components.
- Figure 1 shows the schematic diagram of a collector with an inventive
- Fastening device Figure 2 three-dimensional view of the fastening device of a shell of a collector according to the invention with cooling rings and spokes and webs
- Figure 3 first element with raster elements, which is arranged in the image-side plane of the collector to be illuminated
- Figure 5a three-dimensional view of a first embodiment of a spoke of a holding device
- Figure 5b three-dimensional view of a second embodiment of a spoke of a holding device
- Figure 8 8-shell nested Wolter system
- Figure 9 Sketch to explain the coordinates of a collector shell designed as a collector system with two reflections.
- Figure 10 Overlaying the images of the first raster elements in the field plane
- FIG. 11 course of the scan-integrated energy SE (x)
- FIG. 1 shows an embodiment of a nested collector according to the invention with, for example, two mirror shells 004.1, 1004.2 arranged one inside the other, in which the ring aperture elements, via which the light from the light source 1 is received by the collector, a gap 1000 between the object-side ring aperture elements 1002.1 and 1002.2 of the first Have mirror shell 1004.1 and the second mirror shell 1004.2.
- cooling devices 1006.1, 1006.2, 1006.3 are arranged in the unused area between the two mirror shells 1004.1, 1004.2 and inside and outside the collector.
- the mirror shells 1004.1, 1004.2 end approximately in a plane 1008 and are in this plane 1008 according to the invention by a spoke wheel, one of which
- Each mirror shell 1004.1, 1004.2 of the illustrated embodiment comprises two mirror segments, a first mirror segment 1007.1, 1007.2 with a first optical surface and a second mirror segment 1009.1, 1009.2 with a second optical surface, which are arranged one behind the other without a gap.
- 1007.2 are segments of hyperboloids and the second mirror segments 1009.1, 1009.2 are segments of ellipsoids.
- the inner and outer marginal rays 1016.1, 1016.2, 1018.1, 1018.2 of the respective mirror shell or the connecting lines assigned to them define between the source 1, the image of the source 5, the shell ends 1024.1, 1024.2 and in systems with two mirror segments, the transition area between the first 1007.1, 1007.2 and the second mirror segment 1009.1 1009.2 also an optically used area or a so-called beam tube through which the radiation flow from the object or from the light source 1 to image 5 of the light source flows.
- a meridional section or a meridonal plane is any plane that includes the axis of rotation RA. There is now an unused area between the used areas 1030.1., 1030.2 of at least two mirror shells 1004.1, 1004.2 arranged one inside the other
- Further components of the nested collector can be arranged in the unused area 1032 between two mirror shells 1004.1, 1004.2 without influencing the radiation flow from the light source 1 to the image of the light source 5.
- Examples of such components would be detectors or coupling-out mirrors which deflect light onto detectors or non-optical ones Components such as heat shields or cold traps.
- the cooling devices 1006.1, 1006.2, 1006.3 can be in direct contact with the rear sides of the collector shells.
- the arrangement of electrodes or magnets for deflecting charged or magnetic particles is also possible. Electrical lines or lines for the supply and discharge of coolant can be led to the outside of the collector with only slight shading of the image-side collector aperture, ie the illuminated area in the image-side plane.
- These lines 1044 are preferably guided in the area of the shadows of the spokes 1010 of the spoke wheel with spokes 1010.
- the spoke wheel is in the x direction, ie perpendicular to
- the shells of the nested collector itself are rotationally symmetrical about the axis of rotation z.
- further cooling elements or detectors can also be arranged in areas outside the outermost shell 1004.2 or the central shading 052.
- a panel can preferably also be arranged in the area of the central shading.
- the collector according to the invention shown in FIG. 1 is used in an illumination system
- the first optical element of the illumination system with first raster elements which are also referred to as first field facets, is arranged in or near the plane 3 to be illuminated on the image side.
- Grooves can be embedded in the spokes of the spoke wheel, for example milled.
- the collector shells can be embedded in the grooves. In this way, it is possible to grip the mirror shells with the fastening device according to the invention, for example by gluing the mirror shells in the groove.
- FIG. 2 shows a further developed embodiment of the invention.
- the holding device is shown representative of a single mirror shell.
- the holding device comprises in the xy plane for holding the individual mirror shells two spokes 1204.1, 1204.2 and additional webs 1202.1, 1202.2.
- Each of the webs is attached to a spoke of the spoke wheel.
- the webs contribute to the further mechanical stabilization of the collector.
- FIG. 2 also shows cooling devices for cooling the collector shell, which are designed as cooling rings that run around the full circumference of the collector.
- the cooling rings 1200.1 and 1200.2 are arranged in the unused space between two mirror shells of a collector with, for example, two segments per mirror shell. Such a double-shell Wolter collector is shown in the meridional section, for example in FIG. 1.
- the cooling rings 1200.1 and 1200.2 are held on holding structures or webs 1202.1, 1202.2 which run in the shadow of the spokes of the spoke wheel and extend in the direction of the axis of rotation.
- the cooling rings 1200.1 and 1200.2 can be connected to the holding webs 1202.1, 1202.2, for example, via a soldered connection. This guarantees good mechanical and thermal contact.
- the webs are preferably made of a material with good thermal conductivity, for example copper, and are easily solderable.
- the cooling rings 1202.1, 1202.2 are also preferably made of a highly thermally conductive material such as copper or steel
- spoke wheel 1204.1, 1204.2 of the spoke wheel which holds and fastens the individual mirror shells, for example by means of screws.
- the spokes run in a radial direction, i.e. in a direction perpendicular to the axis of rotation and perpendicular to the scanning direction.
- FIG. 3 shows the arrangement of the first raster elements, which are referred to as field facets, on the first optical element with first raster elements, which is arranged in the plane 3 to be illuminated by the collector.
- the first optical element with first raster elements lies in a plane spanned by the local x and y direction.
- the plane of the field honeycomb mirror spanned by the local x and y direction is not exactly perpendicular to the axis of rotation of the collector and thus corresponds not exactly the plane 3 from FIG. 1 that is to be illuminated homogeneously.
- small angles of inclination do not change the derivation and only lead to a slight distortion of the illumination.
- the first raster elements 1500 are arranged in twelve blocks 1502.1, 1502.2, 1502.3, 1502.4, 1502.5, 1502.6, 1502.7, 1502.8, 1502.9, 1502.10, 1502.11, 1502.12 spaced apart from one another.
- No first raster elements 1500 are arranged in the area not illuminated by the central shading 1504 of the collector.
- no raster elements are arranged in the region of the first optical element with raster elements which is vignetted in the plane to be illuminated by the spokes of the spoked wheel running parallel to the x direction.
- the vignetting in the plane to be illuminated, in which the optical element is arranged with first field facets, can be seen in FIG. 4.
- the spoke wheel which leads to the vignetting shown in FIG.
- 4 in the x ' -y ' plane of the first optical element comprises two support spokes 2000.1 and 2000.2 running parallel to the x ' direction in the local plane of the collector, as well as four further support spokes 2002.1 , 2002.2, 2002.3, 2002.4, which extend in the local x ' -y ' plane of the collector in a direction that is not parallel to the x 'direction in the local x'-y' plane of the collector.
- Collector and the field honeycomb level spanned planes do not exactly match, but are inclined towards each other with small angles of inclination. However, this does not change the general derivation of the arrangement of the support spokes and only leads to slight distortions in the illumination.
- the further supporting spokes 2002.1, 2002.2, 2002.3, 2002.4 are arranged in such a way that the vignetting caused by them in the x'-y 'plane in which the first raster elements are arranged shade the individual first raster elements at different locations.
- the field facets of block 1502.2 are shaded essentially in the middle, whereas the
- Field facets of blocks 1502.11 are only shaded on the edge and in block 1502.3 of four field facets only one is shadowed on the edge.
- block 1502.1 no field facet is switched off at all.
- the blocks of the first raster elements on the first optical element are arranged symmetrically both to the y ′ axis and to the x ′ axis, the same considerations apply to the blocks symmetrical to the blocks 1502.1, 1502.2, 1502.3 and 1502.1 1 , As shown above, the individual
- Field facets are vignetted by the supporting spokes at different locations in the plane to be illuminated, in which the optical element is arranged, the loss of light due to these shadows in the field plane, in which the images of all field honeycombs are superimposed on one another essentially, so that the uniformity of the illumination of the field in the field plane is influenced only to a very small extent by the arrangement of the support spokes according to the invention. This is explained in more detail in the description of FIGS. 11 and 12a-c.
- the spokes of the spoke wheel which do not run parallel to the x ' axis, are tapered in the direction of the axis of rotation of the collector, which lies in the area of the central shading.
- FIGS. 5a and 5b show a single spoke of the holding device shown in FIG. 2 in a three-dimensional view.
- An x, y, z coordinate system is shown, the spoke having an extension in the z direction along the direction of the common axis of rotation RA of the plurality of mirror shells.
- the light source 1 and a mirror shell for example the first mirror shell 1004.1 of the collector according to FIG. 1 and the beam path of a bundle of rays 3000 from the light source 1 to the source image 5.
- the spoke has a shape that tapers in the radial direction, for example in FIG. 4 described on.
- the spoke is not tapered in the z-direction, the boundary beams 3002.1, 3002.1 of a bundle of rays 3000, which are reflected by the collector shell 1004.1, are vignetted, the collector shell
- the boundary rays 3002.1, 3002.2 of the bundle of rays are defined by the extent of the spoke in the x direction for the respective mirror shell.
- 1004.1 reflected and vignetted boundary beams 3004.1, 3004.2 are shown in dash-dot lines in FIG. 5a.
- Mirror shell 1004.1 reflected limiting beams 3004.1, 3004.2 of the beam bundle 3000 can be avoided.
- the boundary beams are defined as in Figure 5a.
- the spoke tapers in profile from the object-side aperture, which receives the light from the light source 1, to the image-side aperture, into which the light is directed in the direction of the plane 3 to be illuminated and to the image of the light source 5 becomes.
- the spoke has a thickness di in the area of the object-side aperture and a substantially smaller thickness d 2 at the outlet-side end of the collector.
- FIG. 6 shows a schematic view of a projection exposure system for the production of, for example, microelectronic components, in which the invention can be used.
- the projection exposure system shown in FIG. 6 comprises a light source 1 and a nested collector 30 with 8 shells for illuminating a plane 103.
- the structure of the collector is shown in FIGS. 8 and 9 and the Data shown in Table 2.
- the plane mirror 300 in the beam path between the nested collector and in front of the intermediate focus Z can be designed as a spectral filter with a diffraction angle of 2 ° between 0 and the diffraction order used.
- the first optical element 102 comprises 122 first raster elements, each with an extension of 54 mm ⁇ 2.75 mm.
- the second optical element 104 has 122 second raster elements assigned to the first raster elements, each with a diameter of 10 mm.
- the optical elements 106, 108 and 110 essentially serve to shape the field in the object plane 114. All locations of the optical components in Table 1 are on the reference coordinate system in the object plane 114 of the
- a structured mask (not shown) is arranged in the object plane 14 and is imaged on the object to be exposed in the plane 124 by means of a projection objective 126.
- the rotation by the angle ⁇ around the local x-axis of the local coordinate systems assigned to the respective optical component results after translational displacement of the reference coordination system to the location of the local coordinate system.
- the parameters of the optical components of the illumination system of the projection exposure system according to FIG. 6 are given in Table 1.
- the illumination system of the projection exposure system shown in FIG. 6 comprises the optical components from the light source 1 to the object plane 114.
- the illumination system is a double-faceted illumination system as disclosed in US Pat. No. 6,198,793 B1, the content of which is fully incorporated in the present application.
- Table 1 shows the positions of the vertices of the individual optical elements with respect to the object plane 114 and the angles of rotation ⁇ of the coordinate systems about the x-axis. Furthermore, right-handed coordinate systems and clockwise rotation are used. In addition to the local coordinate systems of the optical components, the local coordinate systems of the intermediate focus Z and the entrance pupil E are specified.
- the field-forming mirror 110 consists of an off-axis Segment of a rotational hyperboloid.
- the coordinate systems for all of the optical elements of the illumination system of the projection exposure system according to FIG. 6 described in Table 1, with the exception of the nested collector 30, are shown in FIG. All optical elements are given the same reference numbers as in FIG. 6.
- the reticle can be moved in the drawn-in direction 1 16 in the projection exposure system designed as a scanning system.
- the exit pupil of the lighting system is largely homogeneously illuminated.
- the exit pupil coincides with the entry pupil E of the subsequent projection objective 126.
- the entrance pupil is located at the point of intersection of the main beam reflected by the reticle with the optical axis HA of the projection lens.
- the projection objective 126 comprises, for example, six mirrors 128.1, 128.2, 128.3, 128.4, 128.5, 128.6 according to the US patent application 09/503640 and images the reticle in the object plane 114 onto the object 124 to be exposed.
- Table 1 Design data of the illumination system of the projection exposure system according to FIG. 6
- the aperture on the object side is NA ⁇ 0.71.
- a plane mirror 300 is inserted following the collector 30 for folding the system in order to provide installation space for mechanical and electronic components in the object plane 114 in which the wafer stage is arranged.
- the entire optical system is less than 3 m long and less than 1.75 m high.
- the plane mirror 300 has been designed as a diffractive spectral filter, that is to say implemented by a grating.
- undesired radiation with, for example, wavelengths substantially greater than the desired wavelength, in the present case 13.5 nm, can be prevented from entering the part of the lighting system behind the diaphragm 302.
- the aperture 302 can also be used to spatially separate the space 304 comprising the light source 1, the nested collector 3 and the plane mirror 300 designed as a grid from the subsequent lighting system 306. If both rooms are separated by inserting a valve near the intermediate focus Z, a pressure separation is also possible. A spatial or pressure separation can prevent
- the collector 30 of the projection exposure system according to FIG. 6 is shown in FIG. 8 and has a distance between source 1 and intermediate image of source Z of 1500 mm, an object-side aperture of ⁇ 0.72 and an image-side aperture of ⁇ 0.1 15. All angles of incidence are relative to the surface tangent ⁇ 13 °.
- the angle of incidence relative to the surface tangent of the maximum beam in the exemplary embodiment according to FIG. 8 is 11.9 °.
- FIG. 8 also shows an aperture 180 arranged in the interior of the innermost mirror shell. Nested, reflective collectors necessarily have central shadowing because of the finite size of the mirror shells, ie the radiation from the source cannot be recorded below a certain aperture angle NA m j n .
- the aperture 180 prevents that directly light passing through the central shell does not enter the subsequent lighting system as a false layer.
- the aperture 180 is arranged, for example, 78 mm behind the source and has a diameter of 30.3 mm corresponding to an aperture obscuration of
- FIG. 9 shows the characteristic coordinates of a for the mirror shell 200, 202, 204, 205, 206, 207, 208, 209 of the collector according to FIG. 9
- Woltersystems comprising two segments, for example the first segment 200.1 and the second segment 200.3 of the first mirror shell 200. It designates ZS the z position of the surface vertex in relation to the position of the light source 1, ZV and ZH the start and end position of the first segment 200.1, which is a hyperboloid, in relation to the position of the surface vertex ZS.
- the reference symbols ZS, ZH and ZV are used in an analogous manner for the second segment 200.3 of the mirror shell, which is an ellipsoid.
- Table 2 Design data of the collector according to FIG. 8
- the embodiment of the Woltersystem according to FIG. 8 with eight shells is selected so that all shells end approximately in one plane 181. This means that all shells can be contained in one level 181.
- FIG. 10 shows the superimposition of the images of the first raster elements, which are also referred to as field honeycombs, in the field plane.
- the superimposition of images 3500 of the first raster elements results in an annular field in the field plane.
- the field level is spanned by the xy plane.
- the y-direction is parallel to the scanning direction and the x-direction is perpendicular to the scanning direction of a projection exposure system of the scanner type.
- An intensity l (x, y) is assigned to each field point in the xy plane.
- a characteristic quantity for projection exposure systems of the scanner type is the uniformity of the scanning energy in the scanning direction, i.e. Scan energy SE (x) integrated in the y direction.
- Intensity distribution l (x, y) by integrating the intensity distribution in the scan direction, i.e.
- the uniformity error is through
- the curve 4100 results for the scan-integrated energy SE (x) in the field plane if the collector has a total of 6 spokes, two spokes running perpendicular to the scanning direction in the x direction and four spokes each at an angle of 45 degrees to the x -Direction.
- a plan view in the local x-y plane of such a collector is shown in FIG. 12 a.
- 4000.1 and 4000.2 designate the two spokes running in the y direction and 4002.1
- Reference number 4102 denotes the course of the scanning energy SE (x) in the
- Reference number 4104 denotes the course of the scanning energy SE (x) in the field plane in the event that the collector comprises six spokes, two spokes 4000.1, 4000.2 extending in the x direction and four spokes 4002.1, 4002.2, 4002.3, 4002.4 at an angle are inclined by 30 ° with respect to the y-axis.
- the uniformity error ⁇ SE (x) is 8.3%.
- the arrangement of the support spokes can influence the uniformity of the illumination at the field level.
- the local coordinate system coincides with the collector level largely with the local coordinate system of the first optical element with raster elements as shown, for example, in FIG. 3.
- the invention thus for the first time becomes a collector with a fastening device for a large number of rotationally symmetrical ones
- Specified mirror shells which is characterized on the one hand by the fact that it has a high stability and on the other hand by the fact that the arrangement of the spokes means that the uniformity of the field illumination in the field plane, in which a mask or a reticle is arranged, only to a great extent small degree is affected.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02758381A EP1415199A2 (de) | 2001-08-10 | 2002-07-23 | Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen |
AU2002325359A AU2002325359A1 (en) | 2001-08-10 | 2002-07-23 | Collector with fastening devices for fastening mirror shells |
US10/775,037 US7091505B2 (en) | 2001-08-10 | 2004-02-09 | Collector with fastening devices for fastening mirror shells |
US11/416,447 US7321126B2 (en) | 2001-08-10 | 2006-05-02 | Collector with fastening devices for fastening mirror shells |
US11/974,718 US20080042079A1 (en) | 2001-08-10 | 2007-10-16 | Collector with fastening devices for fastening mirror shells |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10138313.4 | 2001-08-10 | ||
DE10138313A DE10138313A1 (de) | 2001-01-23 | 2001-08-10 | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
PCT/EP2002/000608 WO2002065482A2 (de) | 2001-01-23 | 2002-01-23 | KOLLEKTOR MIT UNGENUTZTEM BEREICH FÜR BELEUCHTUNGSSYSTEME MIT EINER WELLENLÄNGE ≤ 193 nm |
EPPCT/EP02/00608 | 2002-01-23 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/775,037 Continuation-In-Part US7091505B2 (en) | 2001-08-10 | 2004-02-09 | Collector with fastening devices for fastening mirror shells |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2003014833A2 true WO2003014833A2 (de) | 2003-02-20 |
WO2003014833A8 WO2003014833A8 (de) | 2003-09-04 |
WO2003014833A3 WO2003014833A3 (de) | 2003-11-13 |
Family
ID=33393732
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/008193 WO2003014833A2 (de) | 2001-08-10 | 2002-07-23 | Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen |
Country Status (3)
Country | Link |
---|---|
US (3) | US7091505B2 (de) |
AU (1) | AU2002325359A1 (de) |
WO (1) | WO2003014833A2 (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1901126A1 (de) * | 2006-09-15 | 2008-03-19 | Media Lario S.r.L. | Optisches Kollektorsystem |
DE102008054882A1 (de) | 2008-01-08 | 2009-07-16 | Carl Zeiss Smt Ag | Reparaturverfahren für optische Elemente mit Beschichtung und entsprechende optische Elemente |
DE102015220955A1 (de) | 2015-10-27 | 2015-12-17 | Carl Zeiss Smt Gmbh | Optisches Bauelement |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7098994B2 (en) * | 2004-01-16 | 2006-08-29 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7405804B2 (en) * | 2004-10-06 | 2008-07-29 | Asml Netherlands B.V. | Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby |
JP4990287B2 (ja) * | 2005-10-18 | 2012-08-01 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 波長が193nm以下の照明システム用集光器 |
WO2008145364A2 (de) * | 2007-05-31 | 2008-12-04 | Carl Zeiss Smt Ag | Verfahren zur herstellung eines optischen elementes mit hilfe von abformung, optisches element hergestellt nach diesem verfahren, kollektor und beleuchtungssystem |
US9461201B2 (en) | 2007-11-14 | 2016-10-04 | Cree, Inc. | Light emitting diode dielectric mirror |
NL1036768A1 (nl) * | 2008-04-29 | 2009-10-30 | Asml Netherlands Bv | Radiation source. |
US8636653B2 (en) * | 2008-06-09 | 2014-01-28 | Capso Vision, Inc. | In vivo camera with multiple sources to illuminate tissue at different distances |
KR101639229B1 (ko) * | 2008-07-21 | 2016-07-13 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치용 광학 요소 마운트 |
US8309944B1 (en) * | 2008-09-29 | 2012-11-13 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Grazing incidence neutron optics |
EP2342720A4 (de) * | 2008-10-30 | 2012-06-06 | Inspired Surgical Technologies Inc | Röntgenstrahlprozessor |
US8050380B2 (en) * | 2009-05-05 | 2011-11-01 | Media Lario, S.R.L. | Zone-optimized mirrors and optical systems using same |
US9362459B2 (en) | 2009-09-02 | 2016-06-07 | United States Department Of Energy | High reflectivity mirrors and method for making same |
US9435493B2 (en) * | 2009-10-27 | 2016-09-06 | Cree, Inc. | Hybrid reflector system for lighting device |
DE102009044462A1 (de) | 2009-11-06 | 2011-01-05 | Carl Zeiss Smt Ag | Optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage |
DE102009047180A1 (de) | 2009-11-26 | 2010-12-16 | Carl Zeiss Smt Ag | Facettenspiegel, Beleuchtungssystem und Projektionsbelichtungsanlage |
JP5670174B2 (ja) | 2010-03-18 | 2015-02-18 | ギガフォトン株式会社 | チャンバ装置および極端紫外光生成装置 |
US9105824B2 (en) | 2010-04-09 | 2015-08-11 | Cree, Inc. | High reflective board or substrate for LEDs |
US9012938B2 (en) | 2010-04-09 | 2015-04-21 | Cree, Inc. | High reflective substrate of light emitting devices with improved light output |
DE102011079933A1 (de) | 2010-08-19 | 2012-02-23 | Carl Zeiss Smt Gmbh | Optisches Element für die UV- oder EUV-Lithographie |
DE102010039965B4 (de) * | 2010-08-31 | 2019-04-25 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
US9728676B2 (en) | 2011-06-24 | 2017-08-08 | Cree, Inc. | High voltage monolithic LED chip |
US10243121B2 (en) | 2011-06-24 | 2019-03-26 | Cree, Inc. | High voltage monolithic LED chip with improved reliability |
EP2814573B1 (de) * | 2012-02-13 | 2018-03-21 | Convergent R.N.R Ltd | Bildgebungsgeführte abgabe von röntgenstrahlung |
DE102013105866A1 (de) * | 2013-06-06 | 2014-12-11 | Ushio Denki Kabushiki Kaisha | Reflektor eines EUV-Kollektors und Verfahren zu dessen Herstellung |
US10658546B2 (en) | 2015-01-21 | 2020-05-19 | Cree, Inc. | High efficiency LEDs and methods of manufacturing |
JP6951926B2 (ja) * | 2017-06-06 | 2021-10-20 | 株式会社オーク製作所 | 露光装置 |
US10942456B1 (en) * | 2020-01-17 | 2021-03-09 | National Applied Research Laboratories | Device of light source with diode array emitting high-uniformity ultraviolet |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1865441A (en) * | 1923-08-04 | 1932-07-05 | Wappler Electric Company Inc | Method of and apparatus for controlling the direction of x-rays |
US5192869A (en) * | 1990-10-31 | 1993-03-09 | X-Ray Optical Systems, Inc. | Device for controlling beams of particles, X-ray and gamma quanta |
EP0724150A1 (de) * | 1994-07-08 | 1996-07-31 | Muradin Abubekirovich Kumakhov | Vorrichtung zur erzeugung eines bildes von einem objekt unter der verwendung eines stromes von neutralen oder geladenen teilchen und einer linse zum konvertierten des stromes von neutralen oder geladenen teilchen |
WO2000063922A1 (en) * | 1999-04-20 | 2000-10-26 | Council For The Central Laboratory Of The Research Councils | Neutron lens |
US6198793B1 (en) * | 1998-05-05 | 2001-03-06 | Carl-Zeiss-Stiftung Trading As Carl Zeiss | Illumination system particularly for EUV lithography |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4242588A (en) | 1979-08-13 | 1980-12-30 | American Science And Engineering, Inc. | X-ray lithography system having collimating optics |
EP0710652B1 (de) * | 1994-11-04 | 1998-03-04 | Yamakawa Chemical Industry Co., Ltd. | Verfahren zur Herstellung von optisch aktiven Piperazinderivaten und Zwischenprodukten für ihre Herstellung |
US5745547A (en) * | 1995-08-04 | 1998-04-28 | X-Ray Optical Systems, Inc. | Multiple channel optic |
US5682415A (en) * | 1995-10-13 | 1997-10-28 | O'hara; David B. | Collimator for x-ray spectroscopy |
US5763930A (en) * | 1997-05-12 | 1998-06-09 | Cymer, Inc. | Plasma focus high energy photon source |
US6064072A (en) * | 1997-05-12 | 2000-05-16 | Cymer, Inc. | Plasma focus high energy photon source |
EP1039510A4 (de) * | 1997-11-14 | 2003-11-12 | Nikon Corp | Belichtungsapparat und herstellungsverfahren, und belichtungsverfahren |
US6108397A (en) | 1997-11-24 | 2000-08-22 | Focused X-Rays, Llc | Collimator for x-ray proximity lithography |
DE10138313A1 (de) * | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
US6438199B1 (en) * | 1998-05-05 | 2002-08-20 | Carl-Zeiss-Stiftung | Illumination system particularly for microlithography |
DE19903907A1 (de) | 1999-02-01 | 2000-08-03 | Mannesmann Rexroth Ag | Verfahren und Einrichtung zum Antreiben eines hydraulischen Verbrauchers |
US6278764B1 (en) | 1999-07-22 | 2001-08-21 | The Regents Of The Unviersity Of California | High efficiency replicated x-ray optics and fabrication method |
-
2002
- 2002-07-23 AU AU2002325359A patent/AU2002325359A1/en not_active Abandoned
- 2002-07-23 WO PCT/EP2002/008193 patent/WO2003014833A2/de not_active Application Discontinuation
-
2004
- 2004-02-09 US US10/775,037 patent/US7091505B2/en not_active Expired - Fee Related
-
2006
- 2006-05-02 US US11/416,447 patent/US7321126B2/en not_active Expired - Fee Related
-
2007
- 2007-10-16 US US11/974,718 patent/US20080042079A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1865441A (en) * | 1923-08-04 | 1932-07-05 | Wappler Electric Company Inc | Method of and apparatus for controlling the direction of x-rays |
US5192869A (en) * | 1990-10-31 | 1993-03-09 | X-Ray Optical Systems, Inc. | Device for controlling beams of particles, X-ray and gamma quanta |
EP0724150A1 (de) * | 1994-07-08 | 1996-07-31 | Muradin Abubekirovich Kumakhov | Vorrichtung zur erzeugung eines bildes von einem objekt unter der verwendung eines stromes von neutralen oder geladenen teilchen und einer linse zum konvertierten des stromes von neutralen oder geladenen teilchen |
US6198793B1 (en) * | 1998-05-05 | 2001-03-06 | Carl-Zeiss-Stiftung Trading As Carl Zeiss | Illumination system particularly for EUV lithography |
WO2000063922A1 (en) * | 1999-04-20 | 2000-10-26 | Council For The Central Laboratory Of The Research Councils | Neutron lens |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1901126A1 (de) * | 2006-09-15 | 2008-03-19 | Media Lario S.r.L. | Optisches Kollektorsystem |
WO2008031514A2 (en) * | 2006-09-15 | 2008-03-20 | Media Lario S.R.L. | A collector optical system |
WO2008031514A3 (en) * | 2006-09-15 | 2008-05-02 | Media Lario Srl | A collector optical system |
US8390785B2 (en) | 2006-09-15 | 2013-03-05 | Media Lario, S. R. L. | Collector optical system |
DE102008054882A1 (de) | 2008-01-08 | 2009-07-16 | Carl Zeiss Smt Ag | Reparaturverfahren für optische Elemente mit Beschichtung und entsprechende optische Elemente |
DE102015220955A1 (de) | 2015-10-27 | 2015-12-17 | Carl Zeiss Smt Gmbh | Optisches Bauelement |
DE102016211732A1 (de) | 2015-10-27 | 2017-04-27 | Carl Zeiss Smt Gmbh | Optisches Bauelement |
Also Published As
Publication number | Publication date |
---|---|
US7321126B2 (en) | 2008-01-22 |
US20060291062A1 (en) | 2006-12-28 |
WO2003014833A8 (de) | 2003-09-04 |
WO2003014833A3 (de) | 2003-11-13 |
US20080042079A1 (en) | 2008-02-21 |
AU2002325359A1 (en) | 2003-02-24 |
US20040227103A1 (en) | 2004-11-18 |
US7091505B2 (en) | 2006-08-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2003014833A2 (de) | Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen | |
EP1354325B1 (de) | KOLLEKTOR MIT UNGENUTZTEM BEREICH FÜR BELEUCHTUNGSSYSTEME MIT EINER WELLENLÄNGE KLEINER ODER GLEICH 193 nm. | |
EP1076906B1 (de) | Beleuchtungssystem insbesondere für die euv-lithographie | |
DE60106966T2 (de) | Beleuchtungssystem, insbesondere für Mikrolithographie | |
EP1614008B1 (de) | Optisches element für ein beleuchtungssystem | |
DE10138284A1 (de) | Beleuchtungssystem mit genesteten Kollektoren | |
EP1845417B1 (de) | Beleuchtungssystem mit Zoomobjetiv | |
EP1658615B1 (de) | Schiefspiegliges normal-incidence-kollektorsystem für lichtquellen, insbesondere euv-plasmaentladungsquellen | |
DE19903807A1 (de) | Beleuchtungssystem insbesondere für die EUV-Lithographie | |
DE19931848A1 (de) | Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen | |
EP1884831A2 (de) | Beleuchtungssystem für eine Projektionsbelichtungsanlage mit Wellenlängen < 193 nm | |
EP1938150A2 (de) | Kollektor für beleuchtungssysteme mit einer wellenlänge = 193 nm | |
EP3803512A1 (de) | Blende zur anordnung in einer engstelle eines euv-beleuchtungsbündels | |
WO2003075068A1 (de) | Beleuchtungssystem mit genestetem kollektor zur annularen ausleuchtung einer austrittspupille | |
EP1202100A2 (de) | Beleuchtungssystem mit reduzierter Wärmebelastung | |
DE102017204312A1 (de) | Optische Wellenlängen-Filterkomponente für ein Lichtbündel | |
DE102023201556A1 (de) | EUV-Kollektor für eine EUV-Projektionsbelichtungsanlage | |
WO2015036225A1 (de) | Beleuchtungsoptik für die euv-projektionslithografie | |
EP1415199A2 (de) | Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen | |
EP1490733A1 (de) | Kollektoreinheit mit einem reflektiven element für beleuchtungssysteme mit einer wellenlänge kleiner als 193 nm | |
WO2003081712A2 (de) | Gitterelement zum filtern von wellenlängen ≤ 100nm | |
DE102005043475A1 (de) | Kollektor mit konischen Spiegelschalen | |
DE102021202770A1 (de) | Verfahren zur Erzeugung eines Plasmas und Projektionsbelichtungsanlage für die Halbleiterlithographie | |
DE102016205624A1 (de) | Beleuchtungsoptik für die EUV-Projektionslithografie |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BY BZ CA CH CN CO CR CU CZ DE DM DZ EC EE ES FI GB GD GE GH HR HU ID IL IN IS JP KE KG KP KR LC LK LR LS LT LU LV MA MD MG MN MW MX MZ NO NZ OM PH PL PT RU SD SE SG SI SK SL TJ TM TN TR TZ UA UG US UZ VN YU ZA ZM |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LU MC NL PT SE SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG Kind code of ref document: A2 Designated state(s): GH GM KE LS MW MZ SD SL SZ UG ZM ZW AM AZ BY KG KZ RU TJ TM AT BE BG CH CY CZ DK EE ES FI FR GB GR IE IT LU MC PT SE SK TR BF BJ CF CG CI GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
CFP | Corrected version of a pamphlet front page | ||
CR1 | Correction of entry in section i |
Free format text: IN PCT GAZETTE 08/2003 UNDER (30) REPLACE "PCT/EP01/00608" BY "PCT/EP02/00608" |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2002758381 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10775037 Country of ref document: US |
|
WWP | Wipo information: published in national office |
Ref document number: 2002758381 Country of ref document: EP |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 2002758381 Country of ref document: EP |
|
REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
NENP | Non-entry into the national phase |
Ref country code: JP |
|
WWW | Wipo information: withdrawn in national office |
Country of ref document: JP |